InGaAs／AlGaAs单量子阱激光器低阈值激射

研制了InGaAs/AlGaAs SQW激光器,对其工作特性如阈值电流密度、激射波长、特征温度、远场分布等进行了研究. 用MOCVD方法生长制备了InGaAs/AlGaAs分别限制单量子阱结构材料,得出其各层组分和能带分布.首先在GaAs衬底上生长GaAs缓冲层和AlGaAs波导层,然后生长窄能带的AlGaAs量子阱势垒层,再继续生长InGaAs量子阱有源区.其后继续生长AlGaAs势垒层、高Al组分AlGaAs波导层和GaAs高掺杂欧姆接触层.我们发现在低温范围里(160 K～220 K)阈值电流密度随温度升高而减小,与普通量子阱激光器正相反,表现出负的特征温度.随着温度进一步提高,阈值电流密度表现出指数式增大.300 K下腔长2000 μm的激光器最低的阈值电流密度约为200 A/cm2.(OD7)     

高功率980nm垂直腔面发射激光器的温度特性

应变补偿量子阱结构因带宽大、增益高和波长漂移速度低等特点而成为近年来研究的热点.首次介绍了国内980 nm 高功率InGaAs/GaAsP应变补偿量子阱结构的垂直腔面发射激光器(VCSEL) 变温实验,测得脉冲条件下600 μm直径的器件在10-100℃温度范围内发射波长漂移速度为0.05 nm/K,阈值电流随温度变化呈现先缓慢下降后迅速上升的特性.结合VCSEL反射谱、PL谱和增益峰值波长漂移速度,对器件阈值电流特性进行了合理的分析和解释.连续工作状态下,测试得到器件峰值功率为1 W,根据波长与耗散功率的实验曲线及热阻计算公式,可估算出垂直腔面发射激光器热阻值为10 K/W.     

快速热退火对高应变InGaAs/Ga As量子阱的影响

用固态分子束外延技术生长了高应变In0.45Ga0.55As/GaAs量子阱材料. 研究了快速热退火对高应变InGaAs/GaAs量子阱材料光学性质的影响. 本文采用假设InGaAs/GaAs量子阱中的In-Ga原子扩散为误差函数扩散并解任意形状量子阱的薛定谔方程的方法，对不同退火温度下InGaAs/GaAs量子阱室温光致发光峰值波长拟合，得到了In原子在高应变InGaAs/GaAs量子阱中的扩散系数以及扩散激活能（0.88eV) .     

外腔面发射激光器自发辐射谱的热特性

热效应是限制外腔面发射激光器(VECSEL)输出功率和光束质量的主要原因。为了优化VECSEL增益芯片有源区量子阱的设计,降低激光器的热效应,提高斜效率和输出功率,采用光致荧光谱方法,对设计波长980nm VECSEL自发辐射谱的热特性进行了实验研究。取得了不同热沉温度下边发射和面发射谱随温度的变化数据。结果表明,反映有源区量子阱自身特性的边发射谱峰值波长随温度升高的红移速率是0.5nm/K,而受到增益芯片多层结构调制的面发射谱峰值波长随温度升高的红移速率只有0.1nm/K;由于受到VECSEL增益芯片中微腔的限制,面发射谱分离为多个模式,分别与微腔的腔模对应。可见对量子阱的发射波长及微腔腔长做预偏置优化处理,可以显著改善激光器的输出性能。     

快速热退火对高应变InGaAs/GaAs量子阱的影响

用固态分子束外延技术生长了高应变In045Ga0.55 As/GaAs量子阱材料.研究了快速热退火对高应变InGaAs/GaAs量子阱材料光学性质的影响.本文采用假设InGaAs/GaAs量子阱中的In-Ga原子扩散为误差函数扩散并解任意形状量子阱的薛定谔方程的方法,对不同退火温度下InGaAs/GaAs量子阱室温光致发光峰值波长拟合,得到了In原子在高应变InGaAs/GaAs量子阱中的扩散系数以及扩散激活能(0.88eV).     

InGaAs/InAlAs盖帽层对InAs自组装量子点发光性质的影响

采用变温及时间分辨光致发光谱研究了MBE设备生长的具有不同盖帽层的InAs量子点样品.发现引入InGaAs盖帽层可以使InAs量子点发光的半高宽减小,且向长波长移动.InGaAs/InAlAs联合盖帽层可以进一步改善InAs量子点发光性能,使得室温发光波长超过1.3μm;在10～300K温度范围内,发光峰值能量及半高宽随温度的变化都较小.随温度升高,InAs量子点的发光寿命首先增大,当温度升高到临界温度TC后,发光寿命逐渐减小.但覆盖不同盖帽层的InAs量子点样品,其发光寿命具有不同的温度关系,联合盖帽层样品具有较大的TC及发光寿命.根据应力及载流子迁移模型对以上实验结果进行了分析.     

高功率VCSEL中应变补偿量子阱的理论设计

利用模型固体理论、k.p理论和Pikus-Bir理论,研究了InGaAs/GaAsP应变补偿量子阱,得出了较为简单通用的设计方法;进而研究了阱宽、InGaAs中In组分和GaAsP中P组分等参数对跃迁波长的影响.理论计算发现,与InGaAs/GaAs普通量子阱相比,InGaAs/GaAsP应变补偿量子阱能提供更深的载流子阱和更大的增益.按照提出的理论设计方法,研制了含InGaAs/GaAsP应变补偿量子阱的垂直腔面发射激光器(VCSEL),理论计算和实验结果相吻合.     

分子束外延生长高应变单量子阱激光器

采用分子束外延方法研究了高应变InGaAs/GaAs量子阱的生长技术.将InGaAs/GaAs量子阱的室温光致发光波长拓展至1160nm,其光致发光峰半峰宽只有22meV.研制出1120nm室温连续工作的InGaAs/GaAs单量子阱激光器.对于100μm条宽和800μm腔长的激光器,最大线性输出功率达到200mW,斜率效率达到0.84mW/mA,最低阈值电流密度为450A/cm2,特征温度达到90K.     

光抽运垂直外腔面发射激光器的增益特性数值模拟

为了深入研究光抽运垂直外腔面发射激光器的增益特性,以InGaAs/GaAs应变量子阱系统为例,建立了将带隙、带边不连续性计算和带结构计算系统结合起来的完整体系,考虑在应变影响下能带及波函数的混合效应。利用有限差分法对含6×6 Luttinger-Kohn哈密顿量的有效质量方程精确求解,得到了InGaAs/GaAs应变量子阱导带、价带的能带结构和包络函数,然后选用Lorentzian线形函数,数值模拟了量子阱的材料增益谱和自发辐射谱。最后讨论了阱宽、载流子浓度、温度等因素对量子阱材料增益的影响,为光抽运垂直外腔面发射激光器的优化设计提供了理论依据。     

Design and Characteristics of InGaAs/GaAs MQW SEED Arrays Structure

讨论了谐振腔中的DBR对InGaAs／GaAs多量子阱SEED面阵光反射特性的影响．采用InGaAs／GaAs作为多量子阱SEED器件的有源区,从而获得了980nm工作波长．设计和分析了InGaAs／GaAs多量子阱SEED中的一种用于倒装焊的新型谐振腔结构．多量子阱材料是用MOCVD系统生长,利用微区光反射谱、PL谱以及X射线双晶衍射对多量子阱材料进行了测量和分析,测量结果表明多量子阱材料具有良好的质量,证明了器件结构的设计和分析是准确的．     

Lasing at a wavelength close to 1.3 µm in InAs quantum-dot structures

The feasibility of lasing at a wavelength close to 1.3 μm is demonstrated in InAs quantum-dot structures placed in an external InGaAs/GaAs quantum well. It is shown that the required wavelength can be attained with the proper choice of thickness of the InAs layer deposited to form an array of three-dimensional islands and with a proper choice of mole fraction of InAs in the InGaAs quantum well. Since the gain attained in the ground state is insufficient, lasing is implemented through excited states in the temperature interval from 85 K to 300 K in a structure based on a single layer of quantum dots. The maximum attainable gain in the laser structure can be raised by using three rows of quantum dots, and this configuration, in turn, leads to low-threshold (70 A/cm²) lasing through the ground state at a wavelength of 1.26 μm at room temperature. Fiz. Tekh. Poluprovodn. 33, 1020–1023 (August 1999)     

High-frequency modulation characteristics of 1.3-/spl mu/m InGaAs quantum dot lasers

In this letter, we report results of small-signal modulation characteristics of self-assembled 1.3-/spl mu/m InGaAs-GaAs quantum dot (QD) lasers at room temperature. The narrow ridge-waveguide lasers were fabricated with multistack InGaAs self-assembled QDs in active region. A high characteristic temperature of T/sub o/=210 K with threshold current density of 200A/cm/sup 2/ was obtained. Small-signal modulation bandwidth of f/sub -3 dB/=12 GHz was measured at 300 K with differential gain of dg/dn/spl cong/2.4/spl times/10/sup -14/ cm/sup 2/ from detailed characteristics. We observed that a limitation of modulation bandwidth in high current injection appeared with gain saturation. This property can direct future high-speed QD laser design.     

Optical studies of asymmetric-waveguide submonolayer InGaAs QD microdisks formed by selective oxidation

Lasing in microdisks with an asymmetric waveguide formed by selective oxidation was achieved under optical pumping in the temperature range 5–180 K. InGaAs quantum dots (QDs) formed by submonolayer deposition were used as the active region. The experimentally determined quality factor Q of a microdisk cavity is no less than 10⁴. The temperature shift of the resonance mode wavelength is attributed to the dispersion and the temperature dependence of the effective refractive index of a microdisk. The observed temperature dependence of the lasing threshold is related to thermal excitation of carriers from QDs into GaAs.     

Broadband tuning (170 nm) of InGaAs quantum well lasers

The wavelength tuning properties of strained InGaAs quantum well lasers using an external grating for feedback is reported. Tunable laser oscillation has been observed over a range of 170 nm, between 840 and 1010 nm, under pulsed current excitation. The optimal conditions for broadband tunability for the InGaAs lasers are different from GaAs lasers, which is attributed to a difference in spectral gain curves. Together with an optimised GaAs quantum well laser the entire region between 740 and 1010 nm is spanned.<>     

Electroluminescence of injection lasers based on vertically coupled quantum dots near the lasing threshold

Electroluminescence spectroscopy has been used in a wide range of temperatures (77–300 K) and driving current densities to study a laser heterostructure based on vertically coupled self-assembled InGaAs quantum dots (QD). It has been found that lasing occurs via the QD ground state in the entire temperature range. The temperature-independent position of the emission peak corresponding to the second excited state in QDs is explained.     

Temperature dependent lasing characteristics of InAs/InP(100) quantum dot laser

We report on the lasing characteristics of InAs/InP(100) quantum dots laser through changing the temperature under continuous-wave mode. Three lasing peaks are simultaneously observed at temperature of 80 K and the lasing order of each peak is unrelated with each other when injection current increases. Laser spectra obtained under fixed current for different temperatures show a drastic influence on their shape. A large spectral broadening is observed at low temperature, while the width of lasing spectra gradually narrows when the operating temperature increased. The lasing process of quantum dot laser is obviously different from that of a reference quantum well laser in the same wavelength region. In addition, very high wavelength stability of 0.088 nm/K in the temperature range of 80–300 K is obtained, which is 6.2 times better than that of reference quantum well laser.     

Investigation of the device characteristics of a low-threshold quantum-dot laser emitting at 1.9 µm

InAs quantum dots in a InGaAs matrix grown on an InP substrate by molecular-beam epitaxy are employed as the active region of an injection laser. Lasing via quantum-dot states is observed in the temperature range 77–200 K. At the lowest threshold current density 11 A/cm² the radiation wavelength is equal to 1.894 μm (77 K). Fiz. Tekh. Poluprovodn. 32, 892–895 (July 1998)