光助电化学刻蚀法制作大面积高深宽比硅深槽

为解决用光助电化学刻蚀法制作大面积高深宽比硅深槽过程中出现均匀性差的问题,在分析了传统光助电化学刻蚀装置中存在的不足的基础上,设计并制作了一套新型大面积光助电化学刻蚀装置.该装置通过特殊设计的花洒式溶液循环机构和水冷隔热系统,解决了大面积硅片在长时间深刻蚀过程中出现的溶液升温和气泡堆积的问题.借助这套装置能够实现127 mm（5 inch）及以上大面积硅片的均匀深刻蚀.同时,通过采用以0.01 A/min的速率逐步增加刻蚀电流的方法,来补偿侧向腐蚀对槽底电流密度的影响,保证了整个刻蚀过程中硅深槽形貌的一致性.最终在整个127 mm硅片上制作出了各处均匀一致的硅深槽,深度达60μm、深宽比在20以上.     

ICP深硅刻蚀工艺研究

感应耦合等离子体(ICP)刻蚀技术是微机电系统器件加工中的关键技术之一.利用英国STS公司STS Multiplex刻蚀机,研究了ICP刻蚀中极板功率、腔室压力、刻蚀/钝化周期、气体流量等工艺参数对刻蚀形貌的影响,分析了刻蚀速率和侧壁垂直度的影响原因,给出了深硅刻蚀、侧壁光滑陡直刻蚀和高深宽比刻蚀等不同形貌刻蚀的优化工艺参数.     

深高宽比微结构的干法刻蚀

介绍了深高宽比微结构在干法刻蚀过程中遇到的刻蚀滞后、刻蚀中止、侧壁弯曲和开槽效应等与传统器件刻蚀不同的现象,讨论了制作高深宽比结构所需的关键技术和检测手段.     

C_(4)F_(6)/SF_(6)混合气体对硅基材料的ICP刻蚀工艺研究北大核心CSCD

为避免深硅刻蚀工艺所引起的扇贝纹效应,同时减少其工艺气体所带来的温室效应,本文将新一代环保电子刻蚀气C4F6引入硅刻蚀工艺,采用刻蚀与钝化同步进行的伪Bosch工艺刻蚀硅槽孔。研究了ICP功率、RIE功率、腔体压强和C_(4)F_(6)/SF_(6)气体流量比对刻蚀速率、光刻胶/硅刻蚀选择比及刻蚀形貌的影响。结果表明,一定程度增加ICP功率和RIE功率可分别提高等离子体密度和物理轰击刻蚀作用;腔体压强对粒子平均自由径有较大影响;而C4F6流量的增加可加强刻蚀侧壁保护机制。通过综合优化工艺参数,获得了2.8μm/min硅刻蚀速率,3.1的光刻胶/硅刻蚀选择比和侧壁平坦,表面光滑,垂直度高的刻蚀形貌。     

CdZnTe像素探测器表面的氧离子刻蚀工艺

本文报道了CdZnTe像素探测器电极的氧离子刻蚀工艺。通过I-V特性、PL谱以及XPS等实验结果分析了氧离子刻蚀对CdZnTe表面成分、缺陷以及漏电流的影响。研究结果表明,表面氧离子刻蚀在CdZnTe晶体表面形成了致密氧化层。刻蚀功率过大时,刻蚀过程中氧离子轰击会对CdZnTe晶体表面造成损伤,使表面漏电流急剧增大。减小刻蚀功率,延长刻蚀时间,可以增强刻蚀过程中的化学作用,减少CdZnTe晶片的表面氧化与损伤,使表面漏电流降低。     

高深宽比硅台阶落差结构的精密成型

针对MEMS深硅台阶刻蚀产生硅草导致器件短路的问题,分析了硅草形成的原因,通过对深硅台阶刻蚀的主要工艺参数,如刻蚀钝化时间、Ar物理轰击设置单因素实验,提出一种基于Bosch工艺,即采用周期性"刻蚀-钝化-预刻蚀"进行精密台阶结构落差成型的方法,该方法主要通过大幅度提高预刻蚀偏置功率和合理配置刻蚀钝化时间来进行实验.结...     

二氧化硅纳米颗粒的反应离子刻蚀及其在硅纳米针尖制备中的应用

系统地研究了硅衬底上二氧化硅纳米颗粒的反应离子刻蚀（R IE）过程,并在此基础上制备了可用于场发射的硅纳米针尖阵列.首先,采用改进的蒸发法在硅衬底上实现二氧化硅纳米颗粒的单层密排结构,再采用典型的刻蚀二氧化硅的RIE技术同时刻蚀硅衬底和二氧化硅纳米颗粒,在对纳米颗粒尺寸随刻蚀进行而改变的电镜照片分析的基础上,获得了相应的二氧化硅纳米颗粒刻蚀模型,计算得到横向和纵向的刻蚀速率;当刻蚀后的二氧化硅纳米颗粒从衬底上脱落后,进一步对硅衬底的刻蚀可以得到锐利的硅纳米针尖阵列,初步的实验结果表明,所制备的硅纳米针尖具有较好的场发射特性.     

牺牲层刻蚀实验的在线观察与研究

设计了多种测试结构，采用在线实时观测的手段，深入研究了氢氟酸（HF）刻蚀二氧化硅牺牲层中，多种因素对刻蚀过程产生的影响，并对实验结果进行了详细分析．实验中可以明显观察到刻蚀过程中的反应限制阶段与扩散限制阶段，说明经过长时间的刻蚀，HF酸的扩散效应将成为影响刻蚀速率的主导因素．对于实验过程中观察到的“凹”状的刻蚀前端和“晕纹”现象，分析认为结构中的应力梯度以及材料间不同的亲水性质是产生这些现象的主要原因．实验方法与结论对MEMS牺牲层释放工艺的研究具有一定的参考意义．     

PMMA的反应离子深刻蚀

对PMMA进行反应离子深刻蚀以获得高深度比微结构.研究了纯氧刻蚀气体中加入CHF3对刻蚀速率、图形形貌等的影响.纯氧刻蚀PMMA,钻蚀现象严重.加入CHF3后,刻蚀速率随CHF3含量增加而下降.加入适量CHF3,可以在侧壁形成钝化层,保护侧壁不受钻蚀.当CHF3含量为40%,刻蚀功率30 W,工作气压为4 Pa时,即使刻蚀深度达到400 μm,侧壁仍然陡直,刻蚀深宽比大于10.     

基于硅基WLP封装的深孔刻蚀工艺研究

本工作针对硅基晶圆级封装(WLP,Wafer level package)的关键工艺技术——深孔刻蚀工艺进行了研究,通过对掩蔽层材料的选择和图形化工艺研究,制备出满足深孔刻蚀工艺要求的掩蔽层,并采用干法刻蚀设备进行深孔刻蚀和工艺优化,最终制作出工艺指标为:刻蚀深度185μm、深宽比9:1、陡直度90.08°、侧壁粗糙度小于64 nm、选择比46:1的硅深孔样品.该深孔刻蚀工艺可应用于薄膜体声波滤波器(FBAR,Film bulk acoustic resonator)晶圆级封装工艺的硅通孔互联(TSV,Through silicon via)技术中.     

Insertion of triangulated surfaces into a meccano tetrahedral discretization by means of mesh refinement and optimization procedures

In this paper, we present a new method for inserting several triangulated surfaces into an existing tetrahedral mesh generated by the meccano method. The result is a conformal mesh where each inserted surface is approximated by a set of faces of the final tetrahedral mesh. First, the tetrahedral mesh is refined around the inserted surfaces to capture their geometric features. Second, each immersed surface is approximated by a set of faces from the tetrahedral mesh. Third, following a novel approach, the nodes of the approximated surfaces are mapped to the corresponding immersed surface. Fourth, we untangle and smooth the mesh by optimizing a regularized shape distortion measure for tetrahedral elements in which we move all the nodes of the mesh, restricting the movement of the edge and surface nodes along the corresponding entity they belong to. The refining process allows approximating the immersed surface for any initial meccano tetrahedral mesh. Moreover, the proposed projection method avoids computational expensive geometric projections. Finally, the applied simultaneous untangling and smoothing process delivers a high‐quality mesh and ensures that the immersed surfaces are interpolated. Several examples are presented to assess the properties of the proposed method.     

Certification Institutions Expected to Update and Transfer Information on Present Standards

Standards are the basis for production enterprises to organize production, ex-factory inspection, trade (delivery) and technical exchanges, product certification, quality arbitration and supervision.……     

Flow calorimeter for enthalpy increment measurements on condensed gases

A flow calorimeter for enthalpy increment measurements on condensed gases is presented. A better knowledge of the properties of the liquefied natural gas is needed, and therefore a liquid loop has been designed for our flow calorimeter. The fluid loop in the calorimeter is designed in order to avoid the two-phase region, since two phases would give compositional disturbances in the measurements. The avoidance of the two-phase region is made possible by increasing the pressure of the test fluid after the measurement section, then heating the fluid at super-critical pressure past the critical point. Finally, the fluid is throttled to the low-pressure gas state at the inlet condition of the compressor that circulates the fluid. To perform the pressure increase, a new cryogenic pump has been designed. To evaluate the new equipment, measurements were taken on liquid ethane over the temperature range 146–256 K at pressure between 0.9 and 5.1 MPa.     

Refrigerators Enter a New Era of Health Preservation Frestech initiates the establishment of China's first standard for household sterilization refrigerators

On November 30, 2007, the China Association for Standardization (CAS) held a press conference at Beijing Diaoyutai State Guest House. Leaders from the China Household Electric Appliance Research Institute, the China Household Electric Appliance Association, and the China Consumers' Association attended and made speeches.……     

Optimum-Simulation von Ernteprozessen

Zusammenfassung Bei der Gestaltung von Ernteprozessen — beispielsweise des Prozesses Mähdrusch, Körnertransport und -abnahme — als transportverbundene Fließarbeitsverfahren mit mindestens zwei verschiedenen Arbeitsmitteln gibt es einen großen Optimierungsspielraum. Solche Prozesse sind mehrstufige Bedienungsprozesse mit gemischter Anordnung der Bedienungseinrichtungen. Außerdem besitzen sie stark ausgeprägte räumliche Aspekte. Es wird vor allem gezeigt, welche Merkmale solcher Prozesse in Simulationsmodellen abgebildet sein müssen, welche Zielgrößen in Abhängigkeit von welchen Einflußgrößen unter Berücksichtigung welcher Prozeßbedingungen ermittelt werden sollten und wie der Bewertungsprozeß zur Ermittlung der gewünschten Informationen gestaltet werden muß.     

A study of centrifugal cast high boron high speed steel

In the present study a high‐boron high speed steel (HSS) roll material was designed. Many expensive alloy elements have been substituted by cheap boron alloy, and high‐boron high speed steel roll has been manufactured by centrifugal casting method. The microstructures, mechanical properties and wear resistance of centrifugal casting high‐boron high speed steel roll have been investigated by optical microscopy (OM), scanning electron microscopy (SEM), and X‐ray diffraction (XRD) analysis, hardness test, impact test and wear test. The results indicated that the solidification microstructures of high‐boron high speed steel roll consisted of M₂(B,C), (W,Mo)₂(B,C), M₃(B,C), M₂₃(B,C)₆ type borocarbides and martensite, a small amount of retained austenite. Borocarbides were continuously distributed over the grain boundary. After quenching from 1050 °C, local broken network appeared in partial borocarbides, and fine secondary borocarbide precipitated from the matrix. After tempering from 525 °C, the amount of precipitated borocarbide increased significantly. After heat treatment, the hardness of high‐boron high speed steel roll excelled 60 HRC, and its impact toughness excelled 8.0 J/cm². The single groove steel rolling amount of high‐boron high speed steel rolls increases by 500% than that of bainite cast iron roll, when the rolls are used in K₁ mill housing of bar mill.     

Thixotropy of Systems with Shear Thinning and Plastic Flow Behavior

The definition of the thixotropy is a decrease in viscosity with time in shear and a subsequent recovery of viscosity after the shear deformation is removed.We ...     

Brainstorming for ISO Strategy 2016-2020

正Responding to ISO’s appeal for survey for the to-be-developed ISO Strategy Plan for 2016-2020,SAC hosted a special workshop over the needs and comments of various fi elds on June 8 in Beijing.The workshop was attended by ISO President-elect and Ansteel General Manager Zhang Xiaogang,SAC Vice-Administrator Yu Xinli,and 30 experts from     

CNAS Passes APLAC's PTP Review

正The review group of Asia Pacific Laboratory Accreditation Cooperation(APLAC)carried out a 4-day peer review of the proficiency testing provider(PTP)for China National Accreditation Service for Conformity Assessment(CNAS)from July 28 to 31,2014.CNAS passed the PTP review with excellent performance.Two senior peer reviewers of APLAC made a comprehensive,rigorous and detailed review of CNAS’s PTP accreditation activities,and made the on-spot inspection of the review groups in Shanghai and Shenzhen respectively.