In situ electrical conductivity and amorphous-crystalline transition in vacuum-deposited thin films of Se20Te80 alloy

In situ electrical conductivity measurements have been carried out on vacuum-deposited thin films of Se₂₀Te₈₀ alloy during heating and cooling cycles. The electrical conductivity and X-ray diffraction studies show that the as-grown Se₂₀Te₈₀ films are amorphous and, upon heating, undergo an irreversible amorphous-crystalline transition between 315 and 350 K. The observation that the as-grown thin films (deposited at room temperature on glass substrates) are amorphous is in contrast to earlier observations by other workers who find that they are polycrystalline. Above the transition temperature, the electrical conductivity of the polycrystalline Se₂₀Te₈₀ films changes as an exponential function of reciprocal temperature. The amorphous-crystalline transition in Se₂₀Te₈₀ thin films is broad, with films of high initial resistance having lower transition temperatures and low-resistance films having higher transition temperatures. The observation of a broad transition in the case of the present Se₂₀Te₈₀ thin films has to be contrasted with our earlier observations of sharp transitions in the case of Se₈₀Te₂₀ and Se₅₀Te₅₀ thin films.     

Structural, electrical and optical properties of Bi2Se3 and Bi2Se(3−x)Tex thin films

Thin films of Bi₂Se₃, Bi₂Se_2.9Te_0.1, Bi₂Se_2.7Te_0.3 and Bi₂Se_2.6Te_0.4 are prepared by compound evaporation. Micro structural, optical and electrical measurements are carried out on these films. X-ray diffraction pattern indicates that the as-prepared films are polycrystalline in nature with exact matching of standard pattern. The composition and morphology are determined using energy dispersive X-ray analysis and scanning electron microscopy (SEM). The optical band gap, which is direct allowed, is 0.67 eV for Bi₂Se₃ thin films and the activation energy is 53 meV. Tellurium doped thin films also show strong optical absorption corresponding to a band gap of 0.70-0.78 eV. Absolute value of electrical conductivity in the case of tellurium doped thin film shows a decreasing trend with respect to parent structure.     

Characterization of p-In2Se3 thin films

Indium selenide thin films were deposited onto glass substrates kept at 150 °C by thermal evaporation of -In₂Se₃. Some of the films were annealed at 150 °C and 200 °C and they all were found to exhibit p-type conductivity without intentional doping. Scanning electron microscopy (SEM) established that the films have an atomic content of In₅₁Se₄₉. X-ray diffraction (XRD) indicated that the as-grown films were amorphous in nature and became polycrystalline -In₂Se₃ films after annealing. The analysis of conductivity temperature-dependence measurements in the range 320–100 K revealed that thermal excitation and thermionic emission of the carriers are the predominant conduction mechanisms above 200 K in the amorphous and polycrystalline samples, respectively. The carrier transport below 200 K is due to variable range hopping in all the samples. Hall measurements revealed that the mobility of the polycrystalline films is limited by the scattering of the charged carriers through the grain boundaries above 200 K. © 2001 Kluwer Academic Publishers     

Preparation and characterization of indium doped CdS0.2Se0.8 thin films by spray pyrolysis

The CdS_0.2Se_0.8 and indium doped CdS_0.2Se_0.8 thin films have been deposited onto the amorphous glass and fluorine doped tin oxide coated glass substrates by spray pyrolysis. The doping concentration of indium has been optimized by photoelectrochemical characterization technique. The structural, surface morphological, optical and electrical properties of CdS_0.2Se_0.8 and indium doped CdS_0.2Se_0.8 thin films have been studied. X-ray diffraction studies reveal that the films are polycrystalline in nature with hexagonal crystal structure. Scanning electron microscopy studies reveal that the grains are uniform with uneven spherically shaped, distributed over the entire substrate surface. The complete surface morphology has been changed after doping. In optical studies, the transition of the deposited films is found to be direct allowed with optical energy gaps decreasing from 1.91 to 1.67 eV with indium doping. Semiconducting behavior has been observed from resistivity measurements. The thermoelectric power measurements reveal that the films exhibit n-type conductivity.     

Influence of annealing on the structural and electrical transport properties of Bi0.5Sb1.5Te3.0 thin films deposited by co-sputtering

Bi_0.5Sb_1.5Te_3.0 thin films were deposited on silicon substrates at room temperature by co-sputtering and the effects of annealing temperatures on structure and thermoelectric properties were investigated. The composition, crystallinity, and microstructure of these thin films were characterized by energy dispersive X-ray spectroscopy, X-ray diffraction, and scanning electron microscopy. The crystalline quality of the thin films was enhanced with a rising annealing temperature. When annealed at 573 K, the layered structure of the Bi_0.5Sb_1.5Te_3.0 thin films with a preferred orientation along the (00l) plane was formed. However, excessive high annealing temperature caused the thin films to become porous due to the separation of substantial Sb-rich precipitates. The electrical transport properties of the thin films, in terms of electrical conductivity and Seebeck coefficient were determined at room temperature. The carrier concentration and mobility were calculated from the Hall coefficient measurement. By optimizing the annealing temperature and time to 573 K for 6 h, the thermoelectric power factor was enhanced to 22.54 μW/(cm K²) at its maximum with a moderate electrical conductivity of 6.21 × 10² S/cm and a maximum Seebeck coefficient of 190.6 μV/K.     

Optical,structural and electrical properties of co-evaporated CuIn2Se3.5 thin films

Polycrystalline CuIn₂Se_3.5 thin films have been prepared by a three-source co-evaporation technique. The optical band gap, structural and electrical properties of these co-evaporated CuIn₂Se_3.5 thin films deposited on glass substrate held at 673 K and in situ annealed at 723 K in selenium atmosphere are reported here. Optical band gap of the films, determined from spectral transmission data, is found to be 1.22 eV. Powder X-ray diffraction (XRD) studies reveal the CuIn₂Se_3.5 films to be polycrystalline in nature with tetragonal structure. The lattice parameters are found to be a=0.576 nm and c=1.151 nm. The average grain size of the films is 1 μm. The films are n-type with room temperature resistivity of 180 Ω cm. The activation energies, determined from the temperature dependence of electrical conductivity, are found to be 0.34 eV (320–415 K) and 0.10 eV (223–320 K) and are attributed to In_Cu and V_Se, respectively.     

Memory switching of ZnGa2Te4 thin films

Electrical and switching property of amorphous defect chalcopyrite ZnGa₂Te₄ thin films prepared by thermal evaporation technique has been studied. The elemental chemical compositions of the prepared bulk as well as the as-deposited film were determined by means of energy dispersive X-ray spectrometry. X-ray diffraction pattern revealed that the powder compound is polycrystalline and the as-deposited and the annealed films at t _a ≤ 548 K have the amorphous phase, while that the annealed at t ≥ 573 K are polycrystalline with a single phase of a defect chalcopyrite structure similar to that of the synthesized material. The great advantage of this material is the capability to appear in two different phases, the amorphous and the crystalline phases, with rather different electrical properties. Both dynamic and static I–V characteristics and the switching phenomenon at 601 nm are investigated. The threshold switching mechanism was explained by a thermal model of switching, i.e., joule heating with an electrically conducting channel. ZnGa₂Te₄ is good candidate in phase change memory device.     

Structural and magnetic properties of Ge0.7Mn0.3 thin films

Ge_0.7Mn_0.3 thin films were fabricated on Al₂O₃ (0001) and glass substrates at growth temperatures ranging from room temperature to 500 °C by a radio frequency magnetron sputtering. We found that the Ge_0.7Mn_0.3 thin films showed a polycrystalline-to-amorphous transition at about 360 °C, and the ferromagnetic transition temperature of each thin film depends on its structure — crystalline or amorphous states. Particularly, the Ge_0.7Mn_0.3 thin films showed room temperature ferromagnetism when they were fabricated at temperatures above the crystallization temperature.     

Effects of annealing on thermoelectric properties of Sb2Te3 thin films prepared by radio frequency magnetron sputtering

Antimony telluride (Sb₂Te₃) thin films were deposited on silicon substrates at room temperature (300 K) by radio frequency magnetron sputtering method. The effects of annealing in N₂ atmosphere on their thermoelectric properties were investigated. The microstructure and composition of these films were characterized using scanning electron microscopy, energy dispersive X-ray spectroscopy and X-ray diffraction, respectively. The electrical transport properties of the thin films, in terms of electrical conductivity and Seebeck coefficient were determined at room temperature. The carrier concentration and mobility were calculated from the Hall coefficient measurement. Both of the Seebeck coefficient and Hall coefficient measurement showed that the prepared Sb₂Te₃ thin films were p-type semiconductor materials. By optimizing the annealing temperature, the power factor achieved a maximum value of 18.02 μW cm^?1 K^?2 when the annealing temperature was increased to 523 K for 6 h with a maximum electrical conductivity (1.17 × 10³ S/cm) and moderate Seebeck coefficient (123.9 μV/K).     

Structural,optical and microscopic properties of chemically deposited Mo<Subscript>0.5</Subscript>W<Subscript>0.5</Subscript>Se<Subscript>2</Subscript> thin films

Mo_0.5W_0.5Se₂ thin films were obtained by using relative simple chemical route at room temperature. Various preparative conditions of the thin films are outlined. The films were characterized by X-ray diffraction, scanning electron microscope, optical and electrical properties. The grown films were found to be uniform, well adherent to substrate and brown in color. The X-ray diffraction pattern shows that thin films have a hexagonal phase. Optical properties show a direct band gap nature with band gap energy 1.44 eV and having specific electrical conductivity in the order of 10⁻⁵ (Ωcm)⁻¹.     

Contribution study of properties of copper indium diselenide thin films

Stoichiometric powder of CuInSe₂ (CIS) was prepared from molten stoichiometric quantities of the elements. The structure analyzed by X-ray diffraction powder (XRD), shows mainly the chalcopyrite phase. CIS polycrystalline thin films deposited from this powder have been grown on glass substrates in vacuum by thermal evaporation method. The structural and electrical properties of both as-deposited and annealed films were studied using X-ray diffraction and dark conductivity measurements respectively. As-prepared films at room temperature showed an amorphous structure. However, the chalcopyrite structure with (112) preferential orientation was observed after annealing in vacuum at 400 °C during 30 min. The influence of the annealing process on the dark conductivity of the films was also discussed.     

Characterization of phase transition in silver photo-diffused Ge2Sb2Te5 thin films

Surface activity of thermally evaporated amorphous chalcogenide films of Ge₂Sb₂Te₅ has been investigated. Silver (Ag) is readily deposited on such films from appropriate aqueous ionic solution and Ag diffuses into the films upon irradiation with energetic photons. The composition of Ge₂Sb₂Te₅ thin films and the amount of Ag photo-diffused has been gathered from electron probe micro-analyzer having a wavelength dispersive spectrometer. The composition of the films was found to be very close to the bulk used to deposit films and the amount of Ag photo-diffused was ∼ 0.38 at. %. X-ray diffraction and temperature dependent sheet resistance studies have been used for the structural analysis of the bulk alloy, as-deposited, Ag photo-diffused and annealed films at different temperatures. The films remain amorphous after Ag photo-diffusion into the amorphous Ge₂Sb₂Te₅ films. The reflectivity, reflectivity contrast and extinction coefficient of the crystalline and amorphous photo-diffused thin films are presented. The optical band gaps of the amorphous and crystalline photo-diffused (Ge₂Sb₂Te₅)_100−xAg_x=0.38 phase change thin films have also been calculated from absorption data using UV-VIS spectroscopy.     

Thermoelectric properties of Bi2Te3-Sb2Te3-Sb2Se3 pseudo-ternary alloys in the temperature range 77 to 300° K

The electrical resistivity, thermoelectric power and thermal conductivity of pseudo-ternary Bi₂Te₃-Sb₂Te₃-Sb₂Se₃ alloys were measured in the temperature range 77 to 300° K. From these measurements, figures of merit at various temperatures were calculated and compared with effective figures of merit obtained from the results of Peltier cooling. Best n-type figure of merit, 3.2×10^–3 deg at 300° K, was found at the Bi₂Te₃-rich region of the alloy system and the best room temperature p-type figure of merit, 3.4×10^–3 deg, was obtained at the Sb₂Te₃-rich end. Peltier couples constructed from these alloys reproducibly yielded a maximum cooling of 77.6° K from room temperature. The superior thermoelectric properties of these alloys were attributed to the reduction in the lattice thermal conductivity and its small temperature dependence, and the increase in the energy band gap of the alloys upon additions of Sb₂Se₃.     

Thermal oxidation of amorphous GaSe thin films

In this work the results of the thermal oxidation of GaSe thin films in air at different temperatures are presented. The structural and morphological characteristics of the thermally annealed products were studied by X-ray diffraction (XRD), Raman spectroscopy and scanning electron microscopy (SEM). The as-deposited GaSe films were amorphous and they transformed into polycrystalline GaSe films with a hexagonal crystal structure at a temperature around 400 °C. Thermal oxidation at 650 °C resulted in the formation of mixed Ga₂Se₃ and Ga₂O₃ compounds both in the monoclinic phase. At higher temperatures, Ga₂Se₃ disappeared and complete oxidation of the initial compound occurred. The optical energy gaps of products were determined at room temperature by transmittance measurements using UV–vis–NIR spectroscopy.     

Study of non-isothermal kinetics, electrical and optical properties of (GaSeTe) films

Ternary Ga_xSe_86−xTe₁₄ amorphous films (x=15 and 36) were prepared by thermal evaporation. The results of differential scanning calorimetry (DSC) at different heating rates are reported and discussed. The glass transition activation energy, E_t, and the crystallization activation energy, E_c, were evaluated by measuring the heating rate dependence of the glass transition, crystallization onset and peak crystallization temperatures. The average calculated values of E_t and E_c are 140.29 and 97.89 kJ/mol, respectively. The electrical conductivity of amorphous Ga_xSe_86−xTe₁₄ thin films with different thickness has been measured in the temperature range (263.2-333.3 K) and this allows the effect of introducing a metallic impurity to be observed. It was observed that conductivity increases with increasing activation energy and with a lowering of the pre-exponential factor, which suggests the results can be explained in terms of hopping conduction. The optical constants of these films were determined by transmission and reflection measurements at normal incidence in the spectral range of 500-800 nm. The refractive index has anomalous behavior in the spectral range 400-500 nm. The refractive index dispersion can be fitted to a single oscillator model.     

Growth of ZnIn2Te4 thin films

Bulk ZnIn₂Te₄ was prepared by melting the constituent elements in stoichiometric proportions. ZnIn₂Te₄ thin films were then grown by the flash evaporation technique. The bulk material and the films were characterized by X-ray diffraction and transmission electron microscopy. The effects of substrate temperature on the structural properties and the electrical resistivity of the films have been studied. It was found that single-phase polycrystalline stoichiometric films could be grown in the substrate temperature range 423 ⩽ T_s ⩽ 523 K and the films deposited at 523 K had the minimum electrical resistivity. The implications are discussed.     

Structural,optical and microscopic properties of chemically deposited In<Subscript>2</Subscript>Se<Subscript>3</Subscript> thin films

Solar cell technologically important binary indium selenide thin film has been developed by relatively simple chemical method. The reaction between indium chloride, tartaric acid, hydrazine hydrate and sodium selenosulphate in an aqueous alkaline medium at room temperature gives deposits In₂Se₃ thin film. Various preparative parameters are discussed. The as grown films were found to be transparent, uniform, well adherent, red in color. The prepared films were studied using X-ray diffraction, scanning electron microscopy, atomic absorption spectroscopy, Energy dispersive atomic X-ray diffraction, optical absorption and electrical conductivity properties. The direct optical band gap value E_g for the films was found to be as the order of 2.35 eV at room temperature and having specific electrical conductivity of the order of 10⁻² (Ω cm)⁻¹ showing n-type conduction mechanism. The utility of the adapted technique is discussed from the point of view of applications considering the optoelectric and structural data obtained.     

Effects of annealing temperatures on optical and electrical properties of vacuum evaporated Ga15Se77In8 chalcogenide thin films

The optical constants (absorption coefficient, optical band gap, refractive index, extinction coefficient, real and imaginary parts of dielectric constants) of amorphous and thermally annealed thin films of Ga₁₅Se₇₇In₈ chalcogenide glasses with thickness 4000 Å have been investigated from absorption and reflection spectra as a function of photon energy in the wave length region 400-800 nm. Thin films of Ga₁₅Se₇₇In₈ chalcogenide glasses were thermally annealed for 2 h at three different annealing temperatures 333 K, 348 K and 363 K, which are in between the glass transition and crystallization temperature of Ga₁₅Se₇₇In₈ glasses. Analysis of the optical absorption data shows that the rule of non-direct transitions predominates. It was found that the optical band gap decreases with increasing annealing temperature. It has been observed that the value of absorption coefficient and extinction coefficient increases while the values of refractive index decrease with increasing annealing temperature. The decrease in optical band gap is explained on the basis of the change in nature of films, from amorphous to crystalline state. The dc conductivity of amorphous and thermally annealed thin films of Ga₁₅Se₇₇In₈ chalcogenide glasses is also reported for the temperature range 298-393 K. It has been observed that the conduction is due to thermally assisted tunneling of the carriers in the localized states near the band edges. The dc conductivity was observed to increase with the corresponding decrease in activation energy on increasing annealing temperature in the present system. These results were analyzed in terms of the Davis-Mott model.     

Phase change and optical band gap behavior of Ge-Te-Ga thin films prepared by thermal evaporation

The amorphous Ge_11.4Te_86.4Ga_2.2 chalcogenide thin films were prepared by thermal evaporation onto chemically cleaned glass substrates. Properties measurements include X-ray diffraction (XRD), Scanning electron microscopy (SEM), Differential scanning calorimetry (DSC), Four-point probe and VIS-NIR transmission spectra. The allowed indirect transition optical band gap and activation energy of samples were calculated according to the classical Tauc equation and Kissinger's equation, respectively. The results show that there is an amorphous-to-crystalline phase transition of Ge_11.4Te_86.4Ga_2.2 thin film. The investigated film has high crystallization temperature (∼200 °C) and activation energy (2.48 eV), indicating the film has good amorphous stability. The sheet resistance of the crystalline state is ∼10 Ω/and the amorphous/crystalline resistance ratio is about 10⁵. Besides, a wide optical band gap (0.653 eV) of Ge_11.4Te_86.4Ga_2.2 is obtained, indicating that the material possesses a low threshold current from amorphous-to-crystalline state for phase-change memory application.     

Growth of zinc peroxide (ZnO2) and zinc oxide (ZnO) thin films by the successive ionic layer adsorption and reaction – SILAR – technique

Zinc peroxide, ZnO₂, thin films were grown by successive ionic layer adsorption and reaction (SILAR) technique at room temperature and normal pressure. The thin films were grown on glass, quartz, silicon, on poly(vinyl chloride) and polycarbonate substrates. The precursors used for ZnO₂ films were diluted aqueous solutions of ZnCl₂ complexed with ethylenediamine for cation and H₂O₂ for anion constituent of the film. The zinc peroxide film could be decomposed to zinc oxide by annealing in air or in vacuum. The as-grown films were polycrystalline, or amorphous and the annealed films were amorphous on all substrate materials. According to scanning electron microscopy images the films were uniform and homogeneous. The films were also characterized by UV spectroscopy.