Influence of Deposition Parameters on the Morphology, Structural, and Optical Properties of ZnSe Nanocrystalline Thin Films

Zinc selenide (ZnSe) nanocrystalline thin films were prepared by using chemical bath deposition at different ammonia concentrations and different deposition temperatures. The structural and optical properties of ZnSe nanocrystalline thin films were investigated as a function of the ammonia concentration in precursors or the deposition temperature using scanning electron microscopy, energy-dispersive spectrometry, x-ray diffraction measurements, and ultraviolet (UV)–visible spectrophotometry measurements. The results reveal that the ZnSe thin films are composed of a large number of uniform spherical particles. Each spherical particle contains several nanocrystals 5 nm to 7 nm in crystallite size. An increase in both the average diameter of the spherical particles and the crystallite size of the nanocrystals occurs with an increase in ammonia concentration and/or deposition temperature. The Se/Zn atom ratios in the ZnSe thin films increase and the optical band gaps, E _g, of the ZnSe thin films decrease with an increase in ammonia concentration or deposition temperature. The kinetics and reaction mechanism of the ZnSe nanocrystalline thin films during deposition are discussed.     

Characterization of CdSe thin films deposited by chemical bath solutions containing triethanolamine

Cadmium selenide (CdSe) thin films were prepared by chemical bath deposition on glass substrates at different temperatures beginning at room temperature (25 °C) upto 80 °C from an aqueous alkaline medium using a precursor solution containing cadmium acetate, 2,2′,2′′-nitrilotriethanol (triethanolamine), ammonia and sodium selenosulphate. The pH of bath was kept constant around 10.50±0.10. Energy dispersive analysis of X-rays confirmed that the films are nearly stoichiometric in composition. The structural and surface morphological properties have been studied by X-ray diffraction, Scanning electron microscopy and Atomic force microscope techniques. X-ray diffraction study reveals a cubic structure with preferential orientation along (111) direction. The dependency of structural parameters such as crystallite size, strain and dislocation density with different bath temperatures for CdSe thin films are calculated. X-ray peak broadening was used to evaluate the crystallite size and lattice strain by the Williamson–Hall plots. Optical properties are studied by photoluminescence spectra which shows blue shift in peak position and reduction in luminescence intensity were observed for films deposited at different bath temperatures.     

Effect of quantum confinement in CdSe/Se multilayer thin films prepared by PVD technique

Quantum confined nanostructures were prepared by depositing alternate CdSe and Se thin layers. The structural and optical characterizations of the prepared samples were carried out using X-ray diffractometer (XRD), Field emission scanning electron microscope (FE-SEM), UV–visible and photoluminescence spectrophotometers. XRD studies revealed that CdSe nanocrystals are polycrystalline in nature with hexagonal phase. The crystallite size of CdSe nanoparticles was found to be in the range of 8–14 nm. FE-SEM images also confirmed that the embedded nanocrystalline CdSe particles are a few nanometers in dimension having a spherical morphology. The quantum confinement of charge carriers in the multilayer (ML) films is evident from the shifting of absorption edge to lower wavelengths in the UV–visible spectra. An increase in the energy band gap with decreasing thickness of the CdSe sub-layer has been ascribed to quantum confinement effect and the subsequent crystallite size calculated from Brus approximation method is ~3.5 nm. Hence, the results indicate that the quantum confinement effect could be realized in CdSe nanocrystallites by ML stacking structure of CdSe and Se in appropriate thickness ratio.     

Optimising conditions for the growth of nanocrystalline ZnS thin films from acidic chemical baths

The growth of nanocrystalline zinc sulfide thin films onto glass substrates by chemical bath deposition has been optimized at acidic pH. Powder X-ray diffraction (p-XRD) confirms the deposition of sphalerite, the cubic phase of ZnS. The crystallite size calculated by Scherrer equation was found to be 4.0 nm. Scanning Electron Microscopy (SEM) show clusters of spherical nanoparticles uniformly distributed over the surface of the glass substrates. Energy Dispersive X-ray (EDX) analysis of the deposited thin films show the zinc to sulfur ratio close to 1:1. The observed band gap (3.78 eV) of the deposited thin films is higher than that reported for cubic phase of bulk ZnS (3.54 eV) as expected due to nano-size crystallites. Binding energies calculated by X-ray Photoelectron Spectroscopy (XPS) confirm the material as ZnS and the photoluminescence measurements show the blue shift in emission maximum.     

The effect of potential on electrodeposited CdSe thin films

Cadmium selenide (CdSe) thin films have been successfully prepared by the electrodeposition technique on indium doped tin oxide (ITO) substrates with aqueous solutions of cadmium sulphate and selenium dioxide. The deposited films were characterized with X-ray diffraction (XRD), scanning electron microscope (SEM), energy dispersive analysis by X-rays (EDAX), photoluminescence (PL), UV spectrometry and electrical resistivity measurements. XRD analysis shows that the films are polycrystalline in nature with hexagonal crystalline structure. The various parameters such as crystallite size, micro strain, dislocation density and texture coefficients were evaluated. SEM study shows that the total substrate surface is well covered with uniformly distributed spherical shaped grains. Photoluminescence spectra of films were recorded to understand the emission properties of the films. The presence of direct transition with band gap energy 1.75 eV is established from optical studies. The electrical resistivity of the thin films is found to be 10⁶ Ω cm and the results are discussed.     

Formation of silicon nanocrystals by thermal annealing of low-pressure chemical-vapor deposited amorphous SiNx (x=0.16) thin films

Silicon nanocrystals have been produced by thermal annealing of SiN_x thin film obtained by low pressure chemical vapor deposition using a mixture between disilane and ammonia. Morphological, structural, and photoluminescence properties of the thin film were investigated using X-ray diffraction, scanning electron microscopy, Raman spectroscopy and photoluminescence spectroscopy. The results revealed a high crystallinity of film with a crystalline volume fraction exceeded 70%, and a dominance of silicon nanocrystallites having the sizes within the range 2.5–5 nm and density ~1.98.10¹²/cm². The PL peaks consist of nanocrystalline silicon and amorphous silicon. The luminescence from the silicon nanocrystals was dominant.     

Effect of annealing temperature on optical and electrical properties of lead sulfide thin films

Lead sulfide (PbS) thin films with 150 nm thickness were prepared onto ultra-clean quartz substrate by the RF-sputtering deposition method. Deposited thin films of PbS were annealed at different temperatures 100 °C, 150 °C, 200 °C, 250 °C and 300 °C. X-ray diffraction pattern of thin films revealed that thin films crystallized at 150 °C. Crystalline thin films had cubic phase and rock salt structure. The average crystallite size of crystalline thin films was 22 nm, 28 nm and 29 nm for 150 °C, 200 °C and 250 °C respectively. From 150 °C to 250 °C increase in annealing temperature leads to increase in crystallite arrangement. FESEM images of thin films revealed that crystallite arrangement improved by increasing annealing temperature up to 250 °C. Increase in DC electrical conductivity by increasing temperature confirmed the semiconductor nature of crystalline thin films. Increase in dark current by increasing annealing temperature showed the effect of crystallite arrangement on carrier transport. Photosensitivity decreased by increasing annealing temperature for crystalline thin films that it was explained at the base of thermal quenching of photoconductivity and adsorption of oxygen at the surface of thin films that leads to the formation of PbO at higher temperatures.     

Thickness dependent physical properties of chemically deposited nanocrystalline MgSe thin films deposited at room temperature by solution growth method

Chemical bath deposition method has been employed to deposit nanocrystalline magnesium selenide thin films of thickness 104–292 nm onto glass substrates at room temperature. The deposition bath consists of magnesium chloride, triethanolamine (TEA) and selenium dioxide. The as deposited films were characterized by X-ray diffraction, scanning electron microscopy (SEM), atomic force microscopy (AFM), optical absorption, electrical resistivity and thermo-emf measurements. The X-ray diffraction (XRD) studies revealed that the crystallinity of the magnesium selenide thin film increases with thickness. SEM studies reveal that MgSe films exhibit uniform distribution of round shaped grains over the entire substrate surface.The optical band-gap and electrical resistivity of MgSe film decrease as the film thickness increases. Such type of dependence is attributed to the quantum size effect that is observed in nanocrystalline semiconductors.The thermo-emf measurement confirms its p-type conductivity.     

Mixed phase silicon thin films grown at high rate using 60 MHz assisted VHF-PECVD technique

Mixed phase amorphous and nanocrystalline silicon (a-Si:H and nc-Si:H) thin films were deposited by VHF-PECVD (60 MHz) using Argon (Ar) as the diluent of silane. These amorphous and crystalline silicon thin films were deposited by varying the argon dilution (f_Ar) from 10–97.5% while keeping other process parameters constant. The effects of argon dilution on deposition rate, structural and optical properties of micro/nanocrystalline silicon thin films are studied. It has been observed that the films deposited from f_Ar 10–70% showed the deposition rate >20 Å/s with the highest deposition rate achieved of ~25 Å/s. Structural characterization has been performed by micro-Raman analysis and Atomic force microscopy. Raman shift towards higher wave number (515 cm⁻¹) with increase of f_Ar indicates variation in crystallinity of silicon films. HRTEM studies revealed the distribution of grain size and the degree of crystallinity. Optical absorption spectroscopy confirmed the increase in band gap of the materials from 1.5 to 2.1 eV.     

Characterization and antibacterial capabilities of nanocrystalline CdS thin films prepared by chemical bath deposition

Antibacterial capabilities of nanocrystalline cadmium sulfide (CdS) thin films have been developed against Gram-positive and Gram-negative bacteria in dark and sunlight at 60 °C. For this purpose, a strain of Gram-positive Staphylococcus aureus, and two strains of Gram-negative bacteria (Pseudomonas aeruginosa, and Escherichia coli) were used. The nanocrystalline CdS thin films have been prepared using a chemical bath deposition (CBD) method at different thicknesses (50, 80 and 100 nm). The different deposition parameters including the speed of rotation of substrate, temperature of chemical bath, pH of solution and time of the deposition were optimized. The Polyvinylpyrrollidone (PVP) was successfully used as capping agent in order to stop the agglomeration in the CdS thin films. It was found that, CdS thin films have remarkable antibacterial activity in dark and sunlight and it could be applied as antimicrobial agent in medical field. In order to confirm the crystalline structure of CdS thin films, the polycrystalline nature of the deposited CdS thin films with hexagonal structure was obtained. Furthermore, the structural parameters including lattice parameters, cell volume, the space group, average grain size, dislocation density and the strain have been calculated. The topography and surface roughness of the CdS thin films have been studied before and after the bacteriostatic effect using Scanning Electron Microscopy (SEM). Furthermore, the compositions of nanocrystalline CdS thin films have been evaluated using Energy Dispersive X-ray emission (EDX) and a Transmission Electron Microscope (TEM). Based on the optical measurements in the range of 300–2500 nm, the band gap energy of the prepared CdS thin films was found to be 2.4 eV.     

Deposition of morphology-tailored PbS thin films by surfactant-enhanced aerosol assisted chemical vapor deposition

In this work, we report the results of deposition of PbS thin films using single molecular precursor, bis(O-isobutylxanthato)lead(II), in the presence of additives namely: sodium dodecyl sulfate (SDS), Tween and Triton x-100, via aerosol assisted chemical vapor deposition (AACVD). The as-deposited PbS thin films are highly crystalline and exhibited superior adhesion to glass substrates. Powder X-ray diffraction (XRD) analysis confirmed the formation of pure cubic phase of PbS. Thin films deposited using 0.4 mM Triton X-100 as additive resulted in wire like structures while 0.8 mM Triton X-100 deposited thin films comprised of predominantly shoe shaped structures. Further, increase in concentration (1.2 mM) of Triton X-100 deposited films having rod like morphology. The scanning electron microscopy (SEM) confirmed that in the presence of SDS, thin films consist of spherical shaped crystallites. Energy dispersive X-ray spectroscopy (EDX) and X-ray photon electron microscopy (XPS) of as-deposited PbS thin films was used to study chemical composition of thin films.     

Annealing temperature dependent structural and optical properties of electrodeposited CdSe thin films

Cadmium selenide films were synthesized using simple electrodeposition method on indium tin oxide coated glass substrates. The synthesized films were post annealed at 200 °C, 300 °C and 400 °C. X-ray diffraction of the films showed the hexagonal structure with crystallite size <3 nm for as deposited films and 3–25 nm for annealed films. The surface morphology of films using field emission scanning electron microscopy showed granular surface. The high resolution transmission electron microscopy of a crystallite of the film revealed lattice fringes which measured lattice spacing of 3.13 Å corresponding to (002) plane, indicating the lattice contraction effect, due to small size of CdSe nanocrystallite. The calculation of optical band gap using UV–visible absorption spectrum showed strong red-shift with increase in crystallite size, indicating to the charge confinement in CdSe nanocrystallite.     

Influence of copper concentration on the opto-structural,morphological and electrical properties of novel MoSb2−xCuxSe2 thin films

In this work, MoSb_2−xCu_xSe₂ nanocrystalline thin films obtained for different copper concentrations (0.1, 0.2 and 0.3 M) on glass substrates by simple chemical bath deposition (CBD) method at room temperature. X-ray diffraction (XRD) patterns revealed the incorporation of copper content by the conversion of orthorhombic Sb₂Se₃ into orthorhombic Cu₃SbSe₃ with shift to higher angles. Average crystallite was found to be 24, 36 and 39 nm for the deposited films. FESEM analysis indicates that morphological transition from spherical grains with cylindrical nanorods to porous nanofibers for 0.3 M and HRTEM confirms the FESEM results with an average grain size of 200 nm for 0.1 M Cu concentration. EDS analysis confirmed the formation of MoSb_2−xCu_xSe₂ thin films. Current–Voltage (I–V) measurements clearly depicted the ohmic nature of the material in the entire region. Thickness of the films was found to be increased with increase in copper content. The band gap energy (E_g) of the film is in the range of 1.644–3.757 eV.     

Physical properties of nanocrystalline CuO thin films prepared by the SILAR method

We report a facile and low-cost successive ionic layer adsorption and reaction method to synthesize nanocrystalline CuO thin films. Influence of deposition cycles on the physical properties of nanocrystalline CuO thin films was investigated. X-ray diffraction studies show that all the films exhibit polycrystalline nature with monoclinic crystal structure. Fourier transform infrared spectroscopy and Raman studies confirmed the formation of single phase CuO wherein the characteristic vibrational mode of CuO was identified. Scanning electron microscopy studies revealed the formation of sporadic growth of rod-shaped elongated particles. Both the structural and surface properties of CuO thin films were improved with the increase in the deposition cycles as a result of which the optical absorption edge of CuO shift towards longer wavelength, and the optical band gap energy decreases from 2.48 eV to 2.31 eV. The room-temperature photoluminescence spectrum showed blue emission band centered at 468 nm, attributed to the near-band-edge emission of CuO due to Burstein–Moss effect.     

Influence of cadmium concentration on the optical and structural properties of cadmium selenide thin films

Thin films of cadmium selenide (CdSe) and Cd_xSe_100−x (x=54, 34) have been deposited by vacuum evaporation onto ultraclean glass substrates at room temperature from as-prepared powders. Fabricated samples were characterized using X-ray diffraction (XRD), UV–vis and Fourier transform infrared (FTIR) spectroscopy. XRD indicated the formation of polycrystalline Cd_xSe_100−x thin films polycrystalline in nature with the preferred orientation along the (002) plane. The crystallite sizes of thin films calculated by the Scherer formula were found to be in the range of 29–82 nm. The crystallinity of thin films degraded on increasing the Cd concentration in the Cd–Se system. The band gaps of thin films were obtained from their optical absorption spectra, which were found in the range of 1.69–2.20 eV. The band gap of the Cd₃₄Se₆₆ thin films was found to be very high because of the decrease of their crystallites sizes in comparison to the CdSe and Cd₅₄Se₄₆ thin films. From the FTIR spectra it was revealed that the Cd–Se peaks shifted to lower wavelengths with increase in selenium concentration. The SEM measurements for CdSe, Cd₅₄Se₄₆ and Cd₃₄Se₆₆ thin films reveal that the particle size and the crystalline nature decreased when Se content increased in the system.     

Effect of deposition temperature on structural,optical properties and configuration of CdSe nanocrystalline thin films deposited by chemical bath deposition

CdSe nanoparticle thin films were deposited on glass substrates by the chemical bath deposition (CBD) method at low deposition temperature ranging from room temperature up to 50 °C while the pH of the bath was kept constant at 12.1. The structural and morphological variation were investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM) technique. The energy band gap and optical properties were characterized by the absorbance spectra. Rutherford backscattering spectroscopy (RBS) analysis reveals the excess of Cd rather than Se in depth profile along the thin film thickness. The prepared CdSe nanoparticles have cubic structure and by increasing the temperature the deposited films become continues, homogeneous and tightly adherent. The results also revealed that by increasing the deposition temperature from room temperature up to 50 °C, the band gap decreases from 3.52 eV up to 1.84 eV.     

Ultraviolet-assisted annealing for low-temperature solution-processed p-type gallium tin oxide (GTO) transparent semiconductor thin films

Solution-processed p-type gallium tin oxide (GTO) transparent semiconductor thin films were prepared at a low temperature of 300 °C using ultraviolet (UV)-assisted annealing instead of conventional high-temperature annealing (> 500 °C). We report the effects of UV irradiation time on the structural, optical, and electrical properties of sol-gel derived GTO thin films and a comparison study of the physical properties of UV-assisted annealed (UVA) and conventional thermally annealed (CTA) GTO thin films. The Ga doping content was fixed at 15 at% in the precursor solution ([Ga]/[Sn]+[Ga] = 15%). After a spin-coating and preheating procedure was performed two times, the dried sol-gel films were heated on a hotplate at 300 °C under UV light irradiation for 1–4 h. Each UVA GTO thin film had a dense microstructure and flat free surface and exhibited an average optical transmittance approaching 85.0%. The level of crystallinity, crystallite size, and hole concentration density of the GTO thin films increased with increasing UV irradiation time. In this study, the UVA 4 h thin film samples exhibited the highest hole concentration (9.87 × 10¹⁷ cm⁻³) and the lowest resistivity (1.8 Ω cm) and had a hole mobility of 5.1 cm²/Vs.     

Investigations on phosphorus doped amorphous/nanocrystalline silicon films deposited by a filtered cathodic vacuum arc technique in the presence of hydrogen gas

Phosphorus doped amorphous/nanocrystalline silicon (a-Si:H/nc-Si:H) thin films have been deposited by a filtered cathodic vacuum arc (FCVA) technique in the presence of hydrogen gas at different substrate temperatures (T_s) ranging from room temperature (RT) to 350 °C. The films have been characterized by using X-ray diffraction (XRD), Raman spectroscopy, Fourier transform infrared (FTIR) spectroscopy, dark conductivity (σ_D), activation energy (ΔE), optical band gap (E_g) and secondary ion mass spectroscopy. The XRD patterns show that RT grown film is amorphous in nature but high temperature (225 and 350 °C) deposited films exhibit nanocrystalline structure with (111) and (220) crystal orientations. The crystallite size of higher temperature grown silicon film evaluated was between 13 and 25 nm. Raman spectra reveal the amorphous nature of the film deposited at RT, whereas higher temperature deposited films show crystalline nature. The crystalline volume fraction of the silicon film deposited at higher temperatures (225 and 350 °C) was estimated to be 58 and 72%. With the increase of T_s, the bonding configuration changes from mono-hydride to di-hydride as revealed by the FTIR spectra. The values of σ_D, ΔE and E_g of silicon films deposited at different T_s were found to be in the range of 5.37×10⁻⁴–1.04 Ω⁻¹ cm⁻¹, 0.05–0.45 eV and 1.42–1.83 eV, respectively. Photoconduction of 3.5% has also been observed in n-type nc-Si:H films with the response and recovery times of 9 and 12 s, respectively. A n-type nc-Si:H/p-type c-Si heterojunction diode was fabricated which showed the diode quality factor between 1.6 and 1.8.     

Spectroscopic studies of sol–gel grown CdS nanocrystalline thin films for optoelectronic devices

CdS is one of the highly photosensitive candidate of II–VI group semiconductor material. Therefore CdS has variety of applications in optoelectronic devices. In this paper, we have fabricated CdS nanocrystalline thin film on ultrasonically cleaned glass substrates using the sol–gel spin coating method. The structural and surface morphologies of the CdS thin film were investigated by X-ray Diffraction (XRD) and Field Emission Scanning Electron Microscopy (FESEM) respectively. The surface morphology of thin films showed that the well covered substrate is without cracks, voids and hole. The round shape particle has been observed in SEM micrographs. The particles sizes of CdS nanocrystals from SEM were estimated to be～10–12 nm. Spectroscopic properties of thin films were investigated using the UV–vis spectroscopy, Photoluminescence and Raman spectroscopy. The optical band gap of the CdS thin film was estimated by UV–vis spectroscopy. The average transmittance of CdS thin film in the visible region of solar spectrum found to be～85%. Optical band gap of CdS thin film was calculated from transmittance spectrum ～2.71 eV which is higher than bulk CdS (2.40 eV) material. This confirms the blue shifting in band edge of CdS nanocrystalline thin films. PL spectrum of thin films showed that the fundamental band edge emission peak centred at 459 nm also recall as green band emission.     

Effects of ammonia concentration on property of Cd1−xZnxS films by chemical bath deposition

Cd_1−xZn_xS thin films were grown on soda–lime glass substrates by chemical-bath deposition (CBD) at 80 °C with stirring. All the samples were annealed at 200 °C for 60 min in the air. The crystal structure, surface morphology, thickness and optical properties of the films were studied with transmission electron microscopy (TEM), X-ray diffraction (XRD), scanning electron microscopy (SEM), step height measurement instrument and spectrophotometer respectively. The results revealed that Cd_1−xZn_xS thin films had cubic crystal structure and the intensity of the diffraction peak increased gradually as ammonia concentration rose and the grain size varied from 5.1 to 8.3 nm. All of Cd_1−xZn_xS thin films had a granular surface with some smaller pores and the average granule sizes increased from 92 to 163 nm with an increase in ammonia concentration. The Cd_1−xZn_xS thin films had the highest transmittance with ammonia concentration of 0.5 M L⁻¹, whose thickness was 50 nm and band gap was 2.62 eV.