Synthesis and electrophoretic deposition of hydrothermally synthesized multilayer TiO2 nanotubes on conductive filters

TiO₂ nanotubes were synthesized by the decomposition of titanium isopropoxide in water and the calcination at 450 °C for 2 h to form TiO₂ nanoparticles. The synthesized TiO₂ in anatase form nanoparticles were processed hydrothermally in 10 M NaOH solution at 130 °C for 24 h to obtain multilayer TiO₂ nanotubes. TEM analysis revealed that the diameters of the tubes were around 10 nm and they are in the length of 100 nm. Subsequently, colloidal suspensions containing 1% wt. Of TiO2 nanotubes were prepared with TEA and butanol and electrophoretic deposition (EPD) experiments were conducted in order to obtain coatings on Ni and carbon filters using a deposition time of 10 min. and an applied voltage of 65 V. It is also shown that multilayer TiO₂ nanotubes having outer diameter around 10 nm and inner diameters of 4.3 nm can be produced using the described technique. EPD is also shown to be an effective technique to coat three dimensional components, such as Ni and C filters for various applications including water and air purification systems.     

Influence of cobalt ion implantation on optical properties of titanium dioxide thin films

Nano-crystalline TiO₂ thin films were synthesized by using sol-gel and spin-coating techniques on glass substrates for photo-catalytic applications. Prior to deposition, a TiO₂ colloidal suspension was synthesized by microwave-induced thermal hydrolysis of the titanium tetrachloride aqueous solution. In this study, the deposited TiO₂ coating with a grain size of 13 ± 2 nm was uniform without aggregation. Co ion implantation into the as-calcined TiO₂ thin films was conducted with fluences of 1 × 10¹⁵-1 × 10¹⁶ doses/cm² at 40 keV. In addition to the emission of TiO₂, the photoluminescence study showed the presence of another Co-related optical center at 405 nm in the Co-implanted TiO₂ thin films. Due to the strong capability of forming impurity compounds between the energetic cobalt ions and TiO₂, the photoluminescence emission and UV-Vis absorption efficiencies were improved.     

Optical properties of TiO2 thin films after Ag ion implantation

Metal plasma ion implantation has being successfully developed for improving the electronic and optical properties of semiconductor materials. Prior to deposition, a TiO₂ colloidal suspension was synthesized by microwave-induced thermal hydrolysis of the titanium tetrachloride aqueous solution. The TiO₂ thin film was optimized to obtain a high-purity crystalline anatase phase by calcinations at 550 °C. The TiO₂ coating was uniform without aggregation, which provided good photo conversion efficiency. Ag ion implantation into the as-calcined TiO₂ thin films was conducted with 1 × 10¹⁵ ~ 1 × 10¹⁶ ions/cm² at 40 keV. The peak position and intensity of the photoluminescence and UV-Vis absorption spectra are quite sensitive to Ag doping. The optical characterization showed a shift in optical absorption wavelength towards infrared ray side, which was correlated with the structure variation of the Ag⁺ implanted TiO₂. Due to the strong capability of forming compounds between the energetic silver ions and TiO₂, the photoluminescence emission and UV-Vis absorption efficiencies were improved.     

Corrosion behaviour of single (Ti) and duplex (Ti–TiO2) coating on 304L stainless steel in nitric acid medium

Sputter deposited single titanium (Ti) layer, and duplex Ti–TiO₂ coating on austenitic type 304L stainless steel (SS) was prepared, and the corrosion performance was evaluated in nitric acid medium using surface morphological and electrochemical techniques. Morphological analysis using atomic force microscope of the duplex Ti–TiO₂ coated surface showed minimization of structural heterogeneities as compared to single Ti layer coating. The electrochemical corrosion results revealed that, titanium coated 304L SS showed moderate to marginal improvement in corrosion resistance in 1 M, and 8 M nitric acid, respectively. Duplex Ti–TiO₂ coated 304L SS specimens showed improved corrosion resistance as compared to Ti coating from dilute (1 M) to concentrated medium (8 M). The percentage of protection efficiency for base material increases significantly for duplex Ti–TiO₂ coating as compared to single Ti layer coating. The oxidizing ability of nitric acid on both the coatings as well as factors responsible for improvement in protection efficiency are discussed and highlighted in this paper.     

Effect of TiO2-SiO2 sol-gel coating on the cpTi-porcelain bond strength

The effects of TiO₂-SiO₂ sol-gel coating with different firing temperatures (300 °C, 500 °C, and 750 °C) on the cpTi-porcelain bond strength were investigated in the present study. Prior to applying the low-fusing dental titanium porcelain, the phase, surface morphology, surface roughness and static water contact angle of the intermediate layer were evaluated. The cpTi-porcelain bond strength was measured using the three-point flexure test according to ISO 9693 standard. Statistical analyses were made using one-way ANOVA and Dunnett-t test. Significantly higher bond strength of TiO₂-SiO₂/750 °C (specimens coated with TiO₂-SiO₂ sol-gel coating and fired at 750 °C for 1 h) when compared to the control group was observed (p < 0.05). No rutile phase was found in all the tested specimens coated with TiO₂-SiO₂ sol-gel coating. The surface morphology of the intermediate layer was apparently different with different firing temperatures. It was found that the static water contact angle of TiO₂-SiO₂/750 °C significantly decreased (p < 0.05). However, no markedly different R_a of TiO₂-SiO₂/500 °C and TiO₂-SiO₂/750 °C in comparison to that of the control group was observed (p > 0.05). The results show that the TiO₂-SiO₂ sol-gel coating fired at 750 °C for 1 h can notably improve the cpTi-porcelain bond strength and may be suitable for clinical use.     

Experimental design in the electrodeposition process of porous composite Ni–P + TiO2 coatings

In this paper, an environmentally friendly electroplating process of the composite Ni–P + TiO₂ coatings was developed. Such coatings were prepared by in situ codeposition of Ni–P with TiO₂ powder (anatase) on a polycrystalline copper substrate from the nickel-plating bath in which titanium dioxide particles were held in suspension. The codeposition was carried out under galvanostatic conditions on a rotating disc electrode. To optimize the production conditions of the Ni–P coatings modified with TiO₂ by the method of mathematical statistics, the Hartley's polyselective quasi D optimum plan of experiments was used. The relationship between the percentage content in the electrodeposited composite Ni–P + TiO₂ coatings (z) and the electrodeposition parameters like cathodic current density (j_dep), bath temperature (T) as well as content of TiO₂ powder suspended in the galvanic bath (c), has been described by the adequate cubic polynomial equation and illustrated graphically. Based on the Hartley's plan it can be stated that the maximal TiO₂ content of 28.7 at.% in the Ni–P + TiO₂ coating can be obtained for the following optimal parameters of the electrodeposition process: j_dep = 0.05 A cm⁻², c = 99 g dm⁻³ and T = 40 °C. The chemical and physical characteristics of the coating obtained under such optimum conditions, have been presented. The deposit exhibits the presence of TiO₂ particles embedded into the amorphous Ni–P matrix. It has been ascertained that embedding of TiO₂ powder to the amorphous Ni–P matrix leads to the production of deposits with large surface area. Such electrochemical codeposition method may be a good alternative in the field of porous composite coatings used in gas evolution.     

Corrosion surface protection by using titanium carbon nitride/titanium-niobium carbon nitride multilayered system

The aim of this work is the improvement of the electrochemical behavior of 4140 steel substrate using TiCN/TiNbCN multilayered system as a protective coating. We have grown [TiCN/TiNbCN]_n multilayered via reactive r.f. magnetron sputtering technique in which was varied systematically the bilayer period (Λ), and the bilayer number (n), maintaining constant the total thickness of the coatings (~ 3 μm). The coatings were characterized by X-ray diffraction (XRD), optical microscopy, electron microscopy and transmission electron microscopy assisted with selected area electron diffraction. The electrochemical properties were studied by Electrochemical Impedance Spectroscopy and Tafel curves. XRD results showed a preferential growth in the face-centered cubic (111) crystal structure for [TiCN/TiNbCN]_n multilayered coatings [1]. In this work was obtained the maximum corrosion resistance for the coating with (Λ) equal to 15 nm, corresponding to n = 200 bilayered. The polarization resistance and corrosion rate were around 8.6 kOhm cm² and 7.59 · 10^− 4 mm/year, these values were 8.6 and 0.001 times better than those showed by the uncoated 4140 steel substrate (1.0 kOhm and 0.57 mm/year), respectively. The improvement of the electrochemical behavior of the 4140 coated with this TiCN/TiNbCN multilayered system can be attributed to the presence of several interfaces that act as obstacles for the inward and outward diffusions of Cl^- ion species, generating an increment in the energy or potential required for translating the corrosive ions across the coating/substrate interface. Moreover, the interface systems affect the means free path on the ions toward the metallic substrate, due to the decreasing of the defects presented in the multilayered coatings.     

Preparation of anatase TiO2 thin films by vacuum arc plasma evaporation

Anatase titanium dioxide (TiO₂) thin films with high photocatalytic activity have been prepared with deposition rates as high as 16 nm/min by a newly developed vacuum arc plasma evaporation (VAPE) method using sintered TiO₂ pellets as the source material. Highly transparent TiO₂ thin films prepared at substrate temperatures from room temperature to 400 °C exhibited photocatalytic activity, regardless whether oxygen (O₂) gas was introduced during the VAPE deposition. The highest photocatalytic activity and photo-induced hydrophilicity were obtained in anatase TiO₂ thin films prepared at 300 °C, which correlated to the best crystallinity of the films, as evidenced from X-ray diffraction. In addition, a transparent and conductive anatase TiO₂ thin film with a resistivity of 2.6 × 10^− 1 Ω cm was prepared at a substrate temperature of 400 °C without the introduction of O₂ gas.     

Effects of different acetylene/nitrogen ratios on characteristics of carbon coatings on optical fibers prepared by thermal chemical vapor deposition

The effects of C₂H₂/(C₂H₂ + N₂) ratios on the characteristics of carbon coatings on optical fibers prepared by thermal chemical vapor deposition are investigated. The C₂H₂/(C₂H₂ + N₂) ratios are set to 60, 70, 80, 90, and 100%. Additionally, the deposition temperature, working pressure, and mass flow rate are 1003 K, 133 kPa, and 40 sccm, respectively. The deposition rate, microstructure, and electrical resistivity of carbon coatings are measured. The low-temperature surface morphology of carbon-coated optical fibers is elucidated. Experimental results indicate that the deposition rate increases with increasing the C₂H₂/(C₂H₂ + N₂) ratio, and the deposition process is located at a surface controlled regime. As the deposition rate increases, the electrical resistivity of carbon coatings increases, while the ordered degree, nano-crystallite size, and sp² carbon atoms of the carbon coatings decrease. Additionally, the low-temperature surface morphology of the carbon coatings shows that if the carbon coating thickness is not smaller than 289 nm, decreasing the deposition rate is good for producing hermetic optical fiber coatings.     

XAFS and CEMS study of dilute magneto-optical semiconductor, Fe doped TiO2 films

TiO₂ films doped with 6% Fe were prepared by pulsed laser deposition (PLD) under different oxygen pressures, and characterized by X-ray absorption fine spectra (XAFS) and conversion electron Mössbauer spectra (CEMS). The edge energy and spectrum profiles of Fe- and Ti K X-ray absorption showed only Fe³⁺ and Ti⁴⁺ states for rutile TiO₂ films prepared under 10^− 1 Torr, the metallic Fe and Ti⁴⁺ for rutile TiO₂ films prepared in 10^− 6 Torr, and the metallic Fe and the average valance of less than “4+” for Ti in Ti_nO_2n−x films prepared by the PLD under 10^− 8 Torr. The metallic Fe clusters are also found in the TEM images of Ti_nO_2n−x film. Magnetic property of Fe doped TiO₂ films prepared by PLD at high vacuum (10^− 6 and 10^− 8 Torr) is considered to originate mainly from the magnetic metal iron clusters.     

Schichten in der Kunststoffverarbeitung. Mittels MSPVD abgeschiedene CrxN-Schichten eröffnen neue Möglichkeiten für den Verschleißschutz von Plastifiziereinheiten

Coatings in polymer processing Cr_xN coatings produced by PVD-magnetron sputtering (MSPVD) open units For several years hard coatings have been used in plastic processing. The reduction of adhesion and contamination effects play a more and more important role besides the wear protection of injection moulds and extrusion tools. Applications of hard coatings in the field of highly stressed screws and barrels of plastification units are very seldom. In these cases the tribological effects are very intense so that the demanded wear resistance of hard coatings in the range 10μm is not sufficient. Different hard coatings based on titanium and chromium were tested according to their applicability for wear protection of screws in plastification units. Thickness, hardness, internal stresses and adhesion of the coatings were studied. Afterwards tribological tests in a model testing unit were investigated. Here the coatings were studied under tribological conditions, similar to those in a real plastification unit. The Cr_xN multilayer coatings showed extremely better wear resistance than the titanium based coatings. For this reason the Cr_xN coatings were optimized by help of the deposition parameters. These optimized coatings have been investigated according to their applicability for different polymers in comparison to other coating systems. First tests of CrCN/TiCN coated screw elements in practice showed very pleasing results. The test in practice with the optimized Cr_xN multilayer coating has yet to take place, but in the model tests the Cr_xN coatings showed excellent results.     

Effects of substrate bias voltage and target sputtering power on the structural and tribological properties of carbon nitride coatings

Effects of substrate bias voltage and target sputtering power on the structural and tribological properties of carbon nitride (CN_x) coatings are investigated. CN_x coatings are fabricated by a hybrid coating process with the combination of radio frequency plasma enhanced chemical vapor deposition (RF PECVD) and DC magnetron sputtering at various substrate bias voltage and target sputtering power in the order of −400 V 200 W, −400 V 100 W, −800 V 200 W, and −800 V 100 W. The deposition rate, N/C atomic ratio, and hardness of CN_x coatings as well as friction coefficient of CN_x coating sliding against AISI 52100 pin in N₂ gas stream decrease, while the residual stress of CN_x coatings increases with the increase of substrate bias voltage and the decrease of target sputtering power. The highest hardness measured under single stiffness mode of 15.0 GPa and lowest residual stress of 3.7 GPa of CN_x coatings are obtained at −400 V 200 W, whereas the lowest friction coefficient of 0.12 of CN_x coatings is achieved at −800 V 100 W. Raman and XPS analysis suggest that sp³ carbon bonding decreases and sp² carbon bonding increases with the variations in substrate bias voltage and target sputtering power. Optical images and Raman characterization of worn surfaces confirm that the friction behavior of CN_x coatings is controlled by the directly sliding between CN_x coating and steel pin. Therefore, the reduction of friction coefficient is attributed to the decrease of sp³ carbon bonding in the CN_x coating. It is concluded that substrate bias voltage and target sputtering power are effective parameters for tailoring the structural and tribological properties of CN_x coatings.     

Comparison of hydrophilic properties of TiO2 thin films prepared by sol-gel method and reactive magnetron sputtering system

This article reports on preparation, characterization and comparison of TiO₂ films prepared by sol-gel method using the titanium isopropoxide sol (TiO₂ coating sol 3%) as solvent precursor and reactive magnetron sputtering from substoichiometric TiO_2 − x targets of 50 mm in diameter. Dual magnetron supplied by dc bipolar pulsed power source was used for reactive magnetron sputtering. Depositions were performed on unheated glass substrates. Comparison of photocatalytic properties was based on measurements of hydrophilicity, i.e. evaluation of water contact angle on the film surface after UV irradiation. It is shown, that TiO₂ films prepared by the sol-gel method exhibited higher hydrophilicity in the as-deposited state but has significant deterioration of hydrophilicity during aging, compared to TiO₂ films prepared by magnetron sputtering. To explain this effect AFM, SEM and high resolution XPS measurements were performed. It is shown that the deterioration of hydrophilicity of sol-gel TiO₂ films can be suppressed if as-deposited films are exposed to the plasma of microwave oxygen discharge.     

Mikrostruktur und Eigenschaften HVOF‐gespritzter Schichten im System TiO2 – Cr2O3

Microstructure and properties of HVOF‐sprayed coatings of the TiO₂ – Cr₂O₃ system Thermally sprayed titanium oxide coatings are known for their good tribological properties and their electrical conductivity. The latter is due to oxygen deficiency from the stoichiometric composition TiO₂. These lattice defects can be ordered and are called crystallograhic shear planes. These structures are known as Magnéli phases. At high temperature in oxygen‐containing atmospheres the material forms isolating TiO₂, therefore the application under such conditions is restricted. At the titania‐rich side of the system TiO₂‐Cr₂O₃ also compounds with the structure of Magnéli‐phases are formed. According to information from the literature, these phases are stable in oxygen‐containing atmospheres and are therefore promising for corresponding coating applications at elevated temperatures. In this paper first results of systematic studies of microstructure and properties of HVOF‐sprayed coatings are presented.     

High rate reactive deposition of TiO2 films using two sputtering sources

We propose a new high-rate reactive sputter-deposition method with two sputtering sources for fabricating TiO₂ films. One source operates in a metal mode sputtering condition and supplies titanium atoms to the substrate. The other source operates in oxide mode and works as an oxygen radical source for supplying oxygen radicals to the substrate surface for promoting oxidization of titanium atoms. Each sputtering source is separated with a mesh grid from the deposition chamber, and Ar and oxygen gas are introduced separately through the titanium supply and oxygen radical sources, respectively. By using this reactive sputtering system, a deposition rate above 80 nm/min can be obtained for the deposition of TiO₂ films with rutile structure.     

Gas sensing mechanism of TiO2-based thin films

Two classes of thin film gas sensors have been studied: TiO₂ doped with Cr or Nb and TiO₂-SnO₂ mixed systems. Thin films have been prepared by the reactive sputtering from mosaic targets. It is demonstrated that titanium dioxide doped with Nb and Cr should be considered as a bulk sensor. Its performance is governed by the diffusion of point defects, i.e. very slow diffusion of Ti vacancies for TiO₂: 9.5 at% of Nb and fast diffusion of oxygen vacancies in the case of TiO₂: 2.5 at% Cr sensor. The corresponding response times are 55 min for TiO₂: 9.5 at% of Nb and 20 s for TiO₂: 2.5 at% Cr. In turn, sensors based on TiO₂-SnO₂, particularly those of the SnO₂-rich composition, belong to the group of surface sensors.     

Novel photocatalytic TiO2 coatings produced by HVOF thermal spraying process

Titanium dioxide coatings were deposited by high velocity oxy-fuel spraying (HVOF) using agglomerated nano-powders. Different spraying parameters were used to determine their influences on the crystallite structure and photocatalytic performance of the coatings. The as-sprayed TiO₂ coatings were characterized by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Photocatalytic efficiency of the elaborated samples was evaluated from the conversion rate of ethanol. A high anatase content of 80% by volume was achieved for the coating deposited by a 120 ml/min fuel flow rate. The results show that the as-sprayed TiO₂ HVOF coatings were highly photocatalytically reactive for the degradation of ethanol.     

Plasma-enhanced chemical vapor deposition of TiO2 thin films for dielectric applications

Amorphous TiO₂ thin films were formed by plasma-enhanced chemical vapor deposition (PECVD) from mixtures of titanium IV isopropoxide (Ti(O-i-C₃H₇)₄) and oxygen. The deposition rate was found to be weakly activated, with an apparent activation energy of 4.5 kJ/mol. The deposition rate increased with equivalence ratio and decreased with plasma power. This dependence on atomic oxygen density was consistent with behavior observed in other metal oxide PECVD systems. Metal-insulator-silicon devices were fabricated, and characterized using capacitance-voltage measurements. The apparent dielectric constant of the TiO₂ thin films increased from 15 to 82 with film thickness. The observed variations were consistent with the formation of an interfacial SiO₂ layer. Assuming that a TiO₂/SiO₂ bilayer behaves as two capacitors in series, an intrinsic TiO₂ dielectric constant of 82 ± 10 and an interfacial SiO₂ layer thickness of 3 ± 1 nm were extracted from electrical measurements.     

Low temperature facile synthesis of anatase TiO2 coated multiwalled carbon nanotube nanocomposites

Anatase TiO₂ coated multiwalled carbon nanotube (MWNT) nanocomposites were prepared by combining the sol-gel method with a self assembly technique at a low temperature. XRD, TEM, FTIR and XPS spectra were applied to characterize the crystal phase, microstructure, and other physicochemical properties of the sample. The results showed that MWNTs were covered with a 12-20 nm thickness layer of anatase TiO₂ or surrounded by a 30 -290 nm thickness coating of anatase TiO₂. The layer or coating is constructed of TiO₂ nanoparticles about 5.8 nm. Furthermore, as-prepared composite was rich in surface hydroxyl groups.     

Influence of annealing treatments for ZnO-doped Zr0.8Sn0.2TiO4 thin films by RF magnetron sputtering

Zirconium tin titanium oxide doped 1 wt.% ZnO thin films on n-type Si substrate were deposited by rf magnetron sputtering at a fixed rf power of 300 W, a substrate temperature of 450 °C, a deposition pressure of 5 mTorr and an Ar/O₂ ratio of 100/0 with various annealing temperatures and annealing times. Electrical properties and microstructures of 1 wt.% ZnO-doped (Zr_0.8Sn_0.2)TiO₄ thin films prepared by rf magnetron sputtering on n-type Si(100) substrates at different annealing temperatures (500 °C-700 °C) and annealing times (2 h-6 h) have been investigated. The structural and morphological characteristics analyzed by X-ray diffraction (XRD) and atomic force microscope (AFM) were sensitive to the treatment conditions such as annealing temperature and annealing time. At an annealing temperature of 600 °C and an annealing time of 6 h, the ZnO-doped (Zr_0.8Sn_0.2)TiO₄ thin films possess a dielectric constant of 46 (at f = 10 MHz), a dissipation factor of 0.059 (at f = 10 MHz), and a low leakage current density of 3.8 × 10^− 9 A/cm² at an electrical field of 1 kV/cm.