膜层厚度对Ag/TiO膜透光隔热性能的影响

采用磁控溅射工艺制备了玻璃基Ag/TiO_2膜,并研究了膜层厚度对其透光隔热性能的影响。结果表明:当Ag膜厚度由6.7 nm增加到9.5 nm时,红外光的平均透过率由42.06%减小到7.70%,隔热温差由1.9℃增大到5.7℃,而可见光的平均透过率则呈现出先增加后减少的变化趋势,当Ag膜厚度为7.7 nm时,复合膜的可见光平均透过率达最大值,为70.85%;当Ti O_2膜厚度由4.1 nm增加到16.7 nm时,红外光的平均透过率由34.12%增大到38.28%,而可见光的平均透过率与隔热温差均呈现出先增大后减少的变化趋势,当Ti O_2膜厚度为10.4 nm时,复合膜的可见光平均透过率达最大值,为70.85%,而厚度为13.6 nm时,膜的隔热温差达最大值,为5.2℃。     

不同厚度分层沉积对多层NiFeCo/Ag薄膜GMR效应的影响

用射频磁控溅射法制备了调制周期分别为5 nm、10 nm、15 nm、20 nm的NiFeCo/Ag非连续多层膜.用俄歇能谱仪测量薄膜的成分,用原子力显微镜观测NiFeCo膜层及Ag膜层的表面形貌,用四探针法测量了溅射态的及在280℃、360℃、400℃退火后的多层膜的GMR值.结果表明:薄膜厚度越大,NiFeCo膜层及Ag膜层的表面粗糙度越大.在经各种不同温度退火后,具有[NiFeCo(10nm)/Ag(10nm)]×20结构的多层膜的GMR效应均比其它结构的多层膜的GMR效应强.退火温度也会影响多层膜的GMR值.经360℃退火后,在79.6 kA/m的外加饱和场下[NiFeCo(10nm)/Ag(10nm)]×20呈现出最强的巨磁电阻效应,其GMR值达到11%.     

不同调制周期的TiSiN/TaVN纳米多层膜的结构及性能

为了探究调制周期对TiSiN/TaVN纳米多层膜性能的影响,使用磁控溅射仪在304不锈钢和硅片上沉积TiSiN/TaVN纳米多层膜,采用X射线衍射仪、扫描电镜、纳米压痕仪、划痕仪、表面性能综合测试仪等分析和探索不同调制周期的TiSiN/TaVN纳米多层膜的微观结构、力学性能和摩擦学性能。结果表明：TiSiN/TaVN纳米多层膜均为面心立方结构,在(111)晶面和(200)晶面呈现择优取向。随着调制周期的增大,TiSiN/TaVN纳米多层膜的硬度、弹性模量、膜基结合力等先增大后减小,摩擦系数先减小后增大。当调制周期为8 nm时,TiSiN/TaVN纳米多层膜具有优异的力学性能和摩擦学性能,硬度最高为28.79 GPa,弹性模量最大为301 GPa,膜基结合力最高为29.2 N。薄膜硬度强化的主要原因是固溶强化和交变应力场。当调制周期为8 nm时,TiSiN/TaVN纳米多层膜的摩擦系数最小值为0.14,磨损机理主要为磨粒磨损和氧化磨损。TiSiN/TaVN纳米多层膜摩擦学性能改善的主要原因之一是摩擦过程中V元素与氧气反应形成了具有自润滑性能的Magnéli相氧化物V₂     

TiAlN/VN纳米多层膜的微结构与力学和摩擦学性能

采用反应磁控溅射制备了TiAlN/VN纳米多层膜, 并使用X射线衍射分析(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、纳米压痕仪和多功能摩擦磨损试验机对多层膜的微结构与力学和摩擦学性能进行了表征和分析。研究结果表明: 不同调制周期的TiAlN/VN多层膜均呈典型的柱状晶生长结构, 插入VN层并没有打断TiAlN涂层柱状晶的生长。在一定调制周期下, TiAlN/VN纳米多层膜中的TiAlN和VN层之间能够形成共格生长结构, 其硬度和弹性模量相比于TiAlN单层膜均有显著提升, 其中, TiAlN (10 nm)/VN (10 nm)的硬度和弹性模量最大增量分别达到39.3%和40.9%。TiAlN/VN纳米多层膜的强化主要与其共格界面生长结构有关。另外, TiAlN单层膜的摩擦系数较高(~0.9), 通过周期性地插入摩擦系数较低的VN层能够使得TiAlN的摩擦系数大大降低, TiAlN/VN纳米多层膜的摩擦系数最低为0.4。     

以W为中间层的C/W多层膜的微观结构及性能研究

利用非平衡磁控溅射技术在钢基体上制备以W为中间层的C/W多层膜,使用扫描电子显微镜(SEM)、X射线衍射仪(XRD)和透射电子显微镜(TEM)对镀层的表面形貌,相组成及截面微观结构进行分析;测试镀层的膜基结合强度和摩擦性能.结果表明:C/W多层膜是由非晶碳和WC纳米晶组成的复合镀层,具有明显的层状结构,周期厚度为6.5...     

TiO2膜层制备参数对Ag/TiO2复合膜隔热性能的影响

采用磁控溅射工艺制备玻璃基Ag/TiO_2复合膜,研究TiO_2膜的射频功率、溅射时间、氩气流量和本底真空度4个制备参数对复合膜隔热性能的影响。结果表明:复合膜的隔热温差随着射频功率、溅射时间、氩气流量、本底真空度的增加均呈现先增大后减少的变化趋势;4个制备参数对复合膜隔热温差的影响程度由大到小的顺序依次为本底真空度、溅射时间、射频功率、氩气流量;4个制备参数的较优组合为本底真空度4×10~(-3) Pa,射频功率150 W,溅射时间15 min,氩气流量20 m L/min。     

多层膜中亚稳结构铁的形成及其磁学性能

报道了作近年来在纳米多层膜中亚稳结构铁相形成及其磁学行为的研究结果,实验结果表明,已在七个多层膜系统中获得三种亚稳结构的铁相,它们分别具有耐心 立方、非晶和菱方结构,这三种亚稳相均表现出铁磁性行为,在Ｆｅ／Ｃｕ和Ｆｅ／Ｐｄ多层膜中的面心立方结构铁的磁矩显增强,面心立方结构铁的磁矩随共点阵参数的增大而减小。具有菱方结构的铁亦具有相当高的磁矩（１．５２μＢ）。而具有非晶结构的铁相磁矩相对较低,一般     

WC/DLC纳米多层膜微观结构研究

阳极层流型气体离子源与非平衡磁控溅射复合技术沉积制备WC/DLC纳米多层膜,并在膜/基间设计了中间过渡层.用扫描电镜、拉曼光谱仪、光电子能谱仪、X衍射仪、透射电镜、干涉显微镜等,对WC/DLC纳米多层膜的微观形貌结构进行分析研究.结果表明:沉积的WC/DLC膜层表面致密、光滑细腻;多层调制周期在3～4 nn,多层界面不清晰,形成渐变过渡界面.WC/DLC膜中主要是sp2键中掺杂有一定量的sp3键,WC则以纳米晶结构弥散分布在DLC之中.     

Cr层厚度对Pd/Cr/Co多层膜光学性质的影响

本文利用磁控溅射的方法生长不同Cr插层厚度的Pd/Cr/Co多层膜,并利用椭偏仪对多层膜的光学常数进行测量.得到了入射光波长在250nm-850nm范围内多层膜的折射率、反射率、吸收系数以及复介电常数的曲线,在此数据的基础上分析了Cr插层厚度对多层膜光学参数的影响.     

磁控溅射TiN/Cu-Zn纳米多层膜腐蚀和抗菌性能研究

采用双靶磁控溅射的方法在不锈钢表面沉积了TiN/Cu-Zn纳米多层膜,研究了多层结构对膜层耐腐蚀性能和抗菌性能的影响,以及表面腐蚀与抗菌的关系。结果表明,Cu-Zn层比较薄时,膜层的耐腐蚀性能比较好,随着Cu-Zn层厚度的增加耐腐蚀性能显著下降。Cu-Zn层薄时,膜层抗菌性能对TiN层厚度较为敏感;而当Cu-Zn层较厚时,抗菌性能对TiN层厚度不敏感,均具有较好的抗菌性能。存在合适的多层结构,如TiN层厚度为3.3~5nm左右,Cu-Zn层厚度约为4nm时,使得膜层具有良好的抗菌性能和耐腐蚀性能。     

Ag层厚度对AZO/Ag/AZO透明导电薄膜性能的影响

在室温条件下,采用磁控溅射技术在玻璃衬底上生长了AZO/Ag/AZO多层透明导电薄膜。主要研究了Ag层厚度对多层透明导电薄膜结构和性能的影响。研究表明,AZO和Ag分别延(002)面和(111)面高度择优生长,随着Ag层厚度的增加,多层透明导电薄膜的电阻率不断降低,透过率呈现先降低再增加最后再降低的变化趋势,其中Ag层厚度为8nm的样品获得最大品质因子33.1×10^-3Ω^-1,综合性能最佳。     

Microstructure,Magnetic and Magnetoresistance Properties of Electrodeposited [Fe/Pt] Granular Multilayers

In this paper, we report experimental results concerning the magnetic properties and the magnetoresistance effect of [Fe/Pt] _n and [Pt/Fe] _n electrodeposited multilayers. Two series of multilayers starting with Pt and Fe layers, respectively, were grown onto glass substrate covered with electroless deposited amorphous Ni. We investigated the effect of the seed layer (Pt or Fe) and Pt layer thicknesses on the magnetic and magnetoresistance properties of electrodeposited multilayers. The structure and morphology of the samples were characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). The hysteresis loops of the [Fe/Pt] _n and [Pt/Fe] _n multilayers showed that the magnetic properties strongly depend on the Pt thickness and on the seed layer (the first layer deposited onto the glass substrate). [Fe/Pt] _n and [Pt/Fe] _n electrodeposited multilayers display magnetoresistance (∼15%) effect which can be explained mainly by the spin-dependent scattering of conduction electrons between Fe layers through a Pt layer and by the existence of anti-ferromagnetic coupling between subsequent Fe layers. The existence of a GMR effect in Fe/Pt multilayers is very promising for technological applications (e.g., magnetoresistance sensors).     

Characterizations of NiCu/Cu Multilayers: Dependence of Nonmagnetic Layer Thickness

A series of NiCu/Cu multilayers were grown on (110) textured polycrystalline Cu substrates from a single electrolyte under potentiostatic deposition conditions. Microstructure, magnetoresistance and magnetic properties of the multilayers were investigated as a function of the nonmagnetic layer thicknesses. The structural studies by X-ray diffraction revealed that the multilayers have face-centered-cubic structure with preferred (110) crystal orientation as their substrates. The composition of the deposits determined by energy dispersive X-ray spectroscopy showed that the Cu content of the films increased as the Cu layer thickness increased. The scanning electron microscope studies showed that samples have homogeneous and smooth surfaces. Multilayers exhibited either anisotropic magnetoresistance (AMR) or giant magnetoresistance (GMR) depending on the non-magnetic Cu layer thickness. The multilayers with Cu layer thickness thicker than 0.7 nm exhibited GMR, but the AMR effect was observed to be dominant for the Cu layer thickness less than 0.7 nm. The GMR curves are broad in shape and the nonsaturated curves indicated the predominance of a superparamagnetic contribution. The GMR magnitudes of NiCu/Cu multilayers are found to be about 1–1.5 %. The vibrating sample magnetometer measurements revealed that the saturation magnetization decrease with increasing nonmagnetic layer thickness. The changes in the magnetic and magnetotransport properties might arise from the change in the Ni and Cu content of the samples caused by the variation of Cu layer thicknesses.     

层厚比对磁控溅射Cr/CrN多层涂层组织和性能的影响

在超高真空磁控溅射仪上,制备了一系列具有相同调制周期不同层厚比的Cr/CrN涂层。用X射线衍射仪分析了涂层的相组成,通过扫描电镜观察了涂层形貌,采用显微硬度计测试了涂层硬度,在划痕仪上确定涂层和基体间的结合力,并利用磨损仪测量涂层的摩擦磨损性能。结果表明:调制周期为400nm时,当层厚比由2.0减小到0.2,Cr/CrN多层涂层始终由Cr和CrN两相组成,涂层择优取向为CrN(200),且涂层变得愈加致密,硬度从1550HV增大到2300HV,磨损率从2.4×10-8 mm3·N-1·m-1减小为0.6×10-8 mm3·N-1·m-1,涂层和基体结合性能优良。     

应变率对Ag/Co多层膜硬度的影响及塑性变形不稳定性研究

周期结构对多层膜硬度和弹性模量的影响已有比较深入的研究,而对多层膜塑性变形特征和机理的研究还少有报道.本文采用直流磁控溅射制备了周期Λ为10 nm,20 nm,40 nm,60 nm的Ag/Co多层膜,X射线衍射表明薄膜均为Ag(111)和Co(002)织构的多晶结构,且具有很好的周期性.采用纳米压入连续刚度法在四种加载应变速率(0.025 s-1,0.05 s-1,0.1 s-1,0.5 s-1)下分别测试了不同周期薄膜的硬度,结果表明硬度随应变速率的变大而增大,且随周期的变大硬度变化随应变速率的变化更加敏感.纳米压入的载荷-位移曲线出现明显的不连续突变,压痕形貌周围有明显的剪切带,表明塑性变形的过程是不稳定的.     

高频辅助溅射沉积及氩气压对Co/Cu磁性多层膜结构和性能的影响

磁控溅射制备薄膜时，工作气体氩气的压强是一个非常重要的参量，氩气压的高低直接影响薄膜的结构形态，这在制备超薄多层膜过程中显得更为重要。利用高频辅助溅射沉积，可使工作气体的压强降低1个数量级，从实验和理论上给予了阐述。最后从巨磁电阻振荡效应方面，对所制备的磁性多层膜的界面状况进行了分析。     

质子辐照对多层膜巨磁电阻结构磁性能的影响

研究了质子辐照对多层膜巨磁电阻结构磁性能的影响。利用5 MeV的不同辐照剂量和剂量率的质子对磁控溅射法制备的CoFe/(CoFe/Cu)₁₀/CoFe/Ta多层膜巨磁电阻结构进行辐照实验。XRD分析表明质子辐照没有改变CoFe/Cu的晶格结构。分析磁滞回线和磁电阻曲线得知在实验选取的辐照剂量范围内, 饱和磁化强度和本征电阻随着辐照剂量的增加而增加, 而矫顽场和磁电阻率随剂量的增加而减小。利用质子辐照对自旋相关散射、平均自由程的影响解释了本征电阻的变化, 并基于二流体模型对磁电阻率的变化进行了分析。由此得出, 多层膜巨磁电阻结构具有一定的抗辐照能力。     

Effects of Ag Layer on the Structure and Magnetic Properties of FePt:AlN Composite Films

[AlN/FePt] 10 , [AlN/FePt] 10 /Ag and Ag/[AlN/FePt] 10 thin films were deposited by magnetron sputtering onto 7059 glass substrates, then were annealed at 550 °C for 30 min. It is found that introducing non-magnetic Ag underlayer can improve the ordering and (001) preferred orientation of FePt grains. Furthermore, the (001) texture of FePt grains increases with increasing Ag underlayer thickness. However, with Ag top layer given, it can only be observed that the ordering of FePt grains was promoted.     

Structure and Growth Mechanism of V/Ag Multilayers with Different Periodic Thickness Fabricated by Magnetron Sputtering Deposition

V/Ag multilayers with different periodic thicknesses were fabricated by magnetron sputtering deposition. The columnar structure and the orientation relationship of the multilayers were investigated by transmission electron microscopy, high resolution transmission electron microscopy, selected-area electron diffraction and X-ray diffraction. It was found that the multilayered structure became flatter as increasing individual layer thickness from 2 to 6 nm, and then became waved as the individual layer thickness increases to 8 nm. At the beginning of the growth, the morphology of the multilayers with small periodic thickness was influenced mainly by thermodynamic instabilities, and the morphology of the multilayers with larger periodic thickness was mainly influenced mainly by the columnar growth of V. When the waved interfaces were formed, the continuum growth of the multilayers was also influenced by the shadowing effect and the finite atomic size effect. All of these factors resulted in the columnar structure of the multilayers. Multilayers with small periodic thickness presented strong orientation relationship. Nano-hardness tests indicated that multilayers with flat sublayer morphology and clear interfaces exhibited larger hardness.     

调制结构对TiN/ZrN纳米多层膜的表面形貌、生长行为及力学性能的影响

利用射频反应磁控溅射方法,设计并制备了一系列不同调制周期的TiN/ZrN纳米多层膜.利用原子力显微镜、X射线衍射仪和纳米压痕仪对多层膜的表面形貌、微观结构和力学性能进行了系统表征.研究结果表明调制结构影响着薄膜的择优生长取向、沉积速率和表面形貌;在调制周期为7nm～26nm的范围内,随调制周期的增加,TiN/ZrN多层膜的织构取向有从(100)面向(111)面转变的趋势;TiN和ZrN层的沉积速率随调制周期的变化而变化.在调制周期为15nm左右时,表面粗糙度最小,减小和增加调制周期均导致粗糙度的增加.力学性能分析表明TiN/ZrN多层膜的硬度和弹性模量均高于单一TiN和ZrN的硬度和弹性模量,且随着调制周期的减小有逐渐增加的趋势.此外,根据调制结构和力学性能的分析结果,讨论了TiN/ZrN纳米多层膜的硬化机制.