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用氧化多孔硅方法制备厚的SiO_2膜及其微观分析 总被引:4,自引:3,他引:4
用氧化多孔硅的方法来制备厚的 Si O2 成本低 ,省时 .氧化硅膜的厚度 ,表面粗糙度和组分这三个参数 ,对波导器件的性能有重要影响 ,扫描电子显微镜 ( SEM)、原子力显微镜 ( AFM)和俄歇分析得到 :氧化的多孔硅的膜厚已达 2 1 .2μm;表面粗糙度在 1 nm以内 ,Si和 O的组分比为 1∶ 1 .90 6.这些结果表明 ,用氧化多孔硅方法制备的厚 Si O2 膜满足低损耗光波导器件的要求 相似文献
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用电化学腐蚀法制备氧化多孔硅波导定向耦合器 总被引:2,自引:0,他引:2
用一种聚合物材料薄膜作为掩膜 ,通过在电化学腐蚀过程中控制腐蚀电流和时间 ,首次制备出了氧化多孔硅波导定向耦合器。实验中用波长为 980nm的激光作为信号光源 ,观测到了样品的耦合光信号。给出了耦合器耦合系数不确定的因素 ,同时也分析了多孔硅波导传输损耗形成的原因。 相似文献
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采用离子束辅助沉积(IBAD)真空镀膜技术制备阵列波导光栅(AWG)波导材料。以固体石英玻璃材料作为衬底,采用离子束辅助沉积真空镀膜制备SiO2膜层,以实现偏振不敏感的阵列波导光栅。实验表明器件的偏振相关性大大改善,其双折射B约为1.4077×10-5,远小于二氧化硅-硅基波导结构阵列波导光栅的双折射B=2×10-4。器件的热稳定性也得以改善,当工作环境的温度变化范围为-10~70℃时,采用此方法研制的阵列波导光栅最大波长漂移为1.144 nm,小于普通的二氧化硅-硅基波导结构阵列波导光栅的波长漂移1.368 nm。 相似文献
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通过高频C-V测试得到实验制备的共平面波导(CPW)下方的Si/SiO2系统电荷主要表现为正电荷,其密度约为4.8×1010/cm2。三种不同衬底上50Ω共平面波导分别为直接制备于高阻硅上、高阻硅氧化层上、去除信号线与地线间的高阻硅氧化层上。20GHz时,测得上述三种CPW的微波传输损耗分别为-0.88dB、-2.50dB及-1.06dB,因此去除线间氧化层使得传输线损耗降低了1.44dB。此外还测试了高阻硅氧化层和除去线间氧化层的高阻硅氧化层上的两种CPW的传输损耗随外加偏压的变化。 相似文献
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小尺寸硅绝缘体光波导损耗测量 总被引:1,自引:1,他引:0
基于法布里-珀罗(F-P)腔理论建立了一种简单有效的硅绝缘体(SOI)光波导损耗测量方法.该方法采用端面耦合,通过测试波导反射功率谱并利用傅里叶频谱信息,完成波导损耗的测量.推导中指出了无法直接利用反射谱F-P峰峰谷值求解损耗的限制因素.应用该方法实现了对刻蚀深度为750 nm和宽度为1200 nm的SOI脊形波导损耗... 相似文献
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低损耗高Q值硅基纳米光波导谐振腔,是高灵敏探测器、生物传感器、光通讯器件等发展的关键。而波导表面粗糙度会造成较大的光传输损耗,是制约硅基纳米光波导谐振腔Q值提高的一个重要因素。降低硅基纳米光波导表面粗糙度已成为光波导器件发展的一个关键问题,氢退火工艺是当前改善波导表面粗糙度的一种关键技术。基于表面硅氢键流密度理论,利用Materials Studio软件模拟氢退火光滑化处理过程中硅与氢之间的反应,搜索反应过渡态,探究硅氢键、温度等因素对反应的影响。结果表明:在高温氢退火氛围下,波导表面硅原子与氢原子之间能够形成硅氢键,且温度越高,在硅氢键作用下表面硅原子迁移速率越快,表面由高能态向低能态过渡,表面光滑化效果越明显。 相似文献
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Fabrication of microscale and nanoscale sili-con waveguide devices requires patterning silicon, but until recently, exploitation of the technology has been restricted by the difficulty of forming ever-small features with minimum linewidth fluctuation.A technique was developed for fabricating such devices achieving vertical sidewall profile, smooth sidewall roughness of less than 10 nm, and fine features of 40 nm.Subsequently, silicon microring resonator and silicon-grating coupler were realized using this technique. 相似文献
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We investigate the dispersion properties of nanometer-scaled silicon nitride suspended membrane waveguides around the communication wavelength and systematically study their relationship with the key structural parameters of the waveguide. The simulation results show that a suspended membrane waveguide can realize anomalous dispersion with a relatively thinner silicon nitride thickness in the range of 400 to 600 nm, whereas, for the same membrane thickness, a conventional rib or strip silicon nitride waveguide cannot support anomalous dispersion. In particular, a waveguide with 400 nm silicon nitride thickness and deep etch depth (r=0.05) exhibits anomalous dispersion around the communication wavelength when the waveguide width ranges from 990 to 1255 nm, and the maximum dispersion is 22.56 ps/(nm·km). This specially designed anomalous dispersion silicon nitride waveguide is highly desirable for micro-resonator based optical frequency combs due to its potential to meet the phase-matching condition required for cascaded four-wave-mixing. 相似文献
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Silicon waveguide sidewall smoothing by wet chemical oxidation 总被引:1,自引:0,他引:1
This paper reports a new and more efficient Si waveguide sidewall smoothing process using wet chemical oxidation. Sidewall roughness is a major source of loss and an impediment to realizing high-transmission Si waveguides. The postetch multistepped approach allows for efficient smoothing (in terms of roughness amplitude reduction to material consumption) by continuous oxidation in the fast reaction-limited regime. This method reduces waveguide transmission loss without sacrificing dimensional integrity or thermal budget. In this proof-of-concept work, Si waveguide sidewall loss has been reduced from 9.2 to 1.9 dB/cm. 相似文献
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Shih-Che Hung Eih-Zhe Liang Ching-Fuh Lin 《Lightwave Technology, Journal of》2009,27(7):887-892
A novel laser-reformation technique is presented for sidewall smoothing of silicon waveguides. A KrF excimer laser is used to melt and reform the sidewalls to reduce the surface roughness. Atomic-force-microscopy measurement shows that the root-mean-square (rms) roughness is reduced from 14 to 0.24 nm. The calculated scattering loss is reduced to 0.033 dB/cm. The waveguide profile after laser illumination at an incident angle of 75deg transforms to a shape of arch. The crystal quality of laser-illuminated silicon wafer characterized by microwave reflection photoconductance-decay carrier lifetimes shows 94% less damage than the furnace-treated wafer. 相似文献
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Qi-jiang Ran Pei-de Han Yu-jun Quan Li-peng Gao Fan-ping Zeng Chun-hua Zhao 《光电子快报》2008,4(4):239-242
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's. 相似文献
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文中采用时域有限差分模拟的方法,研究了狭缝脊形波导中狭缝的宽度、狭缝两侧波导的宽度以及狭缝的深度对狭缝脊形波导光场分布的影响。在狭缝脊型波导中, 随着狭缝宽度的增加, 其归一化光功率先增大后减小;同样,光功率随着狭缝两侧波导的增加也呈现出先增加后减小的现象;随着狭缝刻蚀深度的增加,归一化光功率是逐渐增大的。通过比较狭缝中归一化光功率的值,将其影响量化,进一步找到最合适狭缝脊形波导的几何尺寸。实验结果表明,当狭缝的宽度为40 nm,两侧波导的宽度为220 nm,狭缝刻蚀深度为220 nm时,归一化光功率达到最大值为13.54 %。该仿真结果有助于优化狭缝脊形波导与调制器制造和集成。 相似文献
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SiON对Si基SiO_2AWG偏振补偿的数值分析 总被引:1,自引:1,他引:0
采用全矢量交替方向隐含迭代方法系统分析了高折射率 Si ON薄膜对 Si基 Si O2 阵列波导光栅中波导应力双折射的影响 .分析结果表明在芯区上或下表面沉积 Si ON薄膜可以明显减小 Si基 Si O2 阵列波导光栅 (AWG)中波导的应力双折射 ,但这两种补偿方法容易使模场偏移中心位置 ,不利于波导与光纤的耦合 .理想的补偿方法是在芯区上下同时补偿 ,可减小模场偏移 ,并用该方法设计了偏振无关的 1 6通道 AWG. 相似文献