浅析玻璃膜层的形成与不同工艺之间的关系

文章通过试验数据和理论分析，详细论述了平面靶是如何将靶材粒子沉积到玻璃表面，形成均匀的膜层与不同工艺过程之间的关系。     

浅析玻璃膜层的形成机理及其实用意义

通过试验数据和理论分析,详细论述了平面靶是如何将靶材粒子沉积到玻璃表面,形成均匀膜层的机理及对设计和生产的指导意义。     

浅析磁控溅射镀膜玻璃膜层的形成

通过试验数据和理论分析，详细论述了平面靶是如何将靶材粒子沉积到玻璃表面，形成均匀的膜层及其价值。     

高效节能新型阳光控制膜玻璃的膜系研究

为了改进大面积磁控溅射阳光控制膜玻璃的光学和热学性能，对建立在干扰效应原理上的新型膜系进行了研究和试验。新型阳光控制玻璃之膜系设计为“玻璃∥ＴｉＮ∥ＳｎＯ２∥ＴｉＮ。ＴｉＮ膜在此膜系中起着重要作用，为此对ＴｉＮ膜进行了研究，结果为：在溅射室中，富氮气氛对膜系光学均匀性最为有益。     

影响镀膜玻璃膜层粘附强度的因素及控制

膜层粘虽度是镀膜玻璃质量的重要指标。本文对影响膜层粘附强度因素进行分析并提出控制措施。指出工艺参数的正确选取及玻璃表面的有效预处理是保证镀膜玻璃膜层粘附强度的关键。     

玻璃的各种镀膜技术及脱膜原因分析

通过对蒸发式真空镀膜、磁控溅射真空镀膜、凝胶浸渍镀膜、电浮法镀膜及热喷涂等各种玻璃镀膜技术特点的比较,分析各种镀膜玻璃脱膜的原因.指出凝胶浸渍镀膜的玻璃质胶膜的物理化学性质比较稳定且不易脱膜;磁控溅射真空镀膜比较牢固,近期的发展为人注目.     

浅析磁控溅射玻璃镀膜原理

本文在探讨镀膜玻璃一些问题的基础上，阐述了磁控溅射的应用机理，并简单介绍了膜系结构。     

膜层在玻璃节能中的作用

引言：建筑物的功能是建筑设计不可忽略的重点。建筑物多功能化的发展对建材的选用提出了更高的要求，特性单一的建材越来越无法满足商业及民用建筑安全、防盗、隔音、抗紫外线以及节能等全方面的需求。各种先进的镀膜技术与高性能的中间膜使建筑在安全节能方面跨进了一大步。带着相关问题，“泰姆巴伐朗尼论坛一节能新世纪”走访了积水中间膜（苏州）有限公司副总经理张俊先生，以“膜层与节能”为主题进行了采访。[编者按]     

镀膜玻璃色差的调控技巧

文章通过对离线磁控溅射镀膜玻璃生产工艺和物体呈色原理的了解，以及各种材料形成的薄膜，对玻璃颜色影响程度的分析，提出了在生产过程中准确、快速地将玻璃色差调整到最小的方法。     

估测镀膜中空玻璃中的单片镀膜玻璃颜色值的方法

通过分析离线阳光控制镀膜玻璃和低辐射镀膜玻璃单片与其中空玻璃之间颜色值的关系,论述在不破坏中空玻璃的条件下,如何尽可能准确地获得单片镀膜玻璃的颜色值,指导生产人员调试出客户需要的镀膜玻璃。     

磁控溅射法制备As-S玻璃薄膜

采用磁控溅射法在ITO导电玻璃上制备As-S玻璃薄膜,采用XRD、透可见-红外性能、扫描电镜、XPS等现代测试手段,研究薄膜的结晶形态、光学性质和成分。结果发现,利用磁控溅射方法得到了透过率较高、光学质量优良、没有明显的缺陷的As-S硫系玻璃薄膜,XPS光电子能谱结果显示薄膜As/S摩尔比为0.686,大于设计组成。     

浅析镀膜玻璃生产过程中色差的控制技巧

通过对离线磁控溅射镀膜玻璃生产工艺和物体呈色原理的了解,以及各种材料形成的薄膜,对玻璃颜色影响程度的分析,提出了在生产过程中准确、快速地将玻璃色差调整到最小的方法.     

离线镀膜玻璃针孔缺陷的影响因素探讨

采用离线磁控溅射工艺生产的镀膜玻璃,由于其颜色丰富、性能优良、生产效率高等特点,在建筑玻璃领域得到了广泛的应用。生产过程中由于多种因素的影响,镀膜玻璃会产生各类缺陷,通过对磁控溅射生产镀膜玻璃在过程中出现的针孔缺陷进行分析,结合实际生产经验给出相应的改善方法。     

New methodologies for separating glass transitions from energy of film formation in polystyrene latexes

Polystyrene latexes were synthesized to study water evaporation details, and to separate the energy of film formation from the glass transition temperature. Three experimental techniques were employed in the present work to study the formation of polystyrene latex films: standard differential scanning calorimetry (DSC), modulated DSC, and the Mahr method applied to modulated DSC. High-resolution thermogravimetric analysis (TGA) was used to study the water evaporation. The TGA experiments revealed evaporation curves consistent with the notion of surface tension and tortuosity effects being the controlling factors. The method of Mahr was combined with the new software package for DSC to provide an improved method of separating the glass transition of polystyrene from its surface tension-based free energy of film formation. The result was that the films formed under the extremely mild conditions employed had 30–70% of their surfaces obliterated by interfacial adhesion. © 1999 John Wiley & Sons, Inc. J Appl Polym Sci 73: 1763–1768, 1999     

沉积温度对AZO薄膜性能的影响

在采用直流磁控溅射制备AZO(Aluminum Doped Zinc Oxide,掺铝氧化锌)薄膜的过程中,AZO薄膜的光电性能取决于镀膜过程中的各种工艺参数,包括溅射气压、沉积温度、溅射功率和靶基距等。本文主要研究在固定其它工艺参数不变的情况下,通过改变沉积温度在不同的温度下分别制备AZO薄膜,利用SEM、X射线衍射仪等测试不同AZO薄膜的微观结构,并分析研究不同沉积温度下制备AZO薄膜光电性能及结构的变化特性,以筛选出制备高质量AZO膜的最佳沉积温度。     

Phase formation of Nb2AlC investigated by combinatorial thin film synthesis and ab initio calculations

The phase formation of Nb₂AlC was studied by combinatorial thin film synthesis and ab initio calculations. Thin films with lateral chemical composition gradients were synthesized by DC magnetron sputtering at substrate temperatures of 710–870 °C. The lowest formation temperature for Nb₂AlC is between 710 and 750 °C. A predominantly single phase Nb₂AlC region where 99% of the X-ray diffraction intensity originate from Nb₂AlC was identified. Furthermore, selected area electron diffraction analysis reveals the local formation of single phase Nb₂AlC. The limited Al solubility in Nb₂AlC compared with Cr₂AlC can be understood by comparing the defect formation energy of Al substituting Nb and Cr in Nb₂AlC and Cr₂AlC, respectively. This methodology may serve as indicator for the magnitude of the A-element homogeneity range in M_n+1AX_n phases. The structural and elastic properties of Nb₂AlC determined experimentally are in very good agreement with the ab initio calculated data.     

镀膜玻璃雪花斑的性质与成因

镀膜玻璃雪花斑的性质与成因蒋玉兰，顾迅（上海交通大学２０００３０）ＴｈｅＮａｔｕｒｅａｎｄＣａｕｓｅｏｆＳｎｏｗＭａｒｋｏｎＶａｃｕｕｍＣｏａｔｅｄＧｌａｓｓｅｓ￥ＪｉａｎｇＹｕｌａｎ；ＧｕＸｕｎ（ＪｉａｏＴｏｎｇＵｎｉｖｅｒｓｉｔｙ，Ｓｈａｎｇｈａ...     

Preparation and performance of low-emissivity Al-doped ZnO films for energy-saving glass

Low-emissivity Al-doped ZnO films were deposited on the surface of glass by direct current magnetron sputtering method. The infrared emissivity of sample was focused on. The structural characteristics were investigated by the X-ray diffractometry and scanning electron microscopy, while the properties were measured by a four-point probe, an infrared emissivity measurement instrument and an UV–Vis spectrophotometer. The results show that the infrared emissivity of the AZO film is affected by substrate temperature, working pressure and sputtering power. The film deposited at 200?°C, 1.0?Pa and 80?W possesses the lowest emissivity, 0.41. There is a very strong correlation between emissivity and resistivity. When the resistivity is low, the infrared emissivity increases with the increase of resistivity, following the Hagen-Rubens relationship. When the resistivity is high, the correlation between them decreases.