Effects of ammonia concentration on property of Cd1−xZnxS films by chemical bath deposition

Cd_1−xZn_xS thin films were grown on soda–lime glass substrates by chemical-bath deposition (CBD) at 80 °C with stirring. All the samples were annealed at 200 °C for 60 min in the air. The crystal structure, surface morphology, thickness and optical properties of the films were studied with transmission electron microscopy (TEM), X-ray diffraction (XRD), scanning electron microscopy (SEM), step height measurement instrument and spectrophotometer respectively. The results revealed that Cd_1−xZn_xS thin films had cubic crystal structure and the intensity of the diffraction peak increased gradually as ammonia concentration rose and the grain size varied from 5.1 to 8.3 nm. All of Cd_1−xZn_xS thin films had a granular surface with some smaller pores and the average granule sizes increased from 92 to 163 nm with an increase in ammonia concentration. The Cd_1−xZn_xS thin films had the highest transmittance with ammonia concentration of 0.5 M L⁻¹, whose thickness was 50 nm and band gap was 2.62 eV.     

Pulsed laser deposition and characterization of La1−xSrxMnO3

La_1−xSr_xMnO₃ manganite films with x=0.15, 0.33 and 0.4 were deposited onto silicon substrates by pulsed laser deposition in an 80/20 Ar/O₂ atmosphere at room temperature. After being deposited, the films were annealed at 900 °C in air in order to obtain the desired crystalline phase. Structural characterizations using X-Ray diffraction showed polycrystalline compounds having the predominant peaks corresponding to the perovskite structure. Morphological studies carried out by scanning electron microscopy revealed a very rough surface and led to deducing the nature of the growth process. Spectral ellipsometry was performed between 1.5 and 5 eV range at room temperature, showing electronic transitions near to 2.2 and 4.7 eV in a range of thicknesses between 94 and 107 nm.     

Structural characterization of Zn1−xCdxO (0≤x≤0.20) microrods grown by spray pyrolysis

Zn_1−xCd_xO (x= 0.00, 0.05, 0.10, 0.15 and 0.20) thin films were obtained by spray pyrolysis and characterized by XRD, SEM, EDAX and optical measurements. The Zn_1−xCd_xO microrods are in the wurtzite crystallographic phase with (0 0 2) preferred orientation. A narrowing of the fundamental band gap from 3.30 to 3.10 eV was observed with the increasing nominal Cd content up to 20 at% due to the direct modulation of the band gap caused by Cd substitution. The undoped ZnO film showed two emission bands in the spectra: one sharp UV luminescence at ∼382 nm and one broad visible emission ranging from 430 to 600 nm. The sharp peak at ∼382 nm is split into two at 376 and 400 nm upon Cd doping at levels of 5 and 10 at%. However this splitting is not observed in the doped ZnO samples containing 15 at% Cd and more. It should also be mentioned that the broad peak at the range of 430–600 nm has almost disappeared in the films containing 5, 10 and 15 at% Cd.     

Effect of processing parameter on structural,optical and electrical properties of photovoltaic chalcogenide nanostructured RF magnetron sputtered thin absorbing films

The aim of this work was to develop high quality of CuIn_1−xGa_xSe₂ thin absorbing films with x (Ga/In+Ga)<0.3 by sputtering without selenization process. CuIn_0.8Ga_0.2Se₂ (CIGS) thin absorbing films were deposited on soda lime glass substrate by RF magnetron sputtering using single quaternary chalcogenide (CIGS) target. The effect of substrate temperature, sputtering power & working pressure on structural, morphological, optical and electrical properties of deposited films were studied. CIGS thin films were characterised by X-ray diffraction (XRD), Field emission scanning electron microscope (FE-SEM), Energy dispersive X-ray spectroscopy (EDAX), Atomic force microscopy (AFM), UV–vis–NIR spectroscopy and four probe methods. It was observed that microstructure, surface morphology, elemental composition, transmittance as well as conductivity of thin films were strongly dependent on deposition parameters. The optimum parameters for CIGS thin films were obtained at a power 100 W, pressure 5 mT and substrate temperature 500 °C. XRD revealed that thin film deposited at above said parameters was polycrystalline in nature with larger crystallite size (32 nm) and low dislocation density (0.97×10¹⁵ lines m⁻²). The deposited film also showed preferred orientation along (112) plane. The morphology of the film depicted by FE-SEM was compact and uniform without any micro cracks and pits. The deposited film exhibited good stoichiometry (Ga/In+Ga=0.19 and In/In+Ga=0.8) with desired Cu/In+Ga ratio (0.92), which is essential for high efficiency solar cells. Transmittance of deposited film was found to be very low (1.09%). The absorption coefficient of film was ~10⁵ cm⁻¹ for high energy photon. The band gap of CIGS thin film evaluated from transmission data was found to be 1.13 eV which is optimum for solar cell application. The electrical conductivity (7.87 Ω⁻¹ cm⁻¹) of deposited CIGS thin film at optimum parameters was also high enough for practical purpose.     

Aluminum titanium oxide alloys: Deposition of amorphous,transparent, corrosion-resistant films by pulsed DC reactive magnetron sputtering with RF substrate bias

Optically transparent and mechanically flexible encapsulation films are desirable for advanced optoelectronic devices. Among many variations of encapsulation, ternary metal oxide films present good optical and mechanical properties. In this study, aluminum titanium oxide (Al_1−xTi_xO_y) films were deposited with a range of Ti/(Ti+Al) molar fractions (x) using pulsed DC magnetron sputtering with RF substrate bias. Subsequently, the films were subjected to an Accelerated Weathering Environment (AWE) test at 220 °C, 1.6 atm and ~100% RH for 3 h. Optical, chemical, and morphological analyses revealed that there exists a range of Ti/(Ti+Al) molar fraction (x=0.4–0.7) where films withstood the test, maintaining their optical, chemical, and morphological integrities. The study suggests that encapsulation films with continuously and spatially varying refractive index can be available by varying x within this range, forming encapsulation with broadband, wide angle antireflective coatings.     

Characterization of ternary MgxZn1−xO thin films deposited by electron beam evaporation

Mg_xZn_1−xO (0≤x≤1) thin films were deposited on glass and quartz substrates by electron beam evaporation and effect of the Mg content of the film on its structural, optical and electrical properties were investigated. The structure, surface morphology, optical transmittance, band gap, refractive index and electrical resistivity were found to depend on the Mg content of the film. XRD data revealed that films were polycrystalline in nature. The structure of the films having Mg content in the range of 1–0.74 was cubic, mixed cubic-hexagonal phases for x=0.47 and hexagonal phase for x=0. The composition analysis showed that Mg content in Mg_xZn_1−xO film is high as compared to the corresponding target alloy. It was observed that the optical band gap increases from 3.3 to 6.09 eV, refractive index at 550 nm decreases from 1.99 to 1.75, transmittance increases from about 70% to 90% and electrical resistivity increases from 0.5 to 1.48×10⁶ Ω cm with the increase of Mg concentration in the film from 0 to 1. The results reported in this work are useful for window layer of solar cells and other optoelectronic devices.     

Influence of copper concentration on the opto-structural,morphological and electrical properties of novel MoSb2−xCuxSe2 thin films

In this work, MoSb_2−xCu_xSe₂ nanocrystalline thin films obtained for different copper concentrations (0.1, 0.2 and 0.3 M) on glass substrates by simple chemical bath deposition (CBD) method at room temperature. X-ray diffraction (XRD) patterns revealed the incorporation of copper content by the conversion of orthorhombic Sb₂Se₃ into orthorhombic Cu₃SbSe₃ with shift to higher angles. Average crystallite was found to be 24, 36 and 39 nm for the deposited films. FESEM analysis indicates that morphological transition from spherical grains with cylindrical nanorods to porous nanofibers for 0.3 M and HRTEM confirms the FESEM results with an average grain size of 200 nm for 0.1 M Cu concentration. EDS analysis confirmed the formation of MoSb_2−xCu_xSe₂ thin films. Current–Voltage (I–V) measurements clearly depicted the ohmic nature of the material in the entire region. Thickness of the films was found to be increased with increase in copper content. The band gap energy (E_g) of the film is in the range of 1.644–3.757 eV.     

Influence of substrate type on the structural,optical and electrical properties of CdxZn1−xS MSM thin films prepared by Spray Pyrolysis method

0.25 μm Cd_xZn_1−xS thin films were deposited on Si and glass substrates by using a chemical Spray Pyrolysis technique (CSP). Measurements of the absorption spectrum of the film were carried out. The values of band gaps (E_g) are calculated from the absorption spectrum. X-ray diffraction (XRD) of the Cd_xZn_1−xS thin films on Si and glass substrates was carried out. The full width at half-maximum (FWHM)) of diffraction peak was calculated to be about 0.640, which showed that it is a polycrystalline thin film. A Cd_xZn_1−xS Metal–Semiconductor–Metal (MSM) photodetector with nickel (Ni) contact electrodes was then fabricated. The electrical property of the Ni/Cd_xZn_1−xS/Si and Ni/Cd_xZn_1−xS/glass detectors was investigated using the current–voltage (I–V) measurements. The barrier heights ϕ_Β of Ni/Cd_xZn_1−xS/Ni MSM on Si and glass substrates were 0.551 eV and 0.593 eV, respectively with an applied bias voltage of 3 V.     

Preparation and luminescent properties of novel red phosphors for white-light emitting diodes (W-LEDs) application

A series of Eu³⁺–Gd³⁺ co-doped solid solution of Ca_0.54Sr_{0.46–1.5x–1.5z}Eu_zGd_x (MoO₄)_y (WO₄)_1−y (x=0.01–0.20, y=0–1.0, z=0.01–0.30) have been prepared by solid-state reactions. It is found that appropriate amount of Mo⁶⁺ or W⁶⁺, Eu³⁺ and Gd³⁺concentrations can enhance the luminescent intensity and improve crystal structure. These phosphors can be effectively excited by ultraviolet light at 394 nm and blue light at 465 nm (f–f transition) and emits red light (616 nm) with line spectrum. The wavelengths at 394 and 465 nm are nicely fitted in with the widely applied output wavelengths of ultraviolet or blue LED chips.     

Influence of magnesium doping on the structural and optical properties of tin (II) oxide thin films deposited by electron beam evaporation

Single-phase polycrystalline magnesium-doped tin oxide (Mg_xSn_1?xO; x=0, 0.04, and 0.08) thin films were deposited by electron beam evaporation on the glass substrate. X-ray diffraction analysis showed that the peaks intensity of the polycrystalline α-SnO thin films increased along with the increasing Mg content. The crystallite size calculated from X-ray diffraction data decreased by increasing the Mg doping concentration, which was also confirmed by atomic force microscopy. The stoichiometry and thickness of the thin films were determined by Rutherford backscattering spectroscopy. An increase in both the optical transmission (57–95%) and band gap (2.5–2.82 eV) of the Mg_xSn_1?xO thin films were observed which were investigated by UV–vis spectroscopy. Photoluminescence of Mg_xSn_1?xO thin films revealed that there were two extra peaks at 482 nm and 550 nm due to the crystal defects introduced by the Mg doping and these peaks become weaker and shifted to longer wavelength by increasing the Mg doping concentration.     

Effect of cobalt substitution on the optical properties of bismuth ferrite thin films

Effect of cobalt substitution on the band gap and absorption coefficient of the BiFeO₃ thin films formed on quartz substrate by low cost spin coating method have been investigated. BiFe_1−xCo_xO₃ (x=0, 0.03, 0.06 and 0.10) thin films are polycrystalline and it retains the rhombohedral distorted perovskite structure up to 10 mole % of Co substitution. Smooth and compact surface morphology with uniform size particles are observed in SEM micrographs. Narrowing and broadening of band gap is observed as a function of Co content. Two strong emission peaks at ~2.51 eV and ~2.38 eV are recorded for all films with noticeable change in intensity. Results obtained from the optical absorption and photoluminescence spectroscopy experiments have shown that there exists an inverse correlation between the variation in the band gap and the concentration of oxygen vacancies. Band gap decreased by ~100 meV and absorption coefficient increased by 28% at the wavelength of 375 nm in 6 mole % Co substituted thin film and these observations are necessary requirements to improve the efficiency of photovoltaic devices.     

Influence of cadmium concentration on the optical and structural properties of cadmium selenide thin films

Thin films of cadmium selenide (CdSe) and Cd_xSe_100−x (x=54, 34) have been deposited by vacuum evaporation onto ultraclean glass substrates at room temperature from as-prepared powders. Fabricated samples were characterized using X-ray diffraction (XRD), UV–vis and Fourier transform infrared (FTIR) spectroscopy. XRD indicated the formation of polycrystalline Cd_xSe_100−x thin films polycrystalline in nature with the preferred orientation along the (002) plane. The crystallite sizes of thin films calculated by the Scherer formula were found to be in the range of 29–82 nm. The crystallinity of thin films degraded on increasing the Cd concentration in the Cd–Se system. The band gaps of thin films were obtained from their optical absorption spectra, which were found in the range of 1.69–2.20 eV. The band gap of the Cd₃₄Se₆₆ thin films was found to be very high because of the decrease of their crystallites sizes in comparison to the CdSe and Cd₅₄Se₄₆ thin films. From the FTIR spectra it was revealed that the Cd–Se peaks shifted to lower wavelengths with increase in selenium concentration. The SEM measurements for CdSe, Cd₅₄Se₄₆ and Cd₃₄Se₆₆ thin films reveal that the particle size and the crystalline nature decreased when Se content increased in the system.     

Pulse electrodeposited copper indium sulfide films

Copper indium sulfide (CISu) films were deposited by the pulse galvanostatic deposition technique at different duty cycles. The films are polycrystalline with peaks corresponding to the chalcopyrite phase of CISu. The grain size and surface roughness increased from 10 to 25 nm and 0.85 to 2.50 nm respectively with increase of duty cycle. Optical band gap in the range of 1.30–1.51 eV was observed for the films deposited at different duty cycles. Room temperature resistivity of the films is in the range of 0.1–3.67 Ω cm. Photoconductivity measurements were made at room temperature. Photocurrent spectra exhibited maximum corresponding to the band gap of copper indium sulphide. CdS/CuInS₂ fabricated with CISu films deposited at 50% duty cycle have exhibited a V_oc of 0.62 V, J_sc of 16.30 mA cm^?2, FF of 0.71 and efficiency of 7.16%.     

Characterization of CoxNiyO hybrid metal oxide nanoparticles as charge trapping nodes in nonvolatile memory devices

The Co_xNi_yO hybrid metal oxide nanoparticles (HMONs) embedded in the HfO_xN_y high-k dielectric as charge trapping nodes of the nonvolatile memory devices have been formed via the chemical vapor deposition using the Co/Ni acetate calcined and reduced in the Ar/NH₃ ambient. A charge trap density of 8.96 × 10¹¹ cm^?2 and a flatband voltage shift of 500 mV were estimated by the appearance of the hysteresis in the capacitance–voltage (C–V) measurements during the ±5 V sweep. Scanning electron microscopy image displays that the Co_xNi_yO HMONs with a diameter of ～10–20 nm and a surface density of ～1 × 10¹⁰ cm^?2 were obtained. The mechanism related to the writing characteristics are mainly resulted from the holes trapping. Compared with those devices with the Co_xNi_yO HMONs formed by the dip-coated technique, memory devices with the Co_xNi_yO HMONs fabricated by the drop-coated technique show improved surface properties between the Co_xNi_yO HMONs and the HfON as well as electrical characteristics.     

Broadband triple-layer SiOx/SiOxNy/SiNx antireflective coatings in textured crystalline silicon solar cells

The purpose of this study is to reduce textured crystalline silicon (TCS) substrate surface-reflectivity over a wide spectral range (300–1100 nm), to improve the step coverage of the textured structure, and to shift the minimal value of reflection from the unabsorbed region to the absorbed region. The TCS solar-cell interface between air and silicon was added to a SiO_x/SiO_xN_y/SiN_x triple-layer anti-reflective coatings (TLARCs) structure using the plasma-enhanced chemical vapor deposition (PECVD) growth method. This paper presents theoretical and practical discussions, as well as the experimental results of fabricating the films and devices. The average reflection of the SiO_x/SiO_xN_y/SiN_x TLARs reduced to 2.01% (300–1100 nm). The minimal value of reflection was shifted from 1370 nm (unabsorbed region) to 968 nm (absorbed region). The SEM images show effective step coverage. In comparison to the untreated TCS solar cells, applying the experimental SiO_x/SiO_xN_y/SiN_x TLARCs to conventional TCS solar cells improved the short-circuit current density (J_sc) by 7.78%, and solar-cell efficiency by 10.95%. This study demonstrates that the SiO_x/SiO_xN_y/SiN_x TLARCs structure provides antireflective properties over a broad range of visible and near-infrared light wavelengths. An effective step coverage and minimal value of reflection from unabsorbed region shift to the absorbed region is demonstrated.     

Physical investigations on (In2S3)x(In2O3)y and In2S3−xSex thin films processed through In2S3 annealing in air and selenide atmosphere

In₂S_3−xSe_x and (In₂S₃)_x(In₂O₃)_y thin films have been prepared on glass substrates using appropriate heat treatments of In evaporated thin films. X-ray analysis shows that In thin films which were annealed under sulfur atmosphere at 350 °C were mainly formed by In₂S₃. A heat treatment of this binary in air at 400 °C during one hour leads to (In₂S₃)_x(In₂O₃)_y ternary material which has a tetragonal structure with a preferred orientation of the crystallites along the (109) direction. Similarly, a heat treatment of In₂S₃ in selenium atmosphere at 350 °C during six hours leads to a new In₂S_3−xSe_x ternary material having tetragonal body centered structure with a preferred orientation of the crystallites along the (109) direction. Optical band gap, refractive index and extinction coefficient values of In₂S_3−xSe_x and (In₂S₃)_x(In₂O₃)_y thin films have been reached. Moreover, correlations between optical conductivity, XRD, AFM and Urbach energy of such ternary thin films have been discussed. Finally, the recorded formation disparity between the quaternary (In₂S₃)_x(In₂O₃)_y and ternary In₂S_3−xSe_x compounds has been discussed in terms of the Simha–Somcynsky and Lattice Compatibility theories.     

Device characteristics of AlGaN/GaN MIS–HEMTs with high-k HfxZr1−xO2 (x = 0.66, 0.47, 0.15) insulator layer

This study investigates the characteristics of AlGaN/GaN MIS–HEMTs with Hf_xZr_1−xO₂ (x = 0.66, 0.47, and 0.15) high-k films as gate dielectrics. Sputtered Hf_xZr_1−xO₂ with a dielectric constant of 20–30 and a bandgap of 5.2–5.71 eV was produced. By increasing the Zr content of HfZrO₂, the V_TH shifted from −1.8 V to −1.1 V. The highest Hf content at this study reduced the gate leakage by approximately one order of magnitude below that of those Zr-dominated HFETs. The maximum I_DS currents were 474 mA/mm, 542 mA/mm, and 330 mA/mm for Hf content of 66%, 47%, 15% at V_GS = 3 V, respectively.     

Direct synthesis of quaternary Cd(Zn,S)Se thin films: Effects of composition

In the present communication, the binary CdSe and quaternary Cd_1-xZn_xSe_1-yS_y (0 ≤ x = y ≤ 0.35) thin films were synthesized using a chemical bath deposition. Thin film deposition was carried out at the optimized conditions (pH = 10 ± 0.1, deposition temperature = 70 ± 0.1 °C, deposition time = 100 min and substrate rotation speed = 65 ± 2 rpm). X-ray diffraction studies confirmed hexagonal-wurtzite crystal structure with the formation of quaternary Cd(Zn, S)Se phase along with binary CdSe, CdS, ZnS and ZnSe, phases of the as-grown Cd_1-xZn_xSe_1-yS_y thin films. Elemental analysis showed presence of Cd²⁺, Zn²⁺, S^2- and Se^2- in the deposited films. Fourier transform infrared spectroscopy shown the bands at 911.15 cm⁻¹ – 901.62 cm⁻¹ which are assigned to the stretching frequency of Cd–Se bond. Scanning electron microscopy show transformation of the microstructure from globular crystallites to a rhomboid flake like network. The electrical conductivity was typically ≈ 10⁻⁷ Ω⁻¹ cm⁻¹. At low temperatures, the conduction was by variable range hopping, and this changed to thermally activated grain boundary dominated conduction for T > 350 K.     

YBCO/YSZ coated conductors on flexible Ni alloy substrates

A coating system for the deposition of in-plane oriented yttria-stabilized zirconia (YSZ) template films on 1 cm wide flexible metal substrates is presented. In static mode, the system is capable of producing high quality template films on 20 cm substrate lengths. In a continuous coating mode, the system is capable of producing good quality template films on 1.1 m substrate lengths. Superconducting YBa₂Cu₃O_7−δ (YBCO) films subsequently deposited onto these template films have demonstrated critical currents (I_c) of 200 A (1.5 cm length), 70 A (12 cm length) and 4 A (1 m length).     

Interface studies of ALD-grown metal oxide insulators on Ge and III–V semiconductors (Invited Paper)

Atomic layer deposited (ALD) HfO₂/GeO_xN_y/Ge(1 0 0) and Al₂O₃/In_0.53Ga_0.47As(1 0 0) ? 4 × 2 gate stacks were analyzed both by MOS capacitor electrical characterization and by advanced physical characterization to correlate the presence of electrically-active defects with chemical bonding across the insulator/channel interface. By controlled in situ plasma nitridation of Ge and post-ALD annealing, the capacitance-derived equivalent oxide thickness was reduced to 1.3 nm for 5 nm HfO₂ layers, and mid-gap density of interface states, D_it = 3 × 10¹¹ cm^?2 eV^?1, was obtained. In contrast to the Ge case, where an engineered interface layer greatly improves electrical characteristics, we show that ALD-Al₂O₃ deposited on the In_0.53Ga_0.47As (1 0 0) ? 4 × 2 surface after in situ thermal desorption in the ALD chamber of a protective As cap results in an atomically-abrupt and unpinned interface. By avoiding subcutaneous oxidation of the InGaAs channel during Al₂O₃ deposition, a relatively passive gate oxide/III–V interface is formed.