磁控溅射MgxZn1-xO薄膜的结构与光学性能研究

利用射频磁控溅射技术在玻璃衬底上沉积了MgxZn1-xO(x=0～0.2)薄膜.采用X射线衍射仪、紫外-可见光分光光度计和荧光光谱仪研究了Mg掺杂量对MgxZn1-xO薄膜结构与光学性能的影响.XRD图谱表明,MgxZn1-xO薄膜均为六角纤锌矿结构,并且呈现出C轴择优生长特性,当x>0.1时薄膜出现(100)面衍射峰,薄膜的c轴择优生长特性减弱,随着x值的增加,晶格常数c逐渐减小.紫外可见光透射光谱表明,Mg的掺入提高了薄膜在可见光范围内的透过率,同时使薄膜的禁带宽度增大.PL谱分析显示,Mg的掺入使薄膜的紫外发射峰和蓝光发射带发生蓝移,当x=0.1时近带边发射峰与杂质发射的强度比值最高.     

超声喷雾热解法制备MgxZn1-xO薄膜及其性能研究

采用超声喷雾热解法在石英玻璃衬底上生长出不同组分的宽禁带MgxZn1-xO薄膜(z=0、0.08、0.16、0.25).通过X射线衍射(XRD)、扫描电子显微镜(SEM)和分光光度计等分析测试手段对MgxZn1-xO薄膜的晶体结构、透光性及禁带宽度进行了研究.结果表明,随着Mg含量的增加,MgxZn1-xO薄膜仍然保持着ZnO的纤锌矿结构,没有生成MgO相,Mg可以有效地溶入ZnO的晶格中.MgxZn1-xO薄膜具有良好的透光性,在可见波段的光透过率达85%以上;此外,随着Mg含量的增加,MgxZn1-xO薄膜的吸收边出现蓝移现象,禁带宽度从3.30eV增大到3.54eV.     

Mg掺杂对ZnO纳米纤维发光性能的影响

采用静电纺丝法在Si基底上制备了不同Mg掺杂浓度的ZnO纳米纤维膜,利用扫描电子显微镜(SEM)、X射线衍射(XRD)、X射线光电子能谱(XPS)、光致发光(PL)等手段对不同Mg掺杂浓度ZnO纳米纤维膜的表面形貌、晶体结构、化学成分、发光性能进行研究。SEM结果表明MgxZn1-xO纳米纤维的直径在50~300nm。XRD结果表明在Mg掺杂浓度低于15%(x=0.15)时,晶体呈现ZnO六角纤锌矿结构,当掺杂浓度达到20%(x=0.2)时,晶体出现MgO的分相。XPS结果表明Mg已成功掺入到ZnO纳米纤维中。PL谱表明MgxZn1-xO纤维膜具有较强的紫外发射,而可见发射几乎观察不到,随着Mg掺杂浓度的增加,紫外发光峰明显蓝移且发光强度增加。     

MgxZn1-xO单晶薄膜的分子束外延生长及结构表征

用等离子辅助分子束外延(P-MBE)的方法,在蓝宝石c-平面上外延生长了MgxZn1-xO合金薄膜.在0≤x≤0.2范围内MgxZn1-xO薄膜保持着六角纤锌矿结构不变.原位反射式高能电子衍射图样和X射线双晶衍射谱的结果表明生长的样品是单晶薄膜.随着x值逐渐增大,Mg2+离子逐渐进入ZnO的晶格,X射线双晶衍射测得样品的(002)取向的半高宽度从0.249°增加到0.708°,表明结晶质量逐渐下降,(002)方向的X射线衍射峰向大角度方向移动,晶格常数c由5.205(A)减小到5.185(A).透射光谱的结果表明,合金薄膜的吸收边随着Mg离子的掺入逐渐向高能侧移动,室温光致发光谱出现很强的紫外发光(NBE)峰,没有观察到深能级(DL)发射,且随着Mg掺入量的增加,紫外发光峰有明显的蓝移,这与透射光谱的结果是相吻合的.     

MgxZn1-xO薄膜的结构特性研究

采用射频磁控溅射法在80℃衬底温度下制备了MgxZn1-xO（x=0．23）薄膜，用X射线衍射（XRD）、高分辨透射电镜（HRTEM）、喇曼（Raman）光谱和原子力显微镜（AFM）研究了薄膜的结构特性．XRD和HRTEM分析结果表明MgxZn1-xO薄膜为单相六角纤锌矿结构，且具有沿c轴的择优取向，晶格常数与ZnO晶体的近似相等．Raman光谱不仅揭示MgxZn1-xO薄膜具有六角纤锌矿结构，而且也表明MgxZn1-xO薄膜的结晶质量比在相同条件下制备的ZnO薄膜好．AFM图像则显示出MgxZn1-xO薄膜为多晶结构．     

Zn掺杂TiO2薄膜紫外探测器及其光电性能研究

采用射频磁控溅射的方法制备Zn掺杂TiO2薄膜,用XRD、SEM和UV-Vis分别表征TiO2薄膜的晶体结构、表面形貌及其紫外-可见光吸收谱.并用此材料制备Au/TiO2/An结构MSM光电导型薄膜紫外光探测器,研究其光电特性.实验结果表明,Zn掺杂TiO2紫外探测器在250 nm、5 V偏压紫外光照下光电流约为500μA,其响应度为100 A/W,平均暗电流约为0.5μA;由于ZnO/TiO2复合薄膜之间的费米能级不同而形成的内建电场作用,减少了产生的光生电子与空穴的复合,得到较强的光电流.且其光响应的上升迟豫时间约为22 s,下降响应时间约为80 s;响应时间较长是由于广泛分布于薄膜中的缺陷而造成的.结果表明Zn掺杂TiO2可作为一种良好的紫外探测材料.     

立方MgxZn1-xO晶体薄膜的制备和性能

采用低温物理沉积技术在二氧化硅衬底(SiO2/Si(100))和石英玻璃上生长出了MgxZn1-xO(x＞0.5)晶体薄膜,并用扫描电镜(SEM)、原子力显微镜(AFM)、X射线衍射(XRD)图谱和紫外-可见光透射光谱对其进行了表征.结果表明,在SiO2/Si(100)和石英玻璃衬底上沉积的MgxZn1-xO(x＞0.5)晶体薄膜表面平整,均呈立方结构,且具有高度的(001)择优取向.立方MgxZn1-xO薄膜具有从紫外到近红外波段良好的透明性,折射率为1.7～1.8,随着波长的增大或Mg组分的增大而降低.     

带隙可调的宽禁带半导体MgxZn1-xO薄膜研究进展

MgxZn1-xO薄膜是一种新型宽禁带半导体薄膜,在兼顾ZnO、MgO材料性能的同时,具有带隙连续可调的特点,近年来逐渐成为半导体光电功能材料与器件的研究热点之一。本文从MgxZn1-xO薄膜的基本特性、制备方法、应用研究等方面进行了分析和评述,并对其应用前景进行了展望。     

立方相MgxZn1-xO纳米晶体薄膜的物理特性

介绍了在Si衬底和石英玻璃衬底上生长的立方相MgxZn1-xO(0.55≤x≤1)晶体薄膜的物理特性,AFM和XRD等微结构特性表征显示了良好的表面形貌和高度的(111)取向生长特性.采用Manifacier方法,根据透射光谱中的干涉峰,计算得到立方相MgxZn1-xO薄膜的折射率.与已报道的六方相MgxZn1-xO(0≤x≤0.5)薄膜的折射率相类似,在400～800nm的可见光区域,不同Mg含量的立方相MgxZn1-xO薄膜,其折射率随入射波长的色散关系遵循一阶Sellmeier方程.对给定400nm的入射光波长,当薄膜中的Mg含量由55%增至100%时,其折射率由1.89衰减至1.73.     

溶胶-凝胶法制备Li_xMg_(0.2)Zn_(0.8-x)O四元合金薄膜及其性能表征

采用sol-gel法在载玻片上制备了ZnO薄膜和LixMg0.2Zn0.8-xO四元合金薄膜。利用XRD、SEM、PL、范德堡法以及热探针等测试手段对LixMg0.2Zn0.8-xO四元合金薄膜的结构性能、表面形貌、光学特性和电学特性进行了表征。研究发现LixMg0.2Zn0.8-xO四元合金薄膜具有ZnO薄膜的结构特性,相对于ZnO薄膜LixMg0.2Zn0.8-xO四元合金薄膜的结晶性和晶粒尺寸显著提高,并且光致发光强度大大增强。在LixMg0.2Zn0.8-xO四元合金薄膜的光致发光谱中出现了紫外发光峰和可见发光峰,紫外发光峰随着Mg/Zn的值的增加向短波长方向移动,可见光的发光强度较紫光峰的强度更强。LixMg0.2Zn0.8-xO四元合金薄膜的电阻率约为103～104Ω.cm,并随着Li组分的增加而降低。     

Magnesium content ratio effects of MgxZn1-xO seed layers on structural and optical properties of ZnO nanorods

ZnO nanorods were grown on MgxZn1-xO seed layers with different content ratio ranging from 0 to 0.3 by hydrothermal method. Scanning electron microscopy (SEM), X-ray diffraction (XRD), and photoluminescence (PL) were carried out to investigate the effects of Mg content ratio for the MgxZn1-xO seed layers on the structural and optical properties of the ZnO nanorods. The surface morphology and structural properties of the MgxZn1-xO seed layers were changed by the Mg incorporation. However, the appearance, such as density, diameter, and shape, of the ZnO nanorods grown on the MgxZn1-xO seed layers was not changed significantly. The highest intensity ratio of the near-band-edge emission (NBE) to deep-level emission (DLE) and the narrowest full width at half maximum (FWHM) of the NBE peaks, indicating improvement in the crystallinity and luminescent properties of the ZnO crystals, were observed in the ZnO nanorods grown on the MgxZn1_xO seed layers with the content ratio of the 0.05.     

固溶体半导体Zn1-xMgxS薄膜性质研究

以ZnS、Mg粉末为原料,应用双源真空蒸镀法,在石英玻璃衬底上成功地制备了不同Mg含量x的三元固溶体半导体Zn1-xMgxS薄膜.根据薄膜的X射线能量色散谱、X射线衍射谱和紫外-可见吸收光谱,由Vegard定律得到在实验范围内不同Mg含量x的薄膜晶格常数a与x的关系可表达为a(x)＝0.53965-0.01415x(nm);薄膜的光学带隙Eg与x的关系可表达为Eg(x)=0.853x2+0.086x+3.662(eV).     

MgZnO薄膜的制备及其光电特性

采用射频磁控溅射用x=0.00～0.45的MgxZn1-xO陶瓷靶在Si（100）和石英衬底上生长一系列的MgxZn1-xO薄膜。用XRD、XPS、透射谱和光电导谱对样品进行表征。结果表明用MgxZn1-xO薄膜在x≤0.325时具有单一（002）取向的六方结构,其禁带宽度Eg随x增加而增大,在薄膜表面入射光能量大于禁带宽度时有光电响应,并且在x=0.325时得到了禁带宽度为4.90eV的MgxZn1-xO薄膜。在x≥0.40时出现立方相结构,禁带宽度有所减小,说明此时已为混相薄膜。     

Growth kinetic and characterization of Mg(x)Zn1-xO nanoneedles synthesized by thermal oxidation

Mg(x)Zn1-xO nanoneedles were synthesized on alumina substrate by using thermal oxidation technique under normal atmosphere. Zn powder and MgO powder were mixed and heated to form Mg(x)Zn1-xO with x content of 0-0.3 by mol at heating temperature and time of 400-1000 degrees C and 24 h. The morphology of Mg(x)Zn1-xO nanoneedle was characterized by filed emission scanning electron microscope (FE-SEM). It was found that the needle-like nanostructures with the sharp ends were observed outward from microparticles at 400-800 degrees C. From EDS, XRD, and TEM analysis, it was suggested that Mg(x)Zn1-xO alloy was formed with no segregation of MgO in Mg(x)Zn1-xO alloy after thermal oxidation process. Also, from reflectance spectra, the Mg(x)Zn1-xO nanoneedle exhibited higher energy gap than that of ZnO films for entire Mg content indicating widening band gap energy due to alloying effect. Moreover, we have proposed the growth mechanism of Mg(x)Zn1-xO nanoneedles based on growth kinetic of nucleation formation. This growth model can be explored to explain nanostructure of other metal-oxide alloy prepared by thermal oxidation.     

Mn掺杂对ZnO薄膜结构和光学性质的影响

利用脉冲激光淀积的方法在Si衬底上生长出了c轴高度取向的ZnO和Zn0.9Mn（0.1）O薄膜.光致发光结果显示了Mn的掺杂引起了薄膜的带边发射蓝移,强度减弱,紫光发射几乎消失,但绿光发射增强.利用X射线衍射,X射线吸收精细结构和X射线光电子能谱等实验技术对Mn掺杂的ZnO薄膜的结构及其对光学性质影响进行了研究.结果表明：Mn掺入到ZnO薄膜中形成了Zn0.9Mn0.1O合金薄膜,Mn以＋2价的价态存在,这就导致了掺Mn以后的薄膜带隙变大,在发光谱中表现为带边发射的蓝移.同时由于掺入的Mn与薄膜中的填隙Zn反应,导致薄膜的结晶性变差,薄膜中的填隙Zn减少,O空位增多,引起带边发射和紫光发射减弱,绿光发射增强.     

Optical and structural properties of Mg doped ZnO thin films by chemical bath deposition method

The chemical bath deposition method has often been employed to successfully deposit pure and Mg doped ZnO thin films on a glass substrate. The impact of Mg creates a strained stress in ZnO films affecting its structural and optical properties. XRD patterns revealed that all thin films possess a polycrystalline hexagonal wurtzite structure and Mg doped ZnO thin films (002) plane peak position is shifted towards a lower angle due to Mg doping. From the SEM image, it is understood that the Mg doped ZnO thin films are uniformly coated and are seen as dense rods like pillers deposited over the film. The energy dispersive X-ray analysis confirmed the presence of Mg in doped ZnO thin films. The transmittance spectra exhibit that it is possible for Mg doping to enhance ZnO thin films. The optical energy gap of the films was assessed by applying Tauc’s law and it is observed to show an increasing tendency with an improvement in Mg doping concentrations. The optical constants such as reflectance, index of refraction, extinction coefficient and optical conductivity are determined by using transmission at normal incidence of light by using wavelength range of 200–800 nm. In PL spectra, the band edge emission shifted to the blue with increasing amount of Mg doping.     

溅射法生长 MgxZn1- xO薄膜的结构和光学特性

用射频磁控溅射法在不同衬底上制备出了MgxZn1-xO薄膜。X射线衍射(XRD)和原子力显微镜(AFM)研究结果表明,薄膜为六角纤锌矿结构,具有(002)方向择优取向;随氧分压增加,(002)衍射峰的角度变大,表征薄膜表面粗糙程度的方均根粗糙度减小。室温光致发光谱中有多个紫外及可见光致发光峰,其中344nm发光峰应来源于近带边发射。室温透射谱表明薄膜在可见光区具有极高的透过率,薄膜的吸收边位于340nm附近,进而估算出Mg、Zn1-xO薄膜的带隙宽度为3．59eV,与光致发光结果一致。     

Influence of incorporation of Al3+ ions on the structural, optical and AC impedance characteristics of spin coated ZnO thin films

Aluminium doped zinc oxide thin films were deposited onto glass substrate using spin coating technique. The effects of Al doping on structural, optical and electrical properties of these films were investigated. X-ray diffraction analysis showed that all the thin films were of polycrystalline hexagonal wurtzite structure with (002) as preferential orientation except 2 at.% of Al doped ZnO films. The optical band gap was found to be 3.25 eV for pure ZnO film. It increases up to 1.5 at.% of Al doping (3.47 eV) and then decreased slightly for the doping level of 2 at.% (3.42 eV). The reason for this widening of the optical band gap up to 1.5 at.% is well described by Burstein–Moss effect. The photoluminescence spectra of the films showed that the blue shift and red shift of violet emission were due to the change in the radiative centre between zinc vacancy and zinc interstitial. Variation in ZnO grain boundary resistance against the doping concentration was observed through AC impedance study.     

Mg/sub x/Zn/sub 1-x/O: a new piezoelectric material

Piezoelectric ZnO thin films have been successfully used for multilayer surface acoustic wave (SAW) and bulk acoustic wave (BAW) devices. Magnesium zinc oxide (Mg/sub x/Zn/sub 1-x/O) is a new piezoelectric material, which is formed by alloying ZnO and MgO. Mg/sub x/Zn/sub 1-x/O allows for flexibility in thin film SAW device design, as its piezoelectric properties can be tailored by controlling the Mg composition, as well as by using Mg/sub x/Zn/sub 1-x/O/ZnO multilayer structures. We report the metal-organic chemical vapor deposition (MOCVD) growth, structural characterization and SAW evaluation of piezoelectric Mg/sub x/Zn/sub 1-x/O (x<0.35) thin films grown on (011~2) r-plane sapphire substrates. The primary axis of symmetry, the c-axis, lies on the Mg/sub x/Zn/sub 1-x/O growth plane, resulting in the in-plane anisotropy of piezoelectric properties. SAW test devices for Rayleigh and Love wave modes, propagating parallel and perpendicular to the c-axis, were designed and fabricated. Their SAW properties, including velocity dispersion and piezoelectric coupling, were characterized. It has been found that the acoustic velocity increases, whereas the piezoelectric coupling decreases with increasing Mg composition in piezoelectric Mg/sub x/Zn/sub 1-x/O films.     

Optical properties of electrochemically deposited ZnO thin films on colloidal crystal film of SiO2 microspheres

The optical properties of electrochemically deposited ZnO thin films on colloidal crystal film of SiO2 microspheres structures were studied. Colloidal crystal film of SiO2 microspheres were self-assembled by evaporation using SiO2 in solution at a constant 0.1 wt%. ZnO in thin films was then electrochemically deposited on to colloidal crystal film of SiO2 microspheres. During electrochemical deposition, the content of Zn(NO3)2 x 6H2O in solution was 5 wt%, and the process's conditions were varied between of 2-4 V and 30-120 s at room temperature, with subsequent heat-treatment between 200 and 400 degrees C. A smooth surface and uniform thickness of 1.8 microm were obtained at 3 V for 90 s. The highest PL peak intensity was obtained in the ZnO thin film heat-treated at 400 degrees C. The double layered ZnO/SiO2 colloidal crystals showed clearly better emission properties than the SiO2/ZnO and ZnO structures.