Microwave noise characteristics of AlGaN/GaN HEMTs on SiC substrates for broad-band low-noise amplifiers

This letter reports high-performance passivated AlGaN/GaN high electron-mobility transistors (HEMTs) with 0.25-/spl mu/m gate-length for low noise applications. The devices exhibited a minimum noise figure (NF/sub min/) of 0.98 dB and an associated gain (G/sub a/) of 8.97 dB at 18 GHz. The noise resistance (R/sub n/), the measure of noise sensitivity to source mismatch, is 31/spl Omega/ at 18 GHz, which is relatively low and suitable for broad-band low noise amplifiers. The noise modeling analysis shows that the minimum noise figure of the GaN HEMT can be reduced further by reducing noise contributions from parasitics. These results demonstrate the viability of AlGaN/GaN HEMTs for low-noise as well as high power amplifiers.     

Broadband microwave noise characteristics of high-linearity composite-channel Al/sub 0.3/Ga/sub 0.7/N/Al/sub 0.05/Ga/sub 0.95/N/GaN HEMTs

We report broadband microwave noise characteristics of a high-linearity composite-channel HEMT (CC-HEMT). Owing to the novel composite-channel design, the CC-HEMT exhibits high gain and high linearity such as an output third-order intercept point (OIP3) of 33.2 dBm at 2 GHz. The CC-HEMT also exhibits excellent microwave noise performance. For 1-/spl mu/m gate-length devices, a minimum noise figure (NF/sub min/) of 0.7 dB and an associated gain (G/sub a/) of 19 dB were observed at 1 GHz, and an (NF/sub mi/) of 3.3 dB and a G/sub a/ of 10.8 dB were observed at 10 GHz. The dependence of the noise characteristics on the physical design parameters, such as the gate-source and gate-drain spacing, is also presented.     

Low noise RF MOSFETs on flexible plastic substrates

We report a low minimum noise figure (NF/sub min/) of 1.1 dB and high associated gain (12 dB at 10 GHz) for 16 gate-finger 0.18-/spl mu/m RF MOSFETs, after thinning down the Si substrate to 30 /spl mu/m and mounting it on plastic. The device performance was improved by flexing the substrate to create stress, which produced a 25% enhancement of the saturation drain current and lowered NF/sub min/ to 0.92 dB at 10 GHz. These excellent results for mechanically strained RF MOSFETs on plastic compare well with 0.13-/spl mu/m node (L/sub g/=80 nm) devices.     

Very low noise RF nMOSFETs on plastic by substrate thinning and wafer transfer

A very low minimum noise figure (NF/sub min/) of 1.2 dB and a high associated gain of 12.8 dB at 10 GHz were measured for six-finger, 0.18-/spl mu/m radio frequency (RF) metal-oxide semiconductor field-effect transistors mounted on insulating plastic following substrate-thinning (/spl sim/30 /spl mu/m) and wafer transfer. Before this process, the devices had a slightly better RF performance of 1.1-dB NF/sub min/ and a 13.7-dB associated gain. The small RF performance degradation of the active transistors transferred to plastic shows the potential of integrating electronics onto plastic.     

High microwave and noise performance of 0.17-/spl mu/m AlGaN-GaN HEMTs on high-resistivity silicon substrates

AlGaN-GaN high-electron mobility transistors (HEMTs) based on high-resistivity silicon substrate with a 0.17-/spl mu/m T-shape gate length are fabricated. The device exhibits a high drain current density of 550 mA/mm at V/sub GS/=1 V and V/sub DS/=10 V with an intrinsic transconductance (g/sub m/) of 215 mS/mm. A unity current gain cutoff frequency (f/sub t/) of 46 GHz and a maximum oscillation frequency (f/sub max/) of 92 GHz are measured at V/sub DS/=10 V and I/sub DS/=171 mA/mm. The radio-frequency microwave noise performance of the device is obtained at 10 GHz for different drain currents. At V/sub DS/=10 V and I/sub DS/=92 mA/mm, the device exhibits a minimum-noise figure (NF/sub min/) of 1.1 dB and an associated gain (G/sub ass/) of 12 dB. To our knowledge, these results are the best f/sub t/, f/sub max/ and microwave noise performance ever reported on GaN HEMT grown on Silicon substrate.     

Performance of the AlGaN HEMT structure with a gate extension

The microwave performance of AlGaN/GaN HEMTs at large drain bias is reported. The device structures were grown by organometallic vapor phase epitaxy on SiC substrates with a channel sheet resistance less than 280 ohms/square. The breakdown voltage of the HEMT was improved by the composite gate structure consisting of a 0.35 /spl mu/m long silicon nitride window with a 0.18 /spl mu/m long metal overhang on either side. This produced an metal-insulator-semiconductor (MIS) gate extension toward the drain with the insulator, silicon nitride, approximately 40-nm-thick. Transistors with a 150 /spl mu/m total gate width have demonstrated a continuous wave (CW) 10 GHz output power density and power added efficiency of 16.5 W/mm and 47%, respectively when operated at 60 V drain bias. Small-signal measurements yielded an f/sub T/ and f/sub max/ of 25.7 GHz and 48.8 GHz respectively. Maximum drain current was 1.3 A/mm at +4 V on the gate, with a knee voltage of /spl sim/5 V. This brief demonstrates that AlGaN/GaN HEMTs with an optimized gate structure can extend the device operation to higher drain biases yielding higher power levels and efficiencies than have previously been observed.     

DC and RF characteristics of E-mode Ga/sub 0.51/In/sub 0.49/P-In/sub 0.15/Ga/sub 0.85/As pseudomorphic HEMTs

The DC and RF characteristics of Ga/sub 0.49/In/sub 0.51/P-In/sub 0.15/Ga/sub 0.85/As enhancement- mode pseudomorphic HEMTs (pHEMTs) are reported for the first time. The transistor has a gate length of 0.8 /spl mu/m and a gate width of 200 /spl mu/m. It is found that the device can be operated with gate voltage up to 1.6 V, which corresponds to a high drain-source current (I/sub DS/) of 340 mA/mm when the drain-source voltage (V/sub DS/) is 4.0 V. The measured maximum transconductance, current gain cut-off frequency, and maximum oscillation frequency are 255.2 mS/mm, 20.6 GHz, and 40 GHz, respectively. When this device is operated at 1.9 GHz under class-AB bias condition, a 14.7-dBm (148.6 mW/mm) saturated power with a power-added efficiency of 50% is achieved when the drain voltage is 3.5 V. The measured F/sub min/ is 0.74 dB under I/sub DS/=15 mA and V/sub DS/=2 V.     

A low-voltage folded-switching mixer in 0.18-/spl mu/m CMOS

Scaling of CMOS technologies has a great impact on analog design. The most severe consequence is the reduction of the voltage supply. In this paper, a low voltage, low power, AC-coupled folded-switching mixer with current-reuse is presented. The main advantages of the introduced mixer topology are: high voltage gain, moderate noise figure, moderate linearity, and operation at low supply voltages. Insight into the mixer operation is given by analyzing voltage gain, noise figure (NF), linearity (IIP3), and DC stability. The mixer is designed and implemented in 0.18-/spl mu/m CMOS technology with metal-insulator-metal (MIM) capacitors as an option. The active chip area is 160 /spl mu/m/spl times/200 /spl mu/m. At 2.4 GHz a single side band (SSB) noise figure of 13.9 dB, a voltage gain of 11.9 dB and an IIP3 of -3 dBm are measured at a supply voltage of 1 V and with a power consumption of only 3.2 mW. At a supply voltage of 1.8 V, an SSB noise figure of 12.9 dB, a voltage gain of 16 dB and an IIP3 of 1 dBm are measured at a power consumption of 8.1 mW.     

DC, RF, and microwave noise performances of AlGaN/GaN HEMTs on sapphire substrates

High-performance AlGaN/GaN high electron-mobility transistors with 0.18-/spl mu/m gate length have been fabricated on a sapphire substrate. The devices exhibited an extrinsic transconductance of 212 mS/mm, a unity current gain cutoff frequency (f/sub T/) of 101 GHz, and a maximum oscillation frequency (f/sub MAX/) of 140 GHz. At V/sub ds/=4 V and I/sub ds/=39.4 mA/mm, the devices exhibited a minimum noise figure (NF/sub min/) of 0.48 dB and an associated gain (Ga) of 11.16 dB at 12 GHz. Also, at a fixed drain bias of 4 V with the drain current swept, the lowest NFmin of 0.48 dB at 12 GHz was obtained at I/sub ds/=40 mA/mm, and a peak G/sub a/ of 11.71 dB at 12 GHz was obtained at I/sub ds/=60 mA/mm. With the drain current held at 40 mA/mm and drain bias swept, the NF/sub min/,, increased almost linearly with the increase of drain bias. Meanwhile, the Ga values decreased linearly with the increase of drain bias. At a fixed bias condition (V/sub ds/=4 V and I/sub ds/=40 mA/mm), the NF/sub min/ values at 12 GHz increased from 0.32 dB at -55/spl deg/C to 2.78 dB at 200/spl deg/C. To our knowledge, these data represent the highest f/sub T/ and f/sub MAX/, and the best microwave noise performance of any GaN-based FETs on sapphire substrates ever reported.     

2 V-operated InGaP-AlGaAs-InGaAs enhancement-mode pseudomorphic HEMT

A low-voltage single power supply enhancement-mode InGaP-AlGaAs-InGaAs pseudomorphic high-electron mobility transistor (PHEMT) is reported for the first time. The fabricated 0.5/spl times/160 /spl mu/m/sup 2/ device shows low knee voltage of 0.3 V, drain-source current (I/sub DS/) of 375 mA/mm and maximum transconductance of 550 mS/mm when drain-source voltage (V/sub DS/) was 2.5 V. High-frequency performance was also achieved; the cut-off frequency(F/sub t/) is 60 GHz and maximum oscillation frequency(F/sub max/) is 128 GHz. The noise figure of the 160-/spl mu/m gate width device at 17 GHz was measured to be 1.02 dB with 10.12 dB associated gain. The E-mode InGaP-AlGaAs-InGaAs PHEMT exhibits a high output power density of 453 mW/mm with a high linear gain of 30.5 dB at 2.4 GHz. The E-mode PHEMT can also achieve a high maximum power added efficiency (PAE) of 70%, when tuned for maximum PAE.     

An ultra-low power InAs/AlSb HEMT Ka-band low-noise amplifier

The first antimonide-based compound semiconductor (ABCS) MMIC, a Ka-Band low-noise amplifier using 0.25-/spl mu/m gate length InAs/AlSb metamorphic HEMTs, has been fabricated and characterized on a 75 /spl mu/m GaAs substrate. The compact 1.1 mm/sup 2/ three-stage Ka-band LNA demonstrated an average of 2.1 dB noise-figure between 34-36 GHz with an associated gain of 22 dB. The measured dc power dissipation of the ABCS LNA was an ultra-low 1.5 mW per stage, or 4.5 mW total. This is less than one-tenth the dc power dissipation of a typical equivalent InGaAs/AlGaAs/GaAs HEMT LNA. Operation with degraded gain and noise figure at 1.1 mW total dc power dissipation is also verified. These results demonstrate the outstanding potential of ABCS HEMT technology for mobile and space-based millimeter-wave applications.     

RF noise in 0.18-/spl mu/m and 0.13-/spl mu/m MOSFETs

Studied the gate finger number and gate length dependence on minimum noise figure (NF/sub min/) in deep submicrometer MOSFETs. A lowest NF/sub min/ of 0.93 dB is measured in 0.18-/spl mu/m MOSFET at 5.8 GHz as increasing finger number to 50 fingers, but increases abnormally when above 50. The scaling gate length to 0.13 /spl mu/m shows larger NFmin than the 0.18-/spl mu/m case at the same finger number. From the analysis of a well-calibrated device model, the abnormal finger number dependence is due to the combined effect of reducing gate resistance and increasing substrate loss as increasing finger number. The scaling to 0.13-/spl mu/m MOSFET gives higher NF/sub min/ due to the higher gate resistance and a modified T-gate structure proposed to optimize the NF/sub min/ for further scaling down of the MOSFET.     

A GaN differential oscillator with improved harmonic performance

The first AlGaN/GaN HEMT based differential oscillator is reported. The MMIC oscillates at a frequency of 4.16 GHz and provides 22.9 dBm of power from one side at a biasing of V/sub gs/-1 V and V/sub ds/20 V. The HEMTs each have a 0.7 /spl mu/m/spl times/200 /spl mu/m gate. The second harmonic is 45 dB below the carrier and the third harmonic is more than 70 dB below the carrier. To our knowledge, this is the best reported harmonic performance for a GaN oscillator. The oscillator efficiency is between 4% and 9.4% depending on bias. The measured phase noise is -86.3 dBc and -115.7 dBc at offsets of 100 kHz and 1 MHz respectively. The phase noise at a 1 MHz offset is similar to the noise performance of FET based differential oscillators in other technologies.     

Electrical-stress effects and device modeling of 0.18-/spl mu/m RF MOSFETs

In this paper, a novel microstrip-line layout is used to make accurate measurements of the minimum noise figure (NF/sub min/) of RF MOSFETs. A low NF/sub min/ of 1.05 dB at 10 GHz was directly measured for 16-finger 0.18-/spl mu/m MOSFETs, without de-embedding. Using an analytical expression for NF/sub min/, we have developed a self-consistent dc current-voltage, S-parameter, and NF/sub min/ model, where the simulated results match the measured device characteristics well, both before and after electrical stress.     

InAlAs/InGaAs/InP HEMTs with high breakdown voltages using double-recess gate process

The DC and RF performance of InAlAs/InGaAs/InP HEMTs fabricated using a double-recess gate process are reported. A gate-drain breakdown voltage as high as 16 V was observed. The HEMTs also exhibited a high source-drain breakdown voltage near pinchoff of 16 V and a low RF output conductance of 6 mS/mm. For a 1.4 mu m gate length, an intrinsic transconductance of 560 mS/mm and f/sub T/ and f/sub max/ values of 16 and 40 GHz, respectively, were achieved.<>     

A 50-MHz dB-linear programmable-gain amplifier with 98-dB dynamic range and 2-dB gain steps for 3 V power supply

A programmable-gain amplifier (PGA) circuit introduced in this paper has a dynamic gain range of 98 dB with 2 dB gain steps and is controlled by 6-bit gain control bits for a 3 V power supply. It has been fabricated in a 0.5 /spl mu/m 15 GHz f/sub T/ Si BiCMOS process and draws 13 mA. The active die area taken up by the circuit is 400 /spl mu/m /spl times/ 1170 /spl mu/m. A noise figure (NF) of 4.9 dB was measured at the maximum gain setting. In addition, an analysis of the bias current generation to provide dB-linear gain control is presented.     

Design of wide-band CMOS VCO for multiband wireless LAN applications

In this paper, a general design methodology of low-voltage wide-band voltage-controlled oscillator (VCO) suitable for wireless LAN (WLAN) application is described. The applications of high-quality passives for the resonator are introduced: 1) a single-loop horseshoe inductor with Q > 20 between 2 and 5 GHz for good phase noise performance; and 2) accumulation MOS (AMOS) varactors with C/sub max//C/sub min/ ratio of 6 to provide wide-band tuning capability at low-voltage supply. The adverse effect of AMOS varactors due to high sensitivity is examined. Amendment using bandswitching topology is suggested, and a phase noise improvement of 7 dB is measured to prove the concept. The measured VCO operates on a 1-V supply with a wide tuning range of 58.7% between 3.0 and 5.6 GHz when tuned between /spl plusmn/0.7 V. The phase noise is -120 dBc/Hz at 3.0 GHz, and -114.5 dBc/Hz at 5.6 GHz, with the nominal power dissipation between 2 and 3 mW across the whole tuning range. The best phase noise at 1-MHz offset is -124 dBc/Hz at the frequency of 3 GHz, a supply voltage of 1.4 V, and power dissipation of 8.4 mW. When the supply is reduced to 0.83 V, the VCO dissipates less than 1 mW at 5.6 GHz. Using this design methodology, the feasibility of generating two local oscillator frequencies (2.4-GHz ISM and 5-GHz U-NII) for WLAN transceiver using a single VCO with only one monolithic inductor is demonstrated. The VCO is fabricated in a 0.13-/spl mu/m partially depleted silicon-on-insulator CMOS process.     

Gate layout and bonding pad structure of a RF n-MOSFET for low noise performance

Several 0.35 /spl mu/m n-MOSFETs with different gate geometry were analyzed to maximize the RF performance, after that the pads were shielded to ground to reduce the noise contribution of pads. The F/sub min/ of 0.5 dB was improved by utilizing the ground-shielded pads, and the F/sub min/ of 0.2 dB was improved by using the double-sided gate contact type. The n-MOSFET having the single-sided gate contact and ground-shielded pad showed the F/sub min/ of 0.46 dB and 0.37 dB at 2 GHz with the drain current of 2.0 mA and 5.3 mA, respectively. Furthermore, the weak frequency dependency of the F/sub min/ showed a great possibility of a low noise amplifier above 5 GHz.     

Millimeter-wave high-power 0.25-/spl mu/m gate-length AlGaN/GaN HEMTs on SiC substrates

Reports on the CW power performance at 20 and 30 GHz of 0.25 /spl mu/m /spl times/ 100 /spl mu/m AlGaN/GaN high electron mobility transistors (HEMTs) grown by MOCVD on semi-insulating SiC substrates. The devices exhibited current density of 1300 mA/mm, peak dc extrinsic transconductance of 275 mS/mm, unity current gain cutoff (f/sub T/) of 65 GHz, and maximum frequency of oscillation (f/sub max/) of 110 GHz. Saturated output power at 20 GHz was 6.4 W/mm with 16% power added efficiency (PAE), and output power at 1-dB compression at 30 GHz was 4.0 W/mm with 20% PAE. This is the highest power reported for 0.25-/spl mu/m gate-length devices at 20 GHz, and the 30 GHz results represent the highest frequency power data published to date on GaN-based devices.     

5.7 GHz low-power variable-gain LNA in 0.18 /spl mu/m CMOS

A variable-gain low-noise amplifier (LNA) suitable for low-voltage and low-power operation is designed and implemented in a standard 0.18 /spl mu/m CMOS technology. With a current-reused topology, the common-source gain stages are stacked for minimum power dissipation while achieving high small-signal gain. The fully integrated 5.7 GHz LNA exhibits 16.4 dB gain, 3.5 dB noise figure and 8 dB gain tuning range with good input and output return losses. The LNA consumes 3.2 mW DC power from a supply voltage of 1 V. A gain/power quotient of 5.12 dB/mW is achieved in this work.