Nonalloyed ohmic contacts for p/sup +/-type in GaAs base layer in HBTs

Two new metallisation systems, Pd/Pt and Cr/Au, for nonalloyed ohmic contacts on p/sup +/-InGaAs have been compared with the Ti/Pt contact. The observed strong dependence of the contact resistivity on the metal is related to its work function. The lowest resistivities are achieved with Pd/Pt, e.g. 1.2*10/sup -6/ Omega cm/sub 2/ for p=1.7*/sup 19/ cm/sup -3/.<>     

Voltage-current characteristics of breaking arc at constant opening speed in the air

Voltage-Current (VI) characteristics of breaking arc between electrical contacts have been investigated for several contact materials (Au, Ag, Cu, Pt, and Ni). The purpose of this paper is to investigate the VI-characteristics and minimum arc voltages of the breaking arcs that occur between slowly opening (1.0 cm/s) contacts, and compare these results with those of Holm. Experimental circuit is resistive, which has 5-/spl Omega/ circuit resistance. Experiments were carried out in the air at atmospheric pressure for supply voltages 30, 42, and 54V. The time evolutions of arc voltage, arc current and gap length were measured simultaneously. The VI-characteristics and minimum arc voltages were obtained from those measured values. The results showed that minimum arc voltages for each contact material (Au, Ag, Cu, Pt, and Ni) agreed with those of Holm. On the other hand, VI-characteristics of Au, Ag, Cu, and Pt contacts agreed with those of Holm, but VI-characteristics of Ni electrical contacts disagreed with those of Holm. The difference for VI-characteristics between Ni electrical contacts and the others was because of lower electric field of the arc column for the case of nickel electrical contacts.     

Thermally stable Ge/Ag/Ni Ohmic contact for InAlAs/InGaAs/InP HEMTs

Excellent annealed ohmic contacts based on Ge/Ag/Ni metallization have been realized in a temperature range between 385 and 500/spl deg/C, with a minimum contact resistance of 0.06 /spl Omega//spl middot/mm and a specific contact resistivity of 2.62 /spl times/10/sup -7/ /spl Omega//spl middot/cm/sup 2/ obtained at an annealing temperature of 425/spl deg/C for 60 s in a rapid thermal annealing (RTA) system. Thermal storage tests at temperatures of 215 and 250/spl deg/C in a nitrogen ambient showed that the Ge/Ag/Ni based ohmic contacts with an overlay of Ti/Pt/Au had far superior thermal stabilities than the conventional annealed AuGe/Ni ohmic contacts for InAlAs/InGaAs high electron mobility transistors (HEMTs). During the storage test at 215/spl deg/C, the ohmic contacts showed no degradation after 200 h. At 250/spl deg/C, the contact resistance value of the Ge/Ag/Ni ohmic contact increased only to a value of 0.1 /spl Omega//spl middot/mm over a 250-h period. Depletion-mode HEMTs (D-HEMTs) with a gate length of 0.2 /spl mu/m fabricated using Ge/Ag/Ni ohmic contacts with an overlay of Ti/Pt/Au demonstrated excellent dc and RF characteristics.     

Wetting Behavior of Ternary Au-Ge-X (X = Sb, Sn) Alloys on Cu and Ni

Au-Ge-based alloys are potential substitutes for Pb-rich solders currently used for high-temperature applications. In the present work, the wetting behavior of two Au-Ge-X (X = Sb, Sn) ternary alloys, i.e., Au-15Ge-17Sb and Au-13.7 Ge-15.3Sn (at.%), in contact with Cu and Ni substrates has been investigated. Au-13.7Ge-15.3Sn alloy showed complete wetting on both Cu and Ni substrates. Total spreading of Au-15Ge-17Sb alloy on Cu was also observed, while the final contact angle of this alloy on Ni was about 29°. Pronounced dissolution of Cu substrates into the solder alloys investigated was detected, while the formation of Ni-Ge intermetallic compounds at the interface of both solder/Ni systems suppressed the dissolution of Ni into the solder.     

Interface microstructure effects in Au thermosonic ball bonding contacts by high reliability wire materials

Palladium-doped and (Cu, Pt)-doped high reliability gold wires were used to form wire bond interconnects on aluminum IC metallization. By isothermal annealing of wire bond samples the formation of intermetallic Au–Al phases was stimulated. SEM/EBSD investigations of the phase regions exhibited significantly slower isothermal growth rates compared to a reference gold wire. Correlated TEM, STEM–EDXS and nanobeam diffraction analyses revealed that Pd is preferentially incorporated into the Au₈Al₃ intermetallic forming a new stable phase but additionally can obviously form a new Pd-rich ternary intermetallic. In comparison, Cu dopants are also accumulated into a new Al–Au–Cu phase while Pt is rather found agglomerating within grain boundaries and interfaces. These results suggest a diffusion barrier model that allows discussing how wire doping can affect the bond contact microstructure, thus increasing the lifetime of bond contacts.     

High brightness InGaN green LEDs with an ITO on n/sup ++/-SPS upper contact

Indium tin oxide (ITO) (260 nm) and Ni (5 nm)/Au (10 nm) films were deposited onto glass substrates, p-GaN layers, n/sup +/-InGaN/GaN short-period-superlattice (SPS), n/sup ++/-SPS and nitride-based green light-emitting diodes (LEDs). It was found that ITO could provide us an extremely high transparency (i.e., 95% at 520 nm). It was also found that the 1.03/spl times/10/sup -3/ /spl Omega/cm/sup 2/ specific contact resistance of ITO on n/sup ++/-SPS was reasonably small. Although the forward voltage of the LED with ITO on n/sup ++/-SPS upper contacts was slightly higher than that of the LED with Ni/Au on n/sup ++/-SPS upper contacts, the 20 mA output power and external quantum efficiency of the former could reach 4.98 mW and 8.2%, respectively, which were much larger than the values observed from the latter. The reliability of ITO on n/sup ++/-SPS upper contacts was also found to be reasonably good.     

Synergistically Enhanced Oxygen Reduction Electrocatalysis by Subsurface Atoms in Ternary PdCuNi Alloy Catalysts

For Pd‐based alloy catalysts, the selection of metallic alloying elements and the construction of composition‐gradient surface and subsurface layers are critical in achieving superior electrocatalytic activities in, e.g., the oxygen reduction reaction (ORR). Based on the Pd‐containing alloy, highly monodispersed PdCuNi ternary alloy nanocrystals are prepared through a wet‐chemical approach, and a solution‐based oxidative surface treatment protocol is utilized to activate the surface of the nanocrystals. A drastically enhanced ORR activity can be achieved by removing the surface Ni and Cu atoms through the surface treatment protocol. The treated catalyst demonstrates a mass activity of 0.45 A mg_Pd^?1 in alkaline medium, 5 and 2.4 times those of commercial Pt/C and Pd/C, respectively. The first‐principle calculation result suggests the critical roles of the coexistence of Ni and Cu atoms and their synergistic interaction beneath the outmost pure Pd layer in optimizing the oxygen binding energy for ORR. The calculation also suggests that the optimal binding energy of oxygen requires an appropriate Ni/Cu ratio in the subsurface layer. This work demonstrates a class of high‐performance Pt‐free ternary alloy ORR catalysts and may provide a general guideline for the structural design of Pd‐based ternary alloy catalysts.     

Optimization of AuGe-Ni-Au ohmic contacts for GaAs MOSFETs

GaAs-based metal-oxide-semiconductor field-effect transistors (MOSFETs) are promising devices for high-speed and high-power applications. One important factor influencing the performance of a GaAs MOSFET is the characteristics of ohmic contacts at the drain and source terminals. In this paper, AuGe-Ni-Au metal contacts fabricated on a thin (930 /spl Aring/) and lightly doped (4/spl times/10/sup 17/ cm/sup -3/) n-type GaAs MOSFET channel layer were studied. The effects of controllable processing factors such as the AuGe thickness, the Ni/AuGe thickness ratio, alloy temperature, and alloy time to the characteristics of the ohmic contacts were analyzed. Contact qualities including specific contact resistance, contact uniformity, and surface morphology were optimized by controlling these processing factors. Using the optimized process conditions, a specific contact resistance of 5.6/spl times/10/sup -6/ /spl Omega//spl middot/cm/sup 2/ was achieved. The deviation of contact resistance and surface roughness were improved to 1.5% and 84 /spl Aring/, respectively. Using the improved ohmic contacts, high-performance GaAs MOSFETs (2 /spl mu/m/spl times/100 /spl mu/m) with a large drain current density (350 mA/mm) and a high transconductance (90 mS/mm) were fabricated.     

A Library of Late Transition Metal Alloy Dielectric Functions for Nanophotonic Applications

Accurate complex dielectric functions are critical to accelerate the development of rationally designed metal alloy systems for nanophotonic applications, and to thereby unlock the potential of alloying for tailoring nanostructure optical properties. To date, however, accurate alloy dielectric functions are widely lacking. Here, a time‐dependent density‐functional theory computational framework is employed to compute a comprehensive binary alloy dielectric function library for the late transition metals most commonly employed in plasmonics (Ag, Au, Cu, Pd, Pt). Excellent agreement is found between electrodynamic simulations based on these dielectric functions and selected alloy systems experimentally scrutinized in 10 at% composition intervals. Furthermore, it is demonstrated that the dielectric functions can vary in very non‐linear fashion with composition, which paves the way for non‐trivial optical response optimization by tailoring material composition. The presented dielectric function library is thus a key resource for the development of alloy nanomaterials for applications in nanophotonics, optical sensors, and photocatalysis.     

Sheet resistance measurement of non-standard cleanroom materials using suspended Greek cross test structures

This paper presents work on the development, fabrication and characterization of a suspended Greek cross measurement platform that can be used to determine the sheet resistance of materials that would contaminate Complementary Metal Oxide Semiconductor (CMOS) processing lines. The arms of the test structures are made of polysilicon/silicon nitride (Si/sub 3/N/sub 4/) to provide a carrier for the film to be evaluated and thick aluminum (Al) probe pads for multiple probing. The film to be evaluated is simply blanket deposited onto the structures and because of its design automatically forms a Greek cross structure with (Al) probe pads. To demonstrate its use, 1) gold (Au), 2) copper (Cu), and 3) silver(Ag) loaded chalcogenide glass Ag/sub y/(Ge/sub 30/Se/sub 70/)/sub 1-y/ have been blanket evaporated in various thicknesses onto the platform in the last processing step and autopatterned by the predefined shape of the Greek crosses. The suspension of the platform ensured electrical isolation between the test structure and the surrounding silicon (Si) substrate. The extracted effective resistivity for Au (5.1/spl times/10/sup -8/ /spl Omega//spl middot/m), Cu (1.8- 2.5/spl times/10/sup -8//spl bsol/ /spl Omega//spl middot/m) and Ag/sub y/(Ge/sub 30/Se/sub 70/)/sub 1-y/ (2.27/spl times/10/sup -5/ /spl Omega//spl middot/m-1.88 /spl Omega//spl middot/m) agree with values found in articles in the Journal of Applied Physics (1963), the Journalof Physics D: Applied Physics (1976), and the Journalof Non-Crystalline Solids (2003). These results demonstrate that the proposed Greek cross platform is fully capable to measure the sheet resistance of low (Au, Cu) and high Ag/sub y/(Ge/sub 30/Se/sub 70/)/sub 1-y/ resistive materials.     

Effect of CVD-SiO/sub 2/ film on reliability of GaAs MESFET with Ti/Pt/Au gate metal

The effect of CVD-SiO/sub 2/ films on the reliability of GaAs MESFET with Ti/Pt/Au gate metal was investigated. It was found that the mean time to failure (MTTF) of MESFET with 350/spl deg/C-depositied SiO/sub 2/ was only about one-seventh of that of the ones with 440/spl deg/C-SiO/sub 2/. It was also found that, in the storage test at 300/spl deg/C for 24 hours, diffusion of Pt into GaAs was accelerated when the SiO/sub 2/ deposition temperature was lower than 380/spl deg/C. FT-IR spectra indicated that the lower deposition temperature leads to a higher concentration of the residual hydrogen in SiO/sub 2/. Thermal differential spectrometry (TDS) demonstrated that hydrogen in SiO/sub 2/ could migrate even below 300/spl deg/C. In conclusion, the residual hydrogen in SiO/sub 2/ causes the degradation phenomena.     

Improvement of the luminous intensity of light-emitting diodes by using highly transparent Ag-indium tin oxide p-type ohmic contacts

We have investigated Ag-indium tin oxide (ITO) scheme for obtaining high-quality p-type ohmic contacts for GaN-based light-emitting diodes (LEDs). The Ag(1 nm)-ITO(200 nm) contacts exhibit greatly improved electrical characteristics when annealed at temperatures in the range 400/spl deg/C-600/spl deg/C for 1 min in air, yielding specific contact resistances of /spl sim/10/sup -4/ /spl Omega//spl middot/cm/sup 2/. In addition, the contacts give transmittance of about 96% at 460 nm, which is far better than that of the conventionally used oxidized Ni-Au contacts. It is shown that the luminous intensity of blue LEDs fabricated with the Ag-ITO contacts is about three times higher than that of LEDs with oxidized Ni-Au contacts. This result strongly indicates that the Ag-ITO scheme can serve as a highly promising p-type ohmic contact for the realization of high brightness near ultraviolet LEDs.     

Microstructure, joint strength and failure mechanisms of SnPb and Pb-free solders in BGA packages

The microstructure, joint strength and failure mechanisms of SnPbAg, SnAg and SnAgCu solders on Cu/Ni/Au BGA pad metallization were investigated after multiple reflows or high temperature aging. In the SnPbAg system, a two-layer structure, i.e., Ni/sub 3/Sn/sub 4/ and (Au, Ni)Sn/sub 4/, was formed at the solder-substrate metallization interface after aging at 125, 150, and 175/spl deg/C. However, such structure was not present in the two Pb-free solder systems. Only a layer of Ni/sub 3/Sn/sub 4/ intermetallic compound in the SnAg system and a layer of Cu-Sn-Ni-Au intermetallic compound in the SnAgCu system were found at respective interfaces, even after the two solder systems had been heat treated for 1000 h at the afore-mentioned temperatures. The formation of the (Au, Ni)Sn/sub 4/ ternary compound in the SnPbAg system was due to re-settlement of Au at the interface which led to brittle failure in this system during ball shear testing. In contrast, SnAg and SnAgCu systems failed exclusively inside the solder ball during shear testing after aging at 150/spl deg/C for up to 1000 h. The two Pb-free solder systems showed good resistance to thermal aging with the solder ball shear strength being maintained at 1.60 to 1.70 kgf. The SnPbAg system degraded in mechanical performance with aging time and had strength as low as 1.20 kgf after aging at 150/spl deg/C for 1000 h. The growth rates of intermetallic compound layers at 125, 150, and 175/spl deg/C aging temperatures and the activation energy for the formation of different intermetallic compound layers were also determined in this investigation.     

Effects of Cu and Pd addition on Au bonding wire/Al pad interfacial reactions and bond reliability

Finer pitch wire bonding technology has been needed since chips have more and finer pitch I/Os. However, finer Au wires are more prone to Au-Al bond reliability and wire sweeping problems when molded with epoxy molding compound. One of the solutions for solving these problems is to add special alloying elements to Au bonding wires. In this study, Cu and Pd were added to Au bonding wire as alloying elements. These alloyed Au bonding wires—Au-1 wt.% Cu wire and Au-1 wt.% Pd wire—were bonded on Al pads and then subsequently aged at 175°C and 200°C. Cu and Pd additions to Au bonding wire slowed down interfacial reactions and crack formation due to the formation of a Cu-rich layer and a Pd-rich layer at the interface. Wire pull testing (WPT) after thermal aging showed that Cu and Pd addition enhanced bond reliability, and Cu was more effective for improving bond reliability than Pd. In addition, comparison between the results of observation of interfacial reactions and WPT proved that crack formation was an important factor to evaluate bond reliability.     

Nitride-based LEDs with an SPS tunneling contact Layer and an ITO transparent contact

The indium-tin-oxide [ITO(80 nm)] and Ni(5 nm)-Au(10 nm) films were separately deposited on glass substrates, p-GaN layers, n/sup +/-InGaN-GaN short-period-superlattice (SPS) structures, and nitride-based light-emitting diodes (LEDs). It was found that ITO on n/sup +/-SPS structure could provide us an extremely high transparency (i.e., 93.2% at 465 nm) and also a reasonably small specific contact resistance of 1.6/spl times/10/sup -3//spl Omega//spl middot/cm/sup 2/. Although the forward voltage which corresponds to 20-mA operating current for LED with ITO on n/sup +/-SPS upper contact was slightly higher than that of the LED with Ni-Au on n/sup +/-SPS upper contact, a 30% higher output intensity could still be achieved by using ITO on n/sup +/-SPS upper contact. Moreover, the output power of packaged LED with ITO was about twice as large as that of the other conventional Ni-Au LEDs.     

Fabrication of PRTs and analysis of characteristics

Platinum thin films have been prepared on Al/sub 2/O/sub 3/ substrates by DC magnetron sputtering. Platinum resistance thermometers have been fabricated and their characteristics analysed. We used a UV laser (wavelength 355 nm) to adjust the Pt thin films temperature sensors to 100 /spl Omega/ at 0/spl deg/C. As result of setting the Pt resistors to the target value of 109.73 /spl Omega/ at 25/spl deg/C, 82.3% of total resistors had a tolerance within /spl plusmn/0.03 /spl Omega/ and 17.7% were within /spl plusmn/0.06 /spl Omega/ of A-class tolerance according to DIN EN 60751. The PRTs which were fabricated in this research had excellent characteristics such as high accuracy, long-term stability, wide temperature range, good linearity, good repeatability and rapid response time.     

Low resistance, thermally stable Au/Pt/Ti/WSiN ohmic contacts on n+-InGaAs/n-GaAs layer systems

The electrical properties of the ohmic contact systems Au/Pt/Ti/WSiN and Au/Pt/Ti to n⁺-InGaAs/GaAs layers grown by metalorganic vapor phase epitaxy were investigated and compared to each other. The thermal stability properties of these contact systems were characterized by accelerated stress tests at elevated temperatures and by complementary thin film x-ray diffraction analysis to evaluate the microstructural properties of degraded and nondegraded structures. The goal of these efforts was to develop stable, homogeneous emitter contacts for power heterojunction bipolar transistors. It was found that for both contact systems the best (specific) contact resistance R_c (ρ _c) is about 0.05 Ωmm (2 × 10⁻⁷ Ωcm²) in the as-deposited state. Au/Pt/Ti/WSiN contacts show no degradation after aging at 400°C for more than 20 h. This is in contrast to standard Au/Pt/Ti contacts which significantly degrade even after short time annealing at 400°C. The good long-time stability of the Au/Pt/Ti/WSiN system is related to the advantageous properties of the reactively sputtered WSiN barrier layer.     

Characterization of fritting phenomena on Al electrode for low contact force probe card

We have investigated the characteristics of fritting of thin oxide film on an aluminum electrode for application to a probe card with low contact force. The fritting is a kind of electric breakdown of oxide film on metal electrode. It can be utilized for making electric contacts between the test probe and the electrode on LSI chips without a large force. The voltage and the contact force needed to cause fritting on a sputtered Al film was measured using W, BeCu and Pd needle probes. The contact resistance was also measured. A fritting was occurred by applying a contact load of 1 mN and voltage of 5 V. The contact resistance decreases with increasing the maximum current that passes through the contact. A current of 500 mA is enough to obtain the contact resistance of 1 /spl Omega/, which is low enough in practical test of signal lines. No damages were found on the Al film by optical microscope and scanning electron microscope observation.     

Stability of metal/GaAs-lnterfaces: A phase diagram survey

Calculated phase diagrams of ternary Ga-As-metal systems for the metals Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Re, Os, Rh, Ir, Ni, Pd, Pt, Cu, Ag and Au are presented. The predictive calculations are based on the following simplifications: Ternary phases and solid solubilities are disregarded and the Gibbs energy of formation of binary compounds is estimated by the enthalpy of formation and calculated from Miedema’s model. The predicted diagrams agree surprisingly well with experimental data and they may be useful for the many cases where data are lacking or fragmentary. The phase diagrams and the thermodynamic data are shown to be a powerful tool for the understanding of interface reactions of metallic contacts to GaAs and hence for the development of improved contact materials.     

Ohmic contact formation in palladium-based metallizations to n-Type InP

Two Pd-based metallizations have been systematically studied, i.e., Au/Ge/Pd and Pd/Ge contacts to n-type InP, in an attempt to better understand the role of the metallization constituents in forming ohmic contacts. Ohmic contacts were obtained with minimum specific resistances of 2.5 × 10⁻⁶ Ω-cm² and 4.2 × 10⁻⁶ Ω-cm² for the Au/Ge/Pd and the Pd/Ge contacts, respectively. The annealing regime for ohmic contact formation is 300-375°C for the Au/Ge/Pd/InP system and 350-450°C for the Pd/GelnP system. Palladium, in both cases, reacts with InP to form an amorphous layer and then an epitaxial layer at low temperatures, providing good metallization adhesion to InP substrates and improved contact morphology. Ohmic contact formation in both contacts is attributed to Ge doping, based on the solid state reaction-driven decomposition of an epitaxial layer at the metallization/InP interface, producing a very thin, heavily doped InP layer. Gold appears to be responsible for the difference in contact resistance in the two systems. It is postulated that Au reacts strongly with In to form Au-In compounds, creating additional In site vacancies in the InP surface region (relative to the Au-free metallization), thereby enhancing Ge doping of the InP surface and lowering the contact resistance. Both contacts degrade and ultimately become Schottky barriers again if over annealed, due to consumption of additional InP, which destroys the heavily doped InP layer.