Improvement in dielectric and tunable properties of Fe-doped Ba0.6Sr0.4TiO3 thin films grown by pulsed-laser deposition

Fe-doped Ba(0.6)Sr(0.4)TiO3 (BST) thin films were prepared on Pt/Si substrates by the pulsed-laser deposition method. The concentrations of Fe dopants vary from 0.1 mol% to 1.0 mol%. Our results indicate that a certain amount of Fe dopants can decrease the dielectric loss of BST thin films without causing the significant reduction of the tunability. The leakage current of BST thin films also was reduced by the addition of Fe dopants. BST thin films doped with 0.3 mol% Fe ions show a minimum dielectric loss of 0.88% at 10(6) Hz, which is 1.7% for the undoped BST films. Moreover, the 0.3 mol% Fe-doped BST films reveal a maximum figure of merit (FOM) of 51, indicating the improved comprehensive dielectric and tunable properties.     

Co掺杂对Ba0.6Sr0.4TiO3薄膜介电性能的影响

利用溶胶凝胶工艺在Pt/TiO2/SiO2/Si衬底上制备了Co掺杂量为0～10%(摩尔分数)的(Ba0.6Sr0.4) Ti1-xCoxO3薄膜.研究了薄膜的结构、表面形貌、介电性能与Co掺杂量的关系.薄膜的介电损耗随着Co含量的增加而减少,在摩尔含量10%时达到最小值0.0128.FOM值在摩尔含量为2.5%达到最大值20,它的介电常数、介电损耗和调谐量分别为639.42、0.0218、43.6%.     

Ferroelectric properties of Ba0.6Sr0.4TiO3 thin films with different grain sizes

Barium strontium titanate (BST) thin films were prepared by RF magnetron sputtering. The curves of dielectric constant–voltage, dissipation factor–voltage and the hysteresis loops of BST thin films with different grain sizes were investigated. The differences of the curves were analyzed. The voltage shift and an increase in the maximum dielectric constant were observed in ɛ–V curves as the grain size in the films increased. It is found that the dielectric loss of BST thin films does not change significantly with applied voltage. The origin of the asymmetric hysteresis due to asymmetrical potential barriers at the upper and bottom interfaces, residual elastic stress and incomplete compensation of depolarizing field was discussed.     

富钛梯度(Ba0.6Sr0.4)TiO3薄膜的介电调谐性能研究

采用溶胶凝胶工艺,在Pt/Ti/SiO2/Si衬底制备了富钛(Ba0.6Sr0.4)TiO3(BST)薄膜和富钛梯度薄膜.利用X射线衍射(XRD)和扫描电镜(SEM)分析测定了BST的微结构和薄膜的表面形貌,研究了富钛含量和梯度结构对BST介电调谐性能的影响.结果表明富钛薄膜中析出了TiO2相,薄膜的介电常数、损耗和调谐量随着钙钛矿结构(ABO3)中A/B的增加而增加;当A/B为0.68时,有最小的介电损耗0.017;当A/B为1时,有最高的介电常数和调谐量,分别为592%和43.72%.而富钛梯度薄膜因TiO2的析出而丧失晶格不匹配应力的影响,在介电调谐性能上并没有表现出梯度薄膜的综合优异性能.     

Two critical grain sizes of Ba0.6Sr0.4TiO3 thin films

Ba_0.6Sr_0.4TiO₃ (short for BST) thin films were prepared by RF magnetron sputtering. By adjusting annealing conditions, the BST thin films with different grain sizes were obtained. The microstructures of BST thin films were studied by X-ray diffraction (XRD), atomic force microscopy (AFM), and high-resolution transmission electron microscopy (HRTEM). It is found that there are two critical sizes in BST thin films in relation to grain sizes. The crystalline critical size from amorphous to crystalline is about 10 nm. The ferroelectric critical size from cubic (paraelectric) to tetragonal (ferroelectric) is about 20 nm.     

The dielectric properties of Ba(0.6)Sr(0.4)Cr(x)Ti(1-x)O(3) thin films prepared by pulsed laser deposition.

Ba(0.6)Sr(0.4)Cr(x)Ti(1-x)O(3) (BSCT) films were prepared by pulsed laser deposition with the value of x varying from 0 mol% to 2.0 mol%. X-ray diffraction analysis detected an increase in the lattice parameters, which could be due to the characteristics of the growth process. Dielectric properties and tunability of the BSCT films were measured. The dissipation factors of the films decreased with increasing Cr-concentration. The highest figure of merit (FOM) value of 33.3 was obtained in 1.0 mol%-doped BSCT film. As a result, the effect of Cr doping is positive.     

Direct-current field dependence of dielectric properties in B2O3-SiO2 glass doped Ba0.6Sr0.4TiO3 ceramics

The Ba_0.6Sr_0.4TiO₃ ceramics doped B₂O₃-SiO₂ glass prepared by a sol-gel process and the effect of glass content on the DC field dependence of dielectric characteristics in Ba_0.6Sr_0.4TiO₃ ceramics were studied. The samples were observed and analysed by SEM and X-ray diffraction. The dielectric constant of a BST sample with 1 mol% B₂O₃-SiO₂ sintered at 1250°C was as good as that of undoped BST sintered at 1340°C. The dielectric constant samples decreases as the applied DC field increases. The influence of the DC field on the loss factor is much less than that on the dielectric constant. With increasing of the applied voltage, the T _c was increased and the peaks were surpressed and broadened. With increasing of glass content, the peaks were also surpressed and broadened. The maximum dielectric constant and the percentage change of dielectric constant under a DC field increase.     

Optical properties of Ag nanoparticles embedded Ba0.5Sr0.5TiO3 films prepared by alternating pulsed laser deposition

Nanocomposite thin films consisting of nanometer-sized Ag particles embedded in amorphous Ba0.5Sr0.5TiO3 matrix were prepared on fused silica substrates by an alternating pulsed laser deposition method. Their optical nonlinearities have been studied using the Z-scan method. The surface plasmon resonance (SPR) peak shifts to red and increases with the increasing the volume fraction of Ag in the nanocomposite films. The magnitude of the third-order nonlinear susceptibility of the nanocomposite with an Ag volume fraction of 3.3% was calculated to be approximately 2 x 10(-8) esu at the SPR wavelength.     

不同晶粒尺寸Mg掺杂(Ba0.6Sr0.4)0.925K0.075TiO3薄膜的直流场介电性能研究

采用溶胶凝胶工艺,在Pt/Ti/SiO2/Si衬底制备了Mg掺杂(Ba0.6Sr0.4)0.925K0.075TiO3(BSKT)薄膜.X射线衍射(XRD)和扫描电镜(SEM)分析测定了物相微结构和薄膜表面形貌,研究了Mg掺杂含量对BSKT晶粒尺寸和直流场介电调谐性能的影响,讨论了直流场介电损耗谱演变的原因.结果表明,Mg掺杂BSKT使薄膜表面粗糙度、晶粒尺寸、介电常量、介电损耗和调谐量都降低;在室温1MHz下,BSKT薄膜有最大的调谐量73.6%;6%(摩尔分数)Mg掺杂BSKT薄膜有最低的介电损耗为0.0088;发现直流场下薄膜的介电损耗谱演变一方面可能与薄膜的晶粒尺寸有关,另一方面也可能与测试温度有关.     

Dielectric properties of sol-gel derived barium-strontium-titanate (Ba(0.4)Sr(0.6)TiO(3)) thin films

The structural and dielectric properties of sol-gel derived barium-strontium-titanate (Ba(0.4)Sr(0.6)TiO(3 )) thin films have been investigated. The as-fired films are found to be amorphous, and films crystallize to a cubic phase after a post deposition annealing at 700 degrees C for one hour in air. The variation of dielectric constant with temperature and field was investigated as a function of film thickness. These films display a nonlinear dielectric response that can be described in terms of a power series expansion of the free energy in polarization as in Landau-Ginzburg-Devonshire approach. The measured room temperature dielectric constant (epsilon') of the film was about 320. The dielectric constant did not show any significant frequency dependence up to 100 kHz. The temperature dependence of dielectric constant exhibited a diffused ferroelectric to paraelectric phase transition at -60 degrees C. The room temperature dielectric constant and magnitude of the dielectric peak at the Curie point was dependent on the thickness of the film. The obtained dielectric data on sol-gel barium strontium titanate thin films on platinized substrates were analyzed in the light of a barrier layer model.     

Ba0.6Sr0.4 TiO3粉体的水热法制备

以氯化钡、氯化锶和四氯化钛为原料,在190℃下反应10h合成了平均粒径为80nm左右的立方相Ba0.6Sr0.4 TiO3粉体.粉体粒度均一,团聚少,纯度高,杂质离子少.用X射线衍射(XRD)、扫描电子显微镜(SEM)、X射线荧光光谱议(XRF)等分析方法对合成粉体的物相、形貌和组成进行了表征,并研究了初始配比、矿化剂KOH过量浓度、水热时间和温度等条件对合成Ba0.6Sr0.4 TiO3粉体的影响.     

Study of the electrical properties of pulsed laser ablated (Ba0.5Sr0.5)TiO3 thin films

The laser ablated barium strontium titanate (BST) thin films were characterized in terms of composition, structure, microstructure and electrical properties. Films deposited at 300°C under 50 mTorr oxygen pressure and 3 J cm⁻² laser fluence and further annealed at 600°C in flowing oxygen showed a dielectric constant of 467 and a dissipation factor of 0.02. The room-temperature current-voltage characteristics revealed a space charge limited conduction (SCLC) mechanism, though at low fields the effect of the electrodes was predominant. The conduction mechanism was thoroughly-investigated in terms of Schottky emission at low fields, and bulk-limited SCLC at high fields. The change over to the bulk-limited conduction process from the electrode-limited Schottky emission was, attributed to the process of tunneling through the electrode interface at high fields resulting into the lowering of the electrode contact resistance and consequently giving rise to a bulk limited conduction process. The predominance of SCLC mechanism in the films suggests that the bulk properties are only revealed if the depletion width at the electrode interface is thin enough to allow the tunneling process to take place. This condition is only favorable if the film thickness is high or if the doping concentration is high enough. In the present case the film thickness ranged from 0.3 to 0.7 μm which was suitable to show the transition mentioned above.     

Preparation,microstructure and dielectric properties of Ba0.5Sr0.5TiO3 thin films grown on Pt/Ti/SiO2/Si substrates by pulsed laser deposition

Barium strontium titanate Ba_0.5Sr_0.5TiO₃ (BST) thin films have been deposited on Pt/Ti/SiO₂/Si substrates by a pulsed laser deposition method. The low-frequency dielectric responses of the BST films, grown at different substrate temperatures (T_s), were measured as functions of frequency in the frequency range from 1 kHz to 1 MHz. With increase of T_s, the grain size of BST thin films became larger and the crystallinity was greatly improved, and then the dielectric permittivity increased, while the dielectric dispersion rose drastically. The origin of the large dielectric relaxation is believed to result from the aggravation of oxygen diffusion at the BST/Pt interface for the BST thin films grown at comparatively higher temperatures. This concept could be further explained by considering the influence of post-annealing in oxygen ambient on the dielectric properties of BST thin films. Our results reveal that the dielectric properties are strongly dependent on the processing conditions and the microstructure of thin films.     

脉冲激光沉积Ba0.5Sr0.5TiO3、Pb0.5Ba0.5TiO3和Pb0.5Sr0.5TiO3薄膜及其介电性质

采用脉冲激光沉积法,在Pt／Ti／SiO2／Si基底上分剐制备厚度为350nm的Ba0.5Sr0.5TiO3(BST)、Pb0.5Ba0.5TiO3(PBT)和Pb0.5Sr0.5TiO3(PST)薄膜并研究了它们的介电性质。XRD显示,在相同的制备条件下三者具有不同的择优取向,PST具有(110)择优取向,PBT具有(111)择优取向,而BST则是混合取向。SEM显示三者样品表面均匀致密,颗粒尺寸大约在50nm至150nm之间。PST与BST、PBT相比有更高的介电常数,在频率为10kHz时,分别为874、334和355,而损耗都较低,分别为0．0378、0．0316和0．0423,同时PST漏电流也是最小的。测量薄膜的C-V特性扣铁电性能表明室温下BST呈现的是顺电相,PST和PBT则呈铁电相。本文也测量了薄膜在不同频率下的介电温度特性,BST、PBT和PST均表现出频率弥散现象,即随着频率的降低．居里温度降低而介电常数会升高。并测得BST和PST的居里温度分剐为-75和150℃。而PBT的居里温度在250℃以上。本文研究表明：与BST相比较,PBT的介电常数与之相近,漏电流较大;而PST具有高介电常数,较小的漏电流和较大的电容-电压调谐度,在相关半导体器件中的应用将有很大的潜力。     

Ba0.6Sr0.4TiO3/PANI的制备及吸波性能研究

采用超声场下原位聚合法制备了Ba0.6Sr0.4-TiO3/PANI复合材料。其结构、形貌和电磁性能分别采用X射线衍射仪(XRD)、扫描电镜(SEM)和HP8510网络矢量分析仪进行了研究。结果表明,HCl掺杂后的PANI是部分结晶的。Ba0.6Sr0.4TiO3与PANI分子链之间存在某些相互作用。与PANI相比,在8.2～12GHz频率范围内,Ba0.6Sr0.4TiO3/PA-NI复合物的ε′值和ε″值均较大。在9.8～12.4GHz的频率范围内,Ba0.6Sr0.4TiO3/PANI复合物的tanδε值大于PANI的tanδε值。Ba0.6Sr0.4TiO3/PANI复合材料具有较好的微波吸收性能,最大损耗为-14dB,-10dB带宽超过了5GHz。     

Structural and magnetic properties of Co-Ga co-doped ZnO thin films fabricated by pulsed laser deposition

Co-Ga co-doped ZnO films were fabricated by pulsed laser deposition on quartz substrates. The obtained films exhibited a wurtzite structure with c-axes growth preference. Optical measurements showed the presence of the cobalt ions in a tetrahedral crystal field, which proved that the Co ion substitution in the ZnO lattice, acting as magnetic cation. Hall measurements indicated that the films were n-type conductive with the electron concentrations of ~ 10²⁰/cm³. This value was much higher than that of the Co-doped films, suggesting the effective incorporation of Ga in the films. Room temperature ferromagnetism was observed for the Ga-Co co-doped thin films.     

Dielectric properties of YSZ high-k thin films fabricated at low temperature by pulsed laser deposition

Yttria-stabilized zirconia (YSZ) films were deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition (PLD) technique using a YSZ (5 mol% Y₂O₃-stabilized ZrO₂) ceramic target. The YSZ films were deposited in 1.5×10⁻² Pa O₂ ambient at 300 °C and in situ post-annealed at 400 °C. X-ray diffraction (XRD) and differential thermal analysis measurements demonstrated that YSZ remained amorphous. The dielectric constant of amorphous YSZ was determined to be about 26.4 by measuring Pt/YSZ/Pt capacitor structure. The 6-nm-thick amorphous YSZ films with an equivalent oxide thickness (EOT) of 1.46 nm and a low leakage current of 7.58×10⁻⁵ A/cm² at 1 V gate voltage exhibit good electrical properties. YSZ thin films fabricated at low temperature 300 °C have satisfactory dielectric properties and could be a candidate of high-k gate dielectrics.     

Y掺杂Ba0.6Sr0.4TiO3陶瓷的PTC特性研究

以传统陶瓷制备工艺制备了Y掺杂Ba0.6Sr0.4TiO3基半导体陶瓷材料，分析了不同Y掺杂量与材料PTC特性之间的关系。研究结果表明：Y^3＋作为施主掺杂可使Ba0.6Sr0.4TiO3陶瓷材料的室温电阻率明显降低。在-60℃到室温附近的温度区间内，Y掺杂Ba0.6Sr0.4TiO3陶瓷材料的电阻率较为稳定，当高于室温以上的某-一温度Tx时，电阻率随温度的变化呈线性增加趋势，表现出较好的PTC特性。复阻抗测试结果表明，Y掺杂可以同时降低Ba0.6Sr0.4TiO3陶瓷材料的晶粒电阻和晶界电阻。