高产植酸酶酵母Candida Krusei WZ-001的等离子束诱变选育

从土壤中筛选得到的 1株高产植酸酶酵母菌CandidaKruseiWZ 0 0 1 ,利用等离子诱变方法对这一菌株进行诱变 ,获得 1株植酸酶高产突变株 ,其酶活性比出发菌株提高了 98%。比较了N+、H+、Zn2 +3种离子注入菌体的诱变效果 ,实验结果表明N+离子注入效果最佳 ,注入最佳剂量为 5 0× 1 0 13N+/cm2 。     

Effect of Sequential Ions Implantation on Structure of Cu, Ag Nanoparticles

The preparation of metal nanoparticles composites by Cu, Ag ions sequential implantation is studied. The formation of Cu, Ag nanoparticles has been evidenced by grazing incidence X-ray diffraction, extended x-ray absorption fine structure and transmission electron microscopy. With the increase of Ag ion implantation dose, the size and density of Ag nanoparticles increase significantly.     

Analysis of current waveform in plasma based ion implantation processes

０　ＩＮＴＲＯＤＵＣＴＩＯＮＩｏｎｉｍｐｌａｎｔａｔｉｏｎｕｓｉｎｇｐｌａｓｍａｉｍｍｅｒｓｉｏｎｉｏｎｉｍｐｌａｎｔａｔｉｏｎ（ＰＩＩＩ）ｉｓａｐｒｏｍｉｓｉｎｇａｌｔｅｒｎａｔｉｖｅｔｏｃｏｎｖｅｎｔｉｏｎａｌｂｅａｍｌｉｎｅｉｏｎｉｍｐｌａ...     

类金刚石薄膜的离子注氮研究

以25～35kV的高能离子束将离子化的双原子分子N+2注入非晶态碳膜,硬度可提高10GPa量级.分析研究表明:离子注氮并没有改变碳膜的非晶态结构,但所有拉曼结构参数发生变化,且碳、氮结合能峰位发生化学位移;显然注入的氮和碳形成化学键,并可能形成新相. 结论:类金刚石薄膜离子注氮可合成氮化的类金刚石,改变化学结构,提高机械性能.     

Plasma-based ion implantation of nitrogen into Ti-6Al-4V: effect of implantation time and pre-or post-implantation aging on nitrogen distribution and microhardness

0　ＩＮＴＲＯＤＵＣＴＩＯＮＰｌａｓｍａ ｂａｓｅｄｉｏｎｉｍｐｌａｎｔａｔｉｏｎ (ＰＢＩＩ)ｏｆｎｉｔｒｏｇｅｎｉｓｒｅｐｏｒｔｅｄｔｏｂｅａｖｅｒｙｃｏｓｔ ｅｆｆｅｃｔｉｖｅｔｅｃｈｎｉｑｕｅｆｏｒｓｕｒｆａｃｅｍｏｄｉｆｉｃａｔｉｏｎｏｆＴｉ 6Ａｌ 4Ｖａｌｌｏｙ[1～ 4 ] .Ｆｕｔｕｒｅｗｏｒｋｒｅｍａｉｎｓｔｏｃｏｎｃｅｎｔｒａｔｅｏｎｄｅｔｅｒｍｉｎｉｎｇｔｈｅｅｘａｃｔｍｅｃｈａｎｉｓｍｏｆｔｈｅｔｅｃｈｎｉｑｕｅｗｈｅｎａｐｐｌｉｅｄｔｏｔｈｅａｌｌｏｙ[2 ] .Ｆｏｒｃｏｎｖｅｎｔｉｏｎａ…     

Effects of COOH+ ion implantation on hemocompatibility of polypropylene

Carboxyl ion (COOH⁺) implantation was performed at 50 keV with different fluences for polypropylene. Hemocompatibility tests show that blood coagulation time and recalcification time of polypropylene were enhanced significantly with the increasing fluence. At the same time, the human endothelial cells grown on the surface of the implanted samples exhibited normal cellular growth and morphology. X-ray photoelectron spectroscopy and water contact angle analysis showed that COOH⁺ ion implantation rearranges chemical bonds and produces some new polar O-containing groups on the surface. The formation of polar functional groups, together with increase of roughness, induced an increase in hydrophilicity, which in turn improved the surface hemocompatibility of polypropylene.     

钛离子注入对镀膜光白托力克玻璃光学性能的影响

将钛离子以不同的剂量、能量注入到镀膜光学白托片中进行表面改性。利用UV－240型紫外可见分光光度计、DP－A302型红外分光光度计、激光椭圆测厚仪等仪器,测定了注入前后及退入前后膜层析射率、紫外反向吸收等光学性质并加以分析,发现经离子注入及退火,玻璃的折射率得到提高,玻璃对红外、紫外的吸收增强。     

Load Dependence of Nanohardness in Nitrogen Ion Implanted Ti6AI4V Alloy and Fractal Characterization

Three different nitrogen ion doses were implanted into a Ti6A14V alloy to improve its mechanical surface properties for the application of artificial joints. The titanium nitride phase and nitrogen element distribution profile were characterized with X-ray photoelectron spectroscopy （XPS）. Nano-indentation tests were carried out on the surface of the Ti6A14V alloy and implanted samples on a large scale of applied loads. The XPS analysis results indicate that nitrogen diffuses into the titanium alloy and forms a hard TiN layer on the Ti6A14V alloy. The nanohardness results reveal that nitrogen ion implantation effectively enhances the surface hardness of Ti6A14V. In addition, the nanohardness clearly reveals load dependence over a large segment of the applied loads. Thus a concept of nanohardness fractal dimension is first proposed and the dual fractal model can effectively describe nonlinear deformation in indentation areas on the Ti6A14V surface. The fractal dimension shows a decreased trend in two regions of applied loads, indicating a decrease of the self-similarity complexity in surface indentation owing to an increase in nanohardness after nitrogen ion implantation.     

Load Dependence of Nanohardness in Nitrogen Ion Implanted Ti6Al4V Alloy and Fractal Characterization

Three different nitrogen ion doses were implanted into a Ti6Al4V alloy to improve its mechanical surface properties for the application of artificial joints. The titanium nitride phase and nitrogen element distribution profile were characterized with X-ray photoelectron spectroscopy (XPS). Nano-indentation tests were carried out on the surface of the Ti6Al4V alloy and implanted samples on a large scale of applied loads. The XPS analysis results indicate that nitrogen diffuses into the titanium alloy and forms a hard TiN layer on the Ti6Al4V alloy. The nanohardness results reveal that nitrogen ion implantation effectively enhances the surface hardness of Ti6Al4V. In addition, the nanohardness clearly reveals load dependence over a large segment of the applied loads. Thus a concept of nanohardness fractal dimension is first proposed and the dual fractal model can effectively describe nonlinear deformation in indentation areas on the Ti6Al4V surface. The fractal dimension shows a decreased trend in two regions of applied loads, indicating a decrease of the self-similarity complexity in surface indentation owing to an increase in nanohardness after nitrogen ion implantation.     

Nanometer structure and conductor mechanism of polymer modified by metal ion implantation

Polyethylene terephthalate (PET) has been modified by Ag, Ti, Cu and Si ion implantation with a dose ranging from 1 × 1016 to 2 × 1017 ions/cm2 using a metal vapor vacuum arc (MEVVA) source. The electrical properties of PET have been improved by metal ion implantation. The resistivity of implanted PET decreased obviously with an increase in ion dose. The results show that the conductive behavior of a metal ion implanted sample is different from Si-implantation samples. In order to un-derstant the mechanism of electrical conduction, the structures of implanted layer were observed in detail by XRD and TEM. The nano carbon particles were dispersed in implanted PET. The nano metallic particles were built up in metallic ion implanted layers with dose range from 1 × 1016 to 1 × 1017 ions/ cm2. The nanometer metal net structure was formed in implanted layer when a dose of 2 × 1017ions/ cm2 is reached. Anomalous fractal growths were observed. These surface structure changes revealed conducting mechanism evo     

Synthesis of Co-silicides and fabrication of microwave power device using MEVVA source implantation

Co synthesis silicides with good properties were prepared using MEVVA ion implantation with flux of 25-125μA/cm2 to does of 5×1017/cm2. The structure of the silicides was investigated using X-ray diffraction (XRD) and transmission electron microscopy (TEM). TEM analysis shows that if the ion dose is greater than 2×1017/cm2, a continuous silicide layer will be formed. The sheet resistance of Co silicide decreases with an increase in ion flux and ion dose. The formation of silicides with CoSi and CoSi2 are identified by XRD analysis. After annealing, the sheet resistance decreases further. A continuous silicide layer with a width of 90-133 nm is formed. The optimal implantation condition is that the ion flux and dose are 50μA/cm2 and 5×1017/cm2, respectively. The optimal annealing temperature and time are 900℃ and 10 s, respectively. The ohmic contact for power microwave transistors is fabricated using Co ion implantation technique for the first time. The emitter contact resistance and noise of the t     

The modification behaviour for Si implanted PET

Polymeric solids have low density, high ability to form intricate shapes, versatile electronic properties and low manufacturing cost. However their uses are still limited by their inherent softness and unexpected dielectric properties. In order to enhance their electrical and mechanical properties, ion implantation techniques have been explored[1—3]. Recent studies have shown that ion implantation is very effective for improving surface properties of polymers such as surface hardness and wear…     

等离子体基离子注入过程中试样温度的预测

建立了等离子体基离子注入过程中试样温度预测的理论模型,应用这个模型进行了一系列数学模拟.以纯铝为例测定了在不同的注入条件下试样的温度变化,得到的实验结果与数学模拟相符合.试验表明,低功率注入时,系统达到热平衡的时间较长,而且热平衡温度低;随功率的上升,试样升温加快;注入功率密度高时,试样容易在注入过程中达到平衡温度,而且其平衡温度受注入功率的影响较小;试样的尺寸也是影响试样温度平衡的一个主要因素.在此基础上提出了在等离子体基离子注入过程中控制试样温度的方法.     

离子注入在生物工程上的应用

本文介绍了离子注入在生物工程上的应用．报道了离子束生物技术应用于生物品种改良和外源基因转移所取得的成果,及我们近期所研究的与此相关的其他成果．     

Plasma-enhanced Chemical Vapordeposition SiO2 Film after Ion Implantation Induces Quantum Well Intermixing

A method of QWI ( quantum well intermixing) realizing through plasma-enhanced chemical vapordepositiom (PECVD) SiO2 film following ion implantation was investigated. PECVD 200 nm SiO2 film after 160 keV phosphorus(P) ion implantation was performed to induce InP-based multiple-quantum-well (MQW) laser structural intermixing, annealing process was carried out at 780 ℃ for 30 seconds under N2 flue, the blue shift ofphotoluminescence (PL) peak related to implanted dose: 1 × 1011 , 1 × 1012, 1 × 1013 ,3 × 1013 , 7 × 1013 ion/ cm2 is 22 nm, 65 nm, 104 nm, 109 nm, 101 nm, respectively. Under the same conditions, by comparing the blue shift of PL peak with P ion implantation only, slight differentiation between the two methods was observed, and results reveal that the defects in the implanting layers generated by ion implantation are much more than those in SiO2 film. So, the blue shift results mainly from ion implantation. However , SiO2 film also may promote the quantum well intermixing.     

Effects of COOH~+ ion implantation on hemocompatibility of polypropylene

Carboxyl ion (COOH+) implantation was performed at 50 keV with different fluences for polypropylene. Hemocompatibility tests show that blood coagulation time and recalcification time of polypropylene were enhanced significantly with the increasing fluence. At the same time, the human endothelial cells grown on the surface of the implanted samples exhibited normal cellular growth and morphology. X-ray photoelectron spectroscopy and water contact angle analysis showed that COOH+ ion implantation rearranges chemical bonds and produces some new polar O-containing groups on the surface. The formation of polar functional groups, together with increase of roughness, induced an increase in hydrophilicity, which in turn improved the surface hemocompatibility of polypropylene.     

Surface wear resistance properties of Ta＋N implanted W18Cr4V high speed steel

High-speed steel W18Cr4V is commonly used in industries such as blade and mould manufacturers because of its high level of hardness and toughness, red-hardness and resistance. Ion implantation is an effective method to improve the wear resis-tance of W18Cr4V. In our investigation, Ta and Ta+N ion implantation was performed on W18Cr4V high-speed steel. The surface properties after implantation were evaluated by measuring friction coefficients while the carbonyl phase of the surface was ana-lyzed by X-ray diffraction analysis. It was found that the friction coefficients of the treated samples were much lower. Samples implanted with Ta+N had a lower friction coefficients than samples implanted only with Ta. This can be attributed to the formation of a new chemical compound, Fe7Ta3, on both surfaces. An even harder chemical compound, Fe2N, was formed on both sttrfaces of Ta+N implanted samples.     

N+注入金属薄膜晶体生长的实验研究

研究沉积在相同异反衬底NaCl上的Ag、Au、Al三种金属薄膜,在N＋注入后晶体生长情况和N＋在薄膜中的分布情况．探讨晶体生长与注入条件的关系．     

Research on Surface Modification of 96 Al2O3 by Ni Ion Implantation

A matrix of 96 Al2O3 ceramics was implanted with Ni ion of different dosages and energies using a MEVVA implanter. Then metallic structures of copper were made on the implanted ceramics, by using selective electroless copper plating. In addition, the characteristics and microstructure of the implanted layer were studied by using the SEM, RBS and XPS. The results show that： 1） the implanted Ni exits as Ni^2, Ni^2＋, and Ni^3＋ in the surface of Al2O3 and metal Ni particles precipitate on ceramics during implantation; 2） the concentration of Ni submits to the Gauss distribution along the direction of implantation on the surface of Al2O3 and high Ni concentration on the surface can be obtained if the Ni is implanted with low energy and a high dosage and 3） Ni ion implantation can activate the surface of Al2O3 and induce electroless copper plating on the ceramics.     

4H-SiC离子注入层的欧姆接触的制备

用氮离子注入的方法制备了4H-SiC欧姆接触层。注入层的离子浓度分布由蒙特卡罗分析软件TRIM模拟提取,Si面4H-SiC-Ni/Cr合金欧姆接触的特性由传输线方法结构进行了测量,得到氮离子注入层的方块电阻Rsh为30 kΩ/square,Ni/Cr合金与离子注入层的欧姆接触电阻ρc为7.1×10-4Ωcm2。