ENIG镀层质量对软钎焊点的可靠性的影响

借助实际案例,并利用金相切片、扫描电子显微镜和X射线能谱分析仪等物理分析手段,研究了用化镍浸金工艺处理的PCB焊盘的Ni-P镀层质量对焊点的可靠性的影响,结果表明:Ni-P镀层在ENIG工艺中由于遭受浸金药水的过度攻击,导致其表面产生了严重的氧化腐蚀,造成界面之间生成的IMC层质量差,进而导致焊点结合强度低,在外界应力的作用下或者长期服役过程中,容易引发焊点开裂、掉件等失效现象.     

ENIG焊点微观组织与失效模式关系研究

无铅有铅混装焊点可靠性问题是军工电子需面对的一个重要问题。随着板级电路组装密度的增大,化学镍金（ENIG）镀层工艺以其平整性好和可焊性好等优势而逐步地取代传统锡铅热风整平工艺。但无铅有铅/ENIG焊点的界面形貌、微观组织与可靠性的相互关系待进一步研究。从焊点界面微观组织、剪切强度、温度循环试验和振动试验等多个方面比较了Sn基焊料在ENIG焊盘和Cu焊盘上的差异,并结合实际案例分析ENIG焊点微观组织结构与Sn基焊料在ENIG焊盘上的脆性界面开裂、非典型黑盘故障和柯肯达尔空洞等多种失效模式的关联关系。     

ENIG焊盘润湿不良失效分析

针对化学镍金(ENIG)焊盘的上锡不良问题,选取了一个典型的案例进行分析详细地介绍了分析的过程和手段,通过采用外观检查、金相切片、SEM & EDS等分析手段,发现了导致上锡不良的主要原因为黑焊盘造成的润湿不良.同时,总结和分析了导致此缺陷的原因和应采取的对策.     

黑焊盘有关问题探讨及失效案例分析

本文从化学镍金的原理出发,探讨了黑焊盘的形成机理、影响因素及控制措施,并结合实际案例详细介绍了有关黑焊盘失效分析的思路和方法.     

ENIG黑焊盘的原因分析及其对焊点质量的影响

本文利用扫描电子显微镜(SEM)和X射线能谱分析仪(EDS)以及金相切片等物理分析手段,研究了化镍浸金(ENIG)焊盘润湿不良及焊后发黑的根本原因,即镍层由于遭受浸金药水的过度攻击而产生了严重的氧化腐蚀。镍层的腐蚀不仅会降低焊盘可焊性,也会极大减弱焊点界面的结合强度,造成焊盘润湿不良或焊点开裂失效。     

Sn95Sb5焊料与ENIG/ENEPIG镀层焊点界面可靠性研究

研究了Sn95Sb5焊料在化学镍金(ENIG)镀层、化学镍钯浸金(ENEPIG)镀层表面形成的焊点界面微观组织形貌与剪切强度。使用Sn95Sb5焊料在FR4印制板上焊接0805片式电容,焊点在高温时效测试和温度循环过程中均表现出较高的剪切强度,焊点界面连续且完整,剪切强度下降的最大幅度不超过19.2%。Sn95Sb5焊料在ENIG镀层表面形成的焊点(Sn95Sb5/ENIG焊点)强度更高。Sn95Sb5焊料在ENEPIG镀层表面形成的焊点(Sn95Sb5/ENEPIG焊点)界面反应更为复杂,在焊点界面附近可观察到条块状的(Pd,Ni,Au) Sn₄。Sn95Sb5/ENEPIG焊点界面的金属间化合物层平均厚度约为Sn95Sb5/ENIG焊点界面的2倍。     

Au线改Cu线的新发展及可靠性研究

Au线作为内引线一直占据着键合的主导地位,而由于Cu线具有优良的电性能和价格优势,随着键合技术的发展,以Cu丝代替Au丝作为键合用内引线已经成为现在的主要趋势。介绍了Cu线相对于Au线的优势、存在的可靠性问题,并对Cu引线键合新的发展趋势、如何进行可靠性验证等问题进行了研究。     

ENIG表面产生焊接界面断裂的关键失效模式

概述了固化不足的阻焊沾污了镀液,导致BLN焊接界面断裂,阐述了出现BLN现象的原因和怎样防止BLN现象。     

电子组装中焊点的失效分析

焊点的失效分析是电子产品质量和可靠性保证体系的重要组成部分。本文首先概述了焊点的失效机理,主要包括热致失效、机械失效、电化学失效。在此基础之上,综述了焊点失效分析的基本流程与各类失效分析方法,并对无铅条件下该领域的研究作了简要评述。     

印制电路板焊锡金不熔的失效分析及改善

在印制电路板制造中,由于化镍浸金工艺拥有良好的平整性、焊接性、导电性、键合性及金(Au)本身稳定性好,不易被氧化的特点被广泛应用于印制电路板表面处理中.但由于化镍浸金工艺在实际的焊接操作过程中存在有多种焊接不良现象,如"黑垫"、金不熔;其中金不熔多归结为金面受到污染和金层本身出现质量问题;文章主要阐述一种印制电路板焊接...     

BGA焊点失效分析

文章通过对BGA焊点失效实例的分析,介绍了对BGA焊接失效的分析过程与分析方法,同时得出了引起该BGA焊点失效的主要原因,展现了失效分析对BGA封装的质量控制作用。     

PCB设计对焊点强度及坑裂失效的影响

采用正交试验设计的方法,讨论了PCB基材的树脂禽餐、焊盘类型,以及焊盘大小对焊点强度和坑裂失效的影响。结果表明：在3个方面的因素中,PCB基材的树脂含量对焊点强度的影响程度最大。有阻焊膜限定的焊盘类型（SMD）要比无阻焊膜限定的焊盘类型（NSMD）的焊点强度要高,且不容易发生坑裂失效。     

陶瓷封装倒装焊器件Sn-Pb微焊点的电迁移行为

高密度陶瓷封装倒装焊器件的焊点尺寸已降低至100μm以下,焊点电流密度达到10~4 A/cm~2以上,由此引发的电迁移失效成为不可忽视的问题。以陶瓷封装菊花链倒装焊器件为研究对象,开展了Sn10Pb90、Sn63Pb37焊点热电环境可靠性评估试验,通过电连接检测及扫描电子显微镜(SEM)等方法对焊点互连情况进行分析。结果表明,Sn63Pb37焊点阴极侧金属间化合物(IMC)增长明显,表现出明显的极化现象,IMC厚度的平方与通电时间呈线性关系。通电时间达到576 h后Sn63Pb37焊点阴极侧产生微裂纹,而Sn10Pb90焊点在通电576 h后仍未出现异常,表现出优异的电迁移可靠性。研究结果对于直径100μm微焊点的陶瓷封装倒装焊器件的应用具有重要的意义。     

温度与振动耦合条件下的电路板级焊点失效模式与疲劳寿命分析

基于正交试验法研究不同温度与振动耦合条件下的板级焊点失效行为与模式,采用L₉（34）混合水平正交表设计了不同温度（T）、加速度功率谱密度（PSD）与频率（V）条件下的加速寿命试验,结果表明三者对焊点可靠性影响程度为T>PSD>V,且温度是影响焊点失效模式的主要因素,随温度的升高,焊点裂纹逐渐从近封装侧的界面金属化合物（IMC）层向钎体内部扩展,焊点失效模式从脆性断裂向韧性断裂演化.基于焊点失效数据分析,发现焊点疲劳寿命对数值与PCB板背侧最大应变范围存在关联关系,并采用多项式拟合的方法建立了焊点疲劳寿命模型,拟合结果显示,该模型能较好的评估温度与振动耦合条件下的焊点寿命,预测精度较高.     

Inhibiting AuSn<Subscript>4</Subscript> Formation by Controlling the Interfacial Reaction in Solder Joints

Au was used in an electronic package to protect the conductor from oxidation. However, Au dissolved into solders and reacted with the Sn-rich phase to form AuSn₄ during soldering. After aging, Au diffused from AuSn₄ toward the solder/metallization interface. If Ni₃Sn₄ formed at the soldering interface, a layer of AuSn₄ was redeposited on Ni₃Sn₄. In contrast, Au diffused into Cu₆Sn₅-based intermetallic compounds (IMCs) to produce either (Cu,Au)₆Sn₅ or (Cu,Ni,Au)₆Sn₅, while Cu₆Sn₅ or (Cu,Ni)₆Sn₅ was formed at the soldering interface. Gibbs free energy evaluation revealed that both (Ni,Au)₃Sn₄ and (Cu,Au)₆Sn₅ were more thermodynamically stable than AuSn₄. The maximum amount of Au diffused in Ni₃Sn₄ was 4.6 at.%, while the maximum dissolution of Au in Cu₆Sn₅ was 24.3 at.% at 150°C. Thus, dissolution of Au in Ni₃Sn₄ was limited, and residual Au rereacted with Sn to produce the layer-type AuSn₄. If Cu₆Sn₅ formed at the interface, most of the Au in AuSn₄ diffused into Cu₆Sn₅. Consequently, AuSn₄ formation could be inhibited by controlling formation of Cu₆Sn₅ in solder/under-bump metallization (UBM) assemblies.     

Impact of Thermal Cycling on Sn-Ag-Cu Solder Joints and Board-Level Drop Reliability

The electronic packaging industry uses electroless nickel immersion gold (ENIG) or Cu-organic solderability preservative (Cu-OSP) as a bonding pad surface finish for solder joints. In portable electronic products, drop impact tests induce solder joint failures via the interfacial intermetallic, which is a serious reliability concern. The intermetallic compound (IMC) is subjected to thermal cycling, which negatively affects the drop impact reliability. In this work, the reliability of lead-free Sn-3.0Ag-0.5Cu (SAC) soldered fine-pitch ball grid array assemblies were investigated after being subjected to a combination of thermal cycling followed by board level drop tests. Drop impact tests conducted before and after thermal aging cycles (500, 1000, and 1500 thermal cycles) show a transition of failure modes and a significant reduction in drop durability for both SAC/ENIG and SAC/Cu-OSP soldered assemblies. Without thermal cycling aging, the boards with the Cu-OSP surface finish exhibit better drop impact reliability than those with ENIG. However, the reverse is true if thermal cycle (TC) aging is performed. For SAC/Cu-OSP soldered assemblies, a large number of Kirkendall voids were observed at the interface between the intermetallic and Cu pad after thermal cycling aging. The void formation resulted in weak bonding between the solder and Cu, leading to brittle interface fracture in the drop impact test, which resulted in significantly lower drop test lifetimes. For SAC/ENIG soldered assemblies, the consumption of Ni in the formation of NiCuSn intermetallics induced vertical voids in the Ni(P) layer.     

微电子封装中Sn—Aq—Cu焊点剪切强度研究

提出了一种对微电子封装器件中焊点剪切强度进行测试的方法，可有效降低测试误差。利用该方法，对Sn—Ag—Cu无铅焊料分别在Cu基板和Ni-P基板上形成的焊点，经不同的热时效后的剪切强度进行了测量，并对断裂面的微观结构进行了研究。结果表明，新的剪切测试方法误差小，易于实施，焊点剪切强度、断裂面位置与焊料在不同基板界面上金属间化合物的形貌、成分有关。     

Ball Impact Responses of Ni- or Ge-Doped Sn-Ag-Cu Solder Joints

In this work, we present ball impact test (BIT) responses and fractographies obtained at an impact velocity of 500 mm/s on Sn-4Ag-0.5Cu, Sn-1Ag-0.5Cu, Sn-1Ag-0.5Cu-0.05Ni, Sn-1.2Ag-0.5Cu-0.05Ni, and Sn-1Ag-0.5Cu-0.05Ge package-level solder joints. The solder joints are bonded on substrate pads of either immersion tin (IT) or direct solder on pad (DSOP) surface finishes. Differences of BIT results with respect to multi-reflow are also reported. Taking the impact energy as an indication of board-level drop reliability of the solder joints, the BIT results indicate that better reliability can be achieved by adopting Sn-Ag-Cu solder alloys with low Ag weight contents as well as IT substrate pad finish rather than DSOP. Moreover, the addition of Ni or Ge to the solder alloy provides a large improvement; Ni alters the interfacial intermetallic compound (IMC) structure while Ge enhances the mechanical behavior of the bulk solder.     

Effect of Interfacial Reaction on the Tensile Strength of Sn-3.5Ag/Ni-P and Sn-37Pb/Ni-P Solder Joints

This work investigates the effect of interfacial reaction on the mechanical strength of two types of solder joints, Sn-3.5Ag/Ni-P and Sn-37Pb/Ni-P. The tensile strength and fracture behavior of the joints under different thermal aging conditions have been studied. It is observed that the tensile strength decreases with increasing aging temperature and duration. Associated with the tensile strength decrease is the transition of failure modes from within the bulk solder in the as-soldered condition toward failures at the interface between the solder and the intermetallic compounds (IMCs). For the same aging treatment, the strength of the Sn-3.5Ag/Ni-P joint degrades faster than that of Sn-37Pb/Ni-P. The difference between the two types of joints can be explained by the difference in their interfacial reaction and growth kinetics. An empirical relation is established between the solder joint strength and the Ni₃Sn₄ intermetallic compound thickness.