脉冲偏压占空比对电弧离子镀TiAlN涂层的影响

通过优化电弧离子镀工艺参数改善TiAlN涂层结构及性能对TiAlN涂层应用具有重要的实用价值。本文利用脉冲偏压电弧离子镀制备了TiAlN涂层,研究了偏压占空比对TiAlN涂层结构及性能的影响,结果发现：随着占空比增加,涂层表面缺陷密度和表面粗糙度先降低后增大,占空比为70%时,制备的涂层表面缺陷密度和表面粗糙度最低。随着占空比增加,涂层的硬度和耐磨性得到明显改善,但占空比超过50%后继续增加占空比反而降低了涂层的硬度和耐磨性。TiAlN涂层与Si3N4球对磨时的主要磨损机制为黏着磨损和氧化磨损。     

脉冲偏压电弧离子镀Ti/TiN纳米多层薄膜的结构与硬度

采用脉冲偏压电弧离子镀设备在高速钢基体上沉积Ti／TiN纳米多层硬质薄膜,通过仅改变偏压幅值的方法进行对比实验。XRD分析和薄膜断截面SEM形貌显示出薄膜的纳米多层组织结构;硬度测试表明纳米多层薄膜硬度随脉冲偏压升高而升高。在-900V时超过同等条件制备的TiN单层薄膜,硬度高达34．1GPa;分析表明硬度的提高主要与脉冲偏压工艺对薄膜组织的改善有关;用脉冲偏压电弧离子镀可以制备纳米多层硬质薄膜,并且在工艺控制上相对简单。     

脉冲偏压磁过滤电弧离子镀TiN薄膜的组织结构及耐磨性研究

利用脉冲偏压磁过滤电弧离子镀在高速钢(M2)基底上沉积了厚约2.5μm的TiN薄膜;分别采用FESEM、GDOES、XRD和划痕试验法观察薄膜表面和断面形貌、测试薄膜成分及相结构,分析膜基结合强度,通过显微硬度计和球盘摩擦磨损试验机对比考察TiN薄膜和M2高速钢基体的硬度和耐磨性。结果表明,TiN薄膜表面光滑致密,呈现致密柱状晶结构和明显的(111)择优取向,膜基结合强度大于60 N,薄膜硬度约为26 GPa;脉冲偏压磁过滤电弧离子镀制备的TiN薄膜表现出很好的减摩和耐磨性能。     

负偏压对电弧离子镀复合TiAlN 薄膜的影响

采用电弧离子镀技术,以W18Cr4V高速钢为基体,调整基体负偏压,制得多个复合TiAlN薄膜试样,研究了基体负偏压对薄膜微观组织形貌、物相组成、晶格位向、硬度、厚度和沉积速率的影响。结果表明,过高或过低的负偏压会使得膜层表面不平整,显微硬度下降。当负偏压为200 V时,膜层的沉积速率最大;负偏压为150 V时,有利于薄膜(111)晶面的择优取向生长,且TiAlN膜的硬度最高。     

脉冲偏压对电弧离子镀Ti/TiN纳米多层薄膜显微硬度的影响

采用脉冲偏压电弧离子镀方法在高速钢基体上沉积Ti／TiN纳米多层薄膜,采用正交实验法设计脉冲偏压电参数,考察脉冲偏压对Ti／TiN纳米多层薄膜显微硬度的影响．结果表明,在所有偏压参数（脉冲偏压幅值、占空比和频率）和几何参数（调制周期和周期比）中,脉冲偏压幅值是影响显微硬度的最主要因素;当沉积工艺中脉冲偏压幅值为900V、占空比为50％及频率为30kHZ时,薄膜硬度可高达34．1GPa,此时多层膜调制周期为84nm,TiN和Ti单元层厚度分别为71和13nm;由于薄膜中的单层厚度较厚,纳米尺寸的强化效应并未充分体现于薄膜硬度的贡献中,硬度的提高主要与脉冲偏压工艺,尤其是脉冲偏压幅值对薄膜组织的改善有关．     

电弧离子镀TiN工艺优化及TiN/TiC多层膜性能

采用电弧离子镀技术制备TiN薄膜,研究了不同氮分压以及基体偏压下薄膜的表面质量、微结构、相组成、硬度以及结合力,优化工艺参数并制备TiN/TiC多层膜,比较了多层膜以及TiC单层膜的硬度以及摩擦性能的差异。结果表明,经过对不同工艺参数下薄膜的形貌结构以及性能比较,确定采用0.6 Pa氮分压以及-100 V基体偏压作为TiN优化工艺参数,在该工艺基础上制备的TiN/TiC多层膜与单层TiC薄膜相比具有更高的硬度以及更低的摩擦系数。     

脉冲偏压频率对TiSiN/TiAlN纳米多层膜结构和性能的影响规律

目的 研究脉冲偏压频率对TiSiN/TiAlN纳米多层薄膜结构和性能的影响,优化工艺参数,以提高薄膜的性能.方法 采用脉冲偏压电弧离子镀,在M2高速钢和单晶硅基底上以不同脉冲偏压频率沉积TiSiN/TiAlN纳米多层薄膜,采用扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射仪和纳米压痕仪,研究脉冲偏压频率对TiSiN/TiAlN纳米多层薄膜的表面形貌、元素成分、截面形貌、相结构和纳米硬度的影响.结果 TiSiN/TiAlN纳米多层薄膜表面的大颗粒直径主要集中在1μm以下,随着脉冲偏压频率的变化,大颗粒的数量为184～234,所占面积为40.686～63.87μm2;主要元素为Ti元素和N元素,所占原子比分别为48％和50％,Si和Al元素的含量较少;多层结构不明显,截面形貌可观察到柱状晶的细化,80 kHz时出现片状化结构;以(111)晶面为择优取向,晶粒尺寸在20 nm左右;纳米硬度为28.3～32.3 GPa,弹性模量为262.5～286.8 GPa.结论 50 kHz时,TiSiN/TiAlN纳米多层薄膜表面大颗粒的数量最少,为184个;70 kHz时大颗粒所占面积最小,为40.686μm2;晶粒尺寸在50～60 kHz时发生细化,60 kHz时,晶粒尺寸达到最小值19.366 nm,纳米硬度和弹性模量分别达到最大值32.3 GPa和308.6 GPa,脉冲偏压频率的最佳频率范围为50～70 kHz.     

脉冲偏压占空比对TiSiN薄膜结构和性能的影响

采用电弧离子镀方法,通过改变脉冲偏压占空比在M2高速钢和单晶硅片基体上沉积TiSiN薄膜,研究脉冲偏压占空比对TiSiN薄膜形貌结构、元素成分、相结构、纳米硬度和耐蚀性能的影响。脉冲偏压占空比为30%时,TiSiN薄膜表面的大颗粒数目达到最大值832个,占空比为60%时,大颗粒数目减小到451个;脉冲偏压占空比从20%增加到50%,Si试样表面的膜层厚度从390.8 nm增加到2.339 μm;占空比为30%时,Si在薄膜中的含量最高为13.88at%,(220)晶面为择优取向,晶粒尺寸达到最小值5.05 nm,硬度达到28.34 GPa,自腐蚀电流密度达到最小0.5306 μA/cm²;占空比为40%时,(111)晶面为择优取向,Si的含量降低到最小值0.46at%;占空比为50%时,(111)晶面的晶粒尺寸达到13.22 nm,硬度达到最大值42.08 GPa,自腐蚀电位达到最高值-0.324 V(vs SCE)。40%以上的占空比可以减少大颗粒缺陷数量,降低TiSiN薄膜中的Si含量,改变TiSiN薄膜晶粒生长的择优取向,提高薄膜的硬度和耐蚀性能。     

基体脉冲偏压对TiN/Cu纳米复合薄膜组织结构、力学及耐磨性能的影响

本文采用轴向磁场增强电弧离子镀在高速钢基体上沉积了TiN/Cu纳米复合薄膜,研究了基体脉冲偏压幅值对薄膜成分、结构、力学性能及耐磨性能的影响。结果表明,薄膜中铜含量随着脉冲偏压幅值的增加先增加而后降低,在一个较低的范围内(1.3-2.1at.%)。X射线衍射结果表明所有的薄膜均出现TiN相,并未观察到Cu相。薄膜的择优取向随着脉冲偏压幅值的增加而改变。薄膜的最高硬度为36GPa,是在脉冲偏压幅值为-200V时得到的,对应了1.6at.%的Cu含量。与纯的TiN薄膜相比,Cu的添加明显增强了薄膜的耐磨性能。     

多弧离子镀的工艺参数对TiAlN膜层性能的影响

研究了直流偏压、脉冲偏压、占空比、弧电流和氮气流量对多弧离子镀制备TiAlN涂层结合力和硬度的影响。结果表明,影响TiAlN涂层结合力的因素按重要性排序依次为脉冲偏压、占空比、弧电流、氮气流量、直流偏压。影响TiAlN涂层显微硬度的因素按重要性排序依次为占空比、脉冲偏压、弧电流、氮气流量和直流偏压。     

分离靶电弧离子镀制备TiN/TiAlN多层薄膜的微观结构和力学性能(英文)

采用分离靶电弧离子镀制备TiN/TiAlN多层薄膜。为了减少大颗粒的不利影响,利用直线型磁过滤方法来减少低熔点铝靶产生的大颗粒。结果表明,没有过滤的钛靶和磁过滤的铝靶等离子体到达基体的输出量在相同的数量级,同时,采用该方法制备的薄膜中的大颗粒数目是文献中报道的合金靶制备的薄膜大颗粒数目的1/10～1/3。Al元素的添加引起薄膜在(200)晶面的峰值降低,而在(111)和(220)晶面的峰值增强。TiN/TiAlN多层薄膜的最大硬度为HV2495,薄膜的硬度增强符合混合法则,结合力达75 N。     

Structure and wear resistance of TiN and TiAlN coatings on AZ91 alloy deposited by multi-arc ion plating

In order to investigate the microstructure of TiN and TiAlN coatings and their effect on the wear resistance of Mg alloy, TiN and TiAlN coatings were deposited on AZ91 magnesium alloy by multi-arc ion plating technology. TiN and Ti70Al30N coatings were prepared on the substrate, respectively, which exhibited dark golden color and compact microstructure. The microstructures of TiN and Ti70Al30N coatings were investigated by X-ray diffractometry (XRD) and scanning electron microscopy (SEM). The micro-hardness and wear resistance of TiN and Ti70Al30N coatings were investigated in comparison with the uncoated AZ91 alloy. The XRD peaks assigned to TiN and TiAlN phases are found. The hardness of TiN coatings is two times as high as that of AZ91 alloy, and Ti70Al30N coating exhibits the highest hardness. The wear resistance of the hard coatings increases obviously as result of their high hardness.     

Modified TiAlN coatings prepared by d.c. pulsed magnetron sputtering

Coatings like TiN or TiAlN are well established as hard and wear resistant tool coatings. These coatings often are prepared by PVD techniques like arc evaporation or d.c. magnetron sputtering. Typical micro hardness values of such hard coatings are in the range of 30 GPa. Compared to d.c. magnetron sputtering processes the pulsed magnetron sputter deposition technique could be shown as a clear advancement. Furthermore pure TiAlN hard coatings as well as TiAlN coatings modified by addition of elements like Si and Cr were prepared in order to improve the coating properties using the pulsed magnetron sputter technique in a batch coater equipped with 4 targets. Coatings prepared with the pulsed sputter process showed both high hardness and high wear resistance. The application potential of pulsed sputtered TiAlN coatings is demonstrated by turning test results of coated cemented carbide cutting inserts.Beside hardness and wear, other properties like adhesion or high temperature stability were determined. Cross sectional SEM images revealed the growth structure in dependence of the applied substrate bias and of the added elements. The chemical composition of the coatings was investigated by electron microprobe analysis and the phase and crystal size were determined by X-ray diffraction. Using the pulsed magnetron sputter process the coating properties, especially the hardness and the morphology, could be significantly improved. With indentation hardness values in the range of 40 GPa the region of super hard materials could be reached.     

TiAlN,TiAlSiN涂层的制备及其切削性能

目的研究TiAlN及TiAlSiN涂层的微观结构及力学性能,以及硬质合金涂层刀具切削SUS304不锈钢的切削性能及磨损行为。方法采用阴极电弧离子镀技术在硬质合金试片及铣刀上分别制备纳微米TiAlN及TiAlSiN涂层。通过X射线荧光测量系统测量涂层的厚度,用扫描电镜(SEM)观察涂层表面形貌,用能谱仪(EDAX)分析涂层元素成分,用X射线衍射(XRD)分析涂层晶相结构,用纳米压痕仪表征涂层硬度,用洛氏硬度计定性测量涂层结合力,通过高速铣削试验探究涂层刀具的切削性能及磨损行为。结果 TiAlN及TiAlSiN涂层的厚度分别为3.32μm和3.35μm,表面致密、光滑,高分辨率(20 000×)下观察到涂层表面有液滴、针孔及凹坑存在。Si元素促进了Ti N(200)晶相的生长,晶粒尺寸减小,硬度增加。TiAlN及TiAlSiN涂层的显微硬度分别为29.6 GPa及37.7 GPa,结合力分别满足VDI-3198工业标准的HF3和HF1等级。在130 m/min的高速切削条件下,TiAlSiN涂层刀具寿命约为未涂层刀具的5倍,TiAlN涂层刀具的1.5倍。结论 Si掺杂制备的TiAlSiN涂层具有高的硬度及良好的抗粘附性,更适用于不锈钢材料的高速切削加工。     

SEM study of defects in PVD hard coatings using focused ion beam milling

Hard coatings CrN, TiAlN and multilayer CrN/TiAlN were prepared on different substrates (HSS, D2 tool steels, Al-alloy) by thermoionic arc ion plating and by sputtering. The defects incorporated into the coating were studied by four techniques: top view conventional and field-emission SEM, cross-section SEM, AFM and stylus profilometry. As a specifically useful tool to study internal structure of the defect, we applied focused ion beam milling system, which is built in a conventional scanning electron microscope. By ion beam milling we prepared cross-sections through the defects.     

Corrosion Behaviors of Nitride Coatings on Titanium Alloy in NaCl-Induced Hot Corrosion

TiN and TiAlN coatings were deposited by arc ion plating on titanium alloys to study their hot corrosion resistance when they were exposed to NaCl at 600 ℃.The microstructure and corrosion behaviors of nitride coatings were studied using scanning electron microscope,X-ray diffraction,electro-probe microanalyzer and X-ray photoelectron spectroscopy.The results showed that nitride coatings with the different compositions and the ones with the same composition but different thicknesses presented different hot corrosion resistance.TiN and thin TiAlN coatings showed poor corrosion resistance.Serious internal oxidation attacked the alloy substrate.Their corrosion products were mainly consisted of non-protective TiO2 and sodium salt.By contrast,the thick TiAlN coating presented outstanding corrosion resistance.Besides sodium salt,the corrosion products were composed of protective Al2O3.The increasing thickness of TiAlN significantly enhanced the hot corrosion resistance.The corrosion mechanisms of alloy,TiN and TiAlN coatings were discussed in detail.     

基体负偏压对TiAlN/TiN膜层组织成分及硬度的影响

采用多弧离子镀技术在40Cr基体上制备TiAlN/TiN复合膜层;利用金相显微镜、扫描电子显微镜和显微硬度仪研究基体负偏压对膜层硬度的影响.结果表明:基体负偏压对膜层性能有显著影响,过高或过低的基体偏压会使得膜层表面不平整,表面显微硬度降低.基体负偏压越高,膜层中Ti、Al原子的含量就越低.     

Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C,N) multilayer coatings

1　ＩＮＴＲＯＤＵＣＴＩＯＮＶａｒｉｏｕｓｃｏａｔｉｎｇｓｄｅｐｏｓｉｔｉｏｎｔｅｃｈｎｉｑｕｅｓ ,ｓｕｃｈａｓＰＶＤ ,ＣＶＤ ,ＰＣＶＤ ,ＩＢＥＤａｎｄＰＳＩＩｈａｖｅｂｅｅｎｕｓｅｄｔｏｉｍｐｒｏｖｅｔｈｅｗｅａｒ ｒｅｓｉｓｔａｎｃｅ ,ｃｏｒｒｏｓｉｏｎ ｒｅｓｉｓｔａｎｃｅａｓｗｅｌｌａｓｅｌｅｖａｔｅｄａｎｔｉ ｏｘｉｄａｔｉｏｎｂｅｈａｖｉｏｒｏｆｓｕｒｆａｃｅｏｆｓｔｅｅｌｓ ,ｆｏｒｉｎｓｔａｎｃｅ ,ｃｕｔｔｉｎｇｔｏｏｌｏｒｄｉｅｓｔｅｅｌｓａｎｄｎｏｎ ｆｅｒｒｏｕｓｍｅｔａｌｓｉｎ…