Electrical measurements of dielectric properties of molybdenum-doped zinc oxide thin films

Effects of molybdenum element content on electrical conductivity of ZnO sprayed thin films were investigated using the impedance spectroscopy method in the frequency ranging from 5 Hz to 13 MHz for temperature lying in 300–475 °C domain. It is observed that AC conductivity is a power law. The values of dielectric constants ε₁ and ε₂ were found to decrease with frequency and increase with temperature. The activation energy determined from the plot of both DC conductivity and the hopping frequency with 1000/T shows that the hopping conduction is the dominant mechanism. Also, experimental data of DC conductivity were analyzed using the small polaron hopping model. The impedance analysis of undoped ZnO and Mo-doped ZnO (1% and 2%) shows only one semicircle implying the response originated from a single capacitive element corresponding to the bulk grains. However, the same analysis for ZnO:Mo (3% ) shows two semicircles which proves the existence of grain boundaries. Finally, analyses of polaron hopping mechanism and Urbach tailing allow some explanations of these transport phenomena. This study shows an effective variation of electrical measurements of Mo-doped ZnO films in terms of temperature leading to possible use of such films as gas sensors.     

Sol–gel synthesized Titania nanoparticles deposited on porous polycrystalline silicon: Improved carbon dioxide sensor properties

Titania nanoparticles (TNPs) were synthesized by a sol–gel method in our laboratory using titanium tetrachloride as the precursor and isopropanol as the solvent. The particles׳ size distribution histogram was determined using ImageJ software and the size of TNPs was obtained in the range of 7.5–10.5 nm. The nanoparticle with the average size of 8.5 nm was calculated using Scherrer׳s formula. Homogeneous and spherical nanoparticles were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FESEM) and UV–visible spectroscopy (UV–vis). The X-ray powder diffraction analysis showed that the prepared sample (TNPs) has pure anatase phase. TNPs were deposited on porous polycrystalline silicon (PPS) substrate by electron beam evaporation. The TNPs thickness was 23±2 nm at 10⁻⁵ mbar pressure at room temperature. Porosity was performed by an anodization method. Since polycrystalline silicon wafers consist of different grains with different orientations, the pore size distribution in porous layer is non-uniform [1]. Therefore, the average diameter of pores can be reported in PPS layer analysis. Average diameter of pores was estimated in the range of 5 μm which was characterized by FESEM. The nanostructured thin films devices (Al/Si/PPS/TNPs/Al and Al/Si/PPS/Al) were fabricated in the sandwich form by aluminum (Al) electrodes which were also deposited by electron beam evaporation. Electrical measurements (I–V curves) demonstrated the semiconducting behavior of thin film devices. The gas sensitivity was studied on exposure to 10% CO₂ gas. As a result, conductivity of devices increased on exposure to CO₂ gas. The device with TNPs thin film (Al/Si/PPS/TNPs/Al) was more sensitive and, had better response and reversibility in comparison with the device without TNPs thin film (Al/Si/PPS/Al).     

Electric conduction of PbBr-based layered perovskite organic–inorganic superlattice having carbazole chromophore-linked ammonium molecule as an organic layer

We have successfully prepared thin films of PbBr-based layered perovskite having hole-transporting carbazole chromophore-linked ammonium molecules as an organic layer by a simple spin-coating from the N,N-dimethylformamide solution in which the stoichiometric amount of lead bromide and carbazole-linked ammonium bromides was dissolved. Their X-ray diffraction profiles exhibited that their layer structure formed (0 0 n)-orientation, where c-axis is perpendicular to the substrate plane. Their layer structure depended on the alkyl chain length of ammonium molecules. When methylene length of C₅H₁₀ was employed in the carbazole-linked ammonium molecules, highest orderliness of the layer structure was attained; higher-order X-ray diffraction peaks were observed in the layered perovskite films. In the layered pervskite film, in-plane conduction, namely conduction in the direction of the stacking of carbazole chromophore, was measured. For comparison, conductivity of poly(N-vinylcarbazole) (PVCBz) thin film was also measured. The conductivity of the layered perovskite thin film (1.8 × 10^?10 Scm^?1 at 303 K) was about three order of magnitude larger than that of the PVCBz thin film (5.3 × 10^?14 Scm^?1 at 303 K). Despite the much higher conductivity of the layered peroskite thin film, the activation energy of the conductivity of the layered perovskite thin film (1.44 eV) was about 2.4 times larger than that of the PVCBz thin film (0.61 eV). This phenomenon is probably due to difference in film morphology through considering the results of AFM observation.     

A facile chemical reduction approach for effectively tuning thermoelectric properties of PEDOT films

Poly(3,4-ethylenedioxythiophene)–tosylate–polyethylene glycol–polypropylene glycol–polyethylene glycol (PEDOT–Tos–PPP) films were prepared via a vapor phase polymerization (VPP) method. The films possess good electrical conductivity (1550 S cm⁻¹), low Seebeck coefficient (14.9 μV K⁻¹) and thermal conductivity (0.501 W m⁻¹ K⁻¹), and ZT ∼ 0.02 at room temperature (RT, 295 K). Then, the films were treated with NaBH₄/DMSO solutions of different NaBH₄ concentrations to adjust the redox level. After the NaBH₄/DMSO treatment (dedoping), the electrical conductivity of the films continuously decreased from 1550 to 5.7 S cm⁻¹, whereas the Seebeck coefficient steeply increased from 14.9 to 143.5 μV K⁻¹. A maximum power factor of 98.1 μW m⁻¹ K⁻² has been achieved at an optimum redox level. In addition, the thermal conductivity of the PEDOT–Tos–PPP films decrease from 0.501 to 0.451 W m⁻¹ K⁻¹ after treated with 0.04% NaBH₄/DMSO solution. A maximum ZT value of 0.064 has been achieved at RT. The electrical conductivity and thermal conductivity (Seebeck coefficient) of the untreated and 0.04% NaBH₄/DMSO treated PEDOT–Tos–PPP films decrease (increases) with increasing temperature from 295 to 385 K. And the power factor of the films monotonically increases with temperature. The ZT at 385 K of the 0.04% NaBH₄/DMSO treated film is 0.155.     

Optical,electrical and photovoltaic properties of thermally evaporated 3-amino-2-[(2-nitrophenyl)diazinyl]-3-(piperidin-1-yl)acrylonitrile thin films

Thin films with various thickness of 3-amino-2-[(2-nitrophenyl)diazinyl]-3-(piperidin-1-yl)acrylonitrile (ANPA) were produced by conventional thermal evaporation. The dependence of the optical, electrical, and photovoltaic properties on the film thickness was investigated. X-ray diffraction showed that the films have an amorphous structure. The optical properties were investigated in terms of transmittance and reflectance in the spectral range 200–2500 nm. Spectral distribution analysis of the absorption coefficient revealed that the films have an indirect allowed electronic interband transition. The optical bandgap decreased from 2.47 to 2.1 eV for an increase in film thickness from 105 to 265 nm. The direct current electrical conductivity of the films was measured for sandwich-structured samples as a function of the heating temperature and film thickness. The films exhibited semiconductor behavior and electrical conduction was attributed to hopping of charge carriers in localized states. ANPA films of differing thickness were deposited on p-type Si single-crystal substrates. The influence of film thickness on the electrical and photovoltaic parameters of Au/ANPA/p-Si/Al heterojunction solar cells was investigated.     

Effect of deposition time on lead selenide thermoelectric thin films prepared by chemical bath deposition technique

A series of lead selenide (PbSe) films was deposited at constant bath temperature with various deposition time (3–5 h) using simple chemical bath deposition techniques, to study the effect of deposition time on its structural and thermoelectric properties. The as-deposited film was analyzed through X-ray diffraction, SEM, Energy dispersive X-ray analysis, Raman spectroscopy and Seebeck coefficient measurement. The improvement of crystallinity of the PbSe films was studied using X-ray diffraction and Raman scattering. The structural parameters, such as the lattice constant (a), crystallite size (D), dislocation density (δ) and microstrain (ε) were evaluated from the XRD spectra. Average crystallite size was calculated from Scherrer׳s formula and it was found to be increased from 19.65 to 23.97 nm as the deposition time was varied from 3 h to 5 h. The dislocation density and microstrain were found to vary inversely with the crystallite size, whereas the lattice constant increases with an increase in crystallite size. SEM images show that the morphology of particles strongly depends on the deposition time. The possible growth mechanism for the variation in the morphology is discussed. The thermoelectric measurements have shown n-type conductivity in “as deposited films” and the magnitude of Seebeck coefficient is found to be increasing with an increase in deposition time.     

Template free titiania photoanodes modified with carbon black or multi-wall carbon nanotubes: Thermal treatment at low and high temperature for the fabrication of quasi-solid state dye sensitized solar cells

A simple procedure was developed to prepare modified titiania (TiO₂) photoanodes for dye sensitized solar cells at low and high temperature in order to improve overall cell efficiency. Modification of TiO₂ films achieved by the incorporation of either carbon black powder (CBP) or multi-wall carbon nanotubes (MWCNTs). A small quantity of titanium alkoxide was added in a dispersion of titiania (TiO₂) powder consisting of nanoparticles at room temperature, which after alkoxide׳s hydrolysis helps to the connection between titiania (TiO₂) particles and to the formation of mechanically stable relatively thick films on conductive glass substrates. The absence of surfactant allowed us to prepare films at relatively low temperature (~100 °C), while the effect of sintering at a higher temperature (500 °C) was also studied. The structural properties of the films were examined with porosimetry method and microscopy analysis. Better electrical results were obtained for the MWCNT (0.1 wt%) modified TiO₂ films, with 3.14% and 4.68% conversion efficiencies under 1 sun illumination after treatment at 100 °C and 500 °C, respectively. The enhancement in photocurrent for MWCNT-TiO₂ films compared to pure TiO₂ films is attributed to the improved interconnectivity between TiO₂ nanoparticles, which further improved the electron transport through the film. For carbon doped CBP-TiO₂ cells, lower efficiencies were observed compared to pure TiO₂.     

Preparation and characterization of conductive polypyrrole/kaolinite composites

Conductive polypyrrole (PPy)/kaolinite clay composites were prepared by in situ chemical polymerization of pyrrole in the presence of kaolinite using FeCl₃ as oxidant. The PPy content and conductivity of the composites reached 32.8% and 8.3×10^?2 S/cm at HCl concentrations of 1.5 M and 0.5 M, respectively. The microhardness of the composites containing different amounts of PPy was higher than that of the PPy and kaolinite components. The highest microhardness observed was 30.17 kg/mm² for the composite containing 9.6% PPy. The electrical resistance of the composites was monitored during heating–cooling cycles over the range 5–120 °C. The change in resistance with temperature was more repeatable for the composite than for PPy. The composites were characterized by Fourier-transform infrared spectroscopy (FTIR), X-ray diffraction (XRD), thermogravimetric analysis (TGA) and scanning electron microscopy (SEM). The humidity-sensing properties were also examined.     

Polypyrrole/reduced graphene oxide coated fabric electrodes for supercapacitor application

Flexible and wearable energy storage devices are strongly demanded to power smart textiles. Herein, reduced graphene oxide (RGO) and polypyrrole (PPy) were deposited on cotton fabric via thermal reduction of GO and chemical polymerization of pyrrole to prepare textile-based electrodes for supercapacitor application. The obtained PPy–RGO-fabric retained good flexibility of textile and was highly conductive, with the conductivity of 1.2 S cm⁻¹. The PPy–RGO-fabric supercapacitor showed a specific capacitance of 336 F g⁻¹ and an energy density of 21.1 Wh kg⁻¹ at a current density of 0.6 mA cm⁻². The RGO sheets served as conductor and framework under the PPy layer, which could facilitate electron transfer between RGO and PPy and restrict the swelling and shrinking of PPy, thus resulting in improved electrochemical properties respect to the PPy-fabric device.     

Characterization of solution processed,p-doped films using hole-only devices and organic field-effect transistors

We report a solution processed, p-doped film consisting of the organic materials 4,4′,4″-tris(3-methylphenylphenylamino)triphenylamine (MTDATA) as the electron donor and 2-(3-(adamantan-1-yl)propyl)-3,5,6-trifluorotetracyanoquinodimethane (F3TCNQ-Adl) as the electron acceptor. UV–vis–NIR absorption spectra identified the presence of a charge transfer complex between the donor and acceptor in the doped films. Field-effect transistors were used to characterize charge transport properties of the films, yielding mobility values. Upon doping, mobility increased and then slightly decreased while carrier concentration increased by two orders of magnitude, which in tandem leads to conductivity increasing from 4 × 10^?10 S/cm when undoped to 2 × 10^?7 S/cm at 30 mol% F3TCNQ-Adl. The hole density was calculated based on mobility values extracted from OFET data and conductivity values extracted from bulk I–V data for the MTDATA: x mol% F3TCNQ-Sdl films. These films were then shown to function as the hole injection/hole transport layer in a phosphorescent blue OLED.     

Effect of processing parameter on structural,optical and electrical properties of photovoltaic chalcogenide nanostructured RF magnetron sputtered thin absorbing films

The aim of this work was to develop high quality of CuIn_1−xGa_xSe₂ thin absorbing films with x (Ga/In+Ga)<0.3 by sputtering without selenization process. CuIn_0.8Ga_0.2Se₂ (CIGS) thin absorbing films were deposited on soda lime glass substrate by RF magnetron sputtering using single quaternary chalcogenide (CIGS) target. The effect of substrate temperature, sputtering power & working pressure on structural, morphological, optical and electrical properties of deposited films were studied. CIGS thin films were characterised by X-ray diffraction (XRD), Field emission scanning electron microscope (FE-SEM), Energy dispersive X-ray spectroscopy (EDAX), Atomic force microscopy (AFM), UV–vis–NIR spectroscopy and four probe methods. It was observed that microstructure, surface morphology, elemental composition, transmittance as well as conductivity of thin films were strongly dependent on deposition parameters. The optimum parameters for CIGS thin films were obtained at a power 100 W, pressure 5 mT and substrate temperature 500 °C. XRD revealed that thin film deposited at above said parameters was polycrystalline in nature with larger crystallite size (32 nm) and low dislocation density (0.97×10¹⁵ lines m⁻²). The deposited film also showed preferred orientation along (112) plane. The morphology of the film depicted by FE-SEM was compact and uniform without any micro cracks and pits. The deposited film exhibited good stoichiometry (Ga/In+Ga=0.19 and In/In+Ga=0.8) with desired Cu/In+Ga ratio (0.92), which is essential for high efficiency solar cells. Transmittance of deposited film was found to be very low (1.09%). The absorption coefficient of film was ~10⁵ cm⁻¹ for high energy photon. The band gap of CIGS thin film evaluated from transmission data was found to be 1.13 eV which is optimum for solar cell application. The electrical conductivity (7.87 Ω⁻¹ cm⁻¹) of deposited CIGS thin film at optimum parameters was also high enough for practical purpose.     

Photothermal study of RF-plasma polymerized hexamethyldisilazane thin films

Plasma polymerization by RF excited low pressure plasmas is a powerful technique for synthesizing thin films for a wide range of applications such in microelectronics, biomaterials and aeronautical industries. Among these applications plasma polymerized hexamethyldisilazane (HMDSN here in) is a promising material due its biocompatibility, optical and electrical properties. In the present paper, we reported the thermal diffusivity measurements of plasma polymerized HMDSN thin films using the probe beam deflection technique (PBD). The samples are thermally thin and optically transparent, with thicknesses ranging from 170 to 600 nm, difficulting their thermal characterization by other photo-thermal techniques (photoacoustic and pyroelectric). PBD measurements were carried out with a diode (20 mW, λ=640 nm) and a HeNe (0.9 mW, λ=632 nm) laser, used as pump source and probe beam, respectively. The probe beam was focused close to the sample surface and its direction was perpendicular to the pump beam. The transverse PBD in skimming configuration is employed and the deflection signal is analyzed using the phase method for the determination of thermal diffusivity. The results show the decreasing of thermal diffusivity with the decreasing of film thickness. HMDSN film׳s thermal diffusivity values are reported in this paper for the first time being in the range of typical polymeric samples.     

Effect of thickness on the structural,optical and electrical properties of RF magnetron sputtered GZO thin films

Gallium-doped zinc oxide (GZO) thin films with very high conductivity and transparency were successfully deposited by RF magnetron sputtering at a substrate temperature of 400 °C. The dependence of the film properties over the thickness was investigated. X-ray diffraction (XRD) results revealed the polycrystalline nature of the films with hexagonal wurtzite structure having preferential orientation along [001] direction normal to the substrate. The lowest resistivity obtained from electrical studies was 5.4×10⁻⁴ Ω cm. The optical properties were studied using a UV–vis spectrophotometer and the average transmittance in the visible region (400–700 nm) was found to be 92%, relative to the transmittance of a soda–lime glass reference for a GZO film of thickness 495 nm and also the transparency of the films decreases in the near IR region of the spectra. The mobility of the films showed a linear dependence with crystallite size. GZO film of thickness 495 nm with the highest figure of merit indicates that the GZO film is suitable as an ideal transparent conducting oxide (TCO) material for solar cell applications.     

The correlation of γ-irradiation,particle size and their effects on physical properties of AgInSe2 nanostructure thin films

In this work the effect of γ-irradiation on the optical and electrical properties of near stoichiometric AgInSe₂ nanostructure thin films have been characterized. The XRD pattern of ingot AgInSe₂ powder prepared by solid state reaction showed tetragonal polycrystalline single-phase structure. The thin films of thickness 75 nm were prepared by inert gas condensation (IGC) technique at using constant Ar flow and substrate temperature of 300 K.Thin films were exposed to annealing process at 473 K for 2 h in vacuum of 10⁻² Torr. The amorphous and tetragonal nanocrystalline structures were detected for as-deposited and annealed films respectively by grazing incident in-plane X-ray diffraction (GIIXD) technique. The structure and average particle size of annealed irradiated films by different γ-doses from 0 to 4 Mrad were determined using high resolution transmission electron microscope (HRTEM). Optical transmission, reflection and absorption spectra were studied for both annealed unirradiated and irradiated films. Two optical transitions for each annealed unirradiated and film exposed to γ-irradiation doses from 0 to 4 Mrad were observed. The evaluated E_g1 due to 1^st transition have decreased from 1.52 to 1.44 eV and E_g2 due to 2^nd transition have decreased from 2.83 to 2.30 eV as the particle size increased from 7.3 to 9.5 nm by raising the irradiation dose up to 1 Mrad. The behavior of d.c. electrical conductivity with temperature that measured under vacuum was examined for all films under investigation. The evaluated activation energies due to irradiation doses are ranging from 0.58 to 0.68 eV.     

Investigations on phosphorus doped amorphous/nanocrystalline silicon films deposited by a filtered cathodic vacuum arc technique in the presence of hydrogen gas

Phosphorus doped amorphous/nanocrystalline silicon (a-Si:H/nc-Si:H) thin films have been deposited by a filtered cathodic vacuum arc (FCVA) technique in the presence of hydrogen gas at different substrate temperatures (T_s) ranging from room temperature (RT) to 350 °C. The films have been characterized by using X-ray diffraction (XRD), Raman spectroscopy, Fourier transform infrared (FTIR) spectroscopy, dark conductivity (σ_D), activation energy (ΔE), optical band gap (E_g) and secondary ion mass spectroscopy. The XRD patterns show that RT grown film is amorphous in nature but high temperature (225 and 350 °C) deposited films exhibit nanocrystalline structure with (111) and (220) crystal orientations. The crystallite size of higher temperature grown silicon film evaluated was between 13 and 25 nm. Raman spectra reveal the amorphous nature of the film deposited at RT, whereas higher temperature deposited films show crystalline nature. The crystalline volume fraction of the silicon film deposited at higher temperatures (225 and 350 °C) was estimated to be 58 and 72%. With the increase of T_s, the bonding configuration changes from mono-hydride to di-hydride as revealed by the FTIR spectra. The values of σ_D, ΔE and E_g of silicon films deposited at different T_s were found to be in the range of 5.37×10⁻⁴–1.04 Ω⁻¹ cm⁻¹, 0.05–0.45 eV and 1.42–1.83 eV, respectively. Photoconduction of 3.5% has also been observed in n-type nc-Si:H films with the response and recovery times of 9 and 12 s, respectively. A n-type nc-Si:H/p-type c-Si heterojunction diode was fabricated which showed the diode quality factor between 1.6 and 1.8.     

Chemically deposited ZnS thin film as potential X-ray radiation sensor

In this article X-ray radiation sensitivity of ZnS thin film prepared by a chemical bath deposition technique has been reported. The films were prepared under 0.10, 0.15 and 0.20 molarity (M). Characterization reports show that the 0.20 M film has the best quality than the other low molarity films. I-V characteristics of the films were studied under dark condition and observed that the film prepared at 0.20 M has an electrical conductivity of 2.06×10⁻⁶ (Ω cm)⁻¹ which is about 10 times greater than the other lower molarity films. Further, the I-V characteristic of this film has studied under UV and X-ray radiations. The current under X-ray radiation is found to be significantly higher than that under the UV radiation. At a fix bias voltage of 1.0 V, the conductivity under UV radiation is found to be 3.26×10⁻⁶ (Ω cm)⁻¹ whereas that under the X-ray is 4.13×10⁻⁵ (Ω cm)⁻¹. The sensitivity under X-ray radiation is significantly greater than that under the UV radiation. This analysis suggests that the ZnS thin film which is used as a UV radiation sensor can also be used as a potential X-ray radiation sensor.     

Residual strain and electrical resistivity dependence of molybdenum films on DC plasma magnetron sputtering conditions

Sputter deposited molybdenum (Mo) thin films are used as back contact layer for Cu(In_1−xGa_x)(Se_1−yS_y)₂ based thin film solar cells. Desirable properties of Mo films include chemical and mechanical inertness during the deposition process, high conductivity, appropriate thermal expansion coefficient with contact layers and a low contact resistance with the absorber layer. Mo films were deposited over soda-lime glass substrates using DC-plasma magnetron sputtering technique. A 2³ full factorial design was made to investigate the effect of applied power, chamber pressure, and substrate temperature on structural, morphological, and electrical properties of the films. All the films were of submicron thickness with growth rates in the range of 34–82 nm/min and either voided columnar or dense growth morphology. Atomic force microscope studies revealed very smooth surface topography with average surface roughness values of upto 17 nm. X-ray diffraction studies indicated, all the films to be monocrystalline with (001) orientation and crystallite size in the range of 4.6–21 nm. The films exhibited varying degrees of compressive or tensile residual stresses when produced at low or high chamber pressure. Low pressure synthesis resulted in film buckling and cracking due to poor interfacial strength as characterized by failure during the tape test. Measurement of electrical resistivity for all the films yielded a minimum _value of 42 μΩ cm for Mo films deposited at 200 W DC power.     

Effects of tetramethylene sulfone solvent additives on conductivity of PEDOT:PSS film and performance of polymer photovoltaic cells

A solvent additive in PEDOT:PSS solution is one of many methods to improve the conductivity of the poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) films. We explore a new type of the solvent additive, namely tetramethylene sulfone (TMS), for the fabrication of the PEDOT:PSS conductive layer in the ITO/PEDOT:PSS/P3HT:PCBM/TiO_x/Al polymer photovoltaic cells, in comparison to a more common dimethyl sulfoxide (DMSO) solvent additive. At optimal conditions, the TMS additive at 10 wt.% has been found to enhance the conductivity of pristine PEDOT:PSS films from 0.04 S/cm up to approximately 189 S/cm, compared with the highest conductivity for the case of the DMSO additive at 15 wt.% of 117 S/cm. Possible mechanisms of this conductivity enhancement, relating to the polymer conformation and the film morphology, have been investigated by Raman spectroscopy, X-ray diffraction, atomic force microscopy, and transmission electron microscopy. The performance of the polymer photovoltaic cells fabricated with the solvent additives PEDOT:PSS films follows a similar trend to the conductivity of the films as a function of the additive concentration. The additives mainly lead to greater short circuit current density (J_sc) of the photovoltaic cells. The highest power conversion efficiency (PCE) of 2.24% of the device has been obtained with the 10 wt.% TMS additive of, compared to the PCE of 1.48% for the standard device without solvent additive.     

The effect of introducing Al ions in cationic deposition bath on as-prepared PbS thin film through SILAR deposition method

Undoped and Al doped lead sulfide (PbS) thin films were grown on soda lime glass substrates by Successive Ionic Layer Adsorption and Reaction (SILAR) deposition method. Al content in aqueous cationic solution was varied by adding 0.5–2% of aluminum nitrate in step of 0.5. The characterization of the film was carried out using X-ray diffraction, scanning electron microscopy, and optical and electrical measurement techniques. X-ray diffraction analysis revealed that both the undoped and doped films were polycrystalline and exhibited galena type cubic structure with average crystallite size in the range of 15.5–30.9 nm. The compositional analysis results indicated that Pb, S and Al were present in the samples. Optical studies revealed prominent blue-shift in the absorption edge of as-deposited samples upon doping as compared to that of bulk PbS and this shift was due to a quantum confinement effect. The room temperature conductivity of the PbS thin films was in the range of 1.343×10⁻⁷–1.009×10⁻⁶ (Ω cm)⁻¹for doped samples and 5.172×10⁻⁸ for undoped PbS thin film sample. The optical band gap energy has inverse relation with grain size and electrical conductivity is closely related to structural parameters like grain size, crystallinity and microstrain. The estimated lattice parameter, grain size, optical band gaps and electrical properties were correlated with Al concentration in the cationic solution.     

Ultraviolet-assisted annealing for low-temperature solution-processed p-type gallium tin oxide (GTO) transparent semiconductor thin films

Solution-processed p-type gallium tin oxide (GTO) transparent semiconductor thin films were prepared at a low temperature of 300 °C using ultraviolet (UV)-assisted annealing instead of conventional high-temperature annealing (> 500 °C). We report the effects of UV irradiation time on the structural, optical, and electrical properties of sol-gel derived GTO thin films and a comparison study of the physical properties of UV-assisted annealed (UVA) and conventional thermally annealed (CTA) GTO thin films. The Ga doping content was fixed at 15 at% in the precursor solution ([Ga]/[Sn]+[Ga] = 15%). After a spin-coating and preheating procedure was performed two times, the dried sol-gel films were heated on a hotplate at 300 °C under UV light irradiation for 1–4 h. Each UVA GTO thin film had a dense microstructure and flat free surface and exhibited an average optical transmittance approaching 85.0%. The level of crystallinity, crystallite size, and hole concentration density of the GTO thin films increased with increasing UV irradiation time. In this study, the UVA 4 h thin film samples exhibited the highest hole concentration (9.87 × 10¹⁷ cm⁻³) and the lowest resistivity (1.8 Ω cm) and had a hole mobility of 5.1 cm²/Vs.