Preparation of Ti_2AlC MAX Phase Coating by DC Magnetron Sputtering Deposition and Vacuum Heat Treatment

Due to the excellent corrosion resistance and high irradiation damage resistance,Ti_2AlC MAX phase is considered as a candidate for applications as corrosion resistant and irradiation resistant protective coating.MAX phase coatings can be fabricated through firstly depositing a coating containing the three elements M,A,and X close to stoichiometry of the MAX phases using physical vapor deposition,followed by heat treatment in vacuum.In this work,Ti-Al-C coating was prepared on austenitic stainless steels by reactive DC magnetron sputtering with a compound Ti_(50)Al_(50) target,and CH4 used as the reactive gas.It was found that the as-deposited coating is mainly composed of Ti_3AlC antiperovskite phase with supersaturated solid solution of Al.Additionally,the ratio of Ti/Al remained the same as that of the target composition.Nevertheless,a thicker thermally grown Ti_2AlC MAX phase coating was obtained after being annealed at 800℃ in vacuum for 1 h.Meanwhile,the ratio of Ti/Al became close to stoichiometry of Ti_2AlC MAX phases.It can be understood that owing to the higher activity of Al,it diffused quickly into the substrate during annealing,and then more stable Ti_2AlC MAX phases transformed from the Ti_3AlC antiperovskite phase.     

直流磁控反应溅射制备IrO2薄膜

为研究氧化铱（ＩｒＯ２）对ＰＺＴ铁电薄膜疲性能的影响。利用直流（ＤＣ）磁控反应溅射（ｓｐｕｔｔｅｒｉｎｇ）工艺成功地在ＳｉＯ２／Ｓｉ（１００）衬底上制得了高度取向的ＩｒＯ２薄膜,并在其上制成ＰＺＴ铁电薄膜,讨论了溅射参数（溅射功率、Ａｒ／Ｏ２比、衬底温度）以及退火条件对氧化铱薄膜的结晶,取向和形态的影响。     

磁控溅射MoS2/WS2复合薄膜的工艺与摩擦学性能研究

采用MoS2/WS2复合靶材在不锈钢和硅基片上溅射MoS2/WS2纳米薄膜,通过多次实验,得到溅射MoS2/WS2薄膜的最佳工艺如下:溅射气压4.0Pa,靶基距为70mm,溅射功率为150W,溅射时间为3h.使用X-射线衍射仪,能谱仪,扫描电子显微镜对薄膜的成分和结构进行分析.采用HH-3000薄膜结合强度划痕试验仪,纳米压痕测试系统,UNT-3摩擦磨损试验机对薄膜进行机械性能和摩擦磨损性能分析,结果表明:在大气环境中,WS2/MoS2 复合薄膜摩擦性能要优于纯MoS2薄膜.     

基底温度对直流溅射Nb掺杂TiO2薄膜性能的影响

采用陶瓷靶直流磁控溅射,以玻璃为基底制备2.5wt%Nb掺杂TiO2薄膜,控制薄膜厚度在300~350 nm,研究了不同基底温度下所制得薄膜的结构、形貌和光学特性.XRD分析表明,基底温度为150℃、250℃和350℃时,薄膜分别为非晶态、锐钛矿(101)和金红石相(110)结构.基底温度250℃时,锐钛矿相薄膜的晶粒尺寸最大,约为32 nm.薄膜表面形貌的SEM分析显示,薄膜粗糙度和致密度随基底温度升高得到改善.薄膜的平均可见光透过率在基底温度为250℃以内约为70%,随基底温度升高至350℃,平均透过率下降为59%,金红石相的存在不利于可见光透过.Nb掺杂TiO2薄膜的光学带宽在3.68~3.78 eV之间变化.基底温度为250℃时,锐钛矿相薄膜的禁带宽度最大,为3.78 eV.     

Effects of Power Density and Post Annealing Process on the Microstructure and Wettability of TiO2 Films Deposited by Mid-frequency Magnetron Reactive Sputtering

The relationship of ＂preparation parameters-microstructures-wettability＂ of TiO2 films was reported. In this work, TiO2 films were deposited onto glass and silicon substrates by using mid-frequency dual magnetron sputtering technique at ambient temperature with various power densities and deposition time. After deposition, the films were heat treated at different annealing temperatures. X-ray diffraction （XRD）, Raman spectroscopy, and field-emission scanning electron microscopy （FE-SEM） were utilized to characterize TiO2 films. The wettability of the films was evaluated by water contact angle measurement. The phase transition temperature of TiO2 films depended on the power density. It was demonstrated that wettability was strongly structure dependent and the film with the thickness of 610 nm （the power density was 2.22 W/cm^2） showed the lowest contact angle （8°）. It can be concluded that smaller crystallite size, the rutile phase with （110） face being parallel to the surface, and tensile stress favored the hydrophilicity of the TiO2 films.     

沉积速率及相关工艺条件对直流反应磁控溅射制备TiO2薄膜性质的影响

在玻璃基板上用直流反应磁控溅射钛靶的方法制备TiO2 薄膜。在溅射总气压为 0 4Pa ,氧氩比分别为 1∶9,1∶5及 1∶3 2的情况下 ,调节溅射功率使沉积速率由 0 99nm/min变化到 12 12nm/min ,而且当基板温度为 34 0℃时 ,薄膜在可见光范围内的平均折射率基本不变 ,为 2 48± 0 0 3,而薄膜的表面形貌却有明显变化。XRD表明 ,在pO2 /pAr为 1∶9的条件下 ,薄膜中出现了TiOx(x <2 )的晶粒 ,但这对薄膜的光学性质并无影响。另外对TiO2 薄膜用于多层光学薄膜也作了初步试验及讨论     

反应磁控溅射制备SnO2薄膜及其微观形貌与光致发光性能研究

利用反应磁控溅射法(RMS)制备了SnO_2薄膜,并研究了溅射参数对薄膜微观结构和光学性能的影响。结果表明,随着溅射气压、氧分压的增大和衬底温度的升高,薄膜沉积速率相应减小;在不同衬底温度下(室温至600℃)溅射薄膜时,较高的衬底温度可得到较大的SnO_2晶粒,表面更为粗糙;此外,将原生SnO_2薄膜在O_2气氛下退火可以改善其结晶度,原本的柱状结构转变成致密的薄膜结构,其光学禁带宽度变宽至3.85eV;经过退火的SnO_2薄膜的光致发光(PL)强度显著增强,位于约610nm的PL发光峰主要是源于SnO_2纳米晶体表面悬挂键的未饱和电子态。     

射频磁控溅射制备 HA(+ZrO2+Y2O3)/Ti6Al4V 复合生物活性涂层

采用射频磁控溅射法制备了HA（＋ZrO2＋Y2O3）／Ti6Al4V生物复合涂层．借助于XRD、SEM、FTIR和AFM等对溅射涂层的相组成、微观形貌和界面结合进行了研究，并以模拟体液试验探讨了涂层的生物活性．实验结果表明：磁控溅射的复合涂层呈非晶态，经过退火处理，可以使其转化为晶态；复合涂层的微观表面凹凸不平，并呈现网状结构和较多的孔隙，其孔隙直径约为0．5-2．0μm，孔隙面积占涂层表面积的30％-40％；HA（＋ZrO2＋Y2O3）／Ti6Al4V复合涂层的界面结合强度随（ZrO2＋Y2O3）复合颗粒含量的增大和溅射功率的提高而增强，最高可达59．6MPa．复合涂层在模拟体液中浸泡一段时间后，表面覆盖一层新生物质—含有CO^2-3的类骨磷灰石，其晶粒非常小，它与自然骨中无机相的结构成分相似，表明复合涂层具有良好的生物活性．     

Microstructure Evolution of in situ （Ti3AIC ＋ TisSi3）/Ti3Al Composite Sheet with a Novel Quasi-continuous Chain Reinforcement Distribution Architecture Prepared by Using Roll Bonding and Reaction Annealing

The Ti3AI matrix composite sheet with a novel quasi-continuous chain reinforcement distribution was prepared by using roll bonding and subsequent reaction annealing with pure Ti and SiCp/AI foils. The （Ti3AIC ＋ TisSi3） reinforcements were produced by in situ reaction of the as-rolled Ti-（SiCp/AI） laminated composite sheet after a two-stage annealing treatment including first annealing at 660 °C and second annealing at 1250 °C. The microstructure evolution during the reaction annealing was investigated. In the first reaction annealing, TiAI3 was formed, and the SiC particles were pushed together due to the Kirkendall effect, and after the second reaction annealing, Ti3AI, Ti3AIC and Ti5Si3 were synthesized. In addition, the reinforcement distribution presents a quasi-continuous chain microstructure in Ti3AI matrix composite sheet.