共查询到19条相似文献,搜索用时 109 毫秒
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三酚基甲烷三缩水甘油醚是一种耐高温环氧树脂,具有良好的韧性和加工性能。这种树脂广泛用于高性能复合材料、封装材料等领域。主要研究以苯酚和对羟基苯甲醛为原料合成三酚基甲烷,再以三酚基甲烷与环氧氯丙烷(ECH)缩合制备三酚基甲烷三缩水甘油醚。通过不同反应条件的对比,得出制备优质三酚基甲烷三缩水甘油醚的最佳工艺条件。 相似文献
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电子束(EB)固化技术是1种热固性树脂固化成型新方法。与传统固化方法相比,具有高效,低成本,环保等优点。对环氧树脂电子束固化的特点、反应机理以及应用前景进行了综述。 相似文献
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采用间氯过氧苯甲酸(MCPBA)对腰果酚缩水甘油醚(CGE)侧链上的双键进行环氧化,制备了多环氧基腰果酚缩水甘油醚(PECGE)。研究了以三乙烯四胺为固化剂的PECGE改性双酚A型环氧树脂E-51胶粘剂的固化性能、粘接性能和热稳定性。结果表明:PECGE的改性,可延长环氧树脂胶粘剂的适用期、凝胶时间、硬化时间,并提高了室温固化度;PECGE的加入量为10份时,室温固化5d后室温和80℃的拉伸剪切强度分别提高了29.8%和79.4%,加热固化后室温和80℃的拉伸剪切强度分别提高了6.7%和17.1%;对应失重5%的温度值下降了8.5℃。 相似文献
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以邻氯对苯二酚、环氧氯丙烷为原料,四乙基溴化铵为相转移剂,在碱性条件下,合成邻氯对苯二酚二缩水甘油醚。最佳合成条件:n(环氧氯丙烷)∶n(邻氯对苯二酚)为18,x(催化剂)为1.0%,闭环反应4 h最高收率可达80.5%。通过傅里叶红外光谱仪和显微熔点测定仪对产物结构和熔点进行了表征,并计算出该产物与甲基四氢苯酐(Me–THPA)的固化体系的活化能。 相似文献
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以丙氧基化双酚A(D33)、环氧氯丙烷(ECH)和液碱为主要原料,采用两步法工艺合成了丙氧基化双酚A缩水甘油醚(DGEPBA)。考察了原料配比、催化剂用量、反应温度、反应时间等因素对反应的影响。结果表明:开环催化剂三氟化硼-乙醚(BF3-Et2O),质量分数0.1%,D33与ECH的质量比为1∶2.0,反应温度70℃,反应时间2.5h;闭环催化剂苄基三乙基氯化铵质量分数0.2%,D33与NaOH的质量比为1∶2.2,反应温度40℃,反应时间6h时,产物环氧值为0.291eq/100g,产率95.4%,黏度为1180mPa·s。通过FTIR和1H NMR对产物结构进行表征,并将不同质量分数的DEEBAPO掺入到E-51环氧树脂中,与二乙烯三胺(DETA)进行固化,并对其固化物力学性能进行测试。因为DGEPBA的掺入,使得E-51固化物在抗拉伸、抗冲击方面均有明显提高。热失重(TGA)分析表明固化物热稳定性稍有提高,扫描电镜(SEM)显示断裂面为韧性断裂。 相似文献
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电子束固化复合材料技术 总被引:1,自引:1,他引:0
简述了电子束(EB)固化复合材料的特点,介绍电子束固化机理,电子束固化树脂基体性能,复合材料试件及发动机壳体性能及电子束固化技术在航空航天复合材料其他领域的应用前景。 相似文献
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Virendra Kumar Yatendra Kumar Bhardwaj Sunil Sabharwal 《Progress in Organic Coatings》2006,55(4):316-323
Electron beam curing of bisphenol A diglycidyl ether diacrylate resin (BDGDA) mixed with varying amount of 1,6-hexanediol diacrylate monomer (HDDA) was investigated using low energy DC electron beam accelerator. Cured coating films were analyzed by Fourier transformed infrared spectroscopy (FTIR), gel fraction, swelling ratio and thermogravimetric (TG) techniques. The wood surfaces cured with different coating compositions were tested for their end use performance properties like gloss, pencil hardness, scratch resistance, mar resistance, abrasion resistance, chemical resistance, steam resistance and cigarette burn resistance. FTIR studies indicated that the density of acrylate functionality and degree of curing increased with the HDDA content in the feed mixture. This observation was supported by gel fraction and swelling studies as well. The thermal stability, pencil hardness, mar resistance, abrasion resistance and solvent resistance properties of coating were observed to improve with the incorporation of HDDA. However, there was significant decrease in gloss and scratch resistance at higher HDDA content. The coating showed excellent steam and stain resistance but poor resistance to cigarette burns. 相似文献
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Temperature measurements have been performed in the process of electron‐beam curing of EB‐I and EB‐II epoxy resin systems. The influence of initiator content, resin type, and dose rate on the temperature of the systems was studied. Transverse and longitudinal temperatures of samples in the glass vessel were also analyzed. The nature of temperature curves varied with the different epoxy resin systems in the steel mold, but did not change with different contents of the initiator. At the same time, the heat had no effect on the gel fraction of epoxy resin systems. The temperature curve was greatly affected by the dose rate, and its peak value, peak width, and plateau value also increased with it. The transverse temperature of EB‐II glass vessel samples increased as the radiation dose increased and, in the same sample, the temperature reduced as the distance between the radiation center and the test point increased. The longitudinal temperature of EB‐I and EB‐II resin systems in a glass vessel decreased as the radiation depth increased. As the radiation dose increased, the temperature of the EB‐I resin system increased simultaneously, while that of the EB‐II resin system initially increased and then kept constant when the dose reached a certain value. The temperatures of these two resin systems decreased rapidly when the radiation process stopped. © 2004 Wiley Periodicals, Inc. J Appl Polym Sci 94: 2217–2222, 2004 相似文献
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The morphology and aggregation structure of electron beam (EB)-cured microporous polyurethane-acrylamide film was investigated. The urethane-acrylamide prepolymer was synthesized by the reaction of poly(butylene adipate)diol, 4,4′-diphenylmethane diisocyanate, and N-(hydroxymethyl)acrylamide. It was found from scanning electron microscopy that the urethane-acrylamide film, which was prepared by using a methyl ethyl ketone and dimethylformamide (3:1 v/v) mixture as casting solvent, had a microporous structure with pore size of several micrometres, and that the morphology was fixed by EB irradiation. The pore volume of the EB-cured microporous film was determined to be about 460 mm3 g−1 by mercury porosimetry. The micropores were not destroyed even after immersing in solvent, possibly because the cured film had high crystallinity and dense crosslinking. Moreover, it was found by X-ray photoelectron spectroscopy that terminal portions of urethane-acrylamide were localized at the film surface. 相似文献
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A dilute aqueous solution of the temperature-sensitive polymer, poly(vinyl methyl ether) (PVME), was irradiated by a pulsed electron beam in a closed-loop system. At temperatures, below the lower critical solution temperature (LCST), intramolecular crosslinked macromolecules, nanogels, were formed. With increasing radiation dose D the molecular weights Mw increase, whereas the dimensions (radius of gyration Rg, hydrodynamic radius Rh) of the formed nanogels decrease. The structure of the PVME nanogels was analyzed by field emission scanning electron microscopy (FESEM) and globular structures with d=(10-30) nm were observed. The phase-transition temperature of the nanogels, as determined by cloud point measurements, decreases from Tcr=36 °C (non-irradiated polymer) to Tcr=29 °C (cp=12.5 mM, D=15 kGy), because of the formation of additional crosslinks and an increase in molecular weights. The same behavior was observed for a pre-irradiated PVME (γ-irradiation) with higher molecular weight due to intermolecular crosslinks. After pulsed electron beam irradiation the molecular weight again slightly increases whereas the dimension decreases. Above D=1 kGy the calculated ρ-parameter (ρ=Rg/Rh) is in the range of ρ=0.5-0.6 that corresponds to freely draining globular structures. 相似文献
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将均苯四甲酸二酐与环氧树脂溶于丙酮中,在一定的温度条件下反应,制备了均一的、有一定固化程度的环氧树脂溶液,该溶液可在常温固化。傅里叶变换红外光谱分析表明,所得产物与预期结构相同,最佳反应时间为6 h。采用差示扫描量热法研究其固化工艺,不同升温速率下,体系的固化温度不同,随升温速率增加,固化温度提升,通过动力学计算得到其固化工艺为100℃固化2 h,150℃固化2 h,后处理180℃固化2 h,按此工艺固化的环氧树脂的耐热性能优于常温固化,起始分解温度达到368℃。 相似文献
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Stanley Affrossman Massoud Bakshaee David Bramley Fong Chow Christopher Dix Paul Hendy Mervyn Jones Anthony Ledwith Margaret Mills Phillip Miller Tate Richard A. Pethrick 《Polymer International》1992,28(3):209-217
Synthesis and lithographic characterization of a series of negative acting electron sensitive resists based on poly(4-methylstyrene-co-chloromethylstyrene) are reported. The sensitivity and contrast of these resists were found to depend on the chloromethylstyrene (CMS) content and an optimum value of 5 wt% was determined from consideration of parameters associated with the reproducibility of the synthetic method and also the lithographic performance. Both the sensitivity and resolution were found to depend on the molecular weight and CMS content of the copolymer. Several methods of scale up for the synthesis were explored, the route having a very significant influence on the film formation characteristics of the resists. The reactivity ratios of the monomers were measured in order that the compositional drift, which occurs during the synthesis, could be quantified. The effect of solvent composition and molecular weight of the copolymer were explored in relation to the quality of the resulting lithography. These studies have indicated that the copolymer has the potential of being used as a VLSI sub-micron resist with good plasma etch resistance. 相似文献