Surface and bulk-passivated large area multicrystalline silicon solar cells

We have investigated the surface and bulk passivation technique on large-area multicrystalline silicon solar cells, a large open-circuit voltage has been obtained for cells oxidized to passivate the surface and hydrogen annealed after deposition of silicon nitride film on both surfaces by plasma CVD method (P---SiN) to passivate the bulk. The texture surface like pyramid structure on multicrystalline silicon surface has been obtained uniformly using reactive ion etching (RIE) method. Combining these RIE method and passivation schemes, the conversion efficiency of 17.1% is obtained on 15 cm × 15 cm multicrystalline silicon solar cell. Phosphorus diffusion, BSF formation, passivation technique and contact metallization for low-cost process sequence are also described in this paper.     

Recent results obtained at IMEC on multicrystalline silicon solar cells

In order to optimize the efficiency of multicrystalline silicon solar cells, the influence of specific process steps and sequences were studied. Therefore clean-room high efficiency as well as industrial screen-printed cells were fabricated. Benefits are found in choosing a substrate with lower base resistivity, using front and rear oxide passivation, using hydrogen passivation for bulk and surfaces, the use of Si₃N₄ with a double function i.e. as an anti-reflection and passivation layer and the use of mechanical V-grooving. Efficiencies of 17% are found on 4 cm² clean-room fabricated cells and 15.2% has been obtained on 100 cm² V-grooved screenprinted industrial cells.     

Hydrogen passivation of defects in EFG ribbon silicon

To enhance the bulk lifetime of multicrystalline silicon material, gettering of impurities and hydrogen passivation of defects are investigated. In edge-defined film-fed grown (EFG) ribbon silicon, an aluminium-enhanced hydrogenation of defects by silicon nitride has been reported. On thin wafers, the formation of a full area aluminium back surface field will lead to wafer bending due to different thermal expansion coefficients of aluminium and silicon. To circumvent this problem, remote plasma-enhanced chemical vapour deposited (PECVD) silicon nitride (SiN_x) as passivation scheme for the front and rear surface is proposed. In this work, the bulk passivation by hydrogenation is investigated using two different hydrogen passivation techniques: (i) passivation in a remote hydrogen plasma and (ii) passivation due to a post-deposition anneal of remote PECVD-SiN_x in a lamp-heated conveyor belt furnace. Measurements of the bulk lifetime show that the lifetime improvement due to remote hydrogen plasma passivation degrades under illumination with white light. In contrast, the hydrogen passivation by a post-deposition SiN_x anneal is only effective if a phosphorous-doped emitter is present below the SiN_x layer during the hydrogenation. This lifetime improvement is stable under illumination.     

Ribbon growth on substrate (RGS) silicon solar cells with microwave-induced remote hydrogen plasma passivation and efficiencies exceeding 11%

For the first time efficiencies above 11% for solar cells (4 cm²) based on Bayer ribbon growth on substrate (RGS) crystalline silicon have been demonstrated including mechanical V-structuring of the front surface, aluminum-gettering, microwave-induced remote hydrogen plasma (MIRHP) passivation and PECVD SiN/SiO₂ double-layer antireflection coating. MIRHP alone resulted in absolute improvements in the open-circuit voltage of 27 mV, in the short-circuit current density of 2.8 mA cm⁻² and in the cell efficiency of 1.9% leading to an open-circuit voltage of 538 mV and an efficiency of 11.1%.     

Towards high-efficiency thin-film silicon solar cells with the “micromorph” concept

Tandem solar cells with a microcrystalline silicon bottom cell (1 eV gap) and an amorphous-silicon top cell (1.7 eV gap) have recently been introduced by the authors; they were designated as “micromorph” tandem cells. As of now, stabilised efficiencies of 11.2% have been achieved for micromorph tandem cells, whereas a 10.7% cell is confirmed by ISE Freiburg. Micromorph cells show a rather low relative temperature coefficient of 0.27%/K. Applying the grain-boundary trapping model so far developed for CVD polysilicon to hydrogenated microcrystalline silicon deposited by VHF plasma, an upper limit for the average defect density of around 2 × 10¹⁶/cm³ could be deduced; this fact suggests a rather effective hydrogen passivation of the grain-boundaries. First TEM investigations on μc-Si : H p-i-n cells support earlier findings of a pronounced columnar grain structure. Using Ar dilution, deposition rates of up to 9 Å/s for microcrystalline silicon could be achieved.     

SOLAR CELLS WITH 15.6% EFFICIENCY ON MULTICRYSTALLINE SILICON,USING IMPURITY GETTERING,BACK SURFACE FIELD AND EMITTER PASSIVATION

Three features have been combined to raise the efficiency of solar cells made on industrial multicrystalline silicon wafers: 1) reduction of bulk recombination by a special gettering process, 2) reduction of back recombination by using a p/p ⁺ junction, 3) reduction of front recombination by emitter back-etching and passivation.

A conversion efficiency of 15.6% has been achieved on 2 × 2 cm² solar cells. Spectral response measurements are used to identify the role of each processing parameter.     

Surface texturing of large area multicrystalline silicon solar cells using reactive ion etching method

A reactive ion etching method has been applied to form a surface texture of multicrystalline silicon solar cells in order to reduce the surface reflectance. This surface texture has a pyramid-like shape, and aspect ratio of which can be easily controlled by the gas flow ratio.15 cm × 15 cm multicrystalline silicon solar cells have been fabricated using this texturing method and maximum conversion efficiency of 17.1% has been achieved.     

Novel process of grain boundary metallisation on mc Si solar cells

The electronic properties of multicrystalline silicon are heavily influenced by impurities concentrated along the grain boundaries that increase the recombination activity near the crystallite borders. Dopants can also diffuse preferentially down the grain boundaries, which leads to a low resistance path down the grain. These and other effects decrease the efficiency of multicrystalline silicon solar cells. Additionally, the efficiency is lowered by the shading of areas of silicon by metallisation lines due to the reduction of the active conversion area of the cell. We present a new way to combine the grain boundaries and the front contact grid with the aim to improve the efficiency of multicrystalline silicon solar cells. A first approach has been developed to produce multicrystalline silicon solar cells with a front contact metallisation following the grain boundaries: The different grain boundaries of a multicrystalline silicon wafer are detected by optical scanning of the wafer surface. Together with the emitter sheet resistivity this image serves as an input to calculate a net of finger lines that follow the grain boundaries wherever possible. Onto these detected grain boundaries the metallisation is performed by evaporative deposition of copper and photolithography. We report on the successful implementation of such a grid on 100×100 mm² wafers.     

Comparison of multicrystalline silicon surfaces after wet chemical etching and hydrogen plasma treatment: application to heterojunction solar cells

The modifications of the surface and subsurface properties of p-type multicrystalline silicon (mc-Si) after wet chemical etching and hydrogen plasma treatment were investigated. A simple heterojunction (HJ) solar cell structure consisting of front grids/ITO/(n)a-Si:H/(p)mc-Si/Al was used for investigating the conversion efficiency. It is found that the optimized wet chemical etching and cleaning processes as a last technological step before the deposition of the a-Si:H emitter are more favorable to HJ solar cells fabrication than the hydrogenation. Solar cells on p-type mc-Si were prepared without high-efficiency features (point contacts, back surface field). They exhibited efficiencies up to 13% for a cell area of 1 cm² and 12% for a cell area of 39 cm².     

n–p Junction formation in p-type silicon by hydrogen ion implantation

Hydrogen ion implantations at an energy of 250 keV and a dose of 3×10¹⁶ cm⁻² were applied to float zone, Czochralski grown silicon wafers and to multicrystalline samples. It was found that after annealing at 350°C<T<550°C for 1 h a n–p junction is formed and a photovoltaic behaviour is observed. Spectral responses show that the photocurrent in the near infrared part of the spectrum is comparable to that given by a standard silicon solar cell. The depth of the junction is about 2 μm and C–V measurements show that the junction is graduated. Hydrogen plasma immersion leads to similar results. The conversion of p- to n-type silicon is explained by the formation of shallow donor levels associated to a high concentration of hydrogen.     

Defect passivation of industrial multicrystalline solar cells based on PECVD silicon nitride

Low surface recombination velocity and significant improvements in bulk quality are key issues for efficiency improvements of solar cells based on a large variety of multicrystalline silicon materials. It has been proven that PECVD silicon nitride layers provide excellent surface and bulk passivation and their deposition processes can be executed with a high throughput as required by the PV industry. The paper discusses the various deposition techniques of PECVD silicon nitride layers and also gives results on material and device properties characterisation. Furthermore the paper focuses on the benefits achieved from the passivation properties of PECVD SiN_x layers on the multi-Si solar cells performance. This paper takes a closer look at the interaction between bulk passivation of multi-Si by PECVD SiN_x and the alloying process when forming an Al-BSF layer. Experiments on state-of-the-art multicrystalline silicon solar cells have shown an enhanced passivation effect if the creation of the alloy and the sintering of a silicon nitride layer (to free hydrogen from its bonds) happen simultaneously. The enhanced passivation is very beneficial for multicrystalline silicon, especially if the defect density is high, but it poses processing problems when considering thin (<200 μm) cells.     

Electrical properties of multicrystalline silicon produced by electromagnetic casting process: Degradation and improvement

The electrical properties of boron-doped multicrystalline silicon for photovoltaic applications, elaborated by the cold crucible pulling process, are studied by the photoconductivity decay method and the electron beam-induced current measurement technique. The bulk lifetime mapping of the minority carriers in the as-grown silicon wafers is drawn up using both the techniques. Moreover, the consequence of phosphorus doping on the recombination properties of extended defects are studied using the EBIC measurements. Two different treatments are investigated in order to improve the electrical properties of the as-grown silicon wafers: (a) thermal phosphorus diffusion, for which the gettering efficiency is determined by the different treatment parameters; (b) remote plasma hydrogen passivation which leads to increase of the minority carrier lifetime.     

Effects of hydrogen plasma on passivation and generation of defects in multicrystalline silicon

Hydrogenation by plasma is a low cost and efficient method to improve the photovoltaic properties of multicrystalline silicon. The role of plasma parameters on the efficiency of hydrogenation was studied using secondary ion mass spectrometry (SIMS), hydrogen effusion, electrochemical impedance spectroscopy and electron beam induced current (EBIC). The experimental results showed a deuterium concentration of 10²⁰ atoms cm⁻³ could be reached in the sample after a 15-min treatment. Optimal treatment time depends on temperature and leads to maximum electrical conductivity and minority carrier diffusion length. The results confirm the reduction of defects densities and potential barriers associated with grain boundaries.     

High-efficient operation of large-area (100 cm) thin film polycrystalline silicon solar cell based on SOI structure

High-efficient operation of a large-area thin film polycrystalline Si solar cell with a novel structure based on a silicon on insulator (SOI) structure prepared by zone-melting recrystallization (ZMR) is reported. The (100) crystal orientation area over 90% has successfully been obtained by controlling the ZMR conditions, which allowed to form a uniform random pyramidal structure at the cell surface. The effect of hydrogen passivation has also been investigated for further improvement of the cell characteristics. By employing a light trapping structure (textured surface) and hydrogen passivation, an efficiency of 14.22% was obtained for a practical 100 cm² size.     

R & D activities of crystalline silicon solar cells in Japan

Research and development of crystalline silicon solar cells in Japan have greatly advanced for the past 10 years. Fundamental research has been conducted on the recombination and passivation of minority carriers at Si/SiO₂ interfaces and in bulk regions including grain boundaries. Qualities of Si feedstock and substrates have been improved. A small-area cell efficiency using monocrystalline silicon substrates has reached 21 % and that for large-area, multicrystalline solar cells up to 17% by using low-cost cell fabrication processes. Such high efficiency values are realized by tenacious improvement of substrate quality and the development of new processes for fabricating solar cells.     

Solar cells prepared on multicrystalline silicon subjected to new gettering and passivation treatments

New combined gettering and passivating procedures for solar cells prepared from multicrystalline silicon (mc-Si) have been considered. Passivation has been performed by (i) diamond-like carbon films deposition onto front or rear side of the wafers with following annealing, or (ii) hydrogen plasma treatments. Gettering region has been formed by deposition of Al film on specially prepared Si with developed surface. The advantages of such a gettering process in comparison with traditional gettering with Al are demonstrated. The improving influence of the treatments on diffusion length in mc-Si and efficiency of prepared solar cells have been found out. Physical mechanisms responsible for the observed effects of gettering and passivation are discussed.     

Efficiency improvement by porous silicon coating of multicrystalline solar cells

Shallow junction multicrystalline Si solar cells have been processed by an anodical etching technique. More than 25% improvement in short-circuit current and photovoltaic energy conversion efficiency was demonstrated. It was shown that improved performance was caused by antireflection action of the porous silicon layer as well as by the cell surface and grain boundary passivation.     

0.4% absolute efficiency gain by novel back contact

Replacing the aluminum back contact of screen-printed multicrystalline silicon solar cells by a novel low-temperature layer sequence boosts the absolute power conversion efficiency η by Δη=0.4%. The optimized hydrogenated amorphous silicon (a-Si:H)-based back side junction provides efficient back side passivation and contacting at the same time. The improved passivation quality reduces the effective surface recombination velocity S_eff to S_eff<20 cm s^?1. Due to the optimized back side layer sequence, the open circuit voltage V_OC rises by ΔV_OC=15 mV up to V_OC=622 mV and the short circuit current increases by ΔJ_SC=0.8 mA cm^?2.     

Single-crystalline silicon solar cell with pp heterojunction of c-Si substrate and μc-Si : H film

Annealing effects of the single-crystalline silicon solar cells with hydrogenated microcrystaline silicon (μc-Si : H) film were studied to improve the conversion efficiency. Boron-doped (p⁺) μc-Si : H film was deposited in a RF plasma enhanced chemical vapor deposition system (RF plasma CVD) on the rear surface of the cell. With the optimized annealing conditions for the substrate, the conversion efficiency of 21.4% (AM1.5, 25°C, 100 mW/cm²) was obtained for 5 × 5 cm² area single crystalline-solar cell.     

Development of both-side junction silicon space solar cells

This paper reports the recent results of improving the radiation hardness of silicon solar cells, which is SHARP and NASDA's project since 1998 (Tonomura et al., Second World Conference on Photovoltaic Solar Energy, 1998, pp. 3511–3514). Newly developed 2×2 cm² Si solar cells with ultrathin substrates and both-side junction (BJ) structure showed 72.0 mW (13.3% efficiency) maximum output power at AM0, 28°C after 1 MeV electron irradiation up to 1×10¹⁵ e/cm² and the best cell showed 72.5 mW (13.4%) maximum output power. These solar cells have p–n junctions at both front and rear surfaces and showed less radiation degradation and better remaining factor than previous solar cells.