Electron mobility in the inversion layers of fully depleted SOI films

The dependences of the electron mobility μ_eff in the inversion layers of fully depleted double–gate silicon-on-insulator (SOI) metal–oxide–semiconductor (MOS) transistors on the density N _e of induced charge carriers and temperature T are investigated at different states of the SOI film (inversion–accumulation) from the side of one of the gates. It is shown that at a high density of induced charge carriers of N _e > 6 × 10¹² cm^–2 the μeff(T) dependences allow the components of mobility μ_eff that are related to scattering at surface phonons and from the film/insulator surface roughness to be distinguished. The μ_eff(N _e ) dependences can be approximated by the power functions μ_eff(N _e) ∝ N _e ^?n . The exponents n in the dependences and the dominant mechanisms of scattering of electrons induced near the interface between the SOI film and buried oxide are determined for different N _e ranges and film states from the surface side.     

Interaction of charge carriers with the localized magnetic moments of manganese atoms in <Emphasis Type="Italic">p</Emphasis>-GaInAsSb/<Emphasis Type="Italic">p</Emphasis>-InAs:Mn heterostructures

Transport properties of p-Ga_1?xIn_xAs_ySb_1?y/p-InAs:Mn heterostructures with undoped layers of solid solutions similar in composition to GaSb (x?0.22) grown by liquid-phase epitaxy on substrates with a Mn concentration of (5–7)×10¹⁸ cm^?3 are studied. It is ascertained that there is an electron channel at the interface (from the InAs side). The anomalous Hall effect and negative magnetoresistance are observed at relatively high temperatures (77–200) K. These phenomena can be attributed to the s-d-exchange interaction between Mn ions of the substrate and s electrons of the two-dimensional channel. The effective magnetic moment of Mn ions was evaluated as μ=200µ_B at T=77 K.     

Role of Si-doped Al<Subscript>0.3</Subscript>Ga<Subscript>0.7</Subscript>As layers in the high-frequency conductivity of GaAs/Al<Subscript>0.3</Subscript>Ga<Subscript>0.7</Subscript>As heterostructures under conditions of the quantum hall effect

The complex high-frequency conductivity of GaAs/Al_0.3Ga_0.7As heterostructures that are δ-doped and modulation-doped with silicon was investigated by acoustic methods under conditions of the integer quantum Hall effect. Both the real (σ₁) and imaginary (σ₂) parts of the complex conductivity σ(ω, H)=σ_i?iσ₂ were determined from the dependences of the absorption and velocity of surface acoustic waves on magnetic field. It is shown that, in the heterostructures with electron density n_s=(1.3–7)×10¹¹ cm^?2 and mobility μ=(1–2)×10⁵ cm²/(V s), the high-frequency conductivity near the centers of the Hall plateau is due to electron hopping between localized states. It is established that, with filling numbers 2 and 4, the conductivity of the Al_0.3Ga_0.7As:Si layer efficiently shunts the high-frequency hopping conductivity of the two-dimensional interface layer. A method of separating the contributions of the interface and Al_0.3Ga_0.7As:Si layers to the hopping conductivity σ(ω, H) is developed. The localization length of electrons in the interface layer is determined on the basis of the nearest neighbor hopping model. It is shown that, near the centers of the Hall plateau, both σ(ω, H) and n_s depend on the cooling rate of a GaAs/Al_0.3Ga_0.7As sample. As a result, the sample “remembers” the cooling conditions. Infrared light and static strain also change both σ(ω, H) and n_s. We attribute this behavior to the presence of two-electron defects (so-called DX^? centers) in the Al_0.3Ga_0.7As:Si layer.     

Features of the infrared reflection spectra of SmS semiconductor in the homogeneity range

Infrared reflection spectra in the range of 5200–380 cm^?1 were measured for polycrystalline samarium monosulfide samples in the semiconductor phase with compositions Sm_{1 + x} S lying within the homogeneity range (0 ≤ x ≤ 0.17) in the temperature range of 300–600 K. Five peaks with energies in the range of 1150–880 cm^?1, whose positions depend weakly on the composition and temperature. It was shown that the reflection peaks are associated with ⁷ F ₀–⁷ F ₂ transitions of 4f electrons of Sm²⁺ ions.     

Increase in the rate and discretization of the kinetics of isothermal surface generation of minority charge carriers in metal-insulator-semiconductor structures with a planar-inhomogeneous insulator

Surface generation of minority charge carriers in silicon metal-oxide-semiconductor (MOS) structures is efficient only at the initial recombinationless stage. Quasi-equilibrium between surface generation centers and the minority-carrier band is established in a time t ～ 10^?5 s. In the absence of other carrier generation channels, an equilibrium inversion state at 300 K would need t = t_∞ > 10³ years to become established. In fact, the time t ∞ is much shorter, due to excess-carrier generation via centers located at the SiO₂/Si interface over the gate periphery. This edge-related generation can easily be simulated in an MOS structure with a single gate insulated from Si by oxide layers of various thicknesses. At gate depleting voltages V _g , the role of the periphery is played by a shallow potential well under a thicker oxide, and the current-generation kinetics becomes unconventional: two discrete steps are observed in the dependences I(t), and the duration and height of these steps depend on V _g . An analysis of the I(t) curves allows determination of the electric characteristics of the Si surface in the states of initial depletion (t = 0) and equilibrium inversion (t = t_∞), as well as the parameters of surface lag centers, including their energy and spatial distributions. The functionally specialized planar inhomogeneity of a gate insulator is a promising basis for dynamic sensors with integrating and threshold properties.     

Raman and infrared spectroscopy of GaN nanocrystals grown by chloride-hydride vapor-phase epitaxy on oxidized silicon

Raman and infrared spectroscopy were applied to study nanocrystalline GaN films grown by chloride-hydride vapor-phase epitaxy on SiO₂/Si(111) substrates at T=520°C. It was ascertained that GaN nanocrystals are formed on the oxidized silicon surface at a rate of 10^?2 nm/s. It was shown that the peaks in the Raman spectra E₂(high)=566 cm^?1 and A₁(LO)=730 cm^?1 correspond to the elastically strained GaN wurtzite structure. It was detected that a peak related to E₁(TO)=558 cm^?1 arises in the infrared spectra, which shows that elastic stresses in the nanocrystals are insignificant.     

Electron-phonon damping factor for the landau quantization of 2D electrons with a fine structure of the energy spectrum

The drift of degenerate 2D electrons in the channel of the heterojunction potential well is considered. In a quantizing magnetic field B, the electrons scan the defects of the heteroboundary, which perturb their momentum and energy equilibrium state (T, T _D ⁰ ). The stationary nonequilibrium state (T, T _D ^* ) is attained by electron-phonon relaxation in energy and momentum. The experimentally observed nonlinear dependence T_D(T) is explained by the admixture of deformation acoustic phonons to the interaction of 2D electrons with piezoelectric phonons.     

Traps with near-midgap energies at the bonded Si/SiO<Subscript>2</Subscript> interface in silicon-on-insulator structures

Capture centers (traps) are studied in silicon-on-insulator (SOI) structures obtained by bonding and hydrogen-induced stratification. These centers are located at the Si/SiO₂ interface and in the bulk of the split-off Si layer. The parameters of the centers were determined using charge deep-level transient spectroscopy (Q-DLTS) with scanning over the rate window at fixed temperatures. Such a method allows one to study the traps near the Si midgap at temperatures near 295 K. It is shown that the density of traps with a continuous energy spectrum, which are located at the bonded Si/SiO₂ interface, decreases by more than four orders of magnitude at the mid-gap compared with the peak density observed at the activation energy E _a ≈0.2–0.3 eV. The capture centers are also found in the split-off Si layer of the fabricated SOI structures. Their activation energy at room temperature is E _a =0.53 eV, the capture cross section is 10^?19 cm², and the concentration is (0.7–1.7)×10¹³ cm^?3. It is assumed that these capture centers are related to deep bulk levels induced by electrically active impurities (defects) in the split-off Si layer close to the Si/SiO₂ interface.     

Terahertz luminescence of GaAs-based heterostructures with quantum wells under the optical excitation of donors

Spontaneous emission from selectively doped GaAs/InGaAs:Si and GaAs/InGaAsP:Si heterostructures is studied in the frequency range of ～3–3.5 THz for transitions between the states of the two-dimensional subband and donor center (Si) under the condition of excitation with a CO₂ laser at liquid-helium temperature. It is shown that the population inversion and amplification in an active layer of 100–300 cm^?1 in multilayered structures with quantum wells (50 periods) and a concentration of doping centers N _D ≈ 10¹¹ cm^?2 can be attained under the excitation-flux density 10²³ photons/(cm² s).     

Electron traps in thin layers of low-temperature-grown gallium arsenide with As-Sb nanoclusters

Electron traps in low-temperature-grown ～40-nm-thick GaAs layers containing nanometer As-Sb clusters have been studied using deep-level transient spectroscopy. Measurements at various bias voltages and small-amplitude filling pulses have allowed the identification of two groups (T1 and T2) of traps with substantially different thermal electron emission rates. It is shown that the density of traps T2 (with an activation energy of 0.56 ± 0.04 eV and electron capture cross section of 2 × 10^?13?10^?12cm²) is ～2 × 10¹²cm_?2, while the density of traps T1 (0.44 ± 0.02 eV and 2 × 10^?14?10^?13 cm², respectively) is ten times lower. It is assumed that, according to the existence of the two cluster groups observed in the layers under study, traps T2 are associated with clusters 4–7 nm in diameter and traps T1, with clusters up to ～20 nm in diameter.     

Electron transport and detection of terahertz radiation in a GaN/AlGaN submicrometer field-effect transistor

Electron transport and photoresponse in the terahertz range in a GaN/AlGaN field-effect transistor with the submicrometer gate (0.25 μm) and two-dimensional electron gas in the channel (the electron concentration n _s = 5 × 10¹² cm^?2) were studied at 4.2 K. The charge-carrier mobility in the transistor’s channel μ = 3500 cm²/(V s) was determined from the dependence of the conductance on magnetic field. It is found that the dependence of photovoltage at the radiation frequency f = 574 GHz on the gate voltage (i.e., on the concentration of two-dimensional electrons) features a characteristic maximum, which is related to a resonance response of the subgate plasma in the transistor channel.     

Electrical properties of Si:H/<Emphasis Type="Italic">p</Emphasis>-Si structures fabricated by hydrogen implantation

Hydrogenated silicon (Si:H) layers and Si:H/p-Si heterostructures were produced by multiple-energy (3–24 keV) high-dose (5×10¹⁶–3×10¹⁷ cm^?2) hydrogen implantation into p-Si wafers. After implantation, current transport across the structures is controlled by the Poole-Frenkel mechanism, with the energy of the dominating emission center equal to E _c ?0.89 eV. The maximum photosensitivity is observed for structures implanted with 3.2×10¹⁷ cm^?2 of hydrogen and annealed in the temperature range of 250–300°C. The band gap of the Si:H layer E _g ≈2.4 eV, and the dielectric constant ?≈3.2. The density of states near the Fermi level is (1–2)×10¹⁷ cm^?3 eV^?1.     

Thermoelectric figure of merit in solid solutions with phonon scattering by off-center impurities

The Seebeck coefficient and the electrical and thermal conductivities (S, σ, and κ) of ternary PbTe_1?xSe_x (x=0.1 and 0.3) and quaternary PbTe_1?2xSe_xS_x (x=0.025, 0.05, 0.1, and 0.15) solid solutions have been studied. Polycrystalline samples with an electron density of (0.5–5.0)×10¹⁸ cm^?3 were used; their quality was monitored by comparing the measured and calculated mobility values at 85 K. A considerable decrease in mobility and an anomalous trend in the σ(T) curve near 77 K were revealed in quaternary alloys with x?0.1; for x=0.15, unusual behavior of κ(T) was also found. According to estimates, the lattice thermal conductivity of this material is temperature-independent in the 80-to 300-K temperature range. This means that a reduction in phonon-phonon scattering with an increase in temperature is completely compensated by an increase in the scattering on impurities. The observed anomalies of σ(T) and κ(T) are considered assuming the possible of off-center location of sulfur atoms at the lattice sites. The thermoelectric figure of merit Z of the studied alloys has been determined in the range 80–300 K. In spite of decreasing mobility, the maximum Z was obtained in a quaternary compound with x=0.1: at 300 K, Z_max=2×10^?3 K^?1 with a carrier density of ～3×10¹⁸ cm^?3; at 175 K, Z_max=1.5×10^?3 K^?1 with the density decreasing to 5×10¹⁷ cm^?3. The obtained data indicate that the introduction of off-center impurities rises Z at T?300 K.     

Resonance modulation of the intersubband electron-electron interaction in an AlSb(δ-Te)/InAs/AsSb(δ-Te) quantum well by magnetic field

The amplitude-frequency modulation of oscillations of the magnetoresistance of 2D electrons in an AlSb(δ-Te)/InAs/AsSb(δ-Te) quantum well is studied. In the dependence of the amplitude of the oscillations δ(1/B) _{T = const}, regions of negative Dingle temperature are observed. The anomalies in the dependence δ(1/B) _{T = const} are attributed to the fact that the quantizing magnetic field resonantly induces intersubband electron-electron interaction between the 2D electrons of the ground size-quantization subband and excited subband. The resonance fields B and the times corresponding to the collision-related broadening of the Landau levels are estimated. The concentration threshold of filling of the excited size-quantization subband is established at a level of n _s ≈ 8 × 10¹¹ cm^?2.     

Fine Structure of the long-wavelength edge of exciton-phonon absorption and hyperbolic excitons in silicon carbide of 6<Emphasis Type="Italic">H</Emphasis> polytype

The fine structure of the long-wavelength edge of the polarization spectra of exciton-phonon absorption in moderate-purity n-type 6H-SiC crystals with a concentration of uncompensated donors N_D?N_A=(1.7–2.0)×10¹⁶ cm^?3 at T=1.7 K was studied. The analysis of new special features found at the absorption edge and the reliable detection of the onset of exciton-phonon steps related to the emission of phonons from acoustical and optical branches allowed highly accurate determination of a number of important parameters such as the band gap, the exciton band gap, the exciton binding energy, and the energies of spin-orbit and crystal-field splitting of an exciton. For the first time, transitions with the emission of LA phonons to the 1S exciton state with an M₁-type dispersion law were detected in E ∥ Z(C) polarization (the electric-field vector is parallel to the optical axis of the crystal). This observation supports the previously predicted “two-well” structure of the conduction band minimum in 6H-SiC.     

Low-temperature (77 K) impurity breakdown in <Emphasis Type="Italic">p</Emphasis>-type 4<Emphasis Type="Italic">H</Emphasis>-SiC

The impact ionization of acceptors in aluminum-doped 4H-SiC epitaxial films (Al concentration 2 × 10¹⁵ cm^?3) at a temperature of 77 K is studied. It is found that the impact-ionization coefficient exponentially depends on the reverse electric field: α _p = α*_pexp(?F*/F). The largest ionization coefficient is α* _p = 7.1 × 10⁶ cm^?3 s^?1, and the threshold field is F* = 2.9 × 10⁴ V/cm.     

Carrier drift mobility in porous silicon carbide

The time-of-flight technique was used to determine the drift mobilities of electrons and holes in porous silicon carbide produced by surface anodization of n-type 4H-SiC wafers. The electron and hole mobilities at 300 K in an electric field of 10⁴ V/cm were μ_e=6×10^?3 and μ_h=3×10^?3 cm² V^?1 s^?1, respectively. The low values of the mobilities are accounted for by carrier capture in localized states.     

Effects of Nb Content on the Ferroelectric and Dielectric Properties of Nb/Nd-Co-doped Bi<Subscript>4</Subscript>Ti<Subscript>3</Subscript>O<Subscript>12</Subscript> Thin Films

Nd/Nb-co-substituted Bi_3.15Nd_0.85Ti_3?x Nb _x O₁₂ (BNTN _x , x = 0.01, 0.03, 0.05 and 0.07) thin films were grown on Pt/Ti/SiO₂/Si (100) substrates by chemical solution deposition. The effects of Nb content on the micro-structural, dielectric, ferroelectric, leakage current and capacitive properties of the BNTN _x thin films were investigated. A low-concentration substitution with Nb ions in BNTN _x can greatly enhance its remanent polarization (2P _r) and reduce the coercive field (2E _c) compared with those of Bi₄Ti₃O₁₂ (BIT) thin film. The highest 2P _r (71.4 μC/cm²) was observed in the BNTN_0.03 thin film when the 2E _c was 202 kV/cm. Leakage currents of all the films were on the order of 10^?6 to 10^?5 A/cm², and the BNTN_0.03 thin film has a minimum leakage current (2.1 × 10^?6 A/cm²) under the high electric field (267 kV/cm). Besides, the C–V curve of the BNTN_0.03 thin film is the most symmetrical, and the maximum tunability (21.0%) was also observed in this film. The BNTN_0.03 thin film shows the largest dielectric constant and the lowest dielectric loss and its maximum Curie temperature is 410 ± 5°C.     

Effect of electron-electron and electron-hole collisions on intraband population inversion of electrons in stepped quantum wells

The effect of intersubband electron-electron (e-e) and electron-hole (e-h) scattering on intraband population inversion of electrons in a stepped InGaAs/AlGaAs quantum well is investigated. The characteristic times of the most probable e-e and e-h processes, which affect the electron densities on the excited levels, are calculated for the temperature range 80–300 K. Dependences of these times on the electron and hole density on the ground levels are studied. Temperature dependences of the intraband inversion of population for two nonequilibrium densities are calculated by solving a system of rate equations. It is shown that the intersubband e-e and e-h scattering only slightly affects the population inversion for electron densities below 1×10¹² cm^?2.     

Investigation of the ZnS-CdHgTe interface

The ZnS-Cd_xHg_1?xTe interface was investigated using the capacitance-voltage characteristics of MIS structures in experimental samples. During fabrication of the n⁺-p junctions based on p-Cd_xHg_1?xTe, the density of states within the range N _ss =(1–6)×10¹¹ cm^?2 eV^?1 at T=78 K was obtained. The experiments showed that the conditions in which n⁺-p junctions are fabricated only slightly affect the state of the ZnS-CdHgTe interface. The negative voltages of the at bands V _FB , even if immediately after deposition of the ZnS films V _FB >0, point to the enrichment of the ZnS-p-CdHgTe near-surface layer with majority carriers, specifically, holes. This led to a decrease in the leakage current over the surface. During long-term storage (as long as ～15 years) in air at room temperature, no degradation of differential resistance R _d , current sensitivity S _i , and detectivity D* of such n⁺-p junctions with a ZnS protection film was observed.