AC conductivity,dielectric relaxation and modulus behavior of Sb2S2O new kermesite alloy for optoelectronic applications

In this work, we present some physical properties of Sb₂S₂O thin films obtained through heat treatment of Sb₂S₃ thin films under an atmospheric pressure at 350 °C. The electrical conductivity, dielectric properties and relaxation model of these thin films were studied using impedance spectroscopy technique in the frequency range from 5 Hz to 13 MHz at various temperatures from 350 °C to 425 °C. Besides, the frequency and temperature dependence of the complex impedance, AC conductivity and complex electric modulus has been investigated.     

Effects of Sb,Zn doping on structural,electrical and optical properties of SnO2 thin films

Highly transparent, low resistive pure and Sb, Zn doped nanostructured SnO₂ thin films have been successfully prepared on glass substrates at 400° C by spray pyrolysis method. Structural, electrical and optical properties of pure and Sb, Zn doped SnO₂ thin films are studied in detail. Powder X-ray diffraction confirms the phase purity, increase in crystallinity, size of the grains (90–45 nm), polycrystalline nature and tetragonal rutile structure of thin films. The scanning electron microscopy reveals the continuous change in surface morphology of thin films and size of the grains decrease due to Sb, Zn doping in to SnO₂. The optical transmission spectra of SnO₂ films as a function of wavelength confirm that the optical transmission increases with Sb, Zn doping remarkably. The optical band gap of undoped film is found to be 4.27 eV and decreases with Sb, Zn doping to 4.19 eV, 4.07 eV respectively. The results of electrical measurements indicate that the sheet resistance of the deposited films improves with Sb, Zn doping. The Hall measurements confirm that the films are degenerate n-type semiconductors.     

Electrical measurements of dielectric properties of molybdenum-doped zinc oxide thin films

Effects of molybdenum element content on electrical conductivity of ZnO sprayed thin films were investigated using the impedance spectroscopy method in the frequency ranging from 5 Hz to 13 MHz for temperature lying in 300–475 °C domain. It is observed that AC conductivity is a power law. The values of dielectric constants ε₁ and ε₂ were found to decrease with frequency and increase with temperature. The activation energy determined from the plot of both DC conductivity and the hopping frequency with 1000/T shows that the hopping conduction is the dominant mechanism. Also, experimental data of DC conductivity were analyzed using the small polaron hopping model. The impedance analysis of undoped ZnO and Mo-doped ZnO (1% and 2%) shows only one semicircle implying the response originated from a single capacitive element corresponding to the bulk grains. However, the same analysis for ZnO:Mo (3% ) shows two semicircles which proves the existence of grain boundaries. Finally, analyses of polaron hopping mechanism and Urbach tailing allow some explanations of these transport phenomena. This study shows an effective variation of electrical measurements of Mo-doped ZnO films in terms of temperature leading to possible use of such films as gas sensors.     

Optical and ac conductivity investigations on Sn doped Ag2S thin films under the structural transition framework

This work deals with further optical and electrical investigations on Sn content in Ag₂S sprayed thin films and the beneficial effect of using this type of doping in addition to the results recently reported by R. Boughalmi, A. Boukhachem, I. Gaeid, K. Boubaker, M. Bouhafs, M. Amlouk, Mater. Sci. Semicond. Process. 16 (2013) 1584. The refractive index and extinction coefficient values in terms of Sn content were deduced from transmittance and reflectance data. Moreover, study of dielectric constants has been conducted; the dispersion parameters and high- frequency dielectric constant are determined. Finally, the electrical conductivity and conduction mechanism of these films are studied using an impedance spectroscopy technique in the frequency range 5 Hz–13 MHz at various temperatures (100–230 °C). Besides, the temperature dependence of ac conductivity measurements has been analyzed under the structural transition framework from β- to α-Ag₂S phases.     

Effect of thermal annealing on physical properties of vacuum evaporated In2S3 buffer layer for eco-friendly photovoltaic applications

The present communication reports the effect of thermal annealing on the physical properties of In₂S₃ thin films for eco-friendly buffer layer photovoltaic applications. The thin films of thickness 150 nm were deposited on glass and indium tin oxide (ITO) coated glass substrates employing thermal vacuum evaporation technique followed by post-deposition thermal annealing in air atmosphere within a low temperature range 150–450 °C. These as-deposited and annealed films were subjected to the X-ray diffraction (XRD), UV–vis spectrophotometer, current–voltage tests and scanning electron microscopy (SEM) for structural, optical, electrical and surface morphological analysis respectively. The compositional analysis of as-deposited film is also carried out using energy dispersive spectroscopy (EDS). The XRD patterns reveal that the as-deposited and annealed films (≤300 °C) have amorphous nature while films annealed at 450 °C show tetragonal phase of β-In₂S₃ with preferred orientation (109) and polycrystalline in nature. The crystallographic parameters like lattice constant, inter-planner spacing, grain size, internal strain, dislocation density and number of crystallites per unit area are calculated for thermally annealed (450 °C) thin films. The optical band gap was found in the range 2.84–3.04 eV and observed to increase with annealing temperature. The current–voltage characteristics show that the as-deposited and annealed films exhibit linear ohmic behavior. The SEM studies show that the as-deposited and annealed films are uniform, homogeneous and free from crystal defects and voids. The grains in the thin films are similar in size and densely packed and observed to increase with thermal annealing. The experimental results reveal that the thermal annealing play significant role in the structural, optical, electrical and morphological properties of deposited In₂S₃ thin films and may be used as cadmium-free eco-friendly buffer layer for thin films solar cells applications.     

Effect of substrate temperature on structural,morphological, optical and electrical properties of MnIn2S4 thin films prepared by nebulizer spray pyrolysis technique

Manganese indium sulphide (MnIn₂S₄) thin films were deposited using an aqueous solution of MnCl₂, InCl₃ and (NH₂)₂CS in the molar ratio 1:2:4 by simple chemical spray pyrolysis technique. The thin film substrates were annealed in the temperature range between 250 and 350 °C to study their various physical properties. The structural properties as studied by X-ray diffraction showed that MnIn₂S₄ thin films have cubic spinel structure. The formation of cube and needle shaped grains was clearly observed from FE-SEM analysis. The energy dispersive spectrum (EDS) predicts the presence of Mn, In and S in the synthesized thin film. From the optical studies, it is analyzed that the maximum absorption co-efficient is in the order between 10⁴ and 10⁵ cm⁻¹ and the maximum transmittance (75%) was noted in the visible and infrared regions. It is noted that, the band gap energy decreases (from 3.20 to 2.77 eV) with an increase of substrate temperature (from 250 to 350 °C). The observations from photoluminescence studies confirm the emission of blue, green, yellow and red bands which corresponds to the wavelength range 370–680 nm. Moreover, from the electrical studies, it is observed that, as the substrate temperature increases the conductivity also increases in the range 0.29–0.41×10⁻⁴ Ω⁻¹ m⁻¹. This confirms the highly semiconducting nature of the film. The thickness of the films was also measured and the values ranged between 537 nm (250 °C) to 483 nm (350 °C). This indicates that, as the substrate temperature increases, the thickness of the film decreases. From the present study, it is reported that the MnIn₂S₄ thin films are polycrystalline in nature and can be used as a suitable ternary semiconductor material for photovoltaic applications.     

The correlation of γ-irradiation,particle size and their effects on physical properties of AgInSe2 nanostructure thin films

In this work the effect of γ-irradiation on the optical and electrical properties of near stoichiometric AgInSe₂ nanostructure thin films have been characterized. The XRD pattern of ingot AgInSe₂ powder prepared by solid state reaction showed tetragonal polycrystalline single-phase structure. The thin films of thickness 75 nm were prepared by inert gas condensation (IGC) technique at using constant Ar flow and substrate temperature of 300 K.Thin films were exposed to annealing process at 473 K for 2 h in vacuum of 10⁻² Torr. The amorphous and tetragonal nanocrystalline structures were detected for as-deposited and annealed films respectively by grazing incident in-plane X-ray diffraction (GIIXD) technique. The structure and average particle size of annealed irradiated films by different γ-doses from 0 to 4 Mrad were determined using high resolution transmission electron microscope (HRTEM). Optical transmission, reflection and absorption spectra were studied for both annealed unirradiated and irradiated films. Two optical transitions for each annealed unirradiated and film exposed to γ-irradiation doses from 0 to 4 Mrad were observed. The evaluated E_g1 due to 1^st transition have decreased from 1.52 to 1.44 eV and E_g2 due to 2^nd transition have decreased from 2.83 to 2.30 eV as the particle size increased from 7.3 to 9.5 nm by raising the irradiation dose up to 1 Mrad. The behavior of d.c. electrical conductivity with temperature that measured under vacuum was examined for all films under investigation. The evaluated activation energies due to irradiation doses are ranging from 0.58 to 0.68 eV.     

Temperature effect on the physical properties of CuIn11S17 thin films for photovoltaic applications

CuIn₁₁S₁₇ compound was synthesized by horizontal Bridgman method using high-purity copper, indium and sulfur elements. CuIn₁₁S₁₇ thin films were prepared by high vacuum evaporation on glass substrates. The glass substrates were heated at 30, 100 and 200 °C. The structural properties of the powder and the films were investigated using X-ray diffraction (XRD). XRD analysis of thin films revealed that the sample deposited at a room temperature was amorphous in nature while those deposited on heated substrates were polycrystalline with a preferred orientation along the (311) plane of the spinel phase. Ultraviolet–visible (UV–vis) spectroscopy was used to study the optical properties of thin films. The results showed that CuIn₁₁S₁₇ thin films have high absorption coefficient α in the visible range (10⁵–10⁶ cm⁻¹). The band gap E_g of the films decrease from 2.30 to 1.98 eV with increasing the substrate temperature (T_s) from 30 to 200 °C. We exploited the models of Swanepoel, Wemple–DiDomenico and Spitzer–Fan for the analysis of the dispersion of the refractive index n and the determination of the optical constants of the films. Hot probe method showed that CuIn₁₁S₁₇ films deposited at T_s=30 °C and T_s=100 °C are p-type conductivity whereas the sample deposited at T_s=200 °C is highly compensated.     

Enhancement in the optical and electrical properties of CdS thin films through Ga and K co-doping

In the presented work, Ga-doped CdS and (Ga-K)-co-doped CdS thin films are grown on glass substrates at a temperature of 400 °C through spray pyrolysis. Influence of K-doping on structural, morphological, optical and electrical characteristics of CdS:Ga thin films are examined. K level is changed from 1 at% to 5 at% for CdS:Ga samples just as Ga concentration is fixed 2 at% for all CdS thin films. It is observed from the X-ray diffraction data that all the samples exhibit hexagonal structure and an increase level of K in Ga-doped CdS samples causes a degradation in the crystal quality. Energy-dispersive X-ray spectroscopy measurements illustrate that the best stoichiometric film is acquired when K content is 2 at% in Ga-doped CdS films. Optical transmission curves demonstrate that CdS:Ga thin films exhibit the best optical transparency in the visible range for 4 at% K content compared to other specimens. A widening in the optical bandgap is unveiled after K-dopings. It is obtained that maximum band gap value is found as 2.45 eV for 3 at%, 4 at% and 5 at%. K -dopings while Ga-doped CdS thin films display the band gap value of 2.43 eV. From photoluminescence measurements, the most intensified peak is observed in the deep level emission after incorporation of the 4 at% K atoms. As for electrical characterization results, the resistivity reduces and the carrier density improves with the increase of K concentration from 1 at% to 4 at%. Based on all the data, it can be deduced that 4 at% K-doped CdS:Ga thin films show the best optical and electrical behavior, which can be utilized for solar cell devices.     

Behavior of chemically deposited PbS thin films subjected to two different routes of post deposition annealing

Lead sulfide (PbS) thin films were prepared on soda lime glass substrates at room temperature by Chemical Bath Deposition (CBD) technique. This paper reports a comparative study of characteristic properties of as-prepared PbS thin films after thermal treatment through two different routes. Studies were carried out for as-prepared as well as rapidly and gradually annealed samples at 100, 200 and 300 °C. The characterizations of the films were carried out using X-ray diffraction, scanning electron microscopy and optical measurement techniques. The structural studies confirmed the polycrystalline nature and the cubic structure of the films. As-deposited films partly transformed to Pb₂O₃ when gradually annealed to 300 °C. The presence of nano crystallites was revealed by structural and optical absorption measurements. The values of average crystallite size were found to be in the range 18–20 nm. The variation in the microstructure, thickness, grain size, micro strain and optical band gap on two types of annealing were compared and analyzed. Data showed that post deposition parameters and thermal treatment strongly influence the optical properties of PbS films. Optical band gap of the film gets modified remarkably on annealing. Direct band gap energy values for rapidly and gradually annealed samples varied in the range of 1.68–2.01 eV and 1.68–2.12 eV respectively. Thus we were succeeded in tailoring direct band gap energies by post deposition annealing method.     

Effect of Pb:S molar ratio in precursor solution on the properties of lead sulphide thin films by ultrasonic spray pyrolysis

In this work, PbS thin films were deposited onto glass substrate at 225 °C by spraying precursor solution prepared with different molar ratio of lead acetate and thiourea as a source of Pb²⁺ and S^2- respectively in order to investigate the effect of Pb:S molar ratio in the precursor solution on the physical properties of PbS thin films. Structural investigations carried out by X-ray diffractometer have shown that all films have fcc cubic structure and the average crystal size increased from 11 nm to 25 nm with the increasing the thiourea ratio in the precursor solution. In order to analyze the surface morphology of PbS thin films, AFM and SEM images were taken and elemental analysis of the films was performed by EDS. Optical transmittance and absorption spectra show that all deposited films have fairly low transmittance and high absorbance in the visible region. Additionally, it was determined that optical band gap of the deposited films were varied between 1.18 eV and 1.37 eV. As a consequence of electrical investigations, it was seen that all films have p-type conductivity and electrical resistivity decreased by increasing thiourea molar ratio in the precursor solution. All examinations have revealed that the molar ratio of lead acetate and thiourea has a significant effect on the physical properties of PbS thin films.     

Optical and electrical properties of nickel oxide thin films synthesized by sol–gel spin coating

Nickel oxide thin films were prepared by the sol–gel technique combined with spin coating onto glass substrates. The as-deposited films were pre-heated at 275 °C for 15 min and then annealed in air at different temperatures. The effects of the annealing temperature on the structural and optical properties of the films are studied. The results show that 600 °C is the optimum annealing temperature for preparation of NiO films with p-type conductivity and high optical transparency. Then, by using these optimized deposition parameters, NiO thin films of various thicknesses were deposited at the same experimental conditions and annealed under different atmospheres. Surface morphology of the films was investigated by atomic force microscopy. The surface morphology of the films varies with the annealing atmosphere. Optical transmission was studied by UV–vis spectrophotometer. The transmittance of films decreased as the thickness of films increased. The electrical resistivity, obtained by four-point probe measurements, was improved when NiO layers were annealed in N₂ atmosphere at 600 °C.     

Properties of fluorine-doped SnO2 thin films by a green sol–gel method

Fluorine doped tin oxide (FTO) films were fabricated on a glass substrate by a green sol–gel dip-coating process. Non-toxic SnF₂ was used as fluorine source to replace toxic HF or NH₄F. Effect of SnF₂ content, 0–10 mol%, on structure, electrical resistivity, and optical transmittance of the films were investigated using X-ray diffraction, Hall effect measurements, and UV–vis spectra. Structural analysis revealed that the films are polycrystalline with a tetragonal crystal structure. Grain size varies from 43 to 21 nm with increasing fluorine concentration, which in fact critically impacts resultant electrical and optical properties. The 500 °C-annealed FTO film containing 6 mol% SnF₂ shows the lowest electrical resistivity 7.0×10⁻⁴ Ω cm, carrier concentration 1.1×10²¹ cm⁻³, Hall mobility 8.1 cm²V⁻¹ s⁻¹, optical transmittance 90.1% and optical band-gap 3.91 eV. The 6 mol% SnF₂ added film has the highest figure of merit 2.43×10⁻² Ω⁻¹ which is four times higher than that of un-doped FTO films. Because of the promising electrical and optical properties, F-doped thin films prepared by this green process are well-suited for use in all aspects of transparent conducting oxide.     

Structural,surface morphology and optical properties of sputter-coated CaCu3Ti4O12 thin film: Influence of RF magnetron sputtering power

This study focusses on the investigation of RF power variations (100–300 W) effects on structural, morphological and optical properties of CaCu₃Ti₄O₁₂ thin film deposited on ITO/glass substrate in a non-reactive atmosphere (Ar). The increase of RF power from 100 W to 300 W led to evolution of (112), (022), (033), and (224) of CCTO XRD peaks. The results indicated that all the films were polycrystalline nature with cubic structure. The crystallite size increased from 20 nm to 25 nm with increasing RF power. FESEM revealed that the films deposited were uniform, porous with granular form, while the grain size increased from 30 to 50 nm. AFM analysis confirmed the increment in surface roughness from 1.6 to 2.3 nm with increasing film grain size. Besides, optical transmittance values decreased to minimum 70% with increasing RF power while optical energy bandgap increased from 3.20 eV to 3.44 eV. Therefore, favorable CCTO thin film properties can be possibly obtained for certain application by controlling RF magnetron sputtering power.     

Effect of zinc doping and temperature on the properties of sprayed CuInS2 thin films

Copper indium disulfide (CuInS₂) is an efficient absorber material for photovoltaic and solar cell applications. The structural, optical, photoluminescence properties and electrical conductivities could be controlled and modified by suitably doping CuInS₂ thin films with dopants such as Zn, Sn, Bi, Cd, Na, N, O, P and As. In this work Zn (0.01 M) doped CuInS₂ thin films are (Cu/In=1.25) deposited on to glass substrates in the temperature range 300–400 °C. It is observed that the film growth temperature, ion ratio (Cu/In=1.25) and Zn-doping affect structural, optical, photoluminescence and electrical properties of sprayed CuInS₂ thin films. As the XRD patterns depict, Zn-doping facilitates the growth of CuInS₂ thin films along (112) preferred plane and in other characteristic planes. The EDAX results confirm the presence of Cu, In, S and Zn in the films. The optical studies show, about 90% of light transmission occurs in the IR regions; hence Zn-doped CuInS₂ can be used as an IR transmitter. The absorption coefficient (α) in the UV–visible region is found to be in the order of 10⁴–10⁵ cm⁻¹ which is the optimum value for an efficient absorber. The optical band gap energies increase with increase of temperatures (1.66–1.78 eV). SEM photographs reveal crystalline and amorphous nature of the films at various temperature ranges. Photoluminescence study shows that well defined broad Blue and Green band emissions are exhibited by Zn-doped CuInS₂ thin films. All the films present low resistivity (ρ) values and exhibit semiconducting nature. An evolution of p-type to n-type conductivity is obtained in the temperature range 325–350 °C. Hence, Zn species can be used as a donor and acceptor impurity in CuInS₂ thin films to fabricate efficient solar cells, photovoltaic devices and good IR Transmitters.     

Structural and optoelectronic properties of nanostructured TiO2 thin films with annealing

About 480 nm thick titanium oxide (TiO₂) thin films have been deposited by electron beam evaporation followed by annealing in air at 300–600 °C with a step of 100 °C for a period of 2 h. Optical, electrical and structural properties are studied as a function of annealing temperature. All the films are crystalline (having tetragonal anatase structure) with small amount of amorphous phase. Crystallinity of the films improves with annealing at elevated temperatures. XRD and FESEM results suggest that the films are composed of nanoparticles of 25–35 nm. Raman analysis and optical measurements suggest quantum confinement effects since Raman peaks of the as-deposited films are blue-shifted as compared to those for bulk TiO₂ Optical band gap energy of the as-deposited TiO₂ film is 3.24 eV, which decreases to about 3.09 eV after annealing at 600 °C. Refractive index of the as-deposited TiO₂ film is 2.26, which increases to about 2.32 after annealing at 600 °C. However the films annealed at 500 °C present peculiar behavior as their band gap increases to the highest value of 3.27 eV whereas refractive index, RMS roughness and dc-resistance illustrate a drop as compared to all other films. Illumination to sunlight decreases the dc-resistance of the as-deposited and annealed films as compared to dark measurements possibly due to charge carrier enhancement by photon absorption.     

Study on dielectric properties of lanthanum copper tantalate ceramics by impedance spectroscopy

A new perovskite ceramic material with the composition La_2/3CuTa₄O₁₂ was synthesized by solid state reaction method. SEM observations revealed dense and fine-grained microstructure and not uniform grain size distribution in the ceramics sintered in the temperature range 1180–1220 °C. Impedance spectroscopy studies were carried out in the temperature range from −55 to 700 °C at frequencies 10 Hz–2 MHz. Three types of dielectric responses were recognized, attributed to grains, grain boundaries and the electrode-sample interface. The relaxation times determined from the impedance data follow the Arrhenius law with the activation energies of 0.25 eV and 0.94 eV for grains and grain boundaries, respectively. DC electrical conductivity of the investigated ceramics was investigated in the temperature range 20–700 °C. The determined activation energy of electrical conduction was about 0.5 eV. The dielectric properties of La_2/3CuTa₄O₁₂ ceramics were compared with those of other A_2/3CuTa₄O₁₂ (A=Y, Nd, Sm, Gd, Dy, Bi) materials, being the spontaneously formed internal barrier layer capacitors, and some essential differences were found.     

A study on phase transformation of SnOx thin films prepared by reactive magnetron sputtering

In the paper, SnO_x thin films were deposited by reactive magnetron sputtering from a tin target in O₂ containing working gas. The evolution from Sn-containing SnO to tetravalent SnO₂ films was investigated. The films could be classified into three groups according to their optical band gaps, which are E_g<2.5 eV, E_g=3.0–3.3 eV and E_g>3.7 eV. The electric measurements show that high conductivity can be obtained much easier in SnO₂ than in SnO films. A high electron mobility of 15.7 cm² V⁻¹ s⁻¹, a carrier concentration of 1.43×10²⁰ cm⁻³ and a resistivity of 2.8×10⁻³ Ω cm have been achieved in amorphous SnO₂ films. Films with the optical band gap of 3.0–3.3 eV remain amorphous though the substrate temperature is as high as 300 °C, which implies that °btaining high mobility in p-type SnO is more challenging in contrast to n-type SnO₂ films.     

The effect of annealing on the physical properties of thermally evaporated CuIn2n+1S3n+2 thin films (n=0, 1, 2 and 3)

In this study, the annealing effect on structural, electrical and optical properties of CuIn_2n+1S_3n+2 thin films (n=0, 1, 2 and 3) are investigated. CuIn_2n+1S_3n+2 films were elaborated by vacuum thermal evaporation and annealed at 150 and 250 °C during 2 h in air atmosphere. XRD data analysis shows that CuInS₂ and CuIn₃S₅ (n=0 and 1) crystallize in the chalcopyrite structure according to a preferential direction (112), CuIn₅S₈ and CuIn₇S₁₁ (n=2 and 3) crystallize in the cubic spinel structure with a preferential direction (311). The optical characterization allowed us to determine the optical constants (refractive indexes 2.2–3.1, optical thicknesses 250–500 nm, coefficients of absorption 10⁵ cm^?1, coefficients of extinction <1, and the values of the optical transitions 1.80–2.22 eV) of the samples of all materials. We exploited the models of Cauchy, Wemple–DiDomenico and Spitzer–Fan for the analysis of the dispersion of the refractive index and the determination of the optical and dielectric constants.     

The significant effect of film thickness on the properties of chalcopyrite thin absorbing films deposited by RF magnetron sputtering

In this paper, thickness dependent structural, surface morphological, optical and electrical properties of RF magnetron sputtered CuIn_0.8Ga_0.2Se₂ (CIGS) thin films were studied using X-ray diffraction (XRD), Transmission electron microscopy (TEM), Field emission scanning electron microscopy (FE-SEM), Atomic force microscopy (AFM), UV–vis–NIR spectrophotometer and Keithley electrical measurement unit. The peak intensity along (112) plane as well as crystallite size was found to increase with thickness. However, for higher film thickness >1.16 μm, crystallinity reduced due to higher % of Cu content. TEM analysis confirmed pollycrysallinity as well as chalcopyrite phase of deposited films. The band gap was found to decrease with increase in thickness yielding a minimum value of 1.12 eV for film thickness 1.70 μm. The I–V characteristics showed the ohmic behavior of metal semiconductor contact with higher conductivity for film thickness 1.16 μm.