Rietveld analysis of CaCu<Subscript>3</Subscript>Ti<Subscript>4</Subscript>O<Subscript>12</Subscript> thin films obtained by RF-sputtering

Calcium copper titanate, CaCu₃Ti₄O₁₂, CCTO, thin films with polycrystalline nature have been deposited by RF sputtering on Pt/Ti/SiO₂/Si (100) substrates at a room temperature followed by annealing at 600 °C for 2 h in a conventional furnace. The crystalline structure and the surface morphology of the films were markedly affected by the growth conditions. Rietveld analysis reveal a CCTO film with 100 % pure perovskite belonging to a space group Im3 and pseudo-cubic structure. The XPS spectroscopy reveal that the in a reducing N₂ atmosphere a lower Cu/Ca and Ti/Ca ratio were detected, while the O₂ treatment led to an excess of Cu, due to Cu segregation of the surface forming copper oxide crystals. The film present frequency -independent dielectric properties in the temperature range evaluated, which is similar to those properties obtained in single-crystal or epitaxial thin films. The room temperature dielectric constant of the 600-nm-thick CCTO films annealed at 600 °C at 1 kHz was found to be 70. The leakage current of the MFS capacitor structure was governed by the Schottky barrier conduction mechanism and the leakage current density was lower than 10^?7 A/cm² at a 1.0 V. The current–voltage measurements on MFS capacitors established good switching characteristics.     

Formation behavior of CaCu<Subscript>3</Subscript>Ti<Subscript>4</Subscript>O<Subscript>12</Subscript> from CaTiO<Subscript>3</Subscript>, CuO and TiO<Subscript>2</Subscript>

The formation behavior of CaCu₃Ti₄O₁₂ (CCTO) had been investigated via solid state reaction from CaTiO₃, CuO and TiO₂ powders. In the temperature range from 750 to 1,200 °C, the reaction sequence was traced by XRD, and the microstructure evolution of calcined powders was also investigated by SEM. CCTO began to form owing to the reaction between CaTiO₃, CuO and TiO₂ at around 850 °C, and became the major phase at 1,000 °C. Finally, the single phase CCTO was obtained at 1,150 °C. However, CCTO was decomposed at CaTiO₃, CuO and TiO₂ when the temperature increased to 1,200 °C. In addition, no other intermediate phases occurred in the synthesized process. The formation behaviors indicated that CaTiO₃ prevented the formation and growth of CCTO.     

Fabrication of conductive SrRuO<Subscript>3</Subscript> thin film and Ba<Subscript>0.60</Subscript>Sr<Subscript>0.40</Subscript>TiO<Subscript>3</Subscript>/SrRuO<Subscript>3</Subscript> bilayer films on MgO substrate

Conductive SrRuO₃ (SRO) thin films have been grown on (100) MgO substrates by pulsed laser deposition (PLD) technique. Effects of oxygen pressure and deposition temperature on the orientation of SRO thin film were investigated. X-ray diffraction (XRD) θ/2θ patterns and the temperature dependent resistivity measurements indicated that oxygen pressure of 30 Pa and deposition temperature of 700 °C were the optimized deposition parameters. A parallel-plate capacitor structure was prepared with the SRO films deposited under optimized condition as an electrode layer and Ba_0.60Sr_0.40TiO₃ (BST) thin film as the dielectric layer. XRD Φ scans indicated a epitaxial relationship between BST and SRO on MgO substrate. The dielectric constant and loss tangent measured at 10 kHz and 300 K was 427 and 0.099 under 0 V bias, and 215 and 0.062 under 8 V bias, respectively. A tunability of 49.6% has been achieved with DC bias as low as 8 V. The C–V hysteresis curve and the P–E hysteresis loop suggested that the BST films epitaxially grown on SRO/MgO have ferroelectricity at room temperature. The induced ferroelectricity was believed to originate from the compressive strain between the epitaxial BST and SRO thin films. These results show the potential application of the BST/SRO heterostructures in microelectronic devices.     

Enhanced catalytic activity of nanoscale platinum islands loaded onto SnO<Subscript>2</Subscript> thin film for sensitive LPG gas sensors

In the present study, different catalysts (∼ 10 nm thick) including metals, noble metals and metal oxides, were loaded in dotted island form over SnO₂ thin film for LPG gas detection. A comparison of various catalysts indicated that the presence of platinum dotted islands over SnO₂ thin film deposited by r.f. sputtering exhibited enhanced response characteristics with a high sensitivity, ∼ 742, at an operating temperature of ∼ 280°C. Different characterization techniques have been employed such as atomic force microscopy, X-ray diffraction and UV-vis spectroscopy, to study the surface morphology, grain size and optical properties of the deposited thin films. The results suggest the possibility of utilizing the sensor element with the present novel method of catalyst dispersal for the efficient detection of LPG.     

Microwave synthesis and sintering characteristics of CaCu<Subscript>3</Subscript>Ti<Subscript>4</Subscript>O<Subscript>12</Subscript>

CaCu₃Ti₄O₁₂ (CCTO) was synthesized and sintered by microwave processing at 2·45 GHz, 1·1 kW. The optimum calcination temperature using microwave heating was determined to be 950°C for 20 min to obtain cubic CCTO powders. The microwave processed powders were sintered to 94% density at 1000°C/60 min. The microstructural studies carried out on these ceramics revealed the grain size to be in the range 1–7 μm. The dielectric constants for the microwave sintered (1000°C/60 min) ceramics were found to vary from 11000–7700 in the 100 Hz–00 kHz frequency range. Interestingly the dielectric loss had lower values than those sintered by conventional sintering routes and decreases with increase in frequency.     

Optical and structural characteristics of Y<Subscript>2</Subscript>O<Subscript>3</Subscript> thin films synthesized from yttrium acetylacetonate

Yttrium oxide thin films are deposited on silicon substrates using the ultrasonic spray pyrolysis technique from the thermal decomposition of a β-diketonate, yttrium acetylacetonate (Y(acac)₃). The decomposition of Y(acac)₃ was studied by thermogravimetry, differential scanning calorimetry, mass spectrometry, and infrared spectroscopy. It was found that a β-diketone ligand is lost during the initial steps of decomposition of the Y(acac)₃. The rest of the complex is then dissociated or degraded partially until Y₂O₃ is obtained in the final step with the presence of carbon related residues. Then the Y(acac)₃ was used to synthesize Y₂O₃ thin films using the spray pyrolysis technique. The films were deposited on silicon substrates at temperatures in the range of 400–550 °C. The films were characterized by ellipsometry, infrared spectroscopy, atomic force microscopy, and X-ray diffraction. The films presented a low surface roughness with an index of refraction close to 1.8. The crystalline structure of the films depended on the substrate temperature; films deposited at 400 °C were mainly amorphous, but higher deposition temperatures (450–550 °C), resulted in polycrystalline with a cubic crystalline phase.     

The Development of Microstructure and Ferroelectric Properties of Bi<Subscript>4</Subscript>Ti<Subscript>3.96</Subscript>Nb<Subscript>0.04</Subscript>O<Subscript>12</Subscript> Thin Films

Bi₄Ti_3.96Nb_0.04O₁₂ thin films were successfully deposited on Pt(111)/Ti/SiO₂/Si(100) substrates by a sol–gel method and rapid thermal annealing. The effects of Nb-substitution and annealing temperature (500–800°C) on the microstructure and ferroelectric properties of bismuth titanate thin films were investigated. X-ray diffraction analysis reveals that the intensities of (117) peaks are relatively broad and weak at annealing temperatures smaller than 700°C. With the increase of annealing temperature from 500°C to 800°C, the grain size of Bi₄Ti_3.96Nb_0.04O₁₂ thin films increases. The Bi₄Ti_3.96Nb_0.04O₁₂ thin films annealed at 700°C exhibit the highest remanent polarization (2P _r), 36 μC/cm² and lowest coercive field (2E _c), 110 kV/cm. The improved ferroelectric properties can be attributed to the substitution of Nb⁵⁺ to Ti⁴⁺ in Bi₄Ti₃O₁₂ assisting the elimination of defects such as oxygen vacancy and vacancy complexes.     

Synthesis and Optical Studies of Superconducting MgB<Subscript>2</Subscript> Thin Films

Synthesis and optical transmission of MgB₂ thin films on optically transparent glass are reported. In the 400–1000 nm regime as deposited films show high metallic reflectivity and very little transmission. After deposition, the films were annealedex situ and rendered superconducting withT _c of 38 K, approaching that of the bulk material. The reaction conditions where quite soft ∼ 10 min at 550°C. The optical absorption coefficient,α and photon energy,E followed a Tauc-type behavior, (αE)^1/2=β _T(E −E _g). The band gap (E _g) was observed to peak at 2.5 eV; but, the slope parameterβ _Tbehaved monotonically with reaction temperature. Our results indicate that an intermediate semiconducting phase is produced before the formation of the superconducting phase; also optical measurements provide valuable information in monitoring the synthesis of MgB₂ from its metallic constituents. In addition these films have interesting optical properties that may be integrated into optoelectronics.     

Synthesis,characterization and gas sensing performance of SnO<Subscript>2</Subscript> thin films prepared by spray pyrolysis

In this work, SnO₂ thin films were deposited onto alumina substrates at 350°C by spray pyrolysis technique. The films were studied after annealing in air at temperatures 550°C, 750°C and 950°C for 30 min. The films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and optical absorption spectroscopy technique. The grain size was observed to increase with the increase in annealing temperature. Absorbance spectra were taken to examine the optical properties and bandgap energy was observed to decrease with the increase in annealing temperature. These films were tested in various gases at different operating temperatures ranging from 50–450°C. The film showed maximum sensitivity to H ₂S gas. The H₂S sensing properties of the SnO₂ films were investigated with different annealing temperatures and H ₂S gas concentrations. It was found that the annealing temperature significantly affects the sensitivity of the SnO₂ to the H ₂S. The sensitivity was found to be maximum for the film annealed at temperature 950°C at an operating temperature of 100°C. The quick response and fast recovery are the main features of this film. The effect of annealing temperature on the optical, structural, morphological and gas sensing properties of the films were studied and discussed.     

Characterization and photocatalytic activity of boron-doped TiO<Subscript>2</Subscript> thin films prepared by liquid phase deposition technique

Boron doped TiO₂ thin films have been successfully deposited on glass substrate and silicon wafer at 30°C from an aqueous solution of ammonium hexa-fluoro titanate and boron trifluoride by liquid phase deposition technique. The boric acid was used as an F ⁻ scavenger. The resultant films were characterized by XRD, EDAX, UV and microstructures by SEM. The result shows the deposited film to be amorphous which becomes crystalline between 400 and 500°C. The EDAX and XRD data confirm the existence of boron atom in TiO₂ matrix and a small peak corresponding to rutile phase was also found. Boron doped TiO₂ thin films can be used as photocatalyst for the photodegradation of chlorobenzene which is a great environmental hazard. It was found that chlorobenzene undergoes degradation efficiently in presence of boron doped TiO₂ thin films by exposing its aqueous solution to visible light. The photocatalytic activity increases with increase in the concentration of boron.     

The ferroelectric properties and residual stress analysis of Bi<Subscript>3.15</Subscript>Nd<Subscript>0.85</Subscript>Ti<Subscript>3</Subscript>O<Subscript>12</Subscript> thin films with a LaNiO<Subscript>3</Subscript> buffer layer

Bi_3.15Nd_0.85Ti₃O₁₂ (BNT) thin film with a thin LaNiO₃ film as buffer layer was fabricated by sol–gel method on Pt/TiO₂/SiO₂/Si substrate. The BNT thin films have a perovskite phase with a dense microstructure. The P _r and V _c value are 25.5 μc/cm² and 3.7 V, respectively under the applied voltage of 15 V. After the switching of 2 × 10⁹ cycles, the P _r value decreases to 86% of its pre-fatigue value. The leakage current density of the BNT thin films with LaNiO₃ buffer layer were generally in the order of 10⁻⁸ to 10⁻⁶ A/cm². The fatigue and leakage current properties were improved dramatically compared with the BNT film without a LaNiO₃ buffer layer that we prepared before. The measured residual stress was tensile stress and its value was 176 MPa.     

Effects of Gd doping on the sintering and microwave dielectric properties of BiNbO<Subscript>4</Subscript> ceramics

Gd³⁺ was chosen as a substitute for Bi³⁺ in BiNbO₄ ceramics, and the substitution effects on the sintering performance and microwave dielectric properties were studied in this paper. The high temperature triclinic phase was observed only in the Bi_0.98Gd_0.02NbO₄ ceramics when sintered at 920 °C. Both bulk densities and dielectric constant (ε_r) increased with the sintering temperature, while decreased with the Gd content. The quality factor (Q) exhibited a correlation to the Gd content and the microstructures of Bi_1−x Gd _x NbO₄ ceramics. At the sintering temperature of 900 °C, Bi_0.992Gd_0.008NbO₄ ceramics exhibited microwave dielectric properties of ε_r ∼ 43.87, Q × f ∼ 16,852 GHz (at 4.3 GHz), and its temperature coefficient of resonant frequency (τ_f) was found to be near-to-zero.     

Effects of post-deposition annealing temperature and ambient on RF magnetron sputtered Sm<Subscript>2</Subscript>O<Subscript>3</Subscript> gate on n-type silicon substrate

Samarium oxide (Sm₂O₃) thin films with thicknesses in the range of 15–30 nm are deposited on n-type silicon (100) substrate via radio frequency magnetron sputtering. Effects of post-deposition annealing ambient [argon and forming gas (FG) (90% N₂ + 10% H₂)] and temperatures (500, 600, 700, and 800 °C) on the structural and electrical properties of deposited films are investigated and reported. X-ray diffraction revealed that all of the annealed samples possessed polycrystalline structure with C-type cubic phase. Atomic force microscope results indicated root-mean-square surface roughness of the oxide film being annealed in argon ambient are lower than that of FG annealed samples, but they are comparable at the annealing temperature of 700 °C (Argon—0.378 nm, FG—0.395 nm). High frequency capacitance–voltage measurements are carried out to determine effective oxide charge, dielectric constant and semiconductor-oxide interface trap density of the annealed oxide films. Sm₂O₃ thin films annealed in FG have smaller amount of effective oxide charge and semiconductor-oxide interface trap density than those oxide films annealed in argon. Current–voltage measurements are conducted to obtain barrier heights of the annealed oxide films during Fowler–Nordheim tunneling.     

CO<Subscript>2</Subscript> gas sensitivity of sputtered zinc oxide thin films

For the first time, sputtered zinc oxide (ZnO) thin films have been used as a CO₂ gas sensor. Zinc oxide thin films have been synthesized using reactive d.c. sputtering method for gas sensor applications, in the deposition temperature range from 130–153°C at a chamber pressure of 8·5 mbar for 18 h. Argon and oxygen gases were used as sputtering and reactive gases, respectively. ZnO phase could be crystallized using a pure metal target of zinc. The structure of the films determined by means of X-ray diffraction method indicates that the zinc oxide single phase can be fabricated in this substrate temperature range. The sensitivity of the film synthesized at substrate temperature of 130°C is 2·17 in the presence of CO₂ gas at a measuring temperature of 100°C.     

Varistor properties and aging behavior of ZnO-V<Subscript>2</Subscript>O<Subscript>5</Subscript>-Mn<Subscript>3</Subscript>O<Subscript>4</Subscript> ceramics with sintering process

The microstructure, electrical properties, and DC-accelerated aging behavior of the ZnO-V₂O₅-Mn₃O₄ ceramics were investigated at different sintering temperatures of 850–925°C. The microstructure of the ZnO-V₂O₅-Mn₃O₄ ceramics consisted of ZnO grain as a primary phase, and Zn₃(VO₄)₂ which acts as a liquid-phase sintering aid, in addition to Mn-rich phase as secondary phases. The maximum value (3,172 V/cm) and minimum value (977 V/cm) of breakdown field were obtained at sintering temperature of 850 and 900°C, respectively. The nonlinear coefficient exhibited the highest value, reaching 30 at 925°C and the lowest value, reaching 4 at 850°C. The optimum sintering temperature was 900°C, which exhibited not only high nonlinearity with 24 in nonlinear coefficient, but also the high stability, with %ΔE_1mA = −0.9% and %∆α = −12.5% for DC-accelerated aging stress of 0.85 E_1mA/85°C/24 h.     

Effect of replacement of MgO by CaO on sintering,crystallization and properties of MgO–Al<Subscript>2</Subscript>O<Subscript>3</Subscript>–SiO<Subscript>2</Subscript> system glass-ceramics

The effects of replacement of MgO by CaO on the sintering and crystallization behavior of MgO–Al₂O₃–SiO₂ system glass-ceramics were investigated. The results show that with increasing CaO content, the glass transition temperature firstly increased and then decreased, the melting temperature was lowered and the crystallization temperature of the glass-ceramics shifted clearly towards higher temperatures. With the replacement of MgO by less than 3 wt.% CaO, the predominant crystalline phase in the glass-ceramics fired at 900 °C was found to be α-cordierite and the secondary crystalline phase to be μ-cordierite. When the replacement was increased to 10 wt.%, the predominant crystalline phase was found to be anorthite and the secondary phase to be α-cordierite. Both thermal expansion coefficient (TCE) and dielectric constant of samples increases with the replacement of MgO by CaO. The dielectric loss of sample with 5 wt.% CaO fired at 900 °C has the lowest value of 0.08%. Only the sample containing 5 wt.% and10 wt.% CaO (abbreviated as sample C5 and C10) can be fully sintered before 900 °C. Therefore, a dense and low dielectric loss glass-ceramic with predominant crystal phase of α-cordierite and some amount of anorthite was achieved by using fine glass powders (D₅₀ = 3 μm) fired at 875–900 °C. The as-sintered density approaches 98% theoretical density. The flexural strength of sample C5 firstly increases and then decreases with sintering temperature, which closely corresponds to its relative density. The TCE of sample C5 increases with increasing temperature. The dielectric property of sample C5 sintered at different temperatures depends on not only its relative density but also its crystalline phases. The dense and crystallized glass-ceramic C5 exhibits a low sintering temperature (≤900 °C), a fairly low dielectric constant (5.2–5.3), a low dielectric loss (≤10⁻³) at 1 MHz, a low TCE (4.0–4.25 × 10⁻⁶ K⁻¹), very close to that of Si (∼3.5 × 10⁻⁶ K⁻¹), and a higher flexural strength (≥134 MPa), suggesting that it would be a promising material in the electronic packaging field.     

The influence of the segregation of Cu-rich phase on the microstructural and impedance characteristics of CaCu<Subscript>3</Subscript>Ti<Subscript>4</Subscript>O<Subscript>12</Subscript> ceramics

The influence of sintering conditions on the microstructural features and impedance characteristics of the giant dielectric constant material CaCu₃Ti₄O₁₂ (CCTO) was investigated. The microstructure and impedance characteristics were found to be strongly dependent on the sintering conditions. Sintering of the CCTO ceramics at elevated temperatures (>1100 °C) for prolonged durations resulted in the segregation of Cu-rich phase, mostly confined to the surface, which was in concomitance with the appearance of the additional semicircle at the low frequency end in Impedance (Z*) plots. The absence of this additional semicircle in the Cu-deficient CCTO ceramics and the appearance of the same in Cu-rich CCTO ceramics that were deliberately fabricated corroborated the above observations. Also, La_2/3Cu₃Ti₄O₁₂ (LCTO), a low dielectric constant member of CCTO family, which consisted of small grains without the segregation of Cu-rich phase at the grain boundary, did not reveal the presence of additional semicircle in the Z*plots.     

Optical and electrical properties of obliquely deposited a-GeSe<Subscript>2</Subscript> films

Oblique deposition and exposure to photons of energy greater than the bandgap have a marked effect on the structure and consequently on electrical and optical properties of amorphous chalcogenides. This paper presents a detailed study of photoinduced effect and oblique deposition effect on electrical and optical properties of a-GeSe₂ films deposited at different angles (0°–80°). The indirect-optical bandgap energy (2.18 eV) was found to be independent of angle of incidence. The spectral response of refractive index and extinction coefficient has been determined in the wavelength range of 0.6–1 μm using the transmission spectra. Refractive index decreases with the increase in angle of incidence. The value of refractive index was observed to be 2.28 for 0° and 2.00 for 80° films at 0.646 μm. An increase in bandgap was also observed on exposure to the UV light for ∼120 min. The change in bandgap became more significant with the increase in angle of incidence (∼ 2.3% for 0° and ∼10.6% for 80°). The temperature dependence of conductivity along with time dependence and spectral response of photocurrent has also been investigated.     

Preparation of Sb<Subscript>2</Subscript>S<Subscript>3</Subscript> film on functional organic self-assembled monolayers by chemical bath deposition

In this work, self-assembled monolayers (SAMs) of octadecyltrichlorosilane (OTS) were applied to induce the nucleation and growth of the antimony sulfide (Sb₂S₃) films on the functional ITO glass substrate at low temperature. The structure, morphology, and optical properties of the Sb₂S₃ films were investigated by X-ray diffraction, scanning electron microscopy, X-ray energy dispersive spectroscopy, and UV–vis spectroscopy. After thermal treatment at 200 °C for 1 h in air, the orthorhombic Sb₂S₃ was formed as a predominant phase in the deposited thin films. When the deposited films were thermally treated at 400 °C for 1 h in air, the orthorhombic Sb₂S₃ was decomposed and a cubic Sb₂O₃ was formed. The optical band energies of the as-deposited and thermally treated Sb₂S₃ films at 200 °C for 1 h in air and nitrogen were found to be 2.05 eV, 1.77, and 1.76 eV, respectively. As chemical templates, the OTS-functionalized SAMs played an important role in controlling the nucleation and growth of Sb₂S₃ films at low temperature. The results obtained from different preparation parameters applied in the present work will allow controlling the growth of the Sb₂S₃ films with uniform surface.     

Low-temperature synthesis of Sr<Subscript>0.3</Subscript>Ba<Subscript>0.7</Subscript>Nb<Subscript>2</Subscript>O<Subscript>6</Subscript> ultrafine powder and its characteristics

Ultrafine strontium barium niobate (Sr_0.3Ba_0.7Nb₂O₆, SBN30) powders were prepared by urea method starting from a precursor solution constituting of Sr (NO₃)₂, Ba (NO₃)₂, NbF₅, urea and polyvinyl alcohol (PVA) as surfactant. Their structural behavior and morphology were examined by means of X-ray diffractometry (XRD) and Scanning electron microscopy (SEM). The results showed that the SBN30 powders crystallized to a pure tetragonal phase at annealing temperatures as low as 750 °C. The average particle size of SBN powders subjected to 750 °C was of the order of 150–300 nm. With increasing calcination temperature,however, the average particle size of the calcined powders increased. The SBN30 ceramic prepared from urea method can be sintered at temperature as low as 1,225 °C. The transition temperature from the ferroelectric phase to the paraelectric phase and the relative dielectric permittivity of the SBN30 powder were less than the corresponding values of the bulk ceramic. The permittivity and loss tangent (tan δ) at room temperature (1 kHz) was found to be 930 and below 0.025.