Emission cross sections and spectroscopy of Ho3+ laserchannels in KGd(WO4)2 single crystal

The spectroscopic properties of Ho³⁺ laser channels in KGd(WO₄)₂ crystals have been investigated using optical absorption, photoluminescence, and lifetime measurements. The radiative lifetimes of Ho³⁺ have been calculated through a Judd-Ofelt (JO) formalism using 300-K optical absorption results. The JO parameters obtained were Ω₂=15.35×10^-20 cm², Ω ₄=3.79×10^-20 cm², Ω₆ =1.69×10^-20 cm². The 7-300-K lifetimes obtained in diluted (8·10¹⁸ cm^-3) KGW:0.1% Ho samples are: τ(⁵F₃)≈0.9 μs, τ( ⁵S₂)=19-3.6 μs, and τ(⁵F₅ )≈1.1 μs. For Ho concentrations below 1.5×10²⁰ cm^-3, multiphonon emission is the main source of non radiative losses, and the temperature independent multiphonon probability in KGW is found to follow the energy gap law τ_ph ^-1(0)=βexp(-αΔE), where β=1.4×10^-7 s^-1, and α=1.4×10³ cm. Above this holmium concentration, energy transfer between Ho impurities also contributes to the losses. The spectral distributions of the Ho³⁺ emission cross section σ_EM for several laser channels are calculated in σ- and π-polarized configurations. The peak a σ_EM values achieved for transitions to the ⁵I₈ level are ≈2×10^-20 cm² in the σ-polarized configuration, and three main lasing peaks at 2.02, 2.05, and 2.07 μm are envisaged inside the ⁵I₇→⁵I₈ channel     

Carrier-dependent nonlinearities and modulation in an InGaAs SQWwaveguide

The authors report measurements of optically induced carrier-dependent refractive index changes and their saturation in an InGaAs single quantum well centered within a linear multiple quantum well guided-wave Fabry-Perot resonator using diode laser sources. A low-excitation nonlinear refractive cross-section, σ_n=-1×10^-19 cm³, was deduced for probe wavelengths near the TM (transverse magnetic) absorption edge, falling only to σ_n=-3.1×10^-20 cm³, at over 0.16 μm from the band edge. For an incident irradiance of 18 kW/cm ², refractive index changes in the InGaAs quantum well as large as -0.16 were deduced near the absorption edge, while the index change at a wavelength 0.16 μm from the absorption edge was -0.055. This large off-resonant index change is attributed to an enhanced free-carrier contribution within a 2D system     

Studies of yttrium oxide films prepared by RF magnetron sputtering

Films of yttrium oxide (Y₂O₃) were deposited on Si substrates from a Y₂O₃ target by RF magnetron sputtering. MIS capacitors in the form of Al and Y₂O₃ (400 Å)-Si were then fabricated. The leakage current density was about 10^-6 A/cm² at 1.3×10⁶ V/cm, and the breakdown field of the films was about 2.75×10⁶ V/cm. The dielectric constant of the sputtered Y₂O₃ was found to be about 12-12.7     

Low-resistance bandgap-engineeredW/Si1-xGex/Si contacts

Bandgap-engineered W/Si_1-xGe_x/Si junctions (p⁺ and n⁺) with ultra-low contact resistivity and low leakage have been fabricated and characterized. The junctions are formed via outdiffusion from a selectively deposited Si_0.7Ge _0.3 layer which is implanted and annealed using RTA. The Si _1-xGe_x layer can then be selectively thinned using NH₄OH/H₂O₂/H₂O at 75°C with little change in characteristics or left as-deposited. Leakage currents were better than 1.6×10^-9 A/cm² (areal), 7.45×10^-12 A/cm (peripheral) for p⁺/n and 3.5×10^-10 A/cm² (peripheral) for n⁺/p. W contacts were formed using selective LPCVD on Si_1-xGe_x. A specific contact resistivity of better than 3.2×10^-8 Ω cm² for p ⁺/n and 2.2×10^-8 Ω cm² for n⁺/p is demonstrated-an order of magnitude n⁺ better than current TiSi₂ technology. W/Si_1-xGe _x/Si junctions show great potential for ULSI applications     

Bi1.5Zn1.0 Nb1.5O7栅绝缘层的SiO2修饰对ZnO-TFTs性能的影响

具有高介电常数的栅绝缘层材料存在某种极化及耦合作用,使得ZnO-TFTs具有高的界面费米能级钉扎效应、大的电容耦合效应和低的载流子迁移率.为了解决这些问题,本文提出了一种使用SiO₂修饰的Bi_1.5Zn_1.0Nb_1.5O₇作为栅绝缘层的ZnO-TFTs结构,分析了SiO₂修饰对栅绝缘层和ZnO-TFTs性能的影响.结果表明,使用SiO₂修饰后,栅绝缘层和ZnO-TFTs的性能得到显著提高,使得ZnO-TFTs在下一代显示领域中具有非常广泛的应用前景.栅绝缘层的漏电流密度从4.5×10^-5A/cm²降低到7.7×10^-7A/cm²,粗糙度从4.52nm降低到3.74nm,ZnO-TFTs的亚阈值摆幅从10V/dec降低到2.81V/dec,界面态密度从8×10¹³cm^-2降低到9×10¹²cm^-2,迁移率从0.001cm²/（V·s）升高到0.159cm²/（V·s）.     

Fabrication and characterization of metal-oxide-semiconductorfield-effect transistors and gated diodes using Ta2O5 gate oxide

N-channel metal oxide semiconductor field effect transistors (MOSFETs) using Ta₂O₅, gate oxide were fabricated. The Ta₂O₅ films were deposited by plasma enhanced chemical vapor deposition. The I_DS-V_DS and I_DS-V_GS characteristics mere measured. The electron mobility was 333 cm²/V·s. The subthreshold swing was 73 mV/dec. The interface trapped charge density, the surface recombination velocity, and the minority carrier lifetime in the field-induced depletion region measured from gated diodes were 9.5×10¹² cm^-2 eV^-1, 780 cm/s and 3×10^-6 sec, respectively. A comparison with conventional MOSFETs using SiO₂ gate oxide was made     

Optical absorption and stimulated emission of neodymium in yttriumorthosilicate

A spectroscopic investigation of the biaxial crystal yttrium orthosilicate doped with Nd³⁺(Nd³⁺:Y₂SiO₅) has been performed. Spectrally and orientationally resolved emission cross sections necessary for the evaluation of laser performance on the Nd^{3+ 4}F_3/2-⁴I _9/2 and ⁴F_3/2-⁴I_11/2 transitions have been determined. The Judd-Ofelt theory has been applied to measured values of optical absorption line strengths to obtain the orientation averaged intensity parameters: Ω₂-3.34×10^-20 cm², Ω ₄=4.35×10^-20 cm², and Ω₆=5.60×10^-20 cm². These Judd-Ofelt intensity parameter values are significantly different from those previously reported by A.M. Tkachuk et al. Using these intensity parameters, the Nd^{3+ 4}F₂ metastable state lifetime is predicted to be 225 μs. Measured low Nd concentration ⁴F_3/2 lifetimes of 214 μs indicate a high radiative quantum efficiency. Because of the Stark level splitting of the Nd^{3+ 4}F_3/2 and ⁴I_9/2 manifolds, laser operation at twice one of the Cs atomic resonance filter acceptance wavelengths is possible     

Increasing the current density of dielectric-base transistors withan MgO emitter-base barrier

We measured the current-voltage characteristics of YBa₂Cu₃O_7-x/oxide/n-SrTiO₃ diodes using NdGaO₃, LaAlO₃, CeO₂, and MgO as the oxide. MgO films had the highest current density. We then fabricated dielectric-base transistors with a YBa₂Cu₃ O_7-x(YBCO) emitter/collector on a SrTiO₃ dielectric base with an MgO barrier. The transistors had both voltage and current gains exceeding unity at 4.2 K. The emitter current density was about 4×10³ A/cm² at a collector-emitter voltage of 10 V and base-emitter voltage 10 V; this is 2 to 3 orders of magnitude larger than that of transistors with NdGaO₃ emitter-base barrier. We obtained a transconductance of around 0.4 mS at a collector-emitter voltage of 10 V for a device with a 6-μm-diameter emitter     

Large purely refractive nonlinear index of single crystal P-toluenesulphonate (PTS) at 1600 nm

Z-scan measurements at 1600 nm on single-crystal PTS (p-toluene sulfonate) with single, 65 ps pulses gave a complex nonlinear refractive index coefficient of n₂=2.2(±0.3)×10^-12 cm²/W at 1 GW/cm² and α₂<0.5 cm/GW. This is the first highly nonlinear, organic material to satisfy the conditions imposed by the figures of merit     

Tunable Cr4+:YSO Q-switched Cr:LiCAF laser

Tunable passive Q-switching (781 nm to 806 nm at 300 K) of a flash-lamp pumped Cr³⁺:LiCaAlF₆ (Cr:LiCAF) laser with a Cr⁴⁺:Y₂SiO₅ (Cr⁴⁺:YSO) broad-band solid-state saturable absorber has been realized. Typical pulse widths of the Q-switched laser output ranged from 40 ns to 80 ns, depending on the lasing wavelength. Spectral narrowing and reduced beam diameter with the use of the saturable absorber were observed. The ground state and the excited state absorption cross sections of the Cr⁴⁺:YSO absorber were found by bleaching experiments to be (7.0±1.4)×10^-19 cm² and (2.3±0.5)×10^-19 cm² at 694 nm, respectively. Numerical simulation was utilized to simulate the Cr:LiCAF passive Q-switching with Cr⁴⁺ :YSO solid-state saturable absorber     

Excited-state absorption studies of Cr4+ ions in severalgarnet host crystals

An experimental study of saturable absorption and excited-state absorption (ESA) in several inorganic saturable absorbers, Cr⁴⁺ :YAG, Cr⁴⁺:GGG, and Cr⁴⁺:YSGG, is presented. We provide the theoretical background of absorption characteristics in saturable absorbers that exhibit ESA, with some new results: approximate analytical solutions are proposed for the optical transmission in the case of a slow absorber, and for various light intensity conditions of spatially or temporally Gaussian beams in fast and slow absorbers. Experimentally, partial bleaching of the first excited state itself could be observed in Cr⁴⁺:YAG at λ=1064 nm, yielding the higher excited-state lifetime as τ*=(0.55±0.1) ns. The regular transmission bleaching curve was measured in Cr⁴⁺:GGG, for the first time in this material, yielding σ_ga=(58±5)×10^-1 cm², and σe_s=(13±2)×10^-19 cm² at λ=1064 nm, ESA spectra were measured for the three materials between ~700 and 900 nm. All three exhibit crossing between saturable absorption at longer wavelengths and inverse saturable absorption at shorter wavelengths     

Measurement of the stimulated emission cross section for the 4F3/2-4I13/2transition of Nd3+ in YAlO3 crystal

A method for the simultaneous measurement of the stimulated emission cross section and fluorescence lifetime by studying the relation between laser parameters and the laser relaxation oscillation frequency is discussed. The stimulated emission cross section for the ⁴F_3/2-⁴I_13/2 transition of Nd³⁺ ion in YAP crystal was measured to be (22±1)×10^-20 cm²     

Steady-state and transient forward current-voltage characteristicsof 4H-silicon carbide 5.5 kV diodes at high and superhigh currentdensities

Steady-state and transient forward current-voltage I-V characteristics have been measured in 5.5 kV p⁺-n-n⁺ 4H-SiC rectifier diodes up to a current density j≈5.5×10 ⁴ A/cm². The steady-state data are compared with calculations in the framework of a model, in which the emitter injection coefficient decreases with increasing current density. To compare correctly the experimental and theoretical results, the lifetime of minority carriers for high injection level, τ_ph, has been estimated from transient characteristics. At low injection level, the hole diffusion length L_pl has been measured by photoresponse technique. For a low-doped n-base, the hole diffusion lengths are L_pl≈2 μm and L_ph≈6-10 μm at low and high injection levels respectively. Hole lifetimes for low and high injection levels are τ_pl≈15 ns and τ_ph≈140-400 ns. The calculated and experimental results agree well within the wide range of current densities 10 A/cm ²3 A/cm². At j>5 kA/cm², the experimental values of residual voltage drop V is lower than the calculated ones. In the range of current densities 5×10³ A/cm²4 A/cm², the minimal value of differential resistance R_d =dV/dj is 1.5×10^-4 Ω cm². At j>25 kA/cm², R_d increases with increasing current density manifesting the contribution of other nonlinear mechanisms to the formation steady-state current-voltage characteristic. The possible role of Auger recombination is also discussed     

Mechanism for the thermal dependence of the Cr to Nd energytransfer in garnets

The temperature dependence of the Cr-Nd energy transfer is found to be due to the thermal variation of the radiative decay probability of Cr. The validity of this conjecture is checked in the Gd₃Sc ₂Ga₃O₁₂ and CaMg₂Y₂ Ge₃O₁₂ crystals. It is also found that above 200 K, the nonradiative energy transfer rate from Cr to Nd is greater in Gd₃Sc₂Ga₃O₁₂ than in CaMg ₂Y₂Ge₃O₁₂     

Carrier-induced change in refractive index of InP, GaAs and InGaAsP

The change in refractive index Δn produced by injection of free carriers in InP, GaAs, and InGaAsP is theoretically estimated. Bandfilling (Burstein-Moss effect), bandgap shrinkage, and free-carrier absorption (plasma effect) are included. Carrier concentrations of 10¹⁶/cm³ to 10¹⁹/cm ³ and photon energies of 0.8 to 2.0 eV are considered. Predictions for Δn are in reasonably good agreement with the limited experimental data available. Refractive index changes as large as 10^-2 are predicted for carrier concentrations of 10 ⁸/cm³ suggested that low-loss optical phase modulators and switches using carrier injection are feasible in these materials     

Two-photon absorption coefficients of several liquids at 264 nm

The nonlinear absorption of water (H₂O), heavy water (D ₂O), ethanol, methanol, hexane, cyclohexane, 1, 2-dichloroethane, and chloroform at 264 nm was studied using femtosecond laser pulses. The two-photon absorption coefficients for these liquids were found to be between (34 ± 3) × 10^-11 cm/W and (95 ± 11) × 10^-11 cm/W     

Carrier transport related analysis of high-power AlGaN/GaN HEMTstructures

Shubnikov-de Haas (SdH) oscillation and Hall measurement results were compared with HEMT DC and RF characteristics for two different MOCVD grown AlGaN-GaN HEMT structures on semiinsulating 4H-SiC substrates. A HEMT with a 40-nm, highly doped AlGaN cap layer exhibited an electron mobility of 1500 cm²/V/s and a sheet concentration of 9×10¹² cm at 300 K (7900 cm²/V/s and 8×10¹² cm^-2 at 80 K), but showed a high threshold voltage and high DC output conductance. A 27-nm AlGaN cap with a thinner, lightly doped donor layer yielded similar Hall values, but lower threshold voltage and output conductance and demonstrated a high CW power density of 6.9 W/mm at 10 GHz. The 2DEG of this improved structure had a sheet concentration of n_SdH=7.8×10¹² cm^-2 and a high quantum scattering lifetime of τ_q=1.5×10^-13 s at 4.2 K compared to n_SdH=8.24×10¹² cm^-2 and τ_q=1.72×10^-13 s for the thick AlGaN cap layer structure, Despite the excellent characteristics of the films, the SdH oscillations still indicate a slight parallel conduction and a weak localization of electrons. These results indicate that good channel quality and high sheet carrier density are not the only HEMT attributes required for good transistor performance     

Cr4+:YAG as passive Q-switch and Brewster plate in apulsed Nd:YAG laser

We demonstrate the performance of a Nd:YAG laser, passively Q-switched with a Cr⁴⁺:YAG plate, which plays the double role of a passive Q-switch and a Brewster plate. The Brewster plate configuration contributes an intracavity loss of approximately 3.2-10 ^-3 cm^-1 along the cavity length. Losses contributed by the active Cr⁴⁺ ions in the plate relate to their excited state absorption. A freshly measured transmission saturation curve of Cr⁴⁺:YAG suggests a ground state absorption cross section σ_gs=(8.7±0.8)-10^-19 cm², and an excited state absorption cross section σ_es=(2.2±0.2)-10^-19 cm² of the Cr⁴⁺ ions at λ=1064 nm     

Yttrium oxide/silicon dioxide: a new dielectric structure forVLSI/ULSI circuits

Electrical characteristics of Al/yttrium oxide (~260 Å)/silicon dioxide (~40 Å)/Si and Al/yttrium oxide (~260 Å)/Si structures are described. The Al/Y₂O₃/SiO₂/Si (MYOS) and Al/Y₂ O₃/Si (MYS) capacitors show very well-behaved I-V characteristics with leakage current density <10^-10 A/cm² at 5 V. High-frequency C- V and quasistatic C-V characteristics show very little hysteresis for bias ramp rate ranging from 10 to 100 mV/s. The average interface charge density (Q_f+Q _it) is ~6×10¹¹/cm² and interface state density D_it is ~10¹¹ cm^-2-eV^-1 near the middle of the bandgap of silicon. The accumulation capacitance of this dielectric does not show an appreciable frequency dependence for frequencies varying from 10 kHz to 10 MHz. These electrical characteristics and dielectric constant of ~17-20 for yttrium oxide on SiO₂/Si make it a variable dielectric for DRAM storage capacitors and for decoupling capacitors for on-chip and off-chip applications     

Theoretical high-efficiency extraction study of a short-pulseelectron-beam-pumped ArF laser amplifier with atmospheric pressureAr-rich mixtures

The single-pass (50 cm) amplifier performance of an atmospheric-pressure ArF laser pumped by a 65-ns full-width-at-half-maximum short-pulse electron beam was investigated theoretically for a wide range of excitation rates (0.1-2.0 MW/cm³ ). Atmospheric mixtures of Ne, Ar, and F₂ (three mixtures of Ar=40%, 70%, and Ne-free) were studied. A kinetic numerical model of the ArF amplifier with a Ne buffer system was constructed. A one-dimensional propagation treatment considered the gain depletion and saturation absorption spatially and temporally along the optical axis. In this model the rate constants for electron quenching of ArF* of 1.6×10^-7, 1.9×10^-7, and 2.4×10 ^-7 cm³/s were used for Ar concentration of 40, 70 percent, and Ar/F₂ mixture, respectively