The effect of heat treatment process on structure and properties of ZnO nano layer produced by sol–gel method

ZnO nano layer was prepared by sol–gel method using zinc acetate dihydrate, methanol and diethanolamine as precursor, solvent and stabilizer, respectively. According to the thermal analysis results, the heat treatment process after producing ZnO nano layer can be divided into three stages. The structure of the nano layer showed a significant dependency on heat treatment temperature in the low temperature heat treatment stage, which is performed to evaporate the organic components. The high temperature heat treatment stage has no significant effect on the structure of the films. The temperature employed in the first stage of heat treatment process during the initial 10 min of heat treatment was found to be important in determining the structure of the films. The results determined that the elimination condition of the organic components is very important for achieving high crystallinity.     

Full‐duplex analogue/digital data transmission using lasers coupled to GI fibre and its application

This paper describes a low‐cost version of a full‐duplex optical fibre analogue/digital data transmission link whose practical implementation is simplified by using a pair of laser diodes, each having a built‐in photodiode for monitoring the laser output power, and its application to vibration test data transmission. The transmission link sends digital data of up to 9600 bps in one direction, and analogue data of DC to 100 kHz and image data specified by an NTSC colour video signal in the opposite direction, all at the same time through one GI optical fibre. Being simple in configuration and stable against noise, this type of link has a variety of applications within factory, home and offices. Copyright © 2001 John Wiley & Sons, Ltd.     

Microfabrication of a nickel mold insert by a modified deep X-ray lithography process and its application to hot embossing

In the present study, a modified deep X-ray lithography process is utilized for an efficient fabrication of precise metallic mold insert. A bare bulk polymethylmethacrylate (PMMA) sheet is used without any substrate as an X-ray photoresist in order to achieve a stable fabrication by avoiding a generation of a secondary radiation during a deep X-ray lithography process. The patterned PMMA sheet after development is then bonded on a metallic substrate using adhesive layers. The adhesive layers on the opened region of the patterned PMMA sheet are subsequently removed by X-ray exposure of short duration time. The next procedure is an electroplating process onto the opened area in the PMMA sheet, consequently resulting in the final mold insert. In this manner, a robust metallic mold insert for a mass replication of microstructures could be realized quite efficiently. The present fabrication method is confirmed by an example with a replication of microchannels via hot embossing process.     

Ar等离子体处理PET在非晶硅太阳电池中的应用

在射频等离子体增强化学气相沉积(RF-PECVD)系统的腔室内,对聚对苯二甲酸乙二醇酯(PET)塑料薄膜进行Ar等离子体预处理,并采用光发射谱(OES)对不同处理参数下的氩气辉光状态进行在线监测。对处理前后PET及PET/ITO进行透过谱、原子力显微镜(AFM)以及扫描电镜(SEM)的测试结果表明,Ar等离子体处理改善了PET塑料薄膜的表面形貌,使之更适合ITO薄膜的生长。以Ar等离子体处理的PET/ITO为衬底,在沉积温度为125℃条件下,制备出效率为5.4%的p-i-n型非晶硅(a-Si)柔性太阳电池。