UNCD electron emitters using Si nanostructure as a template

The electron field emission (EFE) properties of silicon nanostructures (SiNSs) coated with ultra-nanocrystalline diamond (UNCD) were characterized. The SiNS, comprising cauliflower-like grainy structure and nanorods, was generated by reaction of a Si substrate with an Au film at 1000 °C, and used as templates to grow UNCD. The UNCD films were deposited by microwave plasma-enhanced chemical vapour deposition (MPECVD) using methane and argon as reaction gases. The UNCD films can be grown on the SiNS with or without ultrasonication pretreatment with diamond particles. The EFE properties of the SiNS were improved by adding an UNCD film. The turn-on field (E₀) decreased from 17.6 V/μm for the SiNS to 15.2 V/μm for the UNCD/SiNS, and the emission current density increased from 0.095 to 3.8 mA/cm² at an electric field of 40 V/μm. Ultrasonication pretreatments of SiNS with diamond particles varied the structure and EFE properties of the UNCD/SiNS. It is shown that the ultrasonication pretreatment degraded the field emission properties of the UNCD/SiNS in this study.     

双层复合栅介质膜的制备及电学性能研究

介电常数分别为2.6的聚甲基丙烯酸甲酯(PMMA)及介电常数为16的偏氟乙烯-三氟乙烯共聚物(P(VDF-TrFE))两种不同的有机绝缘材料,通过溶液旋涂的方法在P型硅衬底上制备了不同结构的复合栅介质膜并测试了它们的高频C-V特性及漏电特性。实验结果表明Si-PMMA-P(VDF-TrFE)-Ag结构绝缘膜上单位面积电容达到了35nF/cm2,40V电压下漏电流随着扫描次数的增加逐渐由7.29×10-7 A/cm2降低至3.44×10-7 A/cm2。而Si-P(VDF-TrFE)-PM-MA-Ag结构栅介质膜测得的单位面积电容仅为15nF/cm2,在相同电压下的单位面积漏电流为1.93×10-8 A/cm2。在此基础上分析了电子陷阱以及电场强度对双层栅绝缘膜C-V、I-V特性的影响。     

用于高频声表面波器件的CVD金刚石衬底的研究

使用纳米金刚石粉研磨工艺预处理硅片衬底抛光面,在低气压成核的条件下,以丙酮和氢气为反应物,采用传统的热丝辅助化学气相沉积法,制备了自支撑金刚石膜;通过射频磁控溅射法沉积氧化锌薄膜在自支撑金刚石膜的成核面,形成氧化锌/自支撑金刚石膜结构.通过光学显微镜、扫描电镜及原子力显微镜测试自支撑金刚石膜成核面的表面形貌.研究结果表明:成核期的低气压有助于提高成核密度,成核面表面粗糙度约为1.5 nm;拉曼光谱显示1334 cm-1附近尖锐的散射峰与金刚石SP3键相对应,成核面含有少量的石墨相,且受到压应力的作用;ZnO/自支撑金刚石膜结构的XRD谱显示,氧化锌薄膜有尖锐的(002)面衍射峰,是c轴择优取向生长的.     

Growth and characteristics of ZnO films on growth side of freestanding diamond substrate dependent on buffer layer thickness

We report the growth and properties of highly c-axis oriented ZnO films, by radio-frequency magnetron sputtering, on the growth side of freestanding chemical vapor deposited diamond film-substrate. Low-temperature ZnO buffer layer is required for the formation of continuous ZnO films. The morphology, structure, and optical properties of the ZnO films deposited are strongly dependent on the thickness of the buffer layer. The optimized thickness of ZnO buffer layer is about 10 nm to realize high-quality ZnO films having small compressive stress and high intensity ultraviolet emission. The ZnO/diamond (growth side) system is available for the applications in numerous fields, especially for high performance surface acoustic wave devices.     

Influence of the diamond grain size on the electrical properties of nano-crystalline diamond film detectors

In this work, we developed X-ray radiation detectors with sandwich structure fabricated from nano-crystalline diamond (NCD) films. These NCD films with different grain size ranging from 15 nm to 160 nm were grown on silicon substrates using a hot-filament chemical vapor deposition technique. I-V measurement results indicate that with reducing of the grain size, the resistivity of diamond films decreases from 9.5 × 10⁸ to 6.20 × 10⁷ Ω cm and the ratio of the photocurrent to the dark-current (I_ph/I_d) of the detectors decreases rapidly from 0.45 to 0.09 at an electric field of 50 kV/cm. Typical spectral response to 5.9 keV ⁵⁵Fe X-rays shows that counting efficiency and energy resolution of NCD detectors with large grains are better than those of detectors with small grains, due to the less defects and grain-boundaries contained in the film.     

Magnetic properties of oxidized iron thin films grown by sputtering at very low temperatures

Iron thin films have been grown by DC magnetron sputtering using Si(100) wafers as substrates, and then oxidized in a well-controlled oxygen atmosphere in the vacuum chamber. Film thickness is about 50 nm, and grains forming these samples do not exceed 20 nm. In order to control structural properties such as size and shape of these grains, growth conditions can be modified, like deposition rate or substrate temperature, varying from 150 to 300 K. Two sets of samples have been prepared considering deposition rate: (i) films grown at 0.6 nm/min and (ii) at 1.2 nm/min. In order to prevent iron films from natural oxidation, all the sample series were covered with a gold layer. Analysis of their magnetic behaviour shows a strong dependence on grain size and temperature, resulting in a more effective oxidation for samples prepared at higher deposition rates and lower substrate temperatures, which behaves as a Fe/Fe oxide granular system.     

Biological evaluation of ultrananocrystalline and nanocrystalline diamond coatings

Nanostructured biomaterials have been investigated for achieving desirable tissue-material interactions in medical implants. Ultrananocrystalline diamond (UNCD) and nanocrystalline diamond (NCD) coatings are the two most studied classes of synthetic diamond coatings; these materials are grown using chemical vapor deposition and are classified based on their nanostructure, grain size, and sp³ content. UNCD and NCD are mechanically robust, chemically inert, biocompatible, and wear resistant, making them ideal implant coatings. UNCD and NCD have been recently investigated for ophthalmic, cardiovascular, dental, and orthopaedic device applications. The aim of this study was (a) to evaluate the in vitro biocompatibility of UNCD and NCD coatings and (b) to determine if variations in surface topography and sp³ content affect cellular response. Diamond coatings with various nanoscale topographies (grain sizes 5–400?nm) were deposited on silicon substrates using microwave plasma chemical vapor deposition. Scanning electron microscopy and atomic force microscopy revealed uniform coatings with different scales of surface topography; Raman spectroscopy confirmed the presence of carbon bonding typical of diamond coatings. Cell viability, proliferation, and morphology responses of human bone marrow-derived mesenchymal stem cells (hBMSCs) to UNCD and NCD surfaces were evaluated. The hBMSCs on UNCD and NCD coatings exhibited similar cell viability, proliferation, and morphology as those on the control material, tissue culture polystyrene. No significant differences in cellular response were observed on UNCD and NCD coatings with different nanoscale topographies. Our data shows that both UNCD and NCD coatings demonstrate in vitro biocompatibility irrespective of surface topography.     

Deposition and characterization of smooth ultra-nanocrystalline diamond film in CH4/H2/Ar by microwave plasma chemical vapor deposition

The smooth ultra-nanocrystalline diamond (UNCD) films were prepared by microwave plasma chemical vapor deposition (MWCVD) using argon-rich CH₄/H₂/Ar plasmas with varying argon concentration from 96% to 98% and negative bias voltage from 0 to −150 V. The influences of argon concentration and negative bias voltage on the microstructure, morphology and phase composition of the deposited UNCD films are investigated by using scanning electron microscopy (SEM), X-ray diffraction (XRD), atom force microscopy (AFM), and visible and UV Raman spectroscopy. It was found that the introduction of argon in the plasma caused the grain size and surface roughness decrease. The RMS surface roughness of 9.6 nm (10 micron square area) and grain size of about 5.7 nm of smooth UNCD films were achieved on Si(100) substrate. Detailed experimental results and mechanisms for UNCD film deposition in argon-based plasma are discussed. The deposited highly smooth UNCD film is also expected to be applicable in medical implants, surface acoustic wave (SAW) devices and micro-electromechanical systems (MEMS).     

Distribution of pyrochlore phase in Pb(Mg1/3Nb2/3)O3-PbTiO3 films and suppression with a Pb(Zr0.52Ti0.48)O3 interfacial layer

Thin films of the relaxor ferroelectric Pb(Mg_1/3Nb_2/3)O₃-PbTiO₃ (PMN-PT) on Pt/Ti/SiO₂/Si (Pt/Si) substrates both with and without a Pb(Zr_0.52Ti_0.48)O₃ (PZT) interfacial layer were investigated. Perovskite and pyrochlore coexistence was observed for PMN-PT thin films without a PZT interfacial layer. Interestingly, most of the pyrochlore phase was observed in single-coated films and in the first layer of multi-coated films. The pyrochlore phase exhibited grains with an average size of about 25 nm, which is smaller than those of the perovskite phase (about 90 nm). In contrast, for PMN-PT thin films grown on a PZT interfacial layer, the formation of a pyrochlore phase at the interface between PMN-PT layers and the substrate is completely suppressed. Moreover, small grains are not observed in the films with a PZT interfacial layer. The measured polarization-electric field (P-E) hysteresis loops of PMN-PT films with and without PZT layers indicate that enhanced electrical properties can be obtained when a PZT interfacial layer is used. These enhanced properties include an increase in the value of remanent polarization P_r from 2.7 to 5.8 μC/cm² and a decrease in the coercive field E_c from 60.5 to 28.0 kV/cm.     

A study of polyaniline deposited nanocrystalline diamond films for glucose detection

Nitrogen-doped nanocrystalline diamond (NCD) films have been deposited on Si substrates in CH4/Ar/N2 gas mixtures by the microwave plasma enhanced chemical vapor deposition (MPECVD) technique. Such films contain very small diamond grains (10 to 30 nm) with high electrical conductivity (126 ohms(-1) cm(-1)) compared to un-doped ones. The films were characterized by scanning electron microscopy (SEM) and Raman spectroscopy. Near edge X-ray fine structure studies showed that the nitrogen-doped NCD had slightly higher sp2/sp3 bonding ratio compared to the un-doped sample. A nitrogen-doped NCD electrode was functionalized by conducting polymer films (polyaniline) to work as an interface for biomedical applications. Glucose sensing has been demonstrated based on this functionalized electrode. Linear response of the sensor has been observed for glucose concentration up to 9 mM.     

Ar流量对磁控溅射制备Al掺杂ZnO薄膜的影响

Al掺杂ZnO(AZO)具有电导率高、光学透射率高的优点,且原料来源丰富、制备成本低廉,被认为是最有应用潜力的透明导电薄膜.本文利用射频磁控溅射制备30 cm×30 cm尺寸大面积AZO薄膜,研究了气压恒定时,Ar流量对薄膜晶粒生长机制、电学和光学性能的影响.结果表明,AZO薄膜晶粒均表现出垂直基片方向的c轴择优取向生...     

Nitrogen-doped ZnO thin films grown on glass substrates by atomic layer deposition using NH3 as a doping source

Nitrogen-doped ZnO (ZnO:N) films were successfully grown on glass substrates by atomic layer deposition (ALD). NH3 was used as a doping source, and the substrate temperature was relatively low (90 approximately 210 degrees C). The main focus of the study was to report on the effect of the temperature on the electrical properties (e.g., carrier concentration, mobility, etc.) of the grown ZnO:N films. At all temperatures, the carrier was found to be n-type, and its electron concentration did not show much variation within the values between 3 x 10(16) and 6 x 10(16) cm-3; the mobility increased with the temperature (1 cm2/Vs at 110 degrees C, 5 cm2/Vs at 190 degrees C); and the resistivity decreased with the temperature (203 omegacm at 110 degrees C, 21 omegacm at 190 degrees C). The electrical properties are discussed in relation with the nitrogen concentration, crystallinity, crystal orientation, grain size, and surface morphology. The nitrogen concentration in the ZnO:N films was constant at all temperatures (approximately 2.5 atomic percent); the crystallinity and crystal orientation improved with the temperature; and the mean grain size increased with the temperature (13.2 nm at 110 degrees C, 35.3 nm at 190 degrees C). The results for the ZnO:N films were also compared with the results for the undoped ZnO films.     

Influence of molybdenum layer on the laser plasma generated from interfacing copper layer

The results for laser-induced breakdown spectroscopy (LIBS) measurement of thin Cu films (1 μm) on soda-lime glass (SLG) substrates with and without a supporting thin Mo layer (1 μm) are reported. The ablation was carried out using a nanosecond Q-switched Nd:YAG laser (λ=1064 nm, τ=4 ns, spot diameter=50 μm, top-hat profile) in the laser fluence range of 19.16-65.97 J/cm(2). It was found that, under the same laser irradiance conditions, the depth and morphology of ablation craters produced with and without the Mo layer were completely different. The electron number densities of the plasma from the two samples calculated from the measured LIBS spectra differed by a factor of 4 as 4.1×10(17) cm(-3) (Cu/Mo/SLG) and 17.7×10(17) cm(-3) (Cu/SLG), which was attributed to the matrix effects resulting from ionization of Na atoms diffused into the Mo layer. It is demonstrated that a nanosecond-laser-based LIBS is applicable for the characterization and composition analysis of thin film layers of a few micrometer thickness on glass substrates, especially for the measurement of Na contents of each layer.     

Effects of Homo-buffer Layer on Properties of Sputter-deposited ZnO Films

Two-step growth regimes were applied to realize a homoepitaxial growth of ZnO films on freestanding diamond substrates by radio-frequency(RF)reactive magnetron sputtering method.ZnO buer layers were deposited on freestanding diamond substrates at a low sputtering power of 50 W,and then ZnO main layers were prepared on this buffer layer at a high sputtering power of 150 W.For comparison,a sample was also deposited directly on freestanding diamond substrate at a power of 150 W.The effects of ZnO buffer layers...     

用氢气/甲醇混合气体在微波等离子体CVD中合成纳米晶粒金刚石膜

用微波等离子体增强化学气相沉积方法(MPECVD),利用氢气和甲醇的混合气体,在硅片上沉积出纳米晶粒的金刚石薄膜.用扫描电子显微镜(SEM)、拉曼光谱(Raman)、原子力显微镜(AFM)及扫描隧道显微镜(STM)对薄膜的晶粒平面平整性及纯度进行了表征.通过SEM发现,提高甲醇浓度或降低沉积温度可以减小金刚石膜的晶粒尺寸.拉曼光谱显示薄膜中确实存在纳米晶粒的金刚石,并且薄膜的主要成分为金刚石.用AFM测得薄膜表面的粗糙度Rms＜80m,STM观测晶粒的平均尺寸在10～20m之间.研究结果表明,用MPECVD方法,利用氢气和甲醇的混合气体是制备纳米晶粒金刚石膜的一种理想方法.     

Growth and characterization of diamond particles,diamond films,and CNT-diamond composite films deposited simultaneously by hot filament CVD

It is important to understand the growth of CNT-diamond composite films in order to improve the inter-link between two carbon allotropes, and, in turn, their physical properties for field emission and other applications. Isolated diamond particles, continuous diamond thin films, and thin films of carbon nanotubes (CNTs) having non-uniformly distributed diamond particles (CNT-diamond composite films) were simultaneously grown on unseeded, seeded, and catalyst pre-treated substrates, respectively, using a large-area multi-wafer-scale hot filament chemical vapor deposition. Films were deposited for four different growth durations at a given deposition condition. The changes in surface morphology and growth behavior of diamond particles with growth duration were investigated ex situ using field emission scanning electron microscopy and 2D confocal Raman depth spectral imaging, respectively. A surface morphological transition from faceted microcrystalline nature to nanocrystalline nature was observed as a function of growth duration in the case of isolated diamond particles grown on both unseeded and catalyst pre-treated substrates. However, such a morphological transition was not observed on the simultaneously grown continuous diamond thin films on seeded substrates. 2D confocal Raman depth spectral imaging of diamond particles showed that the local growth of CNTs did not affect the growth behavior of neighboring diamond particles on catalyst pre-treated substrates. These observations emphasize the importance of surface chemical reactions at the growth site in deciding sp² or sp³ carbon growth and the final grain size of the diamond films.     

Pyrite Films Grown by Sulfurizing Precursive Iron of Different Crystallizing Status

Precursive iron films with different grain sizes were prepared by magnetron sputtering on substrates heated at different temperatures. The iron films were sulfurized at 673 K for 20 h to form pyrite films. The structural and electrical characters were determined. High substrate temperatures produce large crystallites in the precursive iron films. The pyrite films are composed of a surface layer with coarse columnar grains and a bottom layer with fine equiaxed grains. With the increase of iron grain scale, the carrier concentration decreases and the carrier mobility increases. The electrical resistivity of the pyrite films increases to a maximum in the precursive iron films with increasing the grain size to about 39 nm. Sufficient formation and growth of iron grains result in improved crystallinity and high continuity of the pyrite films. The crystal defect density, transformation stress level and atom diffusion behavior are responsible for the characteristics of the electrical properties dependent on the crystallinity and continuity of the pyrite films or the crystallizing status of the precursive iron films.     

透明导电InSnGaMo氧化物薄膜光电性能研究

利用脉冲激光沉积法在石英衬底上制备出了可见光透过率高、电阻率极低的Ga,Mo共掺杂ITO基InSnGaMo复合氧化物薄膜。研究了衬底温度对薄膜结构、表面形貌、光电性能的影响。实验结果表明:衬底温度对InSnGaMo复合氧化物薄膜形貌、光电性能均有很大影响。X射线衍射、扫描电镜和霍尔测试结果表明,随着衬底温度的升高,薄膜晶粒度增大,电阻率快速下降,可见光平均透过率明显提高。当衬底温度为450℃时,InSnGaMo复合氧化物薄膜的电阻率最低为4.15×10-4Ω.cm,载流子浓度和迁移率最大分别为3×1020cm-3,45 cm2V-1s-1,在可见及近红外区平均透过率达92%,特别地,波长为362 nm时,最高透射率可达99%。     

Effects of Substrate Temperature on Properties for Transparent Conducting ZnO:A1 Films on Organic Substrate Deposited by r.f. Sputtering

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Structural and optical properties of ultrananocrystalline diamond / InGaAs/GaAs quantum dot structures

The combination of the unique properties of ultrananocrystalline diamond (UNCD) films and of semiconductor quantum dot (QD) structures could significantly improve the performance of different electronic and optoelectronic devices, where e.g. good thermal management and advanced mechanical parameters are required. In the current work quantum dot InGaAs/GaAs heterostructures have been grown by molecular beam epitaxy (MBE) with different densities between 1.6 × 10¹⁰ cm^− 2 and 1.6 × 10¹¹ cm^− 2 controlled by the substrate temperature in the range between 490 and 515 °C. These structures were overgrown with UNCD by microwave plasma chemical vapor deposition (MWCVD) using methane/nitrogen mixtures at 570 °C. Scanning electron microscopy (SEM) reveals that without ultrasonic pretreatment the diamond nucleation density on QD structures is low and only separate islands of UNCD are deposited, while after pretreatment thin closed films are formed. From the cross-section SEM images a growth rate of ca. 3 nm/min is estimated which is very close to that on silicon at the same deposition conditions. The UNCD coatings exhibit a morphology consisting of two types of structures as shown by atomic force microscopy (AFM). The first one includes nodules with diameters between 180 and 350 nm varying with the density of the underlying QDs; the second is formed by a kind of granular substructure of these nodules with diameters of about 40 nm for all QD densities. The optical properties were investigated by photoluminescence (PL) spectroscopy before and after the deposition of UNCD. The PL signals of QD structures overgrown with UNCD, although with decreased intensity, remain almost unchanged with respect to the peak positions and widths, revealing that the UNCD/QD structures retain the optical properties of uncoated InGaAs/GaAs quantum dots.