金刚石多晶薄膜的合成与研究

本文采用热解化学气相沉积方法，以甲烷和氢的混合气体为原料，在单晶硅和锗、 铜、钼、石英玻璃、碳化钨和石墨基板上合成金刚石薄膜，而且在单晶硅基板上合成出其面积大于２０×２０ｍｍ２的比较均匀的金刚石膜，同时对金刚石膜的生长特性进行了研 究。     

用射频化学气相沉积法制备p型微晶金刚石薄膜

利用射频化学气相沉积法，通过硼的掺杂，在石英玻璃衬底上生长出Ｐ型微晶金刚石薄膜，范德堡法的测试表明，我们得到的薄膜最小电阻率为４×１０－２Ω．ｃｍ，最大空穴迁移率为５０ｃｍ／Ｖ．ｓ；从电阻率与温度关系近似计算出杂质激活能     

在硅和硬质合金基体上金刚石薄膜生长研究

在硅和硬质合金基体上，用热丝CVD法生长出金刚石薄膜。利用X衍射、拉曼谱和扫描电镜对金刚石薄膜的结构形貌进行了检测，并与天然金刚石对比分析。     

微波等离子体合成类金刚石（DLC）膜的研究

本文对用微波等离子体化学气相沉积方法，以甲烷和氢气的混合气体为原材，在硅或石英玻璃基片上合成类金刚石薄膜进行了研究，并对微波放电合成类金刚石膜的条件进行了考察和探讨。     

原位光发射谱研究横向偏压金刚石薄膜生长过程

利用热丝ＣＶＤ方法研究了横向偏压对金刚石薄膜成核和生长的影响．实验表明,随着偏流的增加,金刚石在光滑硅衬底上的成核密度得到显著提高,最高可达 １．１×１０^８ｃｍ^－２,但是横向偏压不利于金刚石薄膜的生长．原位光发射谱研究发现,横向偏流的增加提高了原子氢和ＣＨ基团的浓度,导致衬底表面非晶碳层的形成,这可能是造成横向偏压促进金刚石成核却不利于金刚石薄膜生长的主要原因．     

SiNx介质薄膜制备及其对GaN表面金刚石形核生长的影响

SiNx作为GaN和金刚石异质结构的中间层，不仅是下层GaN材料的保护层，也是上层金刚石的形核生长层，因此SiNx介质薄膜对于GaN表面合成高质量金刚石具有重要的意义。研究分别采用低压化学气相沉积（LPCVD）和磁控溅射（MS）方法在GaN-Si衬底上制备SiNx介质薄膜。利用扫描电镜、傅立叶红光光谱、X射线衍射、激光拉曼等技术对SiNx薄膜的表面形貌、晶体结构和表面官能团等进行分析。结果表明，采用LPCVD镀制的非晶态SiNx介质薄膜经籽晶播种、形核生长金刚石后，金刚石/SiNx/GaN界面完整致密；采用MS制备的SiNx介质薄膜呈晶态特征，对应的界面出现明显的刻蚀坑。沉积方式会影响SiNx薄膜的晶体结构和微观形貌，高致密度的非晶态结构有利于金刚石层快速形核生长，对于构建金刚石基GaN结构更为有利。     

化学汽相沉积金刚石薄膜的生长

利用热丝化学汽相沉积法生长出优异的金刚石薄膜，研究表明，金刚石的成核依赖于沉积点的尖锐度，薄膜的生长包括晶粒长大和薄膜上的二次成核及其生长，可用分层生长来描述，金刚石晶粒的生长由外延生长和二次成核及其生长组成。也是分层进行的，结果导致了金刚石晶体和薄膜的层状结构。     

石英基片上(11O)取向PLZT薄膜及其光学性能研究

在低成本的石英玻璃衬底上制备高性能电光薄膜非常有吸引力.本文采用溅射方法,并结合Pb3O4气氛退火工艺,在ITO/石英玻璃衬底上制备锆钛酸铅镧(PLZT 8/65/35)薄膜.结果表明:在优化工艺条件下,薄膜为(110)方向择优生长,表面均方根粗糙度为3.1nm,可见光范围内透过率为81.3%,消光系数为0.003.这...     

用化学汽相沉积法在刀具材料表面形成金刚石薄膜

本文采用热解化学气相沉积方法，以甲烷和氢气为原料气体，在刀具材料－硬质合金，金刚石烧结体和立方氮化硼烧结体表面形成了金刚石薄膜，而且研究了金刚石在上述材料表面上的生长特性。     

石英基片上(110)取向PLZT薄膜及其光学性能研究

在低成本的石英玻璃衬底上制备高性能电光薄膜非常有吸引力。本文采用溅射方法,并结合Pb3O4气氛退火工艺,在ITO/石英玻璃衬底上制备锆钛酸铅镧(PLZT 8/65/35)薄膜。结果表明:在优化工艺条件下,薄膜为(110)方向择优生长,表面均方根粗糙度为3.1nm,可见光范围内透过率为81.3%,消光系数为0.003。这种表面光滑和高光学性能的PLZT薄膜在集成光学和光电子器件具有重要的应用潜力。     

Properties of synthetic diamond and graphene nanoplatelet-filled epoxy thin film composites for electronic applications

Epoxy thin film composites filled with particulate nanofillers; synthetic diamond and graphene nanoplatelets were prepared and characterized based on tensile, thermal, and electrical properties. The influences of these two types of fillers, especially in terms of their loading, sizes and shapes, were discussed. It was found that the epoxy thin film composites incorporating synthetic diamond displayed optimum properties where the addition of synthetic diamond from 0 to 2 vol.% results in higher elastic modulus, tensile strength, elongation at break, thermal conductivity and storage modulus if compared to those of graphene nanoplatelets composites. Both thin film composites showed improvement in the glass transition temperature with increasing filler loadings. Results on the electrical conductivity of both systems showed that higher conductivity is observed in graphene nanoplatelets composites if compared to synthetic diamond composites.     

Chalcogenide glasses for optical brazing

Protective coatings of CVD diamond have been bonded to infrared-transmitting optical windows of ZnSe with As-Se-S system chalcogenide glasses of which the refractive index is made to closely match that of diamond by the optical brazing process. To select optimal composition in the As-Se-S system, the Tg, Ts, reflective index and infrared-transmittance of the glass samples were measured. Measurement of transmittance with a Fourier transform infrared spectrometer after the brazing process confirmed that scattering losses were greatly reduced. Infrared transmittance of ZnSe windows with a thin film diamond coating bonded to chalcogenide glass was about 63%.     

高透钻面玻璃在线连续镀膜技术研究

使用立式连续直线镀膜生产线,采用真空磁控溅射技术在玻璃表面设计并镀制了Nb2O5/Si O2/Nb2O5/Si O2/CNx多层纳米硬质增透薄膜,并研究其透过率、硬度及理化性能。结果表明:通过引入线性阳极层离子源,控制并形成新的磁控溅射镀膜工艺,钻面玻璃产品的表面硬度达994.8 HV,是普通玻璃的2倍以上;在可见光透过率≥94%,具有一定的增透效果;经过酸/碱/溶剂/热处理后的透过率衰减ΔT0.1%,理化性能优良。     

红外光学材料硫化锌衬底上沉积金刚石膜的研究

采用微波等离子体化学气相沉积法,在预镀陶瓷过渡层的硫化锌衬底上沉积金刚石膜。在以前的实验中,我们发现在陶瓷过渡层上沉积金刚石膜极其困难,但采用金刚石诱导形核方法后,我们已经在过渡层／硫化锌试样表面获得了很小面积（约1mm宽的环状区域）的金刚石形核。本文对前期的诱导形核工作进行了一定改进,目前已经使形核生长范围大大增加,沉积面积超过原来10倍。此外,本文对金刚石／过渡层／硫化锌试样的红外透过特性以及金刚石膜质量等进行了评价。     

The influence of primary oxygen ions on SIMS depth profiling in materials implanted with cesium

The influence of implantation of oxygen as primary ions and cesium on SIMS in-depth profiles in an oxide glass was examined. For comparison samples of silicon and diamond film were used. Various behaviours of particular profiles were generally explained in terms of the chemical affinity of analysed reactants and an electric field created by implanted ions.     

金刚石膜/氧化铝陶瓷复合材料的介电特性和热学性能研究

研究了金刚石膜/氧化铝陶瓷复合材料作为超高速、大功率集成电路封装基板材料的可行性。采用电容法测量了复合材料的介电性质,结果表明在氧化铝上沉积金刚石膜,能有效降低基片材料的介电系数。碳离子预注入处理使介电损耗降低(从5×10^-3降低到2×10^-3),且频率稳定性更好。金刚石膜的沉积可明显提高基片的热导率,随着薄膜厚度的增加,复合材料的热导率单调递增。当薄膜厚度超过100μm时复合材料的介电系数下降到6.5、热导率上升至3.98W/cm·K,热导率接近氧化铝的20倍。     

Advanced deposition characteristics of kinetic sprayed bronze/diamond composite by tailoring feedstock properties

In this study, the effect of protective nickel film on diamond particles was studied with the goal of preventing fracture and obtaining a uniform diamond distribution in a bronze/diamond composite coating during kinetic spraying. Two types of bronze/diamond composite were deposited on aluminum substrate. For comparison with experimental results, the impact behavior between diamonds in the gas flow field was simulated by finite element analysis (using ABAQUS/Explicit 6.7-2). Size distribution and deposition efficiency of the diamond particles in the composite coatings were analyzed through scanning electron microscopy and image analysis methods. Diamond fracturing was avoided because the impact energy was mostly absorbed by the outer protective nickel film on the diamond particle during impact. The uniform distribution and deposition efficiency of diamond particles in the coating layer could also be achieved by tailoring the physical properties (density, size, etc.) of the feedstock.     

微波PCVD法大尺寸透明自支撑金刚石膜的制备及红外透过率

采用微波PCVD方法制备出直径50mm膜厚300um的大尺寸透明自支撑金刚石膜.在甲烷体积分数2%的条件下制备的透明自支撑金刚石膜经过两面抛光后在500cm-1-4000cm-1红外波段范同内红外透过率达到70%,但是其生长速率只有1um/h-2um/h.在体积分数4%甲烷浓度下制备的自支撑透明金刚石膜,其生长速率达到7um/h～8um/h,经过两面抛光之后膜厚为260um的金刚石膜的在500cm-1～4000cm-1红外波段范围内红外透过率达到60%左右,而且膜中心和边缘区的红外透过率基本相同.这些结果为大尺寸金刚石厚膜在红外窗口上的实际应用奠定了基础.     

掺硼对超纳米金刚石薄膜的影响

采用微波等离子体化学气相沉积(MPCVD)技术,利用氩气、甲烷、二氧化碳混合气体,制备出平均晶粒尺寸在7.480 nm左右,表面粗糙度在15.72 nm左右的高质量的超纳米金刚石薄膜;在此工艺基础上以硼烷作为掺杂气体,合成掺硼的金刚石薄膜.表征结果显示在一定的浓度范围内随着硼烷气体的通入,金刚石薄膜的晶粒尺寸及表面粗糙度增大、结晶性变好,不再具有超纳米金刚石膜的显微结构和表面形态;同时膜材的物相组成也发生改变,金刚石组份逐渐增多,并且膜层内出现了更明显的应力以及更好的导电性能.     

大气下火焰法合成金刚石薄膜

本文介绍了用氧-乙炔火焰法在大气下合成金刚石薄膜的实验结果,初步研究了基板温度对金刚石晶体生长速度、结晶习性的影响,指出了在金刚石(111)及(100)晶面上外延单晶金刚石膜的温度范围,还探讨了氧对薄膜的质量均匀性的影响。