Power Factor Anisotropy of <Emphasis Type="Italic">p</Emphasis>-Type and <Emphasis Type="Italic">n</Emphasis>-Type Conductive Thermoelectric Bi-Sb-Te Thin Films

The best films for thermoelectric applications near room temperature are based on the compounds Bi₂Te₃, Sb₂Te₃, and Bi₂Se₃, which as single crystals have distinct anisotropy in their electrical conductivity σ regarding the trigonal c-axis, whereas the Seebeck coefficient S is nearly isotropic. For p- and n-type alloys, P _⊥c > P _||c, and the power factors P _⊥c of single crystals are always higher compared with polycrystalline films, where the power factor is defined as P = S ² σ, ⊥c and ||c are the direction perpendicular and parallel to the c-axis, respectively. For the first time in sputter-deposited p-type (Bi_0.15Sb_0.85)₂Te₃ and n-type Bi₂(Te_0.9Se_0.1)₃ thin films, the anisotropy of the electrical conductivity has been measured directly as it depends on the angle φ between the electrical current and the preferential orientation of the polycrystals (texture) using a standard four-probe method. The graphs of σ(φ) show the expected behavior, which can be described by a weighted mixture of σ _⊥c and σ _||c contributions. Because (σ _⊥c/σ _||c) _p  < (σ _⊥c/σ _||c) _n , the n-type films have stronger anisotropy than the p-type films. For this reason, the angular weighted contributions of P _||c lead to a larger drop in the power factor of polycrystalline n-type films compared with p-type films.     

Crystallographic texture of C54 titanium disilicide as a function of deep submicron structure geometry

Detailed analysis of the crystallographic texture of C54 TiSi₂ was performed and showed a strong correlation between the geometry of the silicide structures and preferential crystallographic orientation. The study was undertaken on blanket and patterned TiSi₂ films formed in the reaction between 32 nm of Ti and undoped polycrystalline silicon using both in situ x-ray diffraction during heating and post-anneal four-circle pole figure reflection geometry measurements. Full pole figures were taken to determine the distribution of C54 TiSi₂ grain orientations in narrow (0.2 to 1.1 μm) lines which was compared with similar results obtained from unpatterned (blanket) films. While in blanket films we found the presence of weak <311> C54 TiSi₂ crystallographic orientation perpendicular to the sample surface, the <040> preferential orientation dominated in patterned submicron line structures and increased with decreasing linewidth. Using pole figure analysis, we observed strong <040> fiber texture in narrow lines with a slight variation in the tilt of the (040) planes normal in the direction perpendicular to the line (full width at half maximum [FWHM] ≈6°), but very little along the length of the line (FWHM ≈2°). In addition, a preferred in-plane (azimuthal) orientation of <040> crystals was found which showed that most of the <040> grains had their (004) plane normals oriented parallel with the line direction. These findings support a model of the C49 to C54 TiSi₂ transformation involving rapid growth of certain orientations favored by the one-dimensional geometry imposed by narrow lines.     

Microstructure and texture of free-standing Cu-line patterns

Free-standing discontinuous Cu-line patterns varying in line widths and interline distances in the range of a few micrometers were manufactured by combining photolithography and electrochemical deposition. Two principally different seed layers, polycrystalline Au and X-ray amorphous Ni-P, were applied prior to electrodeposition of the Cu lines as well as continuous Cu films, which were deposited as reference. The effect of the seed layer and the influence of the pattern design on surface topography and morphology of the deposits were studied by means of light optical and scanning electron microscopy (SEM). The growth behavior is related to the developing crystallographic texture of Cu-line patterns and continuous films, as determined from calculated orientation distribution functions (ODFs) on the basis of X-ray diffraction (XRD) pole figure measurements. While strong crystallographic textures of Cu lines on polycrystalline Au were observed with pattern-dependent differences to continuous films, almost no preferred grain orientations develop both for Cu lines and corresponding continuous films deposited on amorphous Ni-P.     

Growth of polycrystalline silicon films on titanium and aluminum layers

Adherent, polycrystalline silicon films were vacuum deposited onto titanium passivated steel alloy substrates at substrate temperatures between 535 and 650°C and onto aluminum films at substrate temperatures between 480 and 520°C. Silicon films deposited onto titanium layers are characterized by a sub-micron grain size and a preferential orientation of the <110> direction perpendicular to the growth surface. Resistivities of ∿10⁴ ohm-cm are measured for the undoped films. Silicon films deposited onto aluminum layers have a larger grain size, ∿5μm, a columnar morphology and a preferential orientation of the <111> direction perpendicular to the growth surface. As-deposited resistivities of ∿10² ohm-cm are measured for these films. Boron and phosphorus doped silicon films on titanium layers were annealed. The behavior with annealing of the electrical properties of the films depended on which doping impurity was used. Silicon films on aluminum were annealed to reduce lattice damage within the silicon grains and to dope the films with aluminum from the aluminum layer. Resistivities of several ohm-cm were measured for the annealed films on aluminum.     

2D Versus 3D Crystalline Order in Thin Films of Regioregular Poly(3‐hexylthiophene) Oriented by Mechanical Rubbing and Epitaxy

Highly oriented films of regioregular poly(3‐hexylthiophene) (P3HT) are prepared by two methods: mechanical rubbing and directional epitaxial crystallization. The structure, nanomorphology, and optical and charge‐transport properties of the oriented films are investigated by electron diffraction, high resolution transmission electron microscopy (HR‐TEM), absorption spectroscopy, and transistor field‐effect measurements. In rubbed films, P3HT chains align parallel to the rubbing direction and the crystalline domains orientation changes from preferential edge‐on to flat‐on orientation. The maximum in‐plane orientation probed by absorption spectroscopy is a function of the polymer molecular weight M_w; the lower the M_w, the higher the in‐plane orientation induced by rubbing. The anisotropy of field‐effect mobility measured parallel and perpendicular to the rubbing shows the same trend as the absorption. The M_w‐dependence of the orientation is explained in terms of chain folding and entanglement that prevent the reorientation and reorganization of the π‐stacked chains, especially when M_w ≥ 50 kDa. For comparison, P3HT films are oriented by directional epitaxial crystallization using a zone‐melting technique. Electron diffraction and HR‐TEM show that epitaxial and rubbed films differ in terms of intralamellar order within layers of π‐stacked chains. Comparison of UV‐vis absorption spectra for the different samples suggests that the vibronic structure is sensitive to intralamellar disorder.     

LB法制备的P(VDF-TrFE)共聚物薄膜其光学和电学特性研究

运用郎缪尔-布尔吉特法在聚酰亚胺衬底上制备聚偏氟乙烯及三氟乙烯(P(VDF-TrFE))共聚物薄膜.不同厚度薄膜的X射线衍射结果表明,薄膜具有良好的结晶特性,取向为(110).运用波长范围为300～1300nm的椭圆偏振光谱仪对薄膜光学特性进行了表征;运用Cauchy模型对不同角度(θ=75°和85°)测得的Ψ和Δ数据进行了拟合.获得了P(VDF-TrFE)薄膜的光学参数n, k, α以及薄膜的厚度.另外对薄膜的铁电性质的测量,其剩余极化达到了6.3μC/cm2, 矫顽电场为100MV/cm.介电测量得到了薄膜两个明显的相变,铁电-介电相变以及β弛豫.     

Recrystallization of Si films on thermal SiO2-coated Si substrates using a high-speed e-beam line source

Lateral zone melting from a fast-scanning (5-30-cm/s) e-beam line source has been used to grow single-crystal films with an area limited only by the e-beam scan field. Electron backscattering contrast and etch pit techniques have been used to study the crystallographic orientation and the extent of single-crystal silicon film growth on thermal SiO2-coated silicon (SOI) wafers.     

Out-of-plane thermal expansion coefficient of biphenyldianhydride-phenylenediamine polyimide film

The out-of-plane thermal expansion coefficient α_⊥ of biphenyldianhydride-phenylenediamine (BPDA-PDA) polyimide thin film between 20 and 400°C has been measured using a laser spot scanning interferometer. The α_⊥ varies from 100 ppm/°C at 20°C to 400 ppm/°C at 400°C. As the result of highly anisotropic microstructure, the α_⊥ is much larger than the in-plane thermal expansion coefficient α_∥ and increases dramatically when the temperature exceeds the glass transition temperature (≈320°C).     

Leakage current mechanisms of ultrathin high-κEr_2O_3 gate dielectric film

A series of high dielectric material Er_2O_3 thin films with different thicknesses were deposited on p-type Si (100) substrate by pulse laser deposition at different temperatures. Phase structures of the films were determined by means of X-ray diffraction (XRD) and high resolution transmission electron microscopy (HRTEM). Leakage current density was measured with an HP4142B semiconductor parameter analyzer. The XRD and HRTEM results reveal that Er_2O_3 thin films deposited below 400 ℃ are amorphous, while films deposited from 400 to 840 ℃ are well crystallized with (111)-preferential crystallographic orientation. I-V curves show that, for ultrathin crystalline Er_2O_3 films, the leakage current density increases by almost one order of magnitude from 6.20 × 10~(-5) to 6.56×10~(-4) A/cm~2, when the film thickness decreases by only 1.9 nm from 5.7 to 3.8 nm. However the leakage current density of ultrathin amorphous Er_2O_3 films with a thickness of 3.8 nm is only 1.73×10~(-5) A/cm~2. Finally, analysis of leakage current density showed that leakage of ultrathin Er_2O_3 films at high field is mainly caused by Fowler-Nordheim tunneling, and the large leakage of ultrathin crystalline Er_2O_3 films could arise from impurity defects at the grain boundary.     

Metalorganic Chemical Vapor Deposition of CdTe(133) Epilayers on Si(211) Substrates

Single-crystalline CdTe(133) films have been grown by metalorganic chemical vapor deposition on Si(211) substrates. We studied the effect of various growth parameters on the surface morphology and structural quality of CdTe films. Proper oxide removal from the Si substrate is considered to be the principal factor that influences both the morphology and epitaxial quality of the CdTe films. In order to obtain single-crystalline CdTe(133) films, a two-stage growth method was used, i.e., a low-temperature buffer layer step and a high- temperature growth step. Even when the low-temperature buffer layer shows polycrystalline structure, the overgrown layer shows single-crystalline structure. During the subsequent high-temperature growth, two-dimensional crystallites grow faster than other, randomly distributed crystallites in the buffer layer. This is because the capturing of adatoms by steps occurs more easily due to increased adatom mobility. From the viewpoint of crystallographic orientation, it is assumed that the surface structure of Si(211) consists of (111) terrace and (100) step planes with an interplanar angle of 54.8°. This surface structure may provide many preferable nucleation sites for adatoms compared with nominally flat Si(100) or (111) surfaces. The surface morphology of the resulting films shows macroscopic rectangular-shaped terrace—step structures that are considered to be a (111) terrace with two {112} step planes directed toward 〈110〉.     

Substrate‐Dependent Molecular and Nanostructural Orientation of Nafion Thin Films

The effects of film thickness and substrate composition on the ionomer structure in porous electrodes are critical in understanding pathways toward developing higher performance electrochemical devices, including fuel cells and batteries. Insights are gained into the molecular and nanostructural orientation dependence for thin Nafion films (12–300 nm thick) on gold, platinum, and SiO₂ model substrates. Molecular orientation is determined from the birefringence measured using spectroscopic ellipsometry, while the nanostructural orientation of the ionic domains is measured using grazing‐incidence small‐angle X‐ray scattering. Density functional theory calculations for the molecular polarizability of the Nafion backbone and side chain show complimentary contributions to the measured birefringence values for the material. Nafion films prepared on SiO₂ substrates exhibit a nearly isotropic molecular and nanostructural orientation. Films on gold and platinum display parallel backbone orientations, relative to the substrate, with decreasing film thickness. However, a birefringence transition toward molecular isotropy is observed for 30 nm thick films on Au and Pt; while the ionic nanostructured domains continuously align parallel to the substrate. This apparent isotropic molecular orientation with increasing domain orientation highlights the difference between the backbone and side chain orientation, a key finding for elucidating transport in confined films at the interfaces.     

Quantitative Photoelastic Characterization of Residual Strains in Grains of Multicrystalline Silicon

The residual strain and its variation in multicrystalline Si substrates for solar cells have been quantitatively characterized. The strain was evaluated from the absolute difference of refractive indices |Δn| and the principal direction ψ of strain-induced birefringence measured by scanning infrared polariscope, and the effective photoelastic coefficients calculated numerically at each grain, the crystallographic orientation of which was determined by the electron backscatter diffraction technique. It has been shown that the residual strain increases at grains with multitwin boundaries and in the vicinity of small-angle grain boundaries, reaching the order of 10⁻⁴, corresponding to 10 MPa in terms of stress.     

N+注入ZnO薄膜表面性质的变化

用直流反应磁控溅射法制备ZnO薄膜,将N+注入ZnO薄膜经快速热退火(RTA)后,通过XRD,AFM,UV-VIS-NIR分光光度计等比较了N+注入后ZnO薄膜的电阻率、导电类型、表面形貌和可见光透过率等的变化。经不同条件处理后的ZnO薄膜均具有相同的择优取向(002)。经RTA后颗粒普遍增大;N+注入后经RTA颗粒增大明显,最大有1μm。N+注入后,使ZnO膜的导电类型由原来的n型转变为弱p型。     

Growth characteristics and physical properties of PbTe/BaF2 prepared under nonequilibrium conditions

PbTe/BaF₂ films were grown under nonequilibrium conditions by laser-modulated epitaxy. The structural properties of the layers were investigated by x-ray crystallographic methods and scanning tunneling microscopy. It was established that the films obtained under nonequilibrium conditions on (III)BaF₂ substrates are granular (d?250 Å) with (001) orientation. The electrophysical and photoelectric properties of the films depend on the technological conditions of growth and are determined by states at intergrain boundaries.     

The influence of liners with Ti,Ta or Ru finish on thin Cu films

The influence of the different liner material stacks Ti–N/Ti, Ta–N/Ta and Ta–N/Ru on the microstructure of 1 μm thick sputtered Cu films is examined prior to and after annealing. It is shown that the liner has an impact on the crystallographic orientation distribution of the Cu grains and seriously affects the defect density in the Cu films. The measured Cu resistivity shows a strong dependence on the microstrain.     

Characterisation of ar ion laser induced cvd silicon films: deposition,crystallographic texture and phosphorous doping

Pyrolytic dissociation of silane on substrates heated by a cw Ar ion laser beam has been used to deposit polycrystalline silicon thin films. The effects of parameters like laser beam irradiance (power density), dwell time, silane pressure on the silicon deposition are studied. To understand the film growth kinetics, an approximate relationship amongst the film thickness and some of the above parameters is deduced from general chemical thermodynamic considerations. The crystallographic texture of the grown silicon film is studied as a function of laser power. It is found that the texture (preferred orientation) changes from 〈110〉 at low power to 〈111〉 at higher power. Mixtures of silane and phosphine at different partial pressures are used to obtain phosphorous doped polysilicon films. These films show a thermally activated conductivity σ = σ₀ exp ( -E _a /kT) with the activation energyE _a depending on the phosphine partial pressure.     

飞秒脉冲激光沉积Si基a轴择优取向的钛酸铋铁电薄膜

在钛酸铋(Bi4Ti3O12)薄膜的制备过程中容易获得晶粒c轴垂直于基片表面的薄膜,而压电和铁电存储器主要利用a轴的自发极化分量,因而制备a轴择优取向的Bi4Ti3O12铁电薄膜具有特别的意义。采用飞秒脉冲激光作用在钛酸铋陶瓷靶上,采用Si(111)作为衬底,制备了a轴择优取向的钛酸铋薄膜。采用X射线衍射(XRD)的薄膜附件和场发射扫描电镜(FSEM)研究了薄膜的结构和形貌;采用傅里叶红外光谱仪测量了室温(20℃)下在石英基片上沉积的样品的光学特性;室温下沉积的钛酸铋薄膜呈c轴择优取向,晶粒的平均大小为20 nm,其光学禁带宽度约为1.0 eV。在500℃沉积的钛酸铋薄膜呈a轴择优取向,晶粒大小在30~300 nm之间,薄膜的剩余极化强度Pr为15μC/cm2,矫顽力Er为48 kV/cm。     

Investigation into Texture,Preferential Orientation,and Optical Properties of Zinc Oxide Nanopolycrystalline Thin Films Deposited by the Sol–Gel Technique on Different Substrates

ZnO nanopolycrystalline thin films were deposited by the sol–gel technique on glass and silicon, and compared systematically via atomic force microscopy, scanning electron microscopy, x-ray diffraction, UV–Vis spectrophotometry, and fluorescence spectrophotometry. The thickness of the ZnO films was measured by ellipsometric microscopy. A higher preheating temperature was needed to obtain films with a strong preferential orientation. The optimal annealing temperatures for c-axis films on glass and silicon substrates were 525°C and 750°C, respectively. The relative intensity of the blue–green emission peak tends to increase with the annealing temperature. When the film is annealed in N₂, the transmittance of the film reduces while the intensity of the blue–green emission increases.     

Ultrashallow p +-n junctions in Si(111): Electron-beam diagnostics of the surface region

Ultrashallow p ⁺-n junctions fabricated in Si(111) are investigated by low-and intermediateenergy electron-beam probing of the surface region in order to determine how the crystallographic orientation of the silicon films affects the mechanisms for nonequilibrium diffusion of boron. A comparative study is made of p ⁺-n junctions made on both (111) and (100) silicon with regard to how the irradiation-induced conductivity depends on the energy of the primary electron beam, and also its distribution with area. Using this method, it is possible to determine how the probability of an electron-hole pair being separated by the electric field of the Si(111) and Si(100) p ⁺-n junctions varies with depth into the crystal, which experiments show is different, depending on whether diffusive motion of impurities is dominated by the kick-out or dissociative-vacancy mechanisms. It was found that for boron in silicon the kick-out type of diffusion mechanism is strongly enhanced in the [111] crystallographic direction, whereas diffusion in the [100] direction is primarily driven by vacancy mechanisms. It is shown that collection of nonequilibrium carriers in the p ⁺-n junction field is strongly enhanced when the diffusion profile consists of certain combinations of longitudinal and transverse quantum wells. Fiz. Tekh. Poluprovodn. 33, 58–63 (January 1999)     

光折变GaAs在直流电场下双光束耦合的增强效应(英文)

Two-beam coupling and energy transfer occur, because of the birefrin-gent nature of the photorefractive grating formed by the two interfering beams. We report the observation of the enhanced two-beam coupling in the semi-insulation Cr-doped GaAs crystals at 1.15μm polarized beam from a CW He-Ne infrared laser under DC electric fields.We have measured the gain coefficients as a function of the applied DC electric field and the grating spacing. The optimum experimental crystallographic orientation in cubic photo-optic crystals with on applied field has been discussed. These measured results are close to the predicted theoretical values.