Red luminescence of spherical CuxZn1−xS semiconductor nanoparticles using 2-mercaptoethanol as capping agent

Cu²⁺-doped (0–2 at%) ZnS nanoparticles stabilized by 2-mercaptoethanol (2-ME) were successfully prepared using wet precipitation route in aqueous solution. The structural and optical characteristics were studied by various techniques. XRD pattern showed zinc blende cubic structure of Cu²⁺-doped ZnS with grain size of 4±0.5 nm. Spherical shape and well distribution of particles is confirmed by TEM, SEM and STM microscopy. Copper doping were identified by elemental dispersive (EDS) spectrometry. UV–vis spectroscopy revealed strong confinement effect due to blue shift in absorption shoulder peak as compared to bulk ZnS. Red luminescence band at～657 nm on Cu²⁺ doping may be arising from recombination of electrons at sulfur vacancies (V_s) and Cu(t₂) states formed at ZnS band gap. Optimum concentration of 0.25 at% (red band) of Cu²⁺ doping was selected by the observed enhanced PL emission.     

Pulse electrodeposited copper indium sulfide films

Copper indium sulfide (CISu) films were deposited by the pulse galvanostatic deposition technique at different duty cycles. The films are polycrystalline with peaks corresponding to the chalcopyrite phase of CISu. The grain size and surface roughness increased from 10 to 25 nm and 0.85 to 2.50 nm respectively with increase of duty cycle. Optical band gap in the range of 1.30–1.51 eV was observed for the films deposited at different duty cycles. Room temperature resistivity of the films is in the range of 0.1–3.67 Ω cm. Photoconductivity measurements were made at room temperature. Photocurrent spectra exhibited maximum corresponding to the band gap of copper indium sulphide. CdS/CuInS₂ fabricated with CISu films deposited at 50% duty cycle have exhibited a V_oc of 0.62 V, J_sc of 16.30 mA cm^?2, FF of 0.71 and efficiency of 7.16%.     

Pulse electrodeposited copper indium sulpho selenide films and their properties

Copper indium sulpho selenide films of different composition were deposited by the pulse plating technique at 50% duty cycle (15 s ON and 15 s OFF). X-ray diffraction studies indicated the formation of single phase chalcopyrite copper indium sulpho selenide films. Transmission Electron Microscope studies indicated that the grain size increased from 10 nm–40 nm as the selenium content increased. The band gap of the films was in the range of 0.95 eV–1.44 eV. Room temperature resistivity of the films is in the range of 16.0 Ω cm–33.0 Ω cm. Films of different composition used in photoelectrochemical cells have exhibited photo output. Films of composition, CuInS_0.9Se_0.1 have exhibited maximum output, a V_OC of 0.74 V, J_SC of 18.50 mA cm^?2, ff of 0.75 and efficiency of 11.40% for 60 mW cm^?2 illumination.     

Growth and characterization of indium oxide diodes prepared by reactive magnetron sputtering

The electrical properties of Cr/Pt/Au and Ni/Au ohmic contacts with unintentionally doped In₂O₃ (U-In₂O₃) film and zinc-doped In₂O₃ (In₂O₃:Zn) prepared by reactive magnetron sputtering deposition are described. The lowest specific contact resistance of Cr/Pt/Au and Ni/Au is 2.94 × 10⁻⁶ and 1.49 × 10⁻² Ω-cm², respectively, as determined by the transmission line model (TLM) after heat treatment at 300 °C by thermal annealing for 10 min in nitrogen ambient. The indium oxide diodes have an ideality factor of 1.1 and a soft breakdown voltage of 5 V. The reverse leakage current prior to breakdown is around 10⁻⁵ A.     

Effect of substrate temperature on indium tin oxide (ITO) thin films deposited by jet nebulizer spray pyrolysis and solar cell application

This study focused on the effect of substrate temperature (350 °C, 400 °C, and 450 °C) on morphological, optical, and electrical properties of indium tin oxide (ITO) films deposited onto porous silicon/sodalime glass substrates through jet nebulizer spray pyrolysis for use in heterojunction solar cells. X-ray diffraction analysis confirmed the formation of pure and single-phase In₂O₃ for all the deposited films whose crystallinity was enhanced with increasing substrate temperature, as shown by the increasing (222) peak intensity. Morphological observations were conducted using scanning electron microscopy to reveal the formation of continuous dense films composed of nanograins. The UV–vis spectra revealed that the transmittance increased with increasing substrate temperature, reaching a value of over 80% at 450 °C. The photoelectric performance of the solar cell was studied using the I–V curve by illuminating the cell at 100 mW/cm². A high efficiency (η) of 3.325% with I_sc and V_oc values of 14.8 mA/cm² and 0.60 V, respectively, was attained by the ITO solar cell annealed at 450 °C.     

Sulfur stoichiometry driven chalcopyrite and pyrite structure of spray pyrolyzed Cu-alloyed FeS2 thin films

We report on fabrication of Cu_xFe_1−xS₂ (CFS) thin films using chemical spray pyrolysis followed by post-sulfurization. Post-sulfurized CFS films were grown with compact and good crystalline texture. The sulfur stoichiometry in CFS films was found to be crucial for determination of its crystal structure. The sulfur deficient CFS films were driven to chalcopyrite CFS (CH-CFS) structure whereas the sulfur cured CFS films were grown with Cu-incorporated pyrite CFS (P-CFS) structure which was confirmed by X-ray diffraction and Raman spectroscopy analysis along with UV–vis spectroscopy measurement. Electrical characterizations of both types of CFS films revealed p-type conductivity with carrier concentration in the range of 10¹⁸–10²⁰ cm⁻³ and mobility of 0.5–9 cm² V⁻¹ s⁻¹. The band gaps of CFS films of CH-CFS structure (0.885–0.949 eV) were found to be less than that of P-CFS structure (0.966–1.156 eV), which indicates its potential application for thermoelectric and photovoltaic devices.     

The effect of temperature on the growth and properties of green light-emitting In0.5Ga0.5N films prepared by reactive sputtering with single cermet target

We have grown In_0.5Ga_0.5N films on SiO₂/Si (100) substrate at 100–400 °C for 90 min by rf reactive sputtering with single cermet target. The target was made by hot pressing the mixture of metallic indium, gallium and ceramic gallium nitride powder. X-ray diffraction (XRD) measurements indicated that In_0.5Ga_0.5N films had wurtzite structure and showed the preferential (1 0 -1 0) diffraction. Both SEM and AFM showed that In_0.5Ga_0.5N films were smooth and had small roughness of 0.6 nm. Optical properties were measured by photoluminescence (PL) spectra from room temperature to low temperature of 20 K. The 2.28 eV green emission was achieved at room temperature for all our InGaN films. The electrical properties of In_0.5Ga_0.5N films on a SiO₂/Si (100) substrate were measured by the Hall measurement at room temperature. InGaN films showed the electron concentration of 1.51×10²⁰–1.90×10²⁰ cm⁻³ and mobility of 5.94–10.5 cm² V⁻¹ s⁻¹. Alloying of InN and GaN was confirmed for the sputtered InGaN.     

Photoconductivity relaxation processes in Cu1−xZnxInS2 solid solutions

Photoconductivity and its relaxation in Cu_1−xZn_xIn₂S₄ alloys (x=0–16) single crystals were investigated in the temperature range 30–100 K. The long-lasting relaxation processes (τ~10³ s) and induced photoconductivity phenomena were identified. The main parameters characterizing the photoconductivity kinetic were determined. The observed phenomena were analyzed by taking into account effects of the trapping levels. It is shown that relaxation of the photoconductivity and induced photoconductivity are controlled by the multicenter recombination in which both 'fast' and 'slow' recombination centers take part.     

Properties of In2O3 films obtained by thermal oxidation of sprayed In2S3

In₂S₃ thin films were grown by the chemical spray pyrolysis (CSP) method using indium chloride and thiourea as precursors at a molar ratio of S:In=2.5. The deposition was carried out at 350 °C on quartz substrates. The film thickness is about 1 µm. The films were then annealed for 2 h at 550, 600, 650 and 700 °C in oxygen flow. This process allows the transformation of nanocrystal In₂O₃ from In₂S₃ and the reaction is complete at 600 °C. X-ray diffraction spectra show that In₂O₃ films are polycrystalline with a cubic phase and preferentially oriented towards (222). The film grain size increases from 19 to 25 nm and RMS values increase from 9 to 30 nm. In₂O₃ films exhibit transparency over 70–85% in the visible and infrared regions due to the thickness and crystalline properties of the films. The optical band gap is found to vary in the range 3.87–3.95 eV for direct transitions. Hall effect measurements at room temperature show that resistivity is decreased from 117 to 27 Ω cm. A carrier concentration of 1×10¹⁶ cm^?3 and mobility of about 117 cm² V^?1 s^?1 are obtained at 700 °C.     

Repeatability of indium oxide gas sensors for detecting methane at low temperature

A simple method for fabricating methane gas sensor of indium oxide (In₂O₃) transparent film was presented. Indium of 3 mg as a raw material was used to direct deposition of In₂O₃ film through a simplified thermal evaporation method. X-ray diffraction confirmed the cubic polycrystalline structure of the as prepared In₂O₃ film. The transmittance (T) of the film was recorded as high as 96%. The optical band gap (E_g) of the deposited film was found of 3.68 eV. The sensing properties of In₂O₃ film toward methane gas (CH₄) were investigated at various operating temperatures and various gas concentrations. The prepared film highly detected CH₄ gas at concentrations much lower than the explosive limit. Good performance (sensor response and stability) of the film for CH₄ gas was exhibited. The film exhibited a good repeatability with repeating the gas sensing measurements towards CH₄.     

A comparative study of electrical and optical properties of InN and In0.48Ga0.52N

We present results of our studies concerning electrical and optical properties of In_0.48Ga_0.52N and InN. Hall measurement were carried out at temperatures between T=77 and 300 K. Photoluminescence (PL) spectrum in InN and In_0.48Ga_0.52N. InN has a single peak at 0.77 eV at 300 K. However, the PL in In_0.48Ga_0.52N has two peaks; a prominent peak at 1.16 eV and a smaller peak at 1.55 eV. These two peaks are attributed to Indium segregation corresponding to a high Indium concentration of 48% and a low concentration of 36%. High electric field measurements indicate that drift velocity that tends to saturate at around V_d=1.0×10⁷ cm/s at 77 K in InN at an electric field of F=12 kV/cm. However, in In_0.48Ga_0.52N the I–V curve is almost linear up to an electric field of F=45 kV/cm, where the drift velocity is V_d=1.39×10⁶ cm/s. At applied electric fields above this value a S-type negative differential resistance (NDR) is observed leading to an instability in the current and to the irreversible destruction of the sample.     

Investigation of deep level defects in copper irradiated bipolar junction transistor

Commercial bipolar junction transistor (2N 2219A, npn) irradiated with 150 MeV Cu¹¹⁺-ions with fluence of the order 10¹² ions cm^?2, is studied for radiation induced gain degradation and deep level defects. I–V measurements are made to study the gain degradation as a function of ion fluence. The properties such as activation energy, trap concentration and capture cross-section of deep levels are studied by deep level transient spectroscopy (DLTS). Minority carrier trap levels with energies ranging from E_C ? 0.164 eV to E_C ? 0.695 eV are observed in the base–collector junction of the transistor. Majority carrier trap levels are also observed with energies ranging from E_V + 0.203 eV to E_V + 0.526 eV. The irradiated transistor is subjected to isothermal and isochronal annealing. The defects are seen to anneal above 350 °C. The defects generated in the base region of the transistor by displacement damage appear to be responsible for transistor gain degradation.     

Photovoltaic response of Cu2O/In2S3 hetero-structure grown on Cu substrate

A thin layer of p-type Cu₂O was grown over flexible 30 μm thick copper substrates. Using Injection Chemical Vapor Deposition technique, n-type In₂S₃ thin films were grown over the Cu₂O layer. A p–n junction was thus realized. The Cu₂O/In₂S₃ hetero-structure showed photovoltaic behavior. A solar cell with the structure Cu/Cu₂O/In₂S₃/Ag could be fabricated. An acidic texturization sequence was developed which increased the photo-sensitivity of the In₂S₃ window layer. The Cu/Cu₂O/In₂S₃/Ag hetero-structure with the textured window layer had an open circuit voltage of 377 mV, short circuit current density of 0.118 mA/cm² and fill factor of 33.34%. It was found that the efficiency of the solar cell depended upon the photo-sensitivity of the In₂S₃ window layer. The work demonstrates the use of copper substrate for thin film solar cell fabrication.     

Investigation of deep level defects in electron irradiated indium arsenide quantum dots embedded in a gallium arsenide matrix

Gallium arsenide diodes with and without indium arsenide quantum dots were electron irradiated to investigate radiation induced defects. Baseline and quantum dot gallium arsenide pn-junction diodes were characterized by capacitance–voltage measurements, and deep level transient spectroscopy. Carrier accumulation was observed in the gallium arsenide quantum dot sample at the designed depth for the quantum dots via capacitance–voltage measurements. Prior to irradiation, a defect 0.84 eV below the conduction band (E_C – 0.84 eV) was observed in the baseline sample which is consistent with the native EL2 defect seen in gallium arsenide. After 1 MeV electron irradiation three new defects were observed in the baseline sample, labeled as E3 (E_C – 0.25 eV), E4 (E_C – 0.55 eV), and E5 (E_C – 0.76 eV), consistent with literature reports of electron irradiated gallium arsenide. Prior to irradiation, the addition of quantum dots appeared to have introduced defect levels at E_C – 0.21, E_C – 0.38, and E_C – 0.75 eV denoted as QD–DX1, QD–DX2, and QD–EL2 respectively. In the quantum dot sample after 1 MeV electron irradiation, QD–E3 (E_C – 0.28 eV), QD–E4 (E_C – 0.49 eV), and QD–EL2 (E_C – 0.72 eV) defects, similar to the baseline sample, were observed, although the trap density was dissimilar to that of the baseline sample. The quantum dot sample showed a higher density of the QD–E4 defect and a lower density of QD–E3, while the QD–EL2 defect seemed to be unaffected by electron irradiation. These findings suggest that the quantum dot sample may be more radiation tolerant to the E3 defect as compared to the baseline sample.     

Self-aligned inversion n-channel In0.2Ga0.8As/GaAs metal–oxide–semiconductor field-effect-transistors with TiN gate and Ga2O3(Gd2O3) dielectric

A self-aligned process for fabricating inversion n-channel metal–oxide–semiconductor field-effect-transistors (MOSFET’s) of strained In_0.2Ga_0.8As on GaAs using TiN as gate metal and Ga₂O₃(Gd₂O₃) as high κ gate dielectric has been developed. A MOSFET with a 4 μm gate length and a 100 μm gate width exhibits a drain current of 1.5 mA/mm at V_g = 4 V and V_d = 2 V, a low gate leakage of <10^?7 A/cm² at 1 MV/cm, an extrinsic transconductance of 1.7 mS/mm at V_g = 3 V, V_d = 2 V, and an on/off ratio of ～10⁵ in drain current. For comparison, a TiN/Ga₂O₃(Gd₂O₃)/In_0.2Ga_0.8As MOS diode after rapid thermal annealing (RTA) to high temperatures of 750 °C exhibits excellent electrical and structural performances: a low leakage current density of 10^?8–10^?9 A/cm², well-behaved capacitance–voltage (C–V) characteristics giving a high dielectric constant of ～16 and a low interfacial density of state of ～(2～6) × 10¹¹ cm^?2 eV^?1, and an atomically sharp smooth Ga₂O₃(Gd₂O₃)/In_0.2Ga_0.8As interface.     

Indium gallium arsenide antimonide photodetector grown by liquid phase epitaxy: Electrical characterization and optical response

Current–voltage (I–V) and R₀A curves and spectral response as a function of bias voltage and temperature of p–n indium gallium arsenide antimonide (In_0.14Ga_0.86As_0.13Sb_0.87)/n-GaSb photodiodes are presented. InGaAsSb quaternary alloys with a bandgap energy of about 653 meV were grown using the liquid phase epitaxy technique on top of (100) GaSb substrates. Device structure was fabricated using a process that includes passivation with sodium sulfide, thermal annealing and metallizations. The diode architecture was a back-illuminated (B-I) structure with a ring-shaped metallic contact in the GaSb substrate face. Photodiode spectral response showed good performance in the entire temperature range between 20 K and 300 K.     

Mesoporous-assembled In2O3–TiO2 mixed oxide photocatalysts for efficient degradation of azo dye contaminant in aqueous solution

This work focuses on the improvement of the photocatalytic activity of mesoporous-assembled In₂O₃–TiO₂ mixed oxide photocatalysts for Congo Red (CR) azo dye degradation by varying the In₂O₃-to-TiO₂ molar ratio and calcination temperature. All of photocatalysts are synthesized by a sol–gel process with the aid of a structure-directing surfactant. The results show that the incorporation of In₂O₃ to the mesoporous-assembled TiO₂ can increase the specific surface area and total pore volume, inhibit the anatase-to-rutile phase transformation, and decrease the crystallite size of the resulting In₂O₃–TiO₂ mixed oxide photocatalysts. The mesoporous-assembled 0.05In₂O₃–0.95TiO₂ mixed oxide photocatalyst with an In₂O₃-to-TiO₂ molar ratio of 0.05:0.95 (5 mol% In₂O₃ incorporation) and calcined at 500 °C exhibits the highest CR dye degradation activity (with reaction rate constant of 0.86 h⁻¹), being considerably higher than that of the commercial P-25 TiO₂ powder.     

Charge carrier mobility and lifetime of organic bulk heterojunctions analyzed by impedance spectroscopy

Charge carrier diffusion and recombination in an absorber blend of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl C₆₁-butyric acid methyl ester (PCBM) with indium tin oxide (ITO) and aluminium contacts have been analyzed in the dark by means of impedance spectroscopy. Reverse bias capacitance exhibits Mott–Schottky-like behavior indicating the formation of a Schottky junction (band bending) at the P3H:PCBM-Al contact. Impedance measurements show that minority carrier (electrons) diffuse out of the P3HT:PCBM-Al depletion zone and their accumulation contributes to the capacitive response at forward bias. A diffusion–recombination impedance model accounting for the mobility and lifetime parameters is outlined. Electron mobility results to be 2 × 10⁻³ cm² V⁻¹ s⁻¹ and lifetime lies within the milliseconds timescale.     

Stable organic thin-film transistor in a pixel for plastic electronics

We have studied the fabrication of stable organic thin-film transistor (OTFT) for plastic electronics using hybrid multi-layer (HML) of parylene/Au/photoacryl/IZO (indium zinc oxide) on organic semiconductor. The HML-passivated OTFTs exhibited the field-effect mobility (μ_fe) of 0.2–0.3 cm²/V s with an on/off current ratio of 10⁷ after annealing at 180 °C. The changes in on-, off- and subthreshold-currents of the HML-passivated OTFT were negligibly small during the storage of 781 h. Moreover, the hysteresis in transfer characteristics was negligible even after exposure of the OTFT to air for 781 h. These results indicate that HML-passivation is suitable for stable OTFT array for plastic electronics.     

Characterization of solution processed,p-doped films using hole-only devices and organic field-effect transistors

We report a solution processed, p-doped film consisting of the organic materials 4,4′,4″-tris(3-methylphenylphenylamino)triphenylamine (MTDATA) as the electron donor and 2-(3-(adamantan-1-yl)propyl)-3,5,6-trifluorotetracyanoquinodimethane (F3TCNQ-Adl) as the electron acceptor. UV–vis–NIR absorption spectra identified the presence of a charge transfer complex between the donor and acceptor in the doped films. Field-effect transistors were used to characterize charge transport properties of the films, yielding mobility values. Upon doping, mobility increased and then slightly decreased while carrier concentration increased by two orders of magnitude, which in tandem leads to conductivity increasing from 4 × 10^?10 S/cm when undoped to 2 × 10^?7 S/cm at 30 mol% F3TCNQ-Adl. The hole density was calculated based on mobility values extracted from OFET data and conductivity values extracted from bulk I–V data for the MTDATA: x mol% F3TCNQ-Sdl films. These films were then shown to function as the hole injection/hole transport layer in a phosphorescent blue OLED.