An integrated advanced process control framework using run-to-run control,virtual metrology and fault detection

This paper develops a new advanced process control (APC) system for the multiple-input multiple-output (MIMO) semiconductor processes using the partial least squares (PLS) technique to provide the run-to-run control with the virtual metrology data, via the gradual mode or the rapid mode depending on the current system status, in order to deal with metrology delays and compensate for different types of system disturbances. First, we present a controller called the PLS-MIMO double exponentially weighted moving average (PLS-MIMO DEWMA) controller. It employs the PLS method as the model building/estimation technique to help the DEWMA controller generate more consistent and robust control outputs than purely using the conventional DEWMA controller. To cope with metrology delays, the proposed APC system uses the pre-processing metrology data to build up the virtual metrology (VM) system that can provide the estimated process outputs for the PLS-MIMO DEWMA controller. Lastly, the Fault Detection (FD) system is added based upon the principal components of the PLS modeling outcomes, which supplies the process status for the VM mechanism and the PLS-MIMO DEWMA controller as to how the process faults are responded. Two scenarios of the simulation study are conducted to illustrate the APC system proposed in this paper.     

Multi-step virtual metrology for semiconductor manufacturing: A multilevel and regularization methods-based approach

In semiconductor manufacturing, wafer quality control strongly relies on product monitoring and physical metrology. However, the involved metrology operations, generally performed by means of scanning electron microscopes, are particularly cost-intensive and time-consuming. For this reason, in common practice a small subset only of a productive lot is measured at the metrology stations and it is devoted to represent the entire lot. Virtual Metrology (VM) methodologies are used to obtain reliable predictions of metrology results at process time, without actually performing physical measurements. This goal is usually achieved by means of statistical models and by linking process data and context information to target measurements. Since semiconductor manufacturing processes involve a high number of sequential operations, it is reasonable to assume that the quality features of a given wafer (such as layer thickness and critical dimensions) depend on the whole processing and not on the last step before measurement only. In this paper, we investigate the possibilities to enhance VM prediction accuracy by exploiting the knowledge collected in the previous process steps. We present two different schemes of multi-step VM, along with dataset preparation indications. Special emphasis is placed on regression techniques capable of handling high-dimensional input spaces. The proposed multi-step approaches are tested on industrial production data.     

Evaluating the reliability level of virtual metrology results for flexible process control: a novelty detection-based approach

The purpose of virtual metrology (VM) in semiconductor manufacturing is to support process monitoring and quality control by predicting the metrological values of every wafer without an actual metrology process, based on process sensor data collected during the operation. Most VM-based quality control schemes assume that the VM predictions are always accurate, which in fact may not be true due to some unexpected variations that can occur during the process. In this paper, therefore, we propose a means of evaluating the reliability level of VM prediction results based on novelty detection techniques, which would allow flexible utilization of the VM results. Our models generate a high-reliability score for a wafer’s VM prediction only when its process sensor values are found to be consistent with those of the majority of wafers that are used in model building; otherwise, a low-reliability score is returned. Thus, process engineers can selectively utilize VM results based on their reliability level. Experimental results show that our reliability generation models are effective; the VM results for wafers with a high level of reliability were found to be much more accurate than those with a low level.     

A virtual metrology model based on recursive canonical variate analysis with applications to sputtering process

In data driven process monitoring, soft-sensor, or virtual metrology (VM) model is often employed to predict product's quality variables using sensor variables of the manufacturing process. Partial least squares (PLS) are commonly used to achieve this purpose. However, PLS seeks the direction of maximum co-variation between process variables and quality variables. Hence, a PLS model may include the directions representing variations in the process sensor variables that are irrelevant to predicting quality variables. In this case, when direction of sensor variables’ variations most influential to quality variables is nearly orthogonal to direction of largest process variations, a PLS model will lack generalization capability. In contrast to PLS, canonical variate analysis (CVA) identifies a set of basis vector pairs which would maximize the correlation between input and output. Thus, it may uncover complex relationships that reflect the structure between quality variables and process sensor variables. In this work, an adaptive VM based on recursive CVA (RCVA) is proposed. Case study on a numerical example demonstrates the capability of CVA-based VM model compared to PLS-based VM model. Superiority of the proposed model is also presented when it applied to an industrial sputtering process.     

A virtual metrology system for semiconductor manufacturing

Nowadays, the semiconductor manufacturing becomes very complex, consisting of hundreds of individual processes. If a faulty wafer is produced in an early stage but detected at the last moment, unnecessary resource consumption is unavoidable. Measuring every wafer’s quality after each process can save resources, but it is unrealistic and impractical because additional measuring processes put in between each pair of contiguous processes significantly increase the total production time. Metrology, as is employed for product quality monitoring tool today, covers only a small fraction of sampled wafers. Virtual metrology (VM), on the other hand, enables to predict every wafer’s metrology measurements based on production equipment data and preceding metrology results. A well established VM system, therefore, can help improve product quality and reduce production cost and cycle time. In this paper, we develop a VM system for an etching process in semiconductor manufacturing based on various data mining techniques. The experimental results show that our VM system can not only predict the metrology measurement accurately, but also detect possible faulty wafers with a reasonable confidence.     

Robust tuning for machine-directional predictive control of MIMO paper-making processes

This paper solves the controller tuning problem of machine-directional predictive control for multiple-input–multiple-output (MIMO) paper-making processes represented as superposition of first-order-plus-dead-time (FOPDT) components with uncertain model parameters. A user-friendly multi-variable tuning problem is formulated based on user-specified time domain specifications and then simplified based on the structure of the closed-loop system. Based on the simplified tuning problem and a proposed performance evaluation technique, a fast multi-variable tuning technique is developed by ignoring the constraints of the MPC. In addition, a technique to predict the computation time of the tuning algorithm is proposed. The efficiency of the proposed method is verified through Honeywell real time simulator platform with a MIMO paper-making process obtained from real data from an industrial site.     

Machine learning-based novelty detection for faulty wafer detection in semiconductor manufacturing

Since semiconductor manufacturing consists of hundreds of processes, a faulty wafer detection system, which allows for earlier detection of faulty wafers, is required. statistical process control (SPC) and virtual metrology (VM) have been used to detect faulty wafers. However, there are some limitations in that SPC requires linear, unimodal and single variable data and VM underestimates the deviations of predictors. In this paper, seven different machine learning-based novelty detection methods were employed to detect faulty wafers. The models were trained with Fault Detection and Classification (FDC) data to detect wafers having faulty metrology values. The real world semiconductor manufacturing data collected from a semiconductor fab were tested. Since the real world data have more than 150 input variables, we employed three different dimensionality reduction methods. The experimental results showed a high True Positive Rate (TPR). These results are promising enough to warrant further study.     

An Efficient On-Demand Virtual Machine Migration in Cloud Using Common Deployment Model

Cloud Computing provides various services to the customer in a flexible and reliable manner. Virtual Machines (VM) are created from physical resources of the data center for handling huge number of requests as a task. These tasks are executed in the VM at the data center which needs excess hosts for satisfying the customer request. The VM migration solves this problem by migrating the VM from one host to another host and makes the resources available at any time. This process is carried out based on various algorithms which follow a predefined capacity of source VM leads to the capacity issue at the destination VM. The proposed VM migration technique performs the migration process based on the request of the requesting host machine. This technique can perform in three ways namely single VM migration, Multiple VM migration and Cluster VM migration. Common Deployment Manager (CDM) is used to support through negotiation that happens across the source host and destination host for providing the high quality service to their customer. The VM migration requests are handled with an exposure of the source host capabilities. The proposed analysis also uses the retired instructions with execution by the hypervisor to achieve high reliability. The objective of the proposed technique is to perform a VM migration process based on the prior knowledge of the resource availability in the target VM.     

Fuzzy approximate disturbance decoupling of MIMO nonlinear systems by backstepping and application to chemical processes

Fuzzy approximate disturbance decoupling concept is introduced for a class of multiple-input-multiple-output (MIMO) nonlinear systems with completely unknown nonlinearities. Based on backstepping technique, a fuzzy almost disturbance decoupling control scheme is proposed. The fuzzy controllers guarantee internal uniform ultimate boundedness of the closed-loop adaptive systems and render a bounded approximate L/sub 2/ gain from the disturbance input to the output. The developed design scheme is applied to control a two continuous stirred tank reactor process. The simulation results illustrate the effectiveness of the method proposed in this paper.     

Task-Based System Load Balancing in Cloud Computing Using Particle Swarm Optimization

Live virtual machine (VM) migration is a technique for achieving system load balancing in a cloud environment by transferring an active VM from one physical host to another. This technique has been proposed to reduce the downtime for migrating overloaded VMs, but it is still time- and cost-consuming, and a large amount of memory is involved in the migration process. To overcome these drawbacks, we propose a Task-based System Load Balancing method using Particle Swarm Optimization (TBSLB-PSO) that achieves system load balancing by only transferring extra tasks from an overloaded VM instead of migrating the entire overloaded VM. We also design an optimization model to migrate these extra tasks to the new host VMs by applying Particle Swarm Optimization (PSO). To evaluate the proposed method, we extend the cloud simulator (Cloudsim) package and use PSO as its task scheduling model. The simulation results show that the proposed TBSLB-PSO method significantly reduces the time taken for the load balancing process compared to traditional load balancing approaches. Furthermore, in our proposed approach the overloaded VMs will not be paused during the migration process, and there is no need to use the VM pre-copy process. Therefore, the TBSLB-PSO method will eliminate VM downtime and the risk of losing the last activity performed by a customer, and will increase the Quality of Service experienced by cloud customers.     

Coalition theory based task scheduling algorithm using DLFC-NN model

Resource management and job scheduling are essential in today's cloud computing world. Due to task scheduling and users' diverse submission of large-scale requests, co-located VM instances negatively impacted the performance of leased VM instances. This workload further led to resource rivalry across co-located VMs. In order to address the aforementioned problems, numerous strategies have been presented, however, they fail to take the asynchronous nature of the cloud environment into account. To address this issue, a novel “CTA using DLFC-NN model” is proposed. This proposed approach combines the coalition theory and DLFC-NN techniques by including IRT-OPTICS for task size clustering, digital metrology based on ionized information (DMBII) for defect detection in virtue machines (VM), and the dynamic levy flight hamster optimization algorithm for processing time optimization of the clusters. However, the implementation of task scheduling in an online environment is limited by a number of presumptions or oversimplifications made by current scheduling systems. As a result, a unique coalition theory is applied to efficiently schedule activities. In addition, the DLFC-NN model is used to reduce resource consumption, span time, and be highly accurate and energy-efficient when working on both online and offline jobs. Nevertheless, while optimizing the clusters' overall execution time, earlier approaches only decreased the make-span time for task scheduling. However, the DLFC-NN model solves the computation problem by using a fully weighted bipartite graph and the pseudo method to determine the fitness of the least makespan time. The enhanced methodology used in this study reduces the scheduling cost and minimizes job completion times according to different task counts when compared to the existing techniques.     

RCMAC Hybrid Control for MIMO Uncertain Nonlinear Systems Using Sliding-Mode Technology

A hybrid control system, integrating principal and compensation controllers, is developed for multiple-input-multiple-output (MIMO) uncertain nonlinear systems. This hybrid control system is based on sliding-mode technique and uses a recurrent cerebellar model articulation controller (RCMAC) as an uncertainty observer. The principal controller containing an RCMAC uncertainty observer is the main controller, and the compensation controller is a compensator for the approximation error of the system uncertainty. In addition, in order to relax the requirement of approximation error bound, an estimation law is derived to estimate the error bound. The Taylor linearization technique is employed to increase the learning ability of RCMAC and the adaptive laws of the control system are derived based on Lyapunov stability theorem and Barbalat's lemma so that the asymptotical stability of the system can be guaranteed. Finally, the proposed design method is applied to control a biped robot. Simulation results demonstrate the effectiveness of the proposed control scheme for the MIMO uncertain nonlinear system     

Development of decoupling scheme for high order MIMO process based on PSO technique

Multiple-input multiple-output (MIMO) with N Input/ N Output processes are characterized by significant interactions between their inputs and outputs. The control of MIMO processes is usually implemented using sets of single-input single-output (SISO) loop controllers, which requires proper input–output pairing and development of decoupling compensator unit. In this paper, a generalized decoupling technique is proposed. The proposed technique uses relative gain array (RGA) to select proper pairing and particle swarm optimization (PSO) technique to estimate the optimal elements’ values of steady state decoupling compensation matrix constituting the decoupling compensator unit. The proposed technique is applied on 4 Input/ 4 Output two coupled distillation columns process, it proves remarkable success in minimizing the interaction between every input and all outputs except that output has been proper paired with.     

A fuzzy sliding mode control approach for nonlinear chemical processes

Fuzzy sliding mode control (FSMC) as a robust and intelligent nonlinear control technique is proposed to control processes with severe nonlinearity and unknown models. The performance of the proposed method has been evaluated for both single input single output (SISO) and MIMO nonlinear systems through its application in three severely nonlinear processes that are frequently used as benchmarks of nonlinear process control strategies. The evaluation shows that, despite its lack of dependence on the process model, the proposed method performs almost the same as conventional sliding mode control alternatives that utilize all the information that exists in the mathematical model of the process.     

On the assessment of multivariable controllers using closed loop data. Part I: Identification of system models

Controller performance assessment of SISO and MIMO systems requires effective and systematic identification of the associated system models based on closed-loop data. In this work, a new methodology for the identification of the process, controller and disturbance models is presented for the purpose of enabling the evaluation of the performance of MIMO control systems. The methodology is based on subspace identification algorithms for the identification of the controller, process and disturbance models from closed-loop data. However, identification of the process model is enhanced by the estimation of the associated interactor matrix via the Variable Regression Estimation technique, the existence of which is mathematically proved. The proposed identification methodology is applied to two 2 × 2 systems utilizing both step-response and PRBS closed-loop data.     

A novel neural internal model control for multi-input multi-output nonlinear discrete-time processes

An internal model-based neural network control is proposed for unknown non-affine discrete-time multi-input multi-output (MIMO) processes in nonlinear state space form under model mismatch and disturbances. Based on the neural state-space model built for an unknown nonlinear MIMO state space process, an approximate internal model and approximate decoupling controllers are derived simultaneously. Thus, the learning of the inverse process dynamics is not required. A neural network model-based extended Kalman observer is used to estimate the states of a nonlinear process as not all states are accessible. The proposed neural internal model control can work for open-loop unstable processes with its closed-loop stability derived analytically. The application to a distributed thermal process shows the effectiveness of the proposed approach for suppressing nonlinear coupling and external disturbances and its feasibility for the control of unknown non-affine nonlinear discrete-time MIMO state space processes.     

ILC strategy for progress improvement of economic performance in industrial model predictive control systems

A novel approach to progress improvement of the economic performance in model predictive control (MPC) systems is developed. The conventional LQG based economic performance design provides an estimation which cannot be done by the controller while the proposed approach can develop the design performance achievable by the controller. Its optimal performance is achieved by solving economic performance design (EPD) problem and optimizing the MPC performance iteratively in contrast to the original EPD which has nonlinear LQG curve relationship. Based on the current operating data from MPC, EPD is transformed into a linear programming problem. With the iterative learning control (ILC) strategy, EPD is solved at each trial to update the tuning parameter and the designed condition; then MPC is conducted in the condition guided by EPD. The ILC strategy is proposed to adjust the tuning parameter based on the sensitivity analysis. The convergence of EPD by the proposed ILC has also been proved. The strategy can be applied to industry processes to keep enhancing the performance and to obtain the achievable optimal EPD. The performance of the proposed method is illustrated via an SISO numerical system as well as an MIMO industry process.     

An embeddable virtual machine for state space generation

The semantics of modelling languages are not always specified in a precise and formal way, and their rather complex underlying models make it a non-trivial exercise to reuse them in newly developed tools. We report on experiments with a virtual machine-based approach for state space generation. The virtual machine’s (VM) byte-code language is straightforwardly implementable, facilitates reuse and makes it an adequate target for translation of higher-level languages like the SPIN model checker’s Promela, or even C. As added value, it provides efficiently executable operational semantics for modelling languages. Several tools have been built around the VM implementation we developed, to evaluate the benefits of the proposed approach.     

FlatVC:云环境下虚拟机集群的扁平化版本控制

IaaS的发展使得云服务能够快速地部署虚拟机集群。然而,在部署过程中虚拟机群的版本控制效率不高。目前的版本控制方法存在网络负载大、操作速度慢的问题。提出一种新颖的虚拟机集群版本控制方法,叫做FlatVC。FlatVC在计算节点增量地生成虚拟机版本,以避免将版本数据传输至存储节点,并在虚拟机版本恢复时按需传输版本数据,因此减小了网络传输负载并加速了版本控制过程。通过使用缓存树结构来共享网络传输数据,FlatVC减小了根节点数据传输压力。此外,我们针对增量版本所构成的版本链进行了I/O优化,避免了版本链导致的性能下降。实验结果显示,FlatVC能有效地实施虚拟机集群版本控制,加速版本生成以及恢复过程。     

Dimensional metrology interoperability and standardization in manufacturing systems

Dimensional metrology is an important part of any manufacturing system. It consists of distinct components and requires a large, diverse, and interconnected knowledge base. How to pass information seamlessly with minimal cost and minimal data loss between different components of a dimensional metrology system is a major issue that concerns software and hardware vendors, standards developers, and customers. This paper focuses on the four main elements of a dimensional metrology system: product definition, measurement process plan definition, measurement process execution, and analysis and reporting of quality data. The activities and software modules that are involved in these elements are discussed. Key issues that cause interoperability problems are identified. These issues are discussed as they relate to the current situation in dimensional metrology standards development. The STEP (ISO 10303) standards are the product of an international effort to achieve interoperability for manufacturing systems. Extending STEP is an appropriate way to solve the interoperability problem within dimensional metrology systems. Further development of STEP standards is proposed so that Geometric Dimensioning and Tolerancing (GD&T) information already available in STEP can be linked with manufacturing feature information, measurement technology, and measurement results. The proposed STEP data model is an attempt to provide a standard that will support automatic measurement process plan generation for in-process on-machine measurement. Some case studies are under way to test the model.