成像干涉光刻技术及其频域分析

传统光学光刻技术(OL)由于其固有的限制,虽然可对任意图形成像,但分辨力较低。无掩模激光干涉光刻技术(IL)的分辨力可达l /4,却局限于周期图形。成像干涉光刻技术(IIL)结合了二者的优点,用同一个系统分次传递物体不同的空间频率,能更有效地传递物体的信息,以高分辨力对任意图形成像。初步模拟研究表明,在同样的曝光波长和数值孔径下,对同样特征尺寸的掩模图形,IIL得到的结果好于OL。在CD=150nm时,IIL相对于OL把分辨力提高了1.5倍多。     

Nanomachining by colloidal lithography

Colloidal lithography is a recently emerging field; the evolution of this simple technique is still in progress. Recent advances in this area have developed a variety of practical routes of colloidal lithography, which have great potential to replace, at least partially, complex and high-cost advanced lithographic techniques. This Review presents the state of the art of colloidal lithography and consists of three main parts, beginning with synthetic routes to monodisperse colloids and their self-assembly with low defect concentrations, which are used as lithographic masks. Then, we will introduce the modification of the colloidal masks using reactive ion etching (RIE), which produces a variety of nanoscopic features and multifaceted particles. Finally, a few prospective applications of colloidal lithography will be discussed.     

Creating nanopatterns of His-tagged proteins on surfaces by nanoimprint lithography using specific NiNTA-histidine interactions

Directed assembly of the DsRed FT protein is demonstrated on self-assembled monolayers (SAMs) on silicon substrates patterned by nanoimprint lithography. Initially, the DsRed protein is attached using electrostatic interactions on both topographical (polymer) templates with an amino functionalization and on chemically patterned (flat) substrates. In a second experiment, a patterned NiNTA SAM is used in order to attach the DsRed FT protein via supramolecular interactions, taking advantage of the histidine functionalization of the DsRed FT protein. The NTA SAM is formed on silicon oxide using a multistep covalent process. Patterning of the NTA SAM is performed using nanoimprint lithography. The DsRed FT protein is attached on the patterned NTA layer after treating this with a Ni(II) solution. Moreover, the histidine-NiNTA binding may be reversed by removing the Ni using EDTA or by competition using imidazole. The regeneration and reuse of the substrate by subsequently attaching and removing two different histidine-functionalized proteins from the patterned NTA is shown by fluorescence microscopy.     

Three-dimensional fluidic self-assembly by axis translation of two-dimensionally fabricated microcomponents in railed microfluidics

A method for high-throughput 3D self-assembly of 2D photopatterned microstructures using railed microfluidics is presented. Vertical device patterning of heterogeneous materials requires high-level integration using conventional microelectromechanical system (MEMS) technology; however, 3D railed assembly enables easy and fast self-assembly via a fluidic axis-translation process and simple material exchange in microfluidic channels. Individually photopatterned 2D microstructures are axis-translated from in-plane to out-of-plane and fluidically self-assembled, guided by side-rails in microfluidic channels to form a 3D morphology. Since the structures are fabricated in fluidic environments, there are no fixed initial points on the channel substrate allowing fluidic horizontal stacking of erected 2D structures. The guiding mechanism of railed microfluidics enables efficient fluidic handling and deterministic 3D self-assembly of heterogeneous components such as electronic components or polymeric microstructures using only fluidic force.     

Three‐Dimensional Fabrication at Small Size Scales

Despite the fact that we live in a 3D world and macroscale engineering is 3D, conventional submillimeter‐scale engineering is inherently 2D. New fabrication and patterning strategies are needed to enable truly 3D‐engineered structures at small size scales. Here, strategies that have been developed over the past two decades that seek to enable such millimeter to nanoscale 3D fabrication and patterning are reviewed. A focus is the strategy of self‐assembly, specifically in a biologically inspired, more deterministic form, known as self‐folding. Self‐folding methods can leverage the strengths of lithography to enable the construction of precisely patterned 3D structures and “smart” components. This self‐assembly approach is compared with other 3D fabrication paradigms, and its advantages and disadvantages are discussed.

     

Programmable chemical gradient patterns by soft grayscale lithography

A method for fabricating chemical gradients on planar and nonplanar substrates using grayscale lithography is reported. Compliant grayscale amplitude masks are fabricated using a vacuum-assisted microfluidic filling protocol that employs dilutions of a carbon-black-containing polydimethylsiloxane emulsion (bPDMS) within traditional clear PDMS (cPDMS) to create planar, fully self-supporting mask elements. The mask is then placed over a surface functionalized with a hydrophobic coumarin-based photocleavable monolayer, which exposes a polar group upon irradiation. The mask serves to modulate the intensity of incident UV light, thereby controlling the density of molecules cleaved. The resulting molecular-level grayscale patterns are characterized by condensation microscopy and imaging mode time-of-flight secondary-ion mass spectrometry (ToF-SIMS). Due to the inherent flexibility of this technique, the photofuse as well as the gradient patterns can be designed for a wide range of applications; in this paper two proof-of-concept demonstrations are shown. The first utilizes the ability to control the resulting contact angle of the surface for the fabrication of a passive pressure-sensitive microfluidic gating system. The second is a model surface modification process that utilizes the functional groups deprotected during the photocleavage to pattern the deposition of moieties with complementary chemistry. The spatial layout, resolution, and concentration of these covalently linked molecules follow the gradient pattern created by the grayscale mask during exposure. The programmable chemical gradient fabrication scheme presented in this work allows explicit engineering of both surface properties that dictate nonspecific interactions (surface energy, charge, etc.) and functional chemistry necessary for covalent bonding.     

Hierarchical nanostructures by sequential self-assembly of styrene-dimethylsiloxane block copolymers of different periods

Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS of a 34–40 nm period, which is itself templated by micron-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10 nm features and registering them on the substrate.     

Negative‐Tone Block Copolymer Lithography by In Situ Surface Chemical Modification

Negative‐tone block copolymer (BCP) lithography based on in situ surface chemical modification is introduced as a highly efficient, versatile self‐assembled nanopatterning. BCP blends films consisting of end‐functionalized low molecular weight poly(styrene‐ran‐methyl methacrylate) and polystyrene‐block‐Poly(methyl methacylate) can produce surface vertical BCP nanodomains on various substrates without prior surface chemical treatment. Simple oxygen plasma treatment is employed to activate surface functional group formation at various substrates, where the end‐functionalized polymers can be covalently bonded during the thermal annealing of BCP thin films. The covalently bonded brush layer mediates neutral interfacial condition for vertical BCP nanodomain alignment. This straightforward approach for high aspect ratio, vertical self‐assembled nanodomain formation facilitates single step, site‐specific BCP nanopatterning widely useful for various substrates. Moreover, this approach is compatible with directed self‐assembly approaches to produce device oriented laterally ordered nanopatterns.     

Nanowires and Nanostructures that Grow like Polymer Molecules

Unique properties (e.g., rubber elasticity, viscoelasticity, folding, reptation) determine the utility of polymer molecules and derive from their morphology (i.e., one‐dimensional connectivity and large aspect ratios) and flexibility. Crystals do not display similar properties because they have smaller aspect ratios, they are rigid, and they are often too large and heavy to be colloidally stable. We argue, with the support of recent experimental studies, that these limitations are not fundamental and that they might be overcome by growth processes that mimic polymerization. Furthermore, we (i) discuss the similarities between crystallization and polymerization, (ii) critically review the existing experimental evidence of polymer‐like growth kinetic and behavior in crystals and nanostructures, and (iii) propose heuristic guidelines for the synthesis of “polymer‐like” crystals and assemblies. Understanding these anisotropic materials at the boundary between molecules and solids will determine whether we can confer the unique properties of polymer molecules to crystals, expanding them with topology, dynamics, and information and not just tuning them with size.     

Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical-frustum arrays

Based on conventional colloidal nanosphere lithography, we experimentally demonstrate novel graded-index nanostructures for broadband optical antireflection enhancement including the near-ultraviolet (NUV) region by integrating residual polystyrene antireflective (AR) nanoislands coating arrays with silicon nano-conical-frustum arrays. This is a feasible optimized integration method of two major approaches for antireflective surfaces: quarter-wavelength AR coating and biomimetic moth's eye structure.     

Mesocrystals: a new class of solid materials

Possible types of, and formation mechanisms for, mesocrystals are summarized. Mesocrystals are a new class of solid materials, which can be regarded as assemblies of crystallographically oriented nanocrystals. Mesocrystals have high crystallinity as well as high porosity, making them promising substitutes for single-crystalline and/or porous polycrystalline materials in many applications such as catalysis, sensing, and solar-energy conversion.     

Effect of molecular adsorption on the electrical conductance of single au nanowires fabricated by electron-beam lithography and focused ion beam etching

Metal nanowires are one of the potential candidates for nanostructured sensing elements used in future portable devices for chemical detection; however, the optimal methods for fabrication have yet to be fully explored. Two routes to nanowire fabrication, electron-beam lithography (EBL) and focused ion beam (FIB) etching, are studied, and their electrical and chemical sensing properties are compared. Although nanowires fabricated by both techniques exhibit ohmic conductance, I-V characterization indicates that nanowires fabricated by FIB etching exhibit abnormally high resistivity. In addition, the resistivity of nanowires fabricated by FIB etching shows very low sensitivity toward molecular adsorption, while those fabricated by EBL exhibit sensitive resistance change upon exposure to solution-phase adsorbates. The mean grain sizes of nanowires prepared by FIB etching are much smaller than those fabricated by EBL, so their resistance is dominated by grain-boundary scattering. As a result, these nanowires are much less sensitive to molecular adsorption, which mediates nanowire conduction through surface scattering. The much reduced mean grain sizes of these nanowires correlate with Ga ion damage caused during the ion milling process. Thus, even though the nanowires prepared by FIB etching can be smaller than their EBL counterparts, their reduced sensitivity to adsorption suggests that nanowires produced by EBL are preferred for chemical and biochemical sensing applications.