共查询到20条相似文献,搜索用时 11 毫秒
1.
The effect of the substrate-pad physical properties (surface roughness and hardness) on the current-carrying capacity of anisotropic-conductive
film (ACF) joints is investigated in this work. Flip chips with Au bumps were bonded to the flexible substrates with Au/Cu
and Au/Ni/Cu pads using different bonding pressure. It was found that the current-carrying capacity of ACF joints increased
to a maximum value with the rise of the bonding pressure; then, it reduced if the bonding pressure continually increased.
The maximum average value per unit area of Au/Ni/Cu pad and Au/Cu pad ACF joints is about 93 μA/μm2 and 118 μA/μm2, respectively, at 100-MPa bonding pressure. The variation trend of connection resistance is the opposite of current-carrying
capacity. The variation of current-carrying capacity (or connection resistance) of Au/Cu pad joints is larger than that of
Au/Ni/Cu pad joints. The current-carrying capacity is related to the variation of the resistance of ACF joints. The connection
resistance of ACF joints depends primarily on the particle constriction resistance (Rcoi), Rcoi ∞ 1/a, where “a” is the radius of contact spot. A smaller contact area results in larger joule heat generation per unit volume
(Qg), Qg ∞ 1/a4, which preferentially elevates the temperature of the constriction. The raised temperature increases the resistance because
of the temperature-dependent coefficient of the metal resistivity. The theory of tribology is used to explain the difference
between Au/Cu pad and Au/Ni/Cu pad ACF joints. For the Au/Cu pad ACF joints, the deformation of the particles’ upper and bottom
sides is nearly symmetrical; the contact between conductive particles and pad has the character of “sliding contact,” especially
under high pressure. For the Au/Ni/Cu pad ACF joint, the contact between particles and pad determined the conduction characteristics
of ACF joints. It has the character of “static contact.” Thus, the current-carrying capacity (or connection resistance) of
Au/Cu pad joints is more sensitive to the bonding pressure. 相似文献
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System-on-Chip and System-on-Package technologies have advantages depending on application needs. As a number of electrical and electronic equipment manufacturers have an interest in increasing CMOS technology densities, a range of two- and three-dimensional silicon integration technologies are emerging which will support next-generation high-end semiconductors such as high speed microprocessors and high speed memories. However, there are many issues regarding process integration, thermal management, and reliability of 3D stacked package.In this study, the printed circuit board (PCB), silicon carrier and silicon chip are integrated with ultrasonic vibration. Die shear tests of the joints were carried out with increasing bonding time and input power to optimize the bonding condition. The integrated chips were successfully bonded to the PCB with and without NCF using a transverse ultrasonic bonding. Electrical resistance of multi-chip bonded with NCF (10 mΩ) measures lower than that bonded without NCF (28.9 mΩ). The voids and delamination were easily found on the joint bonded without NCF that caused lower shear strength. 相似文献
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This paper presents the technology for the design and fabrication of planar resistive heaters made from vacuum deposited nichrome thin films on a quartz substrate. These heaters are suitable as isolated local heat sources for melting solder to attach discrete components on a hybrid optoelectronic integration platform. Numerical simulations are performed using the Finite Element Method (FEM) to determine the geometry of the heaters in order to deliver adequate thermal performance. Multiple heater elements are batch processed on a 3.0 in polished fused quartz wafer using standard photolithographic techniques. Use of polyimide as a reliable insulation layer between the nichrome thin film and the solder has improved the thermal uniformity over the heater surface. Individual heaters can reach temperatures close to 300/spl deg/C drawing 7.1 W of power on an uncooled alumina platform and 12.0 W on an uncooled copper platform. This temperature is high enough to melt gold-tin (AuSn) solder (with eutectic melting point of 280/spl deg/C), typically used for attaching different optoelectronic components on a substrate. 相似文献
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Gonzalez C.G. Wessel R.A. Padlewski S.A. 《Advanced Packaging, IEEE Transactions on》1999,22(3):385-390
DuPont formulated a new generation of photoimageable permanent resists and conductive ViaPlug polymer to be used as building blocks for sequential build-up of printed circuit boards (PCB's), multichip module-laminates (MCM-Ls), and plastic integrated circuit (IC) packages. The buzzwords for these structures are high density interconnection structures (HDIS) and microvias. The conventional method of making PCB's and MCM-Ls is a sequential lamination of innerlayer cores or interplanes, followed by at least one mechanical drilling. In this paper we will discuss a new approach of using semi-additive plating which means starting with a multilayer core, mechanically drilling for through hole connection, filling the through-hole with conductive ViaPlug, then adding layers of dielectric to make blind or buried vias for interconnection and routing of circuits, and heat dissipation. The paper will discuss the challenges in each application, relevant industry specifications for each application, and the dielectric and conductor materials properties to meet the challenges. From the viewpoint of technology choices, we will compare photoimaging versus laser ablation and plasma etching. Lastly, we will discuss our reliability data developed internally and in conjunction with several consortia 相似文献
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Mridul Sakhuja Jaesung Son Lalit K. Verma Hyunsoo Yang Charanjit S. Bhatia Aaron J. Danner 《Progress in Photovoltaics: Research and Applications》2014,22(3):356-361
Antireflective light trapping glass nanostructures fabricated by a non‐lithographic process are investigated for their angle dependent properties to improve the omnidirectional performance of solar modules. Optical transmission and solar cell module I‐V measurements are used to understand the dependence of angular performance of nanostructures in the packaging glass. Nanostructures 100–400 nm in height demonstrate an increase in solar light transmission both for normal as well as oblique incidence and measurements show that a ~200‐400 nm nanostructure height is optimum for solar modules, providing an absolute increase of 1% in the power conversion efficiency at normal incidence and a gain in short circuit current density over a 120° angular cone of solar incidence. This shows that packaging glass texturing can be an important and often‐overlooked method to yield substantial gain in solar module efficiency. Copyright © 2012 John Wiley & Sons, Ltd. 相似文献
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Thermal management plays a very vital role in the packaging of high performance electronic devices. Effective heat dissipation is crucial to enhance the performance and reliability of the packaged devices. Liquid encapsulants used for glob top, potting, and underfilling applications can strongly influence the package heat dissipation. Unlike molding compounds, the filler loading in these encapsulants is restrained. This paper deals with the development and characterization of thermally conductive encapsulants with relatively low filler loading. A comparative study on the effect of different ceramic fillers on the thermal conductivity and other critical properties of an epoxy based liquid encapsulant is presented 相似文献
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Xia Cai Weidong Huang Bulu Xu Gisela Kaltenpoth Zhaonian Cheng 《Journal of Electronic Materials》2002,31(5):449-455
The absorption and desorption processes of moisture in plastic material were studied with experimental measurement and finite
element (FE) simulation. The diffusion coefficient and the saturate concentration were determined by experiment and simulation
results with Fick’s law. The water molecules inside the plastic material were chemically bonded with polymers by hydrogen
bonds in the microholes formed by the polymer molecule chains. On the saturate concentration, the moisture density in the
effective volumes was 100 times larger than the vapor density in standard state. However, it is only 8% of liquid water. The
water inside the plastic material was in a liquid situation. The delamination and the delamination recovery of flip-chip packaging
inspected by C-mode scanning acoustic microscropy (C-SAM) during a high-temperature and high-humidity accelerating test could
be explained with the state change of the water in plastic material space. The delamination recovery resulted from the increase
in content of liquid water. The bonding of water molecules and polymers reduced the adhesive strength at the interface between
epoxy material and die, and the delamination on the interface was initiated. A comparison of three cases with noncoated film,
top-side SiCx coated, and both-sides SiCx coated indicated that the delamination would occur when the moisture concentration was between 50% and 95% of the saturate
concentration. During the reflow process, the low interface-adhesive strength and the high vapor pressure of the wet sample
might cause popcorning of the plastic packaging. Popcorning could be predicted by simulation of the moisture concentration
at the interface. 相似文献
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B. Wang S. Tanaka B. Guo G. Vereecke S. Severi A. Witvrouw M. Wevers I. De Wolf 《Microelectronics Reliability》2011,51(9-11):1878-1881
Thermal desorption spectroscopy (TDS) was used to study outgassing from polycrystalline SiGe (poly-SiGe), SiC and SiO2 films used for poly-SiGe-based MEMS thin film vacuum package technology. Primary desorption products were found to be H2, H2O and CO2. The CO2 outgassing could be correlated with CF4 plasma interface cleaning used for thick SiGe PECVD, which can leave carbon at the CF4-plasma-cleaned interface. 相似文献
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Yoshimura T. Kumai K. Mikawa T. Ibaragi O. Bonkohara M. 《Electronics Packaging Manufacturing, IEEE Transactions on》2002,25(1):19-25
"Photolithographic packaging (PL-pack) with selectively occupied repeated transfer (SORT)" is proposed for optoelectronic microsystem integration. PL-pack with SORT integrates different types of thin-film device pieces into one substrate with desired configurations using an all-photolithographic process. A process design example is presented for a scalable film optical link multichip-module (S-FOLM). A preliminary estimation reveals that PL-Pack with SORT will achieve III-V epitaxial material saving of <1/100 and module cost reduction of <1/10, compared with flip-chip-bonding-based packaging. The result indicates that the process will save on cost and resources simultaneously. A critical issue is how to simplify the procedure for distributing thin-film device pieces onto a substrate. SORT is found to reduce the distribution step count typically by factor of <1/10-1/10000 compared with the conventional one-by-one method. PL-pack with SORT will be extended to the 3R process (reduce, reuse, recycle), which is generally applied to a variety of device/module fabrications 相似文献
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Micromachined packaging for chemical microsensors 总被引:1,自引:0,他引:1
The critical issues involved in chemical microsensor packaging and encapsulation are reviewed and a hybrid solution is presented. In the design approach, the microsensor is divided into two principal physical parts, an electrode and electronics-containing substrate, and a micromachined membrane package. The fabrication and the resultant performance of each part are independently optimizable. The final microsensor is constructed by first binding the two parts together at the wafer level, followed by die separation, and then lead attachment. The micromachined membrane-holders are then filled with liquid membranes to yield functioning sensors. A calcium-ion sensor fabricated by this method is demonstrated 相似文献
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R. de Reus C. Christensen S. Weichel S. Bouwstra J. Janting G. Friis Eriksen K. Dyrbye T. Romedahl Brown J. P. Krog O. Sndergrd Jensen P. Gravesen 《Microelectronics Reliability》1998,38(6-8)
Packaging concepts for silicon-based micromachined sensors exposed to harsh environments are explored. By exposing the sensors directly to the media and applying protection at the wafer level the packaging and assembly will be simplified as compared to conventional methods of fabrication.Protective coatings of amorphous silicon carbide and tantalum oxide are suitable candidates with etch rates below 0.1 Å/h in aqueous solutions with pH 11 at temperatures up to 140°C. Si-Ta-N films exhibit etch rates around 1 Å/h. Parylene C coatings did not etch but peeled off after extended exposure times at elevated temperatures. The best diamond-like carbon films we tested did not etch, but delaminated due to local penetration of the etchants.Several glue types were investigated for chip mounting of the sensors. Hard epoxies, such as Epotek H77, on the one hand exhibit high bond strength and least degradation and leakage, but on the other hand introduce large sensor output drift with temperature changes. Softening of the Epo-tek H77 was observed at 70°C.An industrially attractive thin-film anodic silicon-to-silicon wafer bonding process was developed. Glass layers are deposited at 20 nm/s (1.2 μm/min) by electron-beam evaporation and bond strengths in excess of 25 N/mm2 are obtained for bonding temperatures higher than 300°C.Through-hole electrical feedthroughs with a minimum line width of 20μm and a density of 250 wires per cm were obtained by applying electro-depositable photo-resist. Hermetically sealed feedthroughs were obtained using glass frits, which withstand pressures of 4000 bar. 相似文献
16.
JIN Yu-feng WANG Zhen-feng WEI Jun 《微纳电子技术》2003,40(7):207
It is well known that packaging plays a very important role in developing microsystems. Packaging accounts for about 60%~80% of costand function of a microsystem. Package is required to provide mechanical protection, media separation or coupling, signal conditioning, etc. 相似文献
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C. A. Neugebauer 《Journal of Electronic Materials》1989,18(2):229-239
This paper concentrates on the materials requirements anticipated for future packaging strategies of electronic components
beyond the 1st level package. This includes Wafer Scale Integration (Level 0), hybrid assembly of bare chips in multichip
modules (Level 1.5), printed wiring board (PWB) assembly, including surface mount (Level 2), and higher levels (connectors,
mother boards, and cables). Furthermore, high-performance digital VLSI logic packaging only is addressed, to the exclusion
of memory, analog, and power circuitry (except power supplies). 相似文献