Study on crosstalk characteristic of carbon nanotube through silicon vias for three dimensional integration

Coupling noise induced by through silicon vias (TSVs) is expected to be a major concern for three dimensional integrated circuits (3-D ICs) system design. Using equivalent electrical parameters for carbon nanotube (CNT) TSV interconnects, a lumped crosstalk noise model is introduced to capture the TSV-to-TSV coupling noise in CNT via based 3-D ICs and validated with multiple conductor transmission line (MTL) simulation results. The effect of geometrical and material parameters involved on the noise transfer function and peak crosstalk noise, such as insulation thickness, TSV–TSV spacing, TSV height, TSV radius, substrate conductivity and metallic CNT density, is investigated with the proposed model. Simulation results show that the TSV coupling can be divided into three frequency behavior regions. Three approaches using driver sizing, grounded vias shielding and air gap-based silicon-on-insulator (SOI) technique are proposed to mitigate TSV crosstalk coupling noise. The proposed approaches are demonstrated in frequency- and time- domain simulations. They provide the reduction in full-band noise transfer function by an average of 11.71 dB, 24.85 dB and 3.46 dB, and the decrease in 1 GHz peak noise voltage by 53.24 mV, 40.72 mV and 15.1 mV.     

Experimental characterization of coaxial through silicon vias for 3D integration

Coaxial through silicon via (TSV) technology is gaining considerable interest as a 3D packaging solution due to its superior performance compared to the current existing TSV technology. By confining signal propagation within the coaxial TSV shield, signal attenuation from the lossy silicon substrate is eliminated, and unintentional signal coupling is avoided. In this paper, we propose and demonstrate a coaxial TSV 3D fabrication process. Next, the fabricated coaxial TSVs are characterized using s-parameters for high frequency analysis. The s-parameter data indicates the coaxial TSVs confine electromagnetic propagation by extracting the inductance and capacitance of the device. Lastly, we demonstrate the coaxial TSVs reduce signal attenuation and time delay by 35% and 25% respectively compared to the shield-less standard TSV technology. In addition, the coaxial interconnect significantly decreases electromagnetic coupling compared to traditional TSV architectures. The improved signal attenuation and high isolation of the coaxial TSV make it an excellent option for 3D packaging applications expanding into the millimeter wave regime.     

Characterization and modeling of RF substrate coupling effects in 3D integrated circuit stacking

This work addresses parasitic substrate coupling effects in 3D integrated circuits due to Through Silicon Vias (TSV). Electrical characterizations have been performed on dedicated test structures in order to extract electrical models of substrate coupling phenomena when RF signals are propagated in TSV. A good compatibility between RF measurements and RF simulations allows validating modeling tools for predictive studies. Next, parametric studies are performed in order to study impact of TSV design and materials on substrate coupling noise.     

Novel through-silicon vias for enhanced signal integrity in 3D integrated systems

In this paper, a new type of through-silicon via (TSV) for via-first process namely bare TSV, is proposed and analyzed with the aim of mitigating noise coupling problems in 3D integrated systems for advanced technology nodes. The bare TSVs have no insulation layers, and are divided into two types: bare signal TSVs and bare ground TSVs. First, by solving Poisson''s equation for cylindrical P-N junctions, the bare signal TSVs are shown to be equivalent to conventional signal TSVs according to the simulation results. Then the bare ground TSV is proved to have improved noise-absorption capability when compared with a conventional ground TSV. Also, the proposed bare TSVs offer more advantages to circuits than other noise isolation methods, because the original circuit design, routing and placement can be retained after the application of the bare TSVs.     

Air-gap-based RF coaxial TSV and its characteristic analysis

Many 3D IC applications such as MEMS and RF systems require Through-Silicon Via （TSV） with operations for high-speed vertical communication. In this paper, we introduce a novel air-gap coaxial TSV that is suiTab, for such RF applications. Firstly, the detailed fabrication process is described to explain how to acquire such a structure. Then, an Resistor Inductance Conductance Capacitance （RLGC） model is developed to profile the transverse electromagnetic field effect of the proposed air-gap TSV. The model is further verified by a 3D field solver program through the S-parameter comparison. With reference to the numerically simulated results, this analytical model delivers a maximum deviation of less than 6%0, on the conditions of varying diameters, outer to inner radius ratios, and SU-8 central angles, etc. Taking advantages of scalability of the model, a number of air-gap-based TSV designs are simulated, providing 1.6-4.0 times higher bandwidth than the con- ventional coaxial TSVs and leading to an efficient high frequency vertical RF interconnection solution for 3D ICs.     

三维集成电路中TSV-TSV的耦合分析与优化

TSV-TSV耦合会对三维集成电路的性能造成影响,主要的负面效应就是引入了耦合噪声。为了能够在初期设计阶段准确的估计TSV间的耦合强度,本文首先提出了存在于TSV间的基于二端口网络的阻抗级耦合通道模型,然后推导出了TSV间的耦合强度公式用来描述TSV-TSV耦合效应。通过与三维全波仿真结果的对比,公式的准确度得到了验证。另外,本文提出了一种减小TSV间耦合强度的设计方法。通过SPICE仿真,所提出设计方法不仅可以应用在简单TSV-TSV的电路结构中,还可以应用在含有多个TSV的复杂电路结构中,从而体现了所提出设计方法的可行性,并且为设计者提供了改善三维集成电路电学性能的可能性。     

一种混合信号集成电路衬底耦合噪声分析方法

讨论分析了混合信号集成电路衬底噪声耦合的机理,及对模拟电路性能的影响。提出了一种混合信号集成电路衬底耦合噪声分析方法,基于TSMC 0.35μm 2P4M CMOS工艺,以14位高速电流舵D/A转换器为例,给出了混合信号集成电路衬底耦合噪声分析方法的仿真结果,并与实际测试结果进行比较,证实了分析方法的可信性。     

基于COMSOL的TSV电感多物理场耦合特性研究

基于硅通孔(TSV)技术,提出了应用于三维集成电路的三维螺旋电感.在实际应用中,TSV电感存在电场、温度场和力场之间的相互耦合,最终会影响TSV电感的实际电学性能.考虑P型和N型两种硅衬底材料,采用COMSOL仿真软件,对TSV电感进行多物理场耦合研究.结果表明,在P型硅衬底情况下,多物理场耦合的影响更大,TSV电感的...     

Validation of TSV thermo-mechanical simulation by stress measurement

Because of the large mismatch in coefficients of thermal expansion (CTE) between copper vias and the silicon substrate in through-silicon vias (TSVs), thermal stresses are induced. These stresses cause severe reliability issues, such as performance degradation of stress-sensitive devices, and interfacial delamination between TSVs and the silicon substrate. Finite element method (FEM) simulation is a useful tool for thermal stress analysis; however, developers and users are concerned about the range of accuracy of simulation models. Direct validation of the thermal simulation via stress measurement is extremely difficult. As non-destructive methods can measure the stresses only at the surface or several micrometers below, it is difficult to measure the internal stresses. Furthermore, any attempt to use an internal measurement location in the sample affects the stress situation. We propose a methodology to validate the simulation model with stress measurements using polarized Raman spectroscopy on cross-sections of TSV samples. The stress-free assumption at room temperature for simulation was compensated for using the measured residual stresses. An accurate comparison of stress data between experiment and simulation was achieved by considering the re-location of measurement points under thermal deformation. The agreement between simulation and experimental data for radial and axial thermal stresses validated the simulation model.The validated simulation model is useful for structural parametric analysis of TSV. The proposed methodology with stress measurement by polarized Raman spectroscopy and stress analysis by simulation can be used to study the radial and axial thermal stress of other devices.     

Scaling trends of power noise in 3-D ICs

Power supply noise in three-dimensional integrated circuits (3-D ICs) considering scaled CMOS and through silicon via (TSV) technologies is the focus of this paper. A TSV and inductance aware cell-based 3-D power network model is proposed and evaluated. Constant TSV aspect ratio and constant TSV area penalty scaling, as two scenarios of TSV technology scaling, are discussed. A comparison of power noise among via-first, via-middle, and via-last TSV technologies with CMOS scaling is also presented. When the TSV technology is a primary bottleneck in high performance 3-D ICs, an increasing TSV area penalty should be adopted to produce lower power noise. As a promising TSV technology, via-middle TSVs are shown to produce the lowest power noise with CMOS technology scaling.     

Analysis of 3D TSV Vertical Interconnection Using Pre-applied Nonconductive Films

Much research has been carried out to realize through-silicon via (TSV) technology for three-dimensional (3D) chip stacking packaging. A vertical chip interconnection method using Cu/Sn-Ag bumps and nonconductive films (NCFs) is one of the most promising approaches for 3D TSV vertical interconnection. In this work, the relationship between the viscosity of pre-applied NCFs and loading forces was investigated to predict the gap change between a TSV chip and a substrate chip. Existing theories of squeeze flow are adapted to predict the gap change of a real TSV chip and a substrate chip during TSV bonding using a simplified model. The real gaps measured during bonding of test dies were matched to check the validity of the prediction model. Considering the thixotropy of NCFs, the prediction well matched the real gap changes between bumped TSV chips and substrate chips during bonding.     

双根锥形硅通孔结构的精确RLGC电路模型

A fast RLGC circuit model with analytical expression is proposed for the dual tapered through-silicon via （TSV） structure in three-dimensional integrated circuits under different slope angles at the wide frequency region. By describing the electrical characteristics of the dual tapered TSV structure, the RLGC parameters are extracted based on the numerical integration method. The RLGC model includes metal resistance, metal inductance, substrate resistance, outer inductance with skin effect and eddy effect taken into account. The proposed analytical model is verified to be nearly as accurate as the Q3D extractor but more efficient.     

Kth-Aggressor Fault (KAF)-based Thru-Silicon-Via Interconnect Built-In Self-Test and Diagnosis

Three-dimensional (3D) integration is a key technology for systems whose performance and power requirements cannot be achieved by traditional silicon technologies. 3D chips consist of two or more stacked silicon dies connected by short inter-die wires called Thru-Silicon-Vias (TSVs). Despite its potential, the poor reliability and yield, thermal management and testing issues remain major challenges of 3D integration. We address the TSV interconnect test challenge of 3D chips by using Interconnect Built-In Self-Test (IBIST) techniques. The proposed test strategy must sensitize structural faults like opens and shorts, and delay faults due to crosstalk. A possible approach is the well-known Maximum Aggressor Fault (MAF) model. Unfortunately, this model is too conservative and it leads to long test sequences and non-negligible hardware costs. Therefore, we present an alternative solution: the K^th-Aggressor Fault (KAF) model. In our model, aggressors of victim wires are neighboring wires within an optimized distance order K. The aggressor order K is technology-dependent and is determined such that the test times are minimal and the fault coverage is maximal. KAF-based IBIST implementation targeting TSV tests occupies three times less area than similar MAF-/marching-based implementations. We also propose a reconfigurable KAF-based IBIST implementation where tests can be performed using different aggressor orders K. Although the reconfigurable IBIST area is significant, interconnect tests during system lifetime can be performed using lower aggressor orders, reducing test duration and improving TSV availability.     

Efficient methods for modelling substrate coupling in mixed-signalintegrated circuits

A key problem in the design of large mixed-signal circuits is the noise caused by the coupling of digital signals into the substrate. This paper describes methods that allow circuit designers to model efficiently such substrate noise in large mixed-signal SPICE designs. In the light of these techniques a new methodology is presented for efficiently modelling the substrate noise caused by current injection and its coupling to analogue signals; this is then extended to provide a real-time modelling capability. The practicality and the numerical efficiency of the methods are demonstrated on several prototype example circuits     

The development of effective model for thermal conduction analysis for 2.5D packaging using TSV interposer

The effective model for the orthotropic TSV (Through Silicon Via) interposer in heat conduction for 2.5D IC integration was proposed in this study. The simple parallel model was used in out-of-plane direction to predict the effective thermal conductivity for the TSV interposer. The in-plane effective thermal conductivity for the interposer was derived on basis of heat balances. By introducing the effective orthotropic thermal parameters, the TSV structures can be ignored in the present effective model. The computations using the effective model for TSV interposer and the 2.5D package with interposer were carried out. The results showed that the accuracy of the effective model was above 95% comparing with the real model including TSV structures when the volume ratio of the electroplating copper and the silicon interposer is smaller than 10%. Using the effective model, the parametric studies on the interposer sizes and the thermal conductivities of different materials in the 2.5D package were conducted with higher efficiency. The results showed that the performance and sizes of EMC (Epoxy Molding Compound) and the package substrate are more important than that of internal underfills in heat dissipation of the package with TSV interposer.     

Comprehensive Electromagnetic Modeling of On-Chip Switching Noise Generation and Coupling

A comprehensive modeling methodology is presented for the investigation of on-chip noise generation and coupling due to power switching. The backbone of the methodology is an electromagnetic model for the on-chip portion of the power grid. This allows for the impact of the displacement current density and, hence, electromagnetic retardation, to be taken into account in the accurate modeling of the power grid behavior at picosecond switching speeds. In this manner, and through the interfacing of this model with an electromagnetic model for the package portion of the power grid, which is described in terms of a multiport rational matrix transfer function, the impact of package-chip electrical interactions on switching noise can be modeled with electromagnetic accuracy. The electromagnetic model for the power grid is complemented by a resistance-capacitance model for the semiconductor substrate, which is capable of modeling local substrate induced noise coupling between neighboring circuits. Finally, distributed resistance, inductance, capacitance and conductance circuits for signal wires are extracted and used to provide for a transmission line-based modeling of crosstalk and power grid induced signal degradation. Transient simulations using the proposed comprehensive model are carried out using a hybrid time-domain integration scheme which combines a SPICE-like engine for the analysis of all circuit netlists and the nonlinear drivers incorporated in the model with a numerical integration algorithm suitable for the expedient update of the state variables in the discrete electromagnetic model for the power grid.      

Fabrication and stress analysis of annular-trench-isolated TSV

The large mismatches among the coefficients of thermal expansion (CTE) of the metal via, insulator liner, and Si substrate of the through-silicon via (TSV) induce thermal stresses within and around the TSV during thermal-cycled fabrication processes. Reduction of thermal stress in the Si substrate is important for minimizing the deviations in the device characteristics. An annular-trench-isolated (ATI) structure was proposed for the TSV to solve the thermal issues, which occur during the three-dimensional (3D) integrated circuit (IC) integration, by stress redistribution. The concept of ATI TSV is based on retaining a Si-ring between the metal core and insulator layer during the fabrication process. We realized the ATI TSV using a via-last fabrication approach, with two deep silicon etching processes (Bosch processes) for the insulator layer and the metal core. Parylene-HT was utilized as the insulator to achieve high uniformity. With a vacuum-assisted filling system, the vias were filled with a solder material. ATI TSVs with diameters of 10 μm and 2-μm-thick Parylene-HT insulation layers were demonstrated. Studies on the thermal stress levels of the ATI TSV were carried out by finite-element method (FEM) simulation, along with comparisons with regular and annular TSVs. We revealed that the ATI TSV shows lower thermal stresses in the Si substrate than the regular and annular TSVs. The ATI TSV is a possible candidate for 3D IC integration with stress-sensitive devices.     

Modeling of peak-to-peak core switching noise, output impedance, and decoupling capacitance along a vertical chain of power distribution TSV pairs

In this article we propose an efficient and accurate model to estimate peak-to-peak core switching noise, caused by simultaneous switching of logic loads along a vertical chain of power distribution TSV pairs in a 3D stack of dies interconnected through TSVs. The proposed model is accurate with only a 2?C3% difference in peak-to-peak core switching noise as compared to the Ansoft Nexxim4.1 equivalent model. The proposed model is 3?C4 times faster than Ansoft Nexxim4.1 and uses two times less memory as compared to the Ansoft Nexxim4.1 equivalent model. In this article we also thoroughly establish design guidelines for almost flat output impedance magnitude at each stage of a vertical chain of power distribution TSV pairs to realize a resonance free scenario over a wide operating frequency range. We also establish decoupling capacitance design guidelines based on the optimum output impedance and critically damped supply voltage for the core logic for each stage of a vertical chain of power distribution TSV pairs.     

A geometric approach to chip-scale TSV shield placement for the reduction of TSV coupling in 3D-ICs

In 3D ICs, through-silicon-vias (TSVs) can suffer from cross coupling if signal integrity is not considered during the design process. In this paper, coupling between TSVs is modeled, and a chip-scale TSV shielding scheme is presented. A geometric model is developed to estimate TSV coupling. The low complexity of the geometric model makes it practical for chip-scale shield placement optimization. Two shield placement algorithms are presented and compared to standard shield placement techniques that use a high complexity circuit model of coupling. Results show that our algorithms are able to reduce the total cross coupling in a layout on average 111%/129% more than standard methods.