Processing parameters for Cu nanopowders prepared by anodic arc plasma

Copper nanopowders were successfully prepared by anodic arc discharging plasma method with home-made experimental apparatus.The effects of various processing parameters on the particle size of Cu nanopowders were investigated in the process,and the optimum processing parameters were obtained.In addition,the morphology,crystal structure,particle size distribution of the nanopowders were characterized via X-ray diffraction(XRD),transmission electron microscopy(TEM)and the corresponding selected area electron diffraction(SAED).The experimental results show that the crystal structure of the samples is the same fcc structure as that of the bulk materials.The processing parameters play a major role in controlling the particle size.The particle size increases with the increase of the arc current or gas pressure.     

Preparation and characterization of Ni nanopowders prepared by anodic arc plasma

Ni nanopowders were successfully prepared in large quantities by anodic arc discharged plasma method with homemade experimental apparatus in inert gas. The particle size, microstructure and morphology of the particles were characterized via X-ray diffractometry (XRD), transmission electron microscopy (TEM) and the corresponding selected area electron diffractometry(SAED). The specific surface area and pore parameters were investigated by nitrogen sorption isotherms at 77 K with Brunauer-Emmett-Teller(BET) equation and Barrett-Joyner-Halenda (BJH) method. The chemical compositions were determined by X-ray energy dispersive spectrometry(XEDS) and element analysis. The experimental results indicate that this method is convenient and effective, and the nanopowders with uniform size, higher purity, weakly agglomerated and spherical chain shape are gotten. The crystal structure of the samples is FCC structure as the bulk materials, the particle size distribution ranges from 20 to 70 nm, and the average particle size is about 46 nm obtained by TEM and confirmed by XRD and BET results. The specific surface area is 14.23 m^2/g, specific pore volume is 0.09 cm^3/g and average pore diameter is 23 nm.     

Preparation and particle size characterization of Cu nanoparticles prepared by anodic arc plasma

1. Introduction Metal nanoparticles exhibit novel physical and chemical properties owing to the small size effect, surface effect, quantum size effect, and quanta tun-nel effect [1-4]. In recent years, the research and de-velopment for metal nanoparticles have attracted significant interest and is still the subject of intense investigation owing to their intriguing properties and various potential applications [5-7]. Because the properties depend strongly on the details of particle size, speci…     

Preparation and particle size characterization of Cu nanopartides prepared by anodic arc plasma

Copper nanoparticles were successfully prepared in large scale by means of anodic arc discharging plasma method in inert atmosphere. The particle size, specific surface area, crystal structure, and morphology of the samples were characterized by X-ray diffraction （XRD）, BET equation, transmission electron microscopy （TEM）, and the corresponding selected area electron diffraction （SAED）. The experimental results indicate that the crystal structure of the samples is fcc structure the same as that of the bulk materials. The specific surface area is 11 m^2/g, the particle size distribution is 30 to 90 nm, and the average particle size is about 67 nm obtained from TEM and confirmed from XRD and BET results. The nanoparticles with uniform size, high purity, narrow size distribution and spherical shape can be prepared by this convenient and effective method.     

阳极弧等离子体制备镍纳米粉

采用自行研制的实验装置，用阳极弧放电等离子体方法制备了高纯镍纳米粉末。利用X射线衍射(XRD)、透射电子显微镜(TEM)和相应选区电子衍射(ED)、BET吸附等对样品的成分、形貌、晶体结构、晶格常数、粒度及其分布、比表面积进行了分析。建立了关于金属超微粒产生过程的近似模型，分析了纳米粉的形成和生长机制，并对整个工艺过程影响纳米粉性能的各种工艺参数进行了理论探讨。结果表明：所制得的镍纳米粉纯度高，晶格结构与相应的致密体相同，为fcc相结构，平均粒径为47nm，粒径范围在20～70nm，比表面积为14．23m^2／g，呈规则的球形链状分布，并发现纳米晶体的晶格常数发生膨胀。     

阳极弧等离子体制备镍纳米粉的机理研究

根据会属结晶的热力学和动力学理论，对采用阳极弧放电等离子体方法制备金属纳米粉的生长过程建立了一个近似的理论模型。研究了等离子体的产生、金属的蒸发、晶核的形成和生长机理。对影响纳米粉性能的各种工艺参数进行了理论分析。并利用X射线衍射（XRD）、透射电子显微镜（TEM）和相应选区电子衍射（ED）对样品的晶体结构、形貌、粒度及其分布进行表征。结果表明：采用阳极弧等离子体法制备的球形镍纳米粒予纯度高，晶格结构与相应的块体物质相同，为fcc结构的晶态，平均粒度为16nm，粒度范围分布在10nm～40nm。电源功率、电弧电流、气体压力及冷却温度是影响晶核的形成和生长的主要因素。通过适当调整各项工艺参数，可有效地控制粒子的粒度。     

约束弧等离子体制备铝纳米粉体工艺

采用约束弧等离子体方法成功制备了高纯铝纳米粉末,利用X射线衍射(XRD)、透射电镜(TEM)和相应选区电子衍射(SAED)对样品的晶体结构、形貌、粒度进行性能表征。对约束弧等离子体方法制备金属纳米粉的形成和长大过程进行了分析,并对制备过程中工艺参数(气体种类和压力、电弧电流等)对纳米粉产率及粒度的影响规律进行了讨论。实验结果表明:本法所制备的铝纳米粉末的晶体结构为fcc结构的晶态,呈规则的球形。适当控制某些工艺参数就能制取粒径在20~100 nm的纳米粉,在其它工艺参数一定时,随着工作气压升高、电流强度的增加,产率和平均粒径都随之增大。     

工艺参数对阳极弧放电等离子体制备镍纳米粉的影响

在Ar惰性保护气氛中，采用阳极弧放电等离子方法用自行研制的装置制备出了高纯Ni纳米粉末。研究了在制备过程中电弧电流、气体压力等工艺参数对纳米粉产率及粒度的影响。利用XRD、TEM对制得的样品的形貌、晶体结构、粒度及其分布进行测定。结果表明，适当控制某些工艺参数就能制取粒径范围在20nm～100nm的纳米粉，在其它工艺参数不变条件下，气压升高或电弧电流增大，都会使粒度增大，产率提高。     

放电等离子烧结法制备Cu/金刚石复合材料的性能与显微组织

由于具备较高的热导率,铜/金刚石复合材料已成为应用于电子封装领域的新一代热管理材料。采用放电等离子烧结工艺（SPS）成功制备含不同金刚石体积分数的Cu/金刚石复合材料,研究复合材料的相对密度、微观结构均匀性和热导率（TC）随金刚石体积分数（50%、60%和70%）和烧结温度的变化规律。结果表明：随着金刚石体积分数的降低,复合材料的相对密度、微观结构均匀性和热导率均升高;随着烧结温度的提高,复合材料的相对密度和热导率不断提高。复合材料的热导率受到金刚石体积分数、微观结构均匀性和复合材料相对密度的综合影响。     

约束弧等离子体制备碳包覆铁纳米颗粒的性能

采用约束弧等离子体技术制备碳包覆铁纳米颗粒,利用X射线衍射、透射电子显微镜、高分辨透射电子显微镜、X射线能量色散分析谱仪和N2吸附等测试手段对样品的化学成分、形貌、微观结构、比表面积和粒度等特征进行表征分析。结果表明：采用约束弧等离子体技术制备的碳包覆纳米金属颗粒具有明显的核？壳结构,内核金属为体心立方结构的铁,外壳为无定形碳。颗粒大多呈球形和椭球形,粒径分布在15～40nm范围内,平均粒径为30nm,内核粒径为18nm,外层碳的厚度为6～8nm,比表面积为24m2/g。     

W-30Cu纳米复合粉末液相烧结致密化与晶粒长大机制

采用喷雾干燥-煅烧、还原工艺制备超细W-30Cu复合粉末,将粉末模压成形,在1340～1420℃液相烧结15～120min,研究其致密化行为及晶粒长大机制。结果表明:W-30Cu复合粉末在液相烧结早期发生了显著的致密化,1340℃烧结15 min致密度可达到90%以上;随烧结时间的延长致密度增加,1380℃烧结90 min相对密度达到99.1%。液相烧结过程中,W晶粒不断长大并逐渐球化,且其晶粒大小G与烧结时间t符合G3∝kt关系,服从液相烧结溶解-析出机制。烧结温度对W晶粒长大影响显著,当温度从1340℃上升到1420℃时,其晶粒长大动力学系数从1.61×10-2μm3/min增大到4.65×10-2μm3/min,液相的形成、颗粒重排、溶解-析出及W晶粒长大使细晶W-Cu获得近全致密。     

Photocatalytic activity of porous TiO2 films prepared by anodic oxidation

Anatase titanium dioxide is an active photocatalyst, however, it is difficult to be immobilized on the substrate. The crystalline TiO2 porous film was prepared directly on the surface of pure titanium by anodic oxidation. The film was then used for photocatalysis via the methyl orange degradation method. The effects of anodization voltage, pH value, TiO2 film area and degradation time on the photocatalyst were investigated respectively by UV-visible spectrum. It was indicated that the TiO2 film prepared by anodic oxidation at 140 V had the best photocatalysis capability and the degradation of methyl orange was accelerated with acid addition.     

热CVD制备定向竹节型碳纳米管生长机制分析

用热化学气相沉积(CVD)技术,用乙炔为碳源,氮气为载气,氢气为还原气体,氨气为刻蚀气体,在单晶硅上制备出定向竹节型结构碳纳米管薄膜。用透射电镜(TEM),扫描电镜(SEM)的X衍射能量色散能谱仪(EDS)和X射线衍射仪(XRD)分析碳纳米管的精细结构,成分和晶型及结晶度,并对制备的碳纳米管的生长机制进行分析和推测。结果表明:在生长碳纳米管的过程中起催化作用的是金属镍颗粒而不是碳化镍,催化剂颗粒呈不同的形貌存在碳纳米管顶部,并遵循顶端生长方式。     

直流电弧制备的Mg-TiO2复合材料的储氢性能

采用直流电弧等离子体法蒸发Mg＋5%Ti O2的混合物并将其在空气中钝化,制备粉体Mg-Ti O2复合储氢材料。利用电感耦合等离子光谱发生仪（ICP）、X射线衍射仪（XRD）、扫描电子显微镜（SEM）表征粉体复合材料的成分、相组成及形貌。采用压力–成分–温度（PCT）和差示扫描量热仪（DSC）对Mg-Ti O2样品的吸放氢性能进行研究。由PCT测量结果可知,Mg-Ti O2复合粉体中镁的氢化焓和氢化熵分别为-71.5 kJ/mol和-130.1 J/（K·mol）,而粉体的氢化激活能为77.2 k J/mol。结果表明,采用电弧等离子体法在超细镁颗粒中加入Ti O2催化剂可显著增强镁的吸放氢动力学性能。     

Electrodeposition of photocatalytic TiO2 film on surface of alumina prepared by anodic oxidation

A new electrochemical method to prepare photocatalytic TiO2 thin film was developed, by which the TiO2 was electrodeposited on surface of alumina by AC electrolysis in solution consisting of K2 [TiO(C2O4 )2] and C2H2O4. The deposited TiO2 thin film was primarily characterized by X-ray diffraction (XRD), scanning electronic microscopy (SEM) and energy dispersive spectrum (EDS) methods. The photocatalytic properties of this film were also studied by the photocatalytic degradation of methyl orange. The results show that the TiO2 film electrodeposited by this method is mainly in amorphous and with a little crystalline component mixed anatase and rutile. The surface of the alumina prepared by anodic oxidation is porous and the TiO2 electrodeposited on it is scattered and incompact. TiO2 thin film fixed on the surface of alumina shows photocatalytic activity to the degradation of methyl orange.     

氮电弧制备陶瓷表面层中TiN相形态及生长机制

利用氮电弧熔化纯钛基体表面,原位制备氮化钛（TiN）陶瓷表面层,研究陶瓷表面层的形成机理、TiN相的生长形态及其生长机制．结果表明,氮电弧熔化过程为非平衡快速冷却凝固过程,冷却速度可达10^2～10^3 K／s,表面层中TiN相的微观生长方式具有多样性．在熔池中过冷度较小的位置,TiN晶体为螺型位错侧面长大方式,而熔池...     

Kinetic mechanism of anodic oxidation of tantalum in nitrate melts

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Growth mechanism of polycrystalline Ir coating by double glow plasma technology

Pure Ir coating was produced by double glow plasma technology.Growth mechanism of the Ir coating was investigated.The Ir coating was composed of irregular compacted columnar grains with lots of nanovoids appeared on the interface between the coating and the substrate.The Ir coating was polycrystalline with a preferred (220) orientation due to the initial nuclei with preferred growth on the surface of the substrate.The formation mechanism of the Ir coating depended on kinetic adsorption and diffusion process with nucleation,coalescence and thickness growth.At the beginning of the deposition process,the growth mode of the coating was mainly controlled by the nucleation rate.Due to the low substrate temperature resulting in low mobility of the deposited atoms,some micropores and nanoviods were present at the interface.With the deposition process,the substrate temperature was increased and then kept steady.The growth of the coating was governed by the growth rate.The high substrate temperature supported enough energy to surface mobility of adatoms.     

AISI304不锈钢表面渗Cu层对其摩擦学行为的影响

利用等离子表面合金化技术,在304不锈钢表面制备渗Cu改性层。借助球-盘磨损试验机对改性层常规大气环境下与不同偶件（GCr15球,Al2O3球）对摩时的摩擦学性能进行了测试。结果表明：不锈钢表面渗Cu改性层均匀致密、与基体结合良好,厚度大约26μm,主要由纯Cu和膨胀的奥氏体等相组成。渗Cu改性层的摩擦学性能与摩擦偶件相关。渗Cu不锈钢与GCr15球对摩时Cu改性层阻止了不锈钢与配副直接接触,并在摩擦过程中起到固体润滑作用,明显改善了不锈钢的摩擦学性能;渗Cu不锈钢与Al2O3球对摩时,由于陶瓷球的稳定化学性能及Cu改性层相对较低的剪切强度,导致摩擦过程中磨粒磨损加剧。     

Electrodeposited Ni,Fe,Co and Cu single and multilayer nanowire arrays on anodic aluminum oxide template

The Ni, Fe, Co and Cu single and multilayer nanowire arrays to make perpendicular magnetic recording media were fabricated with nanoporous anodic aluminum oxide (AAO) templates from Watt solution and additives by the DC electrodeposition. The results show that the diameters of Ni, Fe, Co and Cu single and multilayer nanowires in AAO templates are 40–80 nm and the lengths are about 30 μm with the aspect ratio of 350–750. The magnetic properties of the prepared nanowires are different under different electrodepositing conditions. The remanences (B_r) of Ni/Cu/Fe multilayer nanowires are lower than those of others multilayer nanowires, and coercivity (H_c) of Ni/Cu/Fe multilayer nanowires are lower than those of others multilayer nanowires. These are compatible with the required conditions of high density magnetic media devices that should have the low coercivity to easily success magnetization and high remanence to keep magnetization after removal of magnetic field.