采用KS0713控制芯片的SG12864-5C液晶显示模块的应用

本文介绍了SG12864-5C液晶显示模块的功能,及液晶显示开发的基本步骤.详细介绍了针对KS0713的字模点阵数据的提取和传输的技巧.     

基于FPGA的图形点阵液晶显示模块的应用设计

提出了一种基于FPGA和T6963C模块来控制液晶显示的实现方法,介绍了液晶显示控制器T6963C的性能特点,给出了FPGA与液晶显示屏WG240128B的硬件接口电路、软件设计流程和液晶显示程序。     

电能质量监测装置人机界面的设计与实现

本文介绍了内藏液晶显示控制器(T6963C)的液晶显示模块在电能质量监测装置中的应用和实现,介绍了液晶显示控制器T6963C的众多优点,给出了T6963C与80C196的硬件接口形式,具体分析了如何具体实现显示的若干模块化程序的设计流程。     

在点阵式液晶模块人机交互界面上实现动态显示效果

在基于单片机系统的智能化仪器仪表中,内藏控制器的中小尺寸液晶显示模块在人机交互界面中的应用日益广泛.为了增强界面的吸引力,在液晶显示中加入和丰富动态显示效果是十分必要的.文中以内藏T6963C控制器的点阵式液晶显示模块为例构建单片机实验系统,介绍了流行的单片机编程语言C51在人机交互界面中的几种动态效果编程的实现方法和注意问题.     

单片机液晶显示系统的设计

以C8051F单片机和液晶显示控制器KS0108为核心,设计了单片机控制的液晶显示系统。重点研究了图形的动态显示技术,介绍了液晶显示模块的硬件、软件特性。文中设计的电路在C8051F020单片机仿真实验系统上进行了仿真,实验结果表明,设计达到了预期目标。     

图形液晶显示模块G121C在等离子体激励源中的应用

为了方便地研究等离子体激发过程的优化及控制,设计了等离子体激励源的液晶显示系统.结合图形液晶显示模块G121C与C8051F020,实现了系统相应的硬件电路和控制程序.结合G121C中集成液晶控制器SED1335的丰富指令系统,可以实现图文混合显示,并进行波形的平滑滚动.从而实现等离子体激励频率、功率、反射系数和驻波比等的动态显示,为等离子体激发的研究以及应用研究建立了良好的人机界面.     

内藏液晶显示控制器T6963C与DSP的接口应用

点阵式液晶显示模块具有性能稳定、适合应用于便携式智能仪器仪表等特点,是一种较低价位、具有较高显示功能的显示器件。文中介绍了内藏液晶显示控制器T6963C的液晶显示模块的特点及其显示方式。在此基础上,给出了该液晶显示模块与基于DSP(数字信号处理器)TMS320LF2407A的嵌入式系统的硬件接口电路和部分C语言代码。最后,实现了该液晶显示模块在TMS320LF2407A的嵌入式系统中的液晶显示功能,成为该现场温度监控系统的重要组成部分。其程序与硬件逻辑图也可为其他DSP系统提供参考。     

基于液晶显示的有限状态机在人机界面中的应用

通过分析有限状态机状态转移的特性,提出了利用有限状态机设计液晶显示人机界面的方法。以液晶显示菜单的转换为例,详细论述了使用C语言设计人机界面的过程。使用SPLC501C液晶显示模块实现了菜单的转换功能,且给出了显示菜单转换的液晶显示模块驱动程序。实际应用表明,这种方法易于扩展菜单数量,避免了非法状态的出现,菜单转换迅速、稳定可靠。     

浅析T6963C液晶显示模块与PIC单片机的接口技术

介绍了基于T6963C液晶显示模块的基本特性及其与PIC单片机的接口方法。通过分析PIC单片机的时钟与指令周期关系和T6963C对MCU／MPU时序的要求,得出了基于T6963C液晶显示模块与PIC单片机接口方法,并给出了以单片机PIC16F74为例的软硬件实现方法。     

基于T6963C控制器的液晶模块显示技术

介绍了基于T6963C控制器的液晶显示模块的硬件结构、特点和使用方法以及单片机控制下的硬件接口电路;叙述了T6963C的状态字和指令集在软件编程中的作用和特点,说明了基于该控制器的液晶显示模块图形方式下的字符汉字显示技术。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.