非晶硅太阳电池应用和开发的新进展

评述了ａ－Ｓｉ电池的工艺优势、开发水平，市场现况、应有和领域及发展趋向。     

激光在非晶硅薄膜太阳能电池制造中的应用

人类进入21世纪,能源问题更为突出,常规能源的匮乏不足,面临在有限资源和环保严格要求的双重制约下实现经济和社会可持续发展已成为全球热点问题。传统的石油、煤等化石能源的开发利用,在一定程度上带来了环境污染、温室效应     

非晶硅薄膜太阳能电池特性研究

介绍了太阳能电池的工作原理,并给出了太阳能电池的物理模型。设计了室内测试非晶硅薄膜电池输出特性的实验,并对实验结果进行分析。搭建了小型独立光伏发电系统,给出系统的工程设计结构。实验结果表明,太阳能电池的转换效率与室内实验所测得的结果相吻合,证明该系统具有可靠性和高效性。     

非晶硅薄膜光伏电池结构参数分析

考虑到nip型[ITO/a-Si(n)/a-Si(i)/a-Si(p)/Al]非晶硅光伏电池的各膜层厚度、掺杂浓度等因素,对非晶硅光伏电池的转换效率、填充因子、开路电压等性能参数进行了数值分析与讨论。结果表明,随p型层厚度的增加,光伏电池的短路电流密度、转换效率、开路电压值都有所增加。当本征层的厚度增加时,短波段内的光谱响应变差、内量子效率下降。当n型层厚度为5 nm,本征层厚度为5 nm,p型层厚度为10μm,受主掺杂浓度为2.5×1019cm-3,施主掺杂浓度为1.5×1016cm-3时,转换效率可达9.728%。     

PIN型非晶硅薄膜太阳电池仿真研究

运用AMPS软件,对TCO/p-a-SiC:H/i-a-Si:H/n-a-Si:H/metal型非晶硅薄膜太阳电池进行了仿真研究,重点模拟和分析了电池性能参数随i层和n层厚度变化的规律.结果表明,为了获得电池转换效率和短路电流密度的最大值,n 层非晶硅薄膜应尽可能地减小厚度,而i层非晶硅薄膜厚度最好控制在500～700 nm范围内.     

光诱导化学汽相淀积非晶硅薄膜及其在太阳电池中的应用

本文较系统地评述了光诱导化学汽相淀积(LCVD)技术淀积非晶硅薄膜的开发现状,主要介绍了LCVD淀积非晶硅薄膜 的机理.评价了LCVD淀积非晶硅薄膜的电学和光学特性,最后介绍了这种薄在制备晶硅太阳电池方面的应用.     

非晶硅薄膜太阳能电池激光除边工艺研究

为了解决在非晶硅薄膜太阳能电池的制备中,喷砂除边工序存在污染大、加工一致性不佳等问题,使用1064nm脉冲光纤激光器,在加工速率3500mm/s、功率30W、重复频率80kHz、填充线间距0.05mm的参量下,完成了激光除边,获得了清除区电阻大于1000MΩ的样品。根据实验效果确定了最佳光斑交叠比,x和y方向的最佳比值分别为0.83和0.88。结果表明,激光功率足够时,光斑交叠情况会明显影响除边的效率和效果,扫描速率应与重复频率和填充线间距匹配,从而在最佳效率下获得理想的加工效果。     

聚酰亚胺衬底柔性非晶硅薄膜电池集成串联组件的研究

研究了柔性Si基薄膜太阳电池集成串联组件的制备与关键技术。对导电栅线在柔性薄膜太阳电池集成串联组件中的重要性进行了模拟计算,对柔性薄膜太阳电池激光刻蚀进行了理论分析与实验优化,并对柔性Si基薄膜太阳电池集成串联组件进行了设计与研制。在聚酰亚胺(PI)衬底上,通过卷对卷磁控溅射与卷对卷等离子增强化学气相沉积(PECVD)依次沉积复合背反射层Ag/ZnO、Si基薄膜层和透明导电膜层,采用激光刻蚀与丝网印刷工艺相结合实现集成串联,制备了柔性非晶Si(a-Si)薄膜太阳电池集成串联组件。柔性单结集成串联组件有效面积转换效率达到了4.572%(AM0),开路电压Voc=5.065V,填充因子FF=0.552。     

大面积柔性硅基薄膜电池集成串联组件

采用卷对卷工艺制备了叠层非晶硅/非晶硅锗(a-Si/a-SiGe)电池,采用激光刻划与丝网印刷实现集成串联,形成柔性薄膜电池集成串联组件。研究了SiGe电池渐变带隙、柔性衬底nip倒结构激光刻划、反向脉冲电治疗,并用以改善柔性薄膜电池集成内联组件性能。集成组件有5个子电池内部串联而成,有效面积转换效率达5.424%(AM0,100.1cm2),开路电压达7.156V。     

n-Doped-layer free amorphous silicon thin film solar cells fabricated with the CuMg alloy as back contact metal

The feasibility of using CuMg alloy as back contact metal for n⁺-doped-layer free a-Si:H thin film solar cell (TFSC) has been investigated in this work. The ohmic-contact characteristic has been achieved by using the CuMg alloy as back contact metal. The proposed structure showed the typical solar cell current-voltage (I-V) characteristic. An initial efficiency of 4.3% has been obtained with a open-circuit voltage V_oc = 0.79 V, short-circuit current J_sc = 13.4 mA/cm² and fill factor F.F. = 0.40. Furthermore, the experimental results also showed the CuMg alloy was suitable for the replacement of n⁺-doped-layer with the production cost reduction of a-Si:H TSFC.     

p-Layer bandgap engineering for high efficiency thin film silicon solar cells

Spectroscopic ellipsometry (SE), high resolution transmission electron microscopy (HRTEM), atomic force microscopy (AFM) and optical transmittance measurements were used to study and establish a correlation between the open-circuit voltage (V_oc) of solar cells and the p-layer optical band gap (E_p). It is found that the ellipsometry measurement can be used as an inline non-destructive diagnostic tool for p-layer deposition in commercial operation. The analysis of ellipsometric spectra, together with the optical transmittance data, shows that the best p-layer appears to be very fine nanocrystallites with an E_p 1.95 eV. HRTEM measurements reveal that the best p-layer is composed of nanocrystallites ~9 nm in size. It is also found that the p-layer exhibits very good transmittance, as high as ~91.6% at ~650 nm. These results have guided us to achieve high V_oc value 1.03 V for thin film silicon based single junction solar cell.     

Photocurrent enhancement in thin film amorphous silicon solar cells with silver nanoparticles

Silver nanoparticles embedded in a dielectric material have strong scattering properties under light illumination, due to localized surface plasmons. This effect is a potential way to achieve light trapping in thin‐film solar cells. In this paper we study light scattering properties of nanoparticles on glass and ZnO, and on silver coated with ZnO, which represent the back reflector of a solar cell. We find that large nanoparticles embedded in the dielectric at the back contact of amorphous silicon solar cells lead to a remarkable increase in short circuit current of 20% compared to co‐deposited cells without nanoparticles. This increase is strongly correlated with the enhanced cell absorption in the long wavelengths and is attributed to localized surface plasmons. We also discuss the electrical properties of the cells. Copyright © 2010 John Wiley & Sons, Ltd.     

柔性衬底硅薄膜太阳电池中ZGO薄膜的应用

在室温下,采用孪生对靶直流磁控溅射工艺,在玻璃衬底上制备出高质量的Ga掺杂ZnO(ZnO:Ga)透明导电膜。研究了薄膜厚度对薄膜的结构、光学及电学特性的影响。制备的ZnO:Ga是具有六角纤锌矿结构的多晶薄膜,最佳择优取向为(002)方向。随着薄膜厚度的增加,衍射峰明显增强,晶粒增大。优化反应条件,薄膜的电阻率达到4.69×10-4Ω.cm,在可见光范围内平均透过率达到了85%以上。将不同厚度的ZnO:Ga薄膜(350～820 nm)在柔性聚酰亚胺衬底nip非晶硅(a-Si)薄膜太阳电池中,随厚度的增加,电池的填充因子和效率都得到了提高,得到聚酰亚胺衬底效率7.09%的a-Si薄膜太阳电池。     

PI衬底柔性透明硅薄膜太阳能电池的制备及性能

利用硬质玻璃为载板,采用传统硅薄膜太阳能电池生产设备,在聚酰亚胺(PI)塑料薄膜衬底上沉积了B掺杂的ZnO(BZO)薄膜,并以此作为前电极制备了单节电池结构及多节串联一体结构的非晶硅(a-Si)太阳能电池;研究了PI衬底上BZO薄膜的光学及电学性能。结果表明,PI衬底上沉积BZO薄膜后在300~1 200 nm波长范围的透光率为76.63%,方块电阻19.7?/□。所制备的单节和多节串联一体结构的a-Si薄膜太阳能电池的转化效率分别达到6.45%和5.1%,封装后电池组件具有一定的透光性,透光率约达到30.2%。     

激光波长对非晶硅薄膜晶化效果的影响

为研究波长对连续激光晶化非晶硅(a-Si) 薄膜过程的影响,利用连续Ar＋-Kr＋激光对a-Si薄膜晶 化,在5ms固定照射时间下,改变激光波长,采用拉曼光谱测试技术和场发射扫描电子显微 镜(SEM)研究在不同 激光功率密度下薄膜晶化后的特性。结果表明,a-Si薄膜的晶化阈值随着波长的 增大而增大,当波长为 458nm时薄膜晶化阈值为13.2kW/cm²,波长 为647nm时,晶化阈值为19.2kW/cm²;在激光功率密度范 围为0～27.1kW/cm²内,薄膜的最大晶化率受波长的影响相对较小 ,但总体也随着波长的增大而呈增大 趋势,当波长为647nm时,在激光功率密度26.5kW/cm²处,晶化率达到最大值75.85%。     

Improvement of hydrogenated amorphous silicon germanium thin film solar cells by different p-type contact layer

In this study, we report an appreciably increased efficiency from 6% up to 9.1% of hydrogenated amorphous silicon germanium (a-SiGe:H) thin film solar cells by using a combination of different p-doped window layers, such as boron doped hydrogenated amorphous silicon (p-a-Si:H), amorphous silicon oxide (p-a-SiO_x:H), microcrystalline silicon (p-µc-Si:H), and microcrystalline silicon oxide (p-µc-SiO_x:H). Optoelectronic properties and the role of these p-layers in the enhancement of a-SiGe:H cell efficiency were also examined and discussed. An improvement of 1.62 mA/cm² in the short-circuit current density (J_sc) is attributed to the higher band gap of p-type silicon oxide layers. In addition, an increase in open-circuit voltage (V_oc) by 150 mV and fill factor (FF) by 6.93% is ascribed to significantly improved front TCO/p-layer interface contact.     

TCOs for nip thin film silicon solar cells

Substrate configuration allows for the deposition of thin film silicon (Si) solar cells on non‐transparent substrates such as plastic sheets or metallic foils. In this work, we develop processes compatible with low T_g plastics. The amorphous Si (a‐Si:H) and microcrystalline Si (µc‐Si:H) films are deposited by plasma enhanced chemical vapour deposition, at very high excitation frequencies (VHF‐PECVD). We investigate the optical behaviour of single and triple junction devices prepared with different back and front contacts. The back contact consists either of a 2D periodic grid with moderate slope, or of low pressure CVD (LP‐CVD) ZnO with random pyramids of various sizes. The front contacts are either a 70 nm thick, nominally flat ITO or a rough 2 µm thick LP‐CVD ZnO. We observe that, for a‐Si:H, the cell performance depends critically on the combination of thin flat or thick rough front TCOs and the back contact. Indeed, for a‐Si:H, a thick LP‐CVD ZnO front contact provides more light trapping on the 2D periodic substrate. Then, we investigate the influence of the thick and thin TCOs in conjunction with thick absorbers (µc‐Si:H). Because of the different nature of the optical systems (thick against thin absorber layer), the antireflection effect of ITO becomes more effective and the structure with the flat TCO provides as much light trapping as the rough LP‐CVD ZnO. Finally, the conformality of the layers is investigated and guidelines are given to understand the effectiveness of the light trapping in devices deposited on periodic gratings. Copyright © 2008 John Wiley & Sons, Ltd.     

过渡区p层在高速沉积非晶硅薄膜电池中的应用

研究了采用甚高频等离子体增强化学气相沉积(VHF-PECVD)技术沉积从微晶相向非晶相相变的过渡区p层,并将其作为电池的窗口层应用到高速沉积的非晶硅薄膜电池中。通过调整p层的沉积参数,获得不同p层的暗电导率从1.0E-8S/cm变化到1.0E-1S/cm,并获得了从微晶相向非晶相转变的过渡区p层。实验发现,电池的开路电压Voc随p层SiH4浓度的增加先增加后降低,当p层处在过渡区时达到最大;p层处在过渡区时电池的短路电流Isc和填充因子FF都得到了不同程度的提高。在p/i界面引入buffer层后,能进一步显著提高电池的FF和Voc。在过渡区p层作为电池窗口层,没有背反射电极,本征层沉积速率为1.5nm/s情况下获得效率达8.65%(Voc=0.89V,Jsc=12.90mA/cm2,FF=0.753)的高速非晶硅薄膜电池。比较了过渡区P层与P-a-SiC:H分别作为电池窗口层对于电池性能特别是FF的影响,由于存在结构演变的原因,FF对于过渡区P层厚度的依赖大于后者。     

Design of Ag nanograting for broadband absorption enhancement in amorphous silicon thin film solar cells

Light trapping is one of the key issues to improve the light absorption and increase the efficiency of thin film solar cells. The effects of the triangular Ag nanograting on the absorption of amorphous silicon solar cells were investigated by a numerical simulation based on the finite element method. The light absorption under different angle and area of the grating has been calculated. Furthermore, the light absorption with different incident angle has been calculated. The optimization results show that the absorption of the solar cell with triangular Ag nanograting structure and anti-reflection film is enhanced up to 96% under AM1.5 illumination in the 300–800 nm wavelength range compared with the reference cell. The physical mechanisms of absorption enhancement in different wavelength range have been discussed. Furthermore, the solar cell with the Ag nanograting is much less sensitive to the angle of incident light. These results are promising for the design of amorphous silicon thin film solar cells with enhanced performance.