Excited-state absorption at 1.57 μm in U:CaF2 and Co:ZnSe saturable absorbers

Appreciable excited-state absorption (ESA) in U²⁺:CaF₂ and Co²⁺:ZnSe saturable absorbers was measured at λ=1.573 μm by optical transmission versus light fluence curves of 30–40 ns long pulses. The ground- and excited-state absorption cross-sections obtained were (9.15±0.3)×10⁻²⁰ and (3.6±0.2)×10⁻²⁰ cm², respectively, for U²⁺:CaF₂, and (57±4)×10⁻²⁰ and (12.5±1)×10⁻²⁰ cm² for Co²⁺:ZnSe. Thus, ESA is not negligible in U²⁺:CaF₂ and Co²⁺:ZnSe, as previously estimated.     

Growth and spectroscopy of Dy doped in ZnWO4 crystal

Single-crystal ZnWO₄:Dy³⁺ was grown by Czochralski technique. The XRD, absorption spectra as well as fluorescence spectrum are investigated and the Judd–Ofelt intensity parameters Ω₂, Ω₄, Ω₆ are obtained to be 7.76 × 10⁻²⁰ cm², 0.57 × 10⁻²⁰ cm², 0.31 × 10⁻²⁰ cm², respectively. Calculated radiative transition rate, branching ratios and radiative lifetime for different transition levels of ZnWO₄:Dy³⁺ crystals are presented. Fluorescence lifetime of ⁴F_9/2 level is 158 μs and quantum efficiency is 66%.The most intense fluorescence line at 575 nm correlative with transition ⁴F_9/2 → ⁶H_13/2 is potentially for application of yellow lasers.     

Ordered Langmuir-Blodgett films of a substituted lutetium bisphthalocyanine

High-quality LB multilayers have been prepared from the Lu(III) sandwich complex of 2,3,9,10,16,17,23,24-octa (n-butoxy)phthalocyanine (LuPc₂(OBu)₁₆). Surface pressure-area isotherms were characterized and indicate that a stable monolayer is formed corresponding to an area per molecule of 2.4 nm² at 30 mN m⁻¹. The LB films were highly birefringent, and polarized spectra gave dichroic ratios of 3.3 for the 670 nm absorption band and between 0.5 and 2.8 for infrared absorptions. The results indicate that the phthalocyanine rings were highly oriented perpendicular to the dipping direction but somewhat tilted from the substrate normal. The order was shown to be absent when (i) unsubstituted LuPc₂ was used for LB films, or (ii) the horizontal lifting method of film deposition was used, or (iii) the surface pressure was increased to 50 mN m⁻¹, causing a molecular rearrangement. The ordering was improved at 100 °C and finally lost at 280 °C by annealing on a hot stage. The d.c. electrical conductivity of LB films of LuPc₂(OBu)₁₆ was low (σ ≈ 2 × 10⁻⁷ Ω⁻¹ m⁻¹), in contrast with unsubstituted LuPc₂ (σ ≈ 10⁻¹ Ω⁻¹ m⁻¹) and showed no evidence for anisotropy. The findings are in broad agreement with related studies and illustrate some of the many factors involved in improving the structure of phthalocyanine LB films for possible applications.     

Highly conducting indium tin oxide (ITO) thin films deposited by pulsed laser ablation

Highly conducting and transparent indium tin oxide (ITO) thin films were prepared on SiO₂ glass and silicon substrates by pulsed laser ablation (PLA) from a 90 wt.% In₂O₃-10 wt.% SnO₂ sintered ceramic target. The growths of ITO films under different oxygen pressures (P_O2) ranging from 1×10⁻⁴–5×10⁻² Torr at low substrate temperatures (T_s) between room temperature (RT) and 200°C were investigated. The opto-electrical properties of the films were found to be strongly dependent on the P_O2 during the film deposition. Under a P_O2 of 1×10⁻² Torr, ITO films with low resistivity of 5.35×10⁻⁴ and 1.75×10⁻⁴ Ω cm were obtained at RT (25°C) and 200°C, respectively. The films exhibited high carrier density and reasonably high Hall mobility at the optimal P_O2 region of 1×10⁻² to 1.5×10⁻² Torr. Optical transmittance in excess of 87% in the visible region of the solar spectrum was displayed by the films deposited at Po₂≥1×10⁻² Torr and it was significantly reduced as the P_O2 decreases.     

Normal metal, ohmic contacts to high-temperature superconducting YBa2Cu3O7-δ thin films suitable for multichip modules

Normal metal, ohmic contacts to high-temperature superconductor (HTSC) materials will be used to form via structures between HTSC interconnect levels, and also, substrate bonding pads in a superconducting multichip module (SMCM). Specific contact resistivities below 10⁻⁸ Ω cm² will be required for such contacts to control signal attenuation and local contact heating of the LN₂cooled SMCM. Previous work on normal metal/superconducting contacts has not focused on metallization schemes which will be stable during subsequent high-temperature processing. Metal contacts of gold, silver, and palladium were formed on superconducting thin films of YBa₂Cu₃O_7-δ via evaporation and sputtering through a shadow mask followed by annealing in various ambients and at several temperatures. Palladium contacts oxidized readily during anneal, and sputtered gold contacts required additional processing and exhibited higher specific contact resistivities. The best contacts were obtained by a controlled-cooling oxygen anneal of evaporated gold or silver, as indicated by normal-state specific contact resistivities of 3 × 10⁻⁵ Ω cm² and 4 × 10⁻⁵ Ω cm², respectively. This work differs from previously published results by describing contacts which required no extensive preparation of the HTSC surface and were stable to 700 °C, indicating these contacts would be compatible with subsequent high-temperature processing of the additional HTSC layers required in a multi-level SMCM.     

A comparative study of low dielectric constant barrier layer, etch stop and hardmask films of hydrogenated amorphous Si-(C, O, N)

New barrier layer, etch stop and hardmask films, including hydrogenated amorphous a-SiC_x:H (SiC), a-SiC_xO_y:H (SiCO), and a-SiC_xN_y:H (SiCN) films with a dielectric constant (k) approximately 4.3, are produced using the plasma-enhanced chemical vapor deposition technique. The chemical and structural nature, and mechanical properties of these films are characterized using X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, and nano-indentation. The leakage current density and breakdown electric field are investigated by a mercury probe on a metal-insulator-semiconductor structure. The properties of the studied films indicate that they are potential candidates as barrier layer, etch stop and hardmask films for the advanced interconnect technology. The SiC film shows a high leakage current density (1.3×10⁻⁷ A/cm² at 1.0 MV/cm) and low breakdown field (1.2 MV/cm at 1.0×10⁻⁶ A/cm²). Considering the mechanical and electrical properties requirements of the interconnect process, SiCN might be a good choice, but the N content may result in via poison problem. The low leakage current (1.2×10⁻⁹ A/cm² at 1.0 MV/cm), high breakdown field (3.1 MV/cm at 1.0×10⁻⁶ A/cm²), and relative high hardness (5.7 GPa) of the SiCO film indicates a good candidate as a barrier layer, etch stop, or hardmask.     

Underlying mechanisms for unique elastic properties of nanocrystalline Au

In order to get an insight into the grain boundaries (GBs) in nanocrystalline (n-) metal, we prepared the high-density n-Au with ρ/ρ₀>99% by the gas-deposition method and carried out the vibrating reed measurements, where ρ/ρ₀ is the relative density referring to the bulk density. The strain amplitude dependence (SAMD) of the resonant frequency (f) and the internal friction (Q⁻¹) was measured for the strain () amplitude between 10⁻⁶ and 2×10⁻³ and for temperature between 5 and 300 K. No plastic deformations are detected for the present strain range, where f decreases for up to 10⁻⁴ and then turns to increase, showing saturation for between 10⁻⁴ and 2×10⁻³. The low temperature irradiation by 2 MeV electrons or 20 MeV protons causes an increase in the Young’s modulus at 6 K, which is surmised to reflect a modification of the anelastic process in the GB regions. In contrast, the SAMD of f is hardly modified by irradiation, suggesting that it is indicative of a collective motion of atoms in n-Au.     

The optical and electrical properties of copper indium di-selenide thin films

Thin films of copper indium di-selenide (CIS) with a wide range of compositions near stoichiometry have been formed on glass substrates in vacuum by the stacked elemental layer (SEL) deposition technique. The compositional and optical properties of the films have been measured by proton-induced X-ray emission (PIXE) and spectrophotometry (photon wavelength range of 300–2500 nm), respectively. Electrical conductivity (σ), charge-carrier concentration (n), and Hall mobility (μ_H) were measured at temperatures ranging from 143 to 400 K. It was found that more indium-rich films have higher energy gaps than less indium-rich ones while more Cu-rich films have lower energy gaps than less Cu-rich films. The sub-bandgap absorption of photons is minimum in the samples having Cu/In ≈ 1 and it again decreases, as Cu/In ratio becomes less than 0.60. Indium-rich films show n-type conductivities while near-stoichiometric and copper-rich films have p-type conductivities. At 300 K σ, n and μ_H of the films vary from 2.15 × 10⁻³ to 1.60 × 10⁻¹ (Ω cm)⁻¹, 2.28 × 10¹⁵ to 5.74 × 10¹⁷ cm⁻³ and 1.74 to 5.88 cm² (V s)⁻¹, respectively, and are dependent on the composition of the films. All the films were found to be non-degenerate. The ionization energies for acceptors and donors vary between 12 and 24, and 3 and 8 meV, respectively, and they are correlated well with the Cu/In ratios. The crystallites of the films were found to be partially depleted in charge carriers.     

Effects of reduction treatment on the photorefractive properties of Pb0.5Ba0.5Nb2O6

Lead barium niobate is a new photorefractive material of high interest for a variety of applications including holographic storage. Pb_0.5Ba_0.5Nb₂O₆ crystals have been grown by the Bridgman method, and the effects of heat treatments on their photorefractive properties were investigated using Ar ion laser at λ=514.5 nm. The color and absorption spectrum of the crystals varied depending on the oxygen partial pressure during heat treatment. The oxygen diffusivity was estimated to be in the order of 10⁻⁶ and 10⁻⁵ cm²/h at 425 and 550 °C, respectively. Reduction treatment at an oxygen pressure of 215 mTorr increased the effective density of photorefractive charges about three times from 8.0×10¹⁵ to 2.2×10¹⁶ cm⁻³ and made the charge transport more electron-dominant. As a result, the maximum gain coefficient improved from 5.5 to 13.8 cm⁻¹. A diffraction efficiency as high as 70% was achieved in a reduced crystal.     

Effect of Al2O3 particles on mechanical properties of directionally solidified intermetallic Ti–46Al–2W–0.5Si alloy

The effect of Al₂O₃ particles on microhardness and room-temperature compression properties of directionally solidified (DS) intermetallic Ti–46Al–2W–0.5Si (at.%) alloy was studied. The ingots with various volume fractions of Al₂O₃ particles and mean ₂–₂ interlamellar spacings were prepared by directional solidification at constant growth rates ranging from 2.78×10⁻⁶ to 1.18×10⁻⁴ ms⁻¹ in alumina moulds. The ingots with constant volume fraction of Al₂O₃ particles and various mean interlamellar spacings were prepared by directional solidification at a growth rate of 1.18×10⁻⁴ ms⁻¹ and subsequent solution annealing followed by cooling at constant rates varying between 0.078 and 1.889 K s⁻¹. The mean ₂–₂ interlamellar spacing λ for both DS and heat-treated (HT) ingots decreased with increasing cooling rate according to the relationship λ∝ ^−0.46. In DS ingots, microhardness, ultimate compression strength, yield strength and plastic deformation to fracture increased with increasing cooling rate. In HT ingots, microhardness and yield strength increased and ultimate compression strength and plastic deformation to fracture decreased with increasing cooling rate. The yield stress increased with decreasing interlamellar spacing and increasing volume fraction of Al₂O₃ particles. A linear relationship between the Vickers microhardness and yield stress was found for both DS and HT ingots. A simple model including the effect of interlamellar spacing and increasing volume fraction of Al₂O₃ particles was proposed for the prediction of the yield stress.     

Phase formation at rapid thermal annealing of Al/Ti/Ni ohmic contacts on 4H-SiC

Ohmic contacts to the top p-type layers of 4H-SiC p⁺–n–n⁺ epitaxial structures having an acceptor concentration lower than 1×10¹⁹ cm⁻³ were fabricated by the rapid thermal anneal of multilayer Al/Ti/Pt/Ni metal composition. The rapid thermal anneal of multilayer A1/Ti/Pt/Ni metal composition led to the formation of duplex cermet composition containing Ni₂Si and TiC phases. The decomposition of the SiC under the contact was found to be down to a depth of about 100 nm. The contacts exhibited a contact resistivity R_c of 9×10⁻⁵ Ω cm⁻² at 21°C, decreasing to 3.1×10⁻⁵ Ω cm⁻² at 186°C. It was found that thermionic emission through the barrier having a height of 0.097 eV is the predominant current transport mechanism in the fabricated contacts.     

Light emitting devices from organic charge transfer adduct thin films

For the first time, thin film devices of charge transfer adducts of tetrathiafulvalene (TTF) have been fabricated. A luminance of 5 cd m⁻² has been achieved for a device structure ITO/poly(aniline)/TTF(NO₃)_0.55/Al whose EL spectrum has a broad peak at 645 nm. The devices were fabricated by spin coating from solutions of the adducts. A luminous efficiency of 5×10⁻⁴ lm W⁻¹ has been obtained for these devices which is comparable to that of ITO/poly(aniline)/Alq₃/Al (5.2×10⁻⁴ lm W⁻¹) under same fabrication conditions. The single layer, mixed layer and double layer devices fabricated in this study fit the space charge limited model. Devices fabricated from the adduct [TTF–Alq₃] emit white light (40 cd m⁻²) with a luminous efficiency of 6.6×10⁻⁴ lm W⁻¹. The colour of light emitted appears to depend on the effective oxidation state of TTF in the adducts.     

Femtosecond Z-scan investigation of nonlinear refraction in surface modified PbS nanoparticles

The third-order optical nonlinearities of surface modified PbS nanoparticles have been measured using the Z-scan technique with femtosecond laser pulses at 780 nm wavelength. The samples studied are the nanoparticles in microemulsion with the PbS concentration ranging from 0.3×10⁻³ to 1.9×10⁻³ M (mol/l). A Z-scan analysis method based on the Huygens–Fresnel (H–F) propagation integral is employed to extract the nonlinear refractive index from the experimental Z-scan data with a large nonlinear phase shift. The nonlinear refractive index of the PbS nanoparticles in microemulsion is found to increase linearly with the PbS concentration. The highest concentration microemulsion gives a nonlinear refractive index of −4.7×10⁻¹² cm²/W, which is approximately 3 orders of magnitude higher than those of commercially available bulk semiconductors, such as ZnS and CdS. In addition, nonlinear absorption in these samples remained unmeasurable up to 0.9 GW/cm². The mechanisms responsible for the observed large refractive nonlinearity are discussed.     

Elevated temperature creep behavior of three rapidly solidified Al-Fe-Si materials containing Cr, Mn, or Mo

Research on the high temperature creep behavior of three rapidly solidified Al-Fe-X-Si (where X = Cr, Mn or Mo) dispersion strengthened materials with three different alloying compositions has been conducted. Firstly, microstructural examinations have been carried out on the as-received, thermally treated and tested samples. The microstructure consists of a fine Al matrix embedding small round-shaped Al₁₂(Fe,X)₃Si and Al₁₃(Fe,X)₄ dispersoids. Grain sizes ranging from 0.85 to 1.45 μm and dispersoid sizes ranging from 45 to 54 nm were observed. Secondly, tensile tests were performed at high temperature from 573 to 823 K at strain rates ranging from 2.5×10⁻⁶ to 10⁻²s⁻¹. The experimental data exhibited high apparent stress exponent, n_ap, and high activation energy, Q_ap. The rnicrostructure remained stable and fine after testing. The results are analyzed by means of various models used in the literature.     

New transparent conducting MgIn2O4---Zn2In2O5 thin films prepared by magnetron sputtering

New materials for a transparent conducting oxide film are demonstrated. Highly transparent Zn₂In₂O₅ films with a resistivity of 3.9 × 10⁻⁴ Ω cm were prepared on substrates at room temperature using a pseudobinary compound powder target composed of ZnO (50 mol.%) and In₂O₃ (50 mol.%) by r.f. magnetron sputtering. MgIn₂O₄---Zn₂In₂O₅ films were prepared using MgIn₂O₄ targets with a ZnO content of 0–100 wt.%. The resistivity of the deposited films gradually decreased from 2 × 10⁻³ to 3.9 × 10⁻⁴ Ω cm as the Zn/(Mg + Zn) atomic ratio introduced into the films was increased. The greatest transparency was obtained in a MgIn₂O₄ film. The optical absorption edge of the films decreased as the Zn/(Mg + Zn) atomic ratio was increased, corresponding to the bandgap energy of their materials. It was found that the resistance of the undoped Zn₂In₂O₅ films was more stable than either the undoped MgIn₂O₄, ZnO or In₂O₃ films in oxidizing environments at high temperatures.     

Structural properties of swift heavy ion beam irradiated Fe/Si bilayers

The Fe/Si multilayers were prepared by electron beam evaporation in a cryo-pumped vacuum deposition system. Ag⁺ and Au⁺ ions of 100 MeV at two different fluencies such as 1 × 10¹² ions/cm² and 1 × 10¹³ ions/cm² at a pressure of 10^− 7 torr were used to irradiate the Fe/Si samples. The irradiated samples were analyzed by High-Resolution XRD and it reveals that the irradiated films are having polycrystalline nature and it confirms the formation of the β-FeSi₂. The structural parameters such as crystallite size (D), strain (ε) and dislocation density (δ) have been evaluated from the XRD spectrum. The role of the substrates and the influence of swift heavy ions on the formation of β-FeSi₂ have been discussed in this paper.     

Development of Bi-oxide superconducting tapes and coils

We have developed Bi-2212 and 2223 tapes. For Bi-2212, two double stacked pancake type coils were fabricated using Bi-2212/Ag tapes prepared by a combination of the continuous dip-coating process and melt-solidification. A small coil (13 mm inner bore, 46.5 mm outer diameter) was inserted in a conventional superconducting magnet system. In a bias field of 20.9 T, the generated field of the coil was 0.9 T, at an I_c of 310 A (criterion 10⁻¹³ Ωm) at 1.8 K. Thus, the superconducting magnet system achieved the generation of a field of 21.8 T in the full superconducting state. A large coil (20 mm inner bore, 94 mm outer diameter) generated a field of 2.6 T (I_c = 385 A (10⁻¹³ Ωm)) at 4.2 K and 1.53 T (I_c = 225 A (10⁻¹³Ωm)) at 20 K in self-field. For Bi-2223, tapes were prepared by the powder-in-tube technique using Ag-10% Cu-x%M (x = 0–1.0, M = Ti, Zr, Hf or Au) alloy sheaths. The high J_c values of 5–7 × 10⁴ A cm⁻² at 4.2 K and 14 T were obtained for the tapes doped with x = 0.03–0.1 at.% Ti, 0.1 at.% Zr, 0.1 at.% Hf or 0.3% Au. These tapes have a modified Bi-2223 grain structure at the sheath/core interface and also a dense and more aligned microstructure, resulting in higher J_c values.     

Charge trapping in polymer diodes

We report studies focusing on the nature of trap states present in single layer ITO/poly(phenylene vinylene)/Al light emitting diodes. At high applied bias the IV characteristics from 11 to 290 K can be successfully modelled by space charge limited current (SCLC) theory with an exponential trap distribution, giving a trap density H_t of 4(±2) × 10¹⁷ cm⁻³, μ_p, between 10⁻⁶ and 5 × 10⁻⁸ cm² V⁻¹ s⁻¹ and a characteristic energy E_t of 0.15 eV at high temperatures. The transient conductance follows a power-law relationship with time whose decay rate decreases with decreasing temperature. This can be directly related to the emptying of the trap distribution found in the SCLC analysis. Due to variations in structure, conformation and environment, the polymer LUMO and HOMO density of states form Gaussian distributions of chain sites. The deep sites in the tail of the distributions are the observed traps for both positive and negative carriers. The same sites dominate the photo- and electroluminescence emission. This implies that the emissive layer in organic LED's should be made as structurally disordered as possible.     

Transparent conductive In2O3:Mo thin films prepared by reactive direct current magnetron sputtering at room temperature

An amorphous transparent conductive oxide thin film of molybdenum-doped indium oxide (IMO) was prepared by reactive direct current magnetron sputtering at room temperature. The films formed on glass microscope slides show good electrical and optical properties: the low resistivity of 5.9 × 10^− 4 Ω cm, the carrier concentration of 5.2 × 10²⁰ cm^− 3, the carrier mobility of 20.2 cm² V^− 1 s^− 1, and an average visible transmittance of about 90.1%. The investigation reveals that oxygen content influences greatly the carrier concentration and then the photoelectrical properties of the films. Atomic force microscope evaluation shows that the IMO film with uniform particle size and smooth surface in terms of root mean square of 0.8 nm was obtained.     

Physics and diagnostics of laser ablation plume propagation for high-Tc superconductor film growth

The formation, composition and propagation of laser-produced plasmas used for pulsed laser deposition (PLD) of Y₁Ba₂Cu₃O_7−x have been studied under film growth conditions. Four complementary spatially and temporally resolved in situ diagnostic techniques are applied to characterize the expansion of the laser plume into both vacuum and ambient gases: optical emission and absorption spectroscopy, fast ion probe measurements, and fast photography with a gated, image-intensified charge-coupled detector-array (ICCD) camera system. Transient optical absorption spectroscopy reveals large densities of ground state atoms, ions, and molecules in the plume as well as a slower component to the plume transport than is indicated by the plasma fluorescence and ion current.

Ablation into background gases results in scattering and attenuation of the laser plume. The exponential attenuation of the positive ion flux transmitted through 50–300 mTorr background oxygen is measured and used to define an overall ion-oxygen reaction cross-section σ_i−O2 = 2.3 × 10⁻¹⁶ cm² under the described film growth conditions.

The slowing of the laser plasma and formation of shock structures due to collisions with the ambient gas are described using ion probe measurements and ICCD photographic comparisons of expansion into vacuum and background oxygen. At the pressures used for PLD, distance-time R−t plots derived from the photographs and ion probe waveforms indicate that the higher pressure plume initially expands through the ambient gas in accordance with a drag model (where R = x_f[1 − exp( − βt)]), experiencing little slowing until a visible shock structure forms. Following a transition period, in which the plume appears to have two components, a single-component shock structure propagates in better agreement with a shock, or blast wave (R = ξ₀(E/₀)^1/5t^2/5) model.