硫化锌/多孔硅体系和氧化锌/多孔硅体系的光学和电学特性比较

用脉冲激光沉积法在相同孔隙率的多孔硅(Porous Silicon, PS)衬底上生长了ZnS薄膜和ZnO薄膜,在室温下对ZnS/PS和ZnO/PS的光学和电学性质进行了比较.结果发现,ZnS/PS和ZnO/PS在可见光区450～700 nm都有一个较宽的光致发光谱带,呈现较强的白光发射,但ZnS/PS体系的白光发射性能要优于ZnO/PS体系的发光性能.从二者的I-V特性曲线来看,ZnS/PS异质结呈现出与普通二极管相似的整流特性,而ZnO/PS异质结的整流特性与普通二极管不同,其反向电流不饱和.     

硫化锌／多孔硅复合体系光致发光特性的研究

为了研究硫化锌／多孔硅复合体系的光致发光特性,通过电化学阳极氧化法制备了多孔硅样品,然后用脉冲激光沉积的方法在其上沉积硫化锌薄膜,测量了硫化锌／多孔硅复合体系的光致发光谱,并对其进行了详细的理论分析和实验验证。结果表明,在不同的激发波长(340nm,360nm,390nm)下,硫化锌／多孔硅复合体系的光致发光谱不同,硫化锌和多孔硅发光的相对(蓝／红)积分强度比值也不同;硫化锌薄膜的生长温度不同(100℃,250℃,350℃)时,硫化锌／多孔硅复合体系的发光不同,随着生长温度的升高,复合体系的发光谱中,硫化锌的发光增强而多孔硅的发光减弱;衬底多孔硅的制备电流密度不同(3mA／cm²,9mA／cm²,11mA／cm²)时,硫化锌／多孔硅复合体系的发光也有着不同的特点。在适当的多孔硅制备电流密度条件下,把硫化锌的发光与多孔硅的发光叠加,得到了可见光区较宽的光致发光谱带(450nm～700nm),呈现较强的白光发射,这一结果为白光二极管的实现开辟了一条新的捷径。     

多孔硅衬底上ZnS薄膜的白光光致发光

通过脉冲激光沉积（PLD）技术在多孔硅（PS）衬底上制备了ZnS薄膜。用光致发光（PL）的方法观察到白光发射,这个白光是由ZnS薄膜的蓝、绿光和PS的红光叠加形成的。白光光致发光谱是一个从450nm 到700nm的较强的可见光宽谱带。同时研究了激发波长、ZnS薄膜的生长温度、PS的孔隙率和退火温度对ZnS/PS光致发光谱的影响。     

ZnS/PS复合体系的制备和性能表征

以电化学阳极氧化法制备的多孔硅（PS）为衬底,用脉冲激光沉积方法分别在200和300℃下制备了ZnS薄膜,得到ZnS/PS复合体系。利用X射线衍射仪（XRD）、扫描电子显微镜（SEM）、荧光分光光度计分别对ZnS/PS复合体系的晶体结构、形貌和光致发光（PL）特性进行了研究。XRD结果表明,制备的ZnS薄膜呈立方相晶体结构,沿β-ZnS（111）晶向择优取向生长,生长温度较高的样品的XRD衍射峰强度较大。SEM图像显示,生长温度较高的ZnS薄膜表面较致密平整。室温下的PL谱表明,沉积ZnS薄膜后,PS的发光峰发生蓝移。较高的生长温度下,ZnS的自激活发光强度较大,而PS的红光强度较低且峰位红移。根据三基色叠加的原理,ZnS的蓝绿光与PS的红光叠加在一起,ZnS/PS复合体系呈现出较强的白光发射,为固态白光发射器件的实现开辟了一条新的捷径。     

在多孔硅衬底上制备的ZnS薄膜及其光学性能

用脉冲激光沉积（PLD）方法在多孔硅（Ps）衬底上沉积了ZnS薄膜。用x射线衍射仪（XRD）、扫描电子显微镜（SEM）、荧光分光光度计分别研究了ZnS薄膜的晶体结构、表面形貌及光学性能。结果表明,ZnS薄膜呈立方相晶体结构,沿β-ZnS（111）晶向择优取向生长;经过300℃真空退火30min后,ZnS薄膜的XRD衍射峰强度增大,表面变得粗糙,在可见光区的平均透射率达到80％以上,适合作太阳能电池过渡层、红外增透膜、红外窗口和头罩等。在退火后的ZnS／PS复合膜体系的光致发光谱（PL）中,除了高能端ZnS的蓝光发射和低能端Ps的红光发射外,在光谱中间550nm附近出现了一个新的绿光发射,这归因于ZnS薄膜退火过程中形成的缺陷能级而产生的缺陷中心发光。根据三基色叠加的原理将ZnS的蓝、绿光与Ps的红光叠加在一起后,ZnS／PS复合膜体系呈现出了较强的白光发射,这为固态白光发射器件的实现开辟了一条新的捷径。     

ZnS/PS复合体系的光致发光特性研究

通过电化学阳极氧化法制备了多孔硅（porous Si,PS）样品,然后用脉冲激光沉积的方法在其上沉积ZnS薄膜,并测量了ZnS/PS复合体系的光致发光谱,结果表明,在不同的激发波长（340nm,360nm,390nm）下,ZnS/PS复合体系的光致发光谱不同,ZnS和PS发光的相对（蓝/红）积分强度比值也不同;ZnS薄膜的生长温度不同（100℃,250℃,350℃）时,ZnS/PS复合体系的发光不同,随着生长温度的升高,复合体系的发光谱中,ZnS的发光增强而PS的发光减弱;衬底PS的制备电流密度不同（3mA/cm2,9mA/cm2,11mA/cm2）时,ZnS/PS复合体系的发光也有着不同的特点,在适当的PS制备电流密度条件下,把ZnS的发光与PS的发光叠加,得到了可见光区较宽的光致发光谱带（450nm～700nm）,呈现较强的白光发射。     

退火温度对ZnS/PS薄膜的晶体结构和光电性质的影响

用脉冲激光沉积法(PLD)在多孔硅(PS)衬底上生长ZnS薄膜,分别在300℃、400℃和500℃下真空退火。用X射线衍射(XRD)和扫描电子显微镜(SEM)研究了退火对ZnS薄膜的晶体结构和表面形貌的影响,并测量了ZnS/PS复合体系的光致发光(PL)谱和异质结的I-V特性曲线。研究表明,ZnS薄膜仅在28.5°附近存在着(111)方向的高度取向生长,由此判断薄膜是单晶立方结构的-βZnS。随着退火温度的升高,-βZnS的(111)衍射峰强度逐渐增大,且ZnS薄膜表面变得更加均匀致密,说明高温退火可以有效地促进晶粒的结合并改善结晶质量。ZnS/PS复合体系的PL谱中,随着退火温度升高,ZnS薄膜的自激活发光强度增大,而PS的发光强度减小,说明退火处理更有利于ZnS薄膜的发光。根据三基色叠加的原理,ZnS的蓝、绿光与PS的红光相叠加,ZnS/PS体系可以发射出较强的白光。但过高的退火温度会影响整个ZnS/PS体系的白光发射。ZnS/PS异质结的I-V特性曲线呈现出整流特性,且随着退火温度的升高其正向电流增加。     

ZnS/PS体系的结构和发光特性

用电化学阳极氧化法制备了不同孔隙率的多孔硅(PS)样品,然后用脉冲激光沉积(PLD)法在其表面生长ZnS薄膜,研究ZnS/Ps复合体系的结构和发光特性.X射线衍射仪(XRD)结果表明,ZnS薄膜的生长具有高度择优取向,在28.5°附近有一很强的衍射峰,对应于β-ZnS(111)晶向.扫描电子显微镜像(SEM)显示,ZnS薄膜表面很不平整并出现空洞,这是由于衬底PS的表面粗糙所致.ZnS/PS复合体系的光致发光(PL)谱的高斯拟合分峰表明,随着衬底孑L隙率的增大,在样品B和C的发光谱中,在光谱中间520 nm左右都出现了一个新的绿色发光峰,归因于ZnS的缺陷中心发光.位于480 nm附近的ZnS的蓝光和520 nm附近的ZnS的绿光以及位于600 nm处的PS的橙红光叠加在一起,整个znS/PS复合体系呈现出较强的白光.     

多孔Si/纳米ZnS复合材料发光的研究

利用脉冲激光沉积(PLD)分别在Si片和多孔Si衬底上沉积了ZnS薄膜,考察衬底对ZnS薄膜结构和发光性能的影响。X射线衍射(XRD)和扫描电镜(SEM)测量表明,两种衬底上制备的ZnS薄膜均沿立方相结构β-ZnS(111)晶向择优取向生长。多孔Si衬底上生长的ZnS薄膜表面有很多凹坑,而Si衬底上生长的ZnS薄膜表面相对比较平整。光致发光(PL)谱显示,ZnS薄膜沉积后,多孔Si的发光峰强度减小且峰位发生蓝移。根据ZnS薄膜具有较高透射率的特点,把透射出ZnS的多孔Si的橙红光和ZnS的发光叠加,多孔Si/ZnS纳米薄膜复合体系在可见光区有很强的PL现象。     

ZnS/PS复合体系的白光发射

用电化学方法制备了一定孔隙率的多孔硅(PS)样品,然后用脉冲激光沉积(PLD)法以多孔硅为衬底生长一层ZnS薄膜.ZnS的带隙较宽,对可见光是透明的,用适当波长的光激发,PS发射的橙红光可以透过ZnS薄膜,与ZnS的蓝绿光相叠加,得到了可见光区较宽的光致发光带,呈现较强的白光发射.用X射线衍射仪(XRD)和扫描电子显微镜(SEM)表征了ZnS薄膜的结构性质.结果表明,沉积的ZnS薄膜结晶质量较差,薄膜表面起伏不平,这是由于衬底PS的表面不平整所致.     

White light photoluminescence from ZnS films on porous Si substrates

ZnS films were deposited on porous Si (PS) substrates using a pulsed laser deposition (PLD) technique.White light emission is observed in photoluminescence (PL) spectra, and the white light is the combination of blue and green emission from ZnS and red emission from PS. The white PL spectra are broad, intense in a visible band ranging from 450 to 700 nm. The effects of the excitation wavelength, growth temperature of ZnS films, PS porosity and annealing temperature on the PL spectra of ZnS/PS were also investigated.     

多孔硅衬底上ZnS薄膜的PLD制备和表征

在电化学阳极氧化法制备的多孔硅（porous silicon,PS）衬底上用脉冲激光沉积法（pulsed laser deposition,PLD）在250℃和350℃下生长ZnS薄膜。XRD图样显示,制备的ZnS薄膜沿β—ZnS（111）方向择优生长,较高的生长温度下,衍射峰强度较大。SEM结果表明,250℃生长的Z...     

Effect of substrate porosity on photoluminescence properties of ZnS films prepared on porous Si substrates by pulsed laser deposition

ZnS films were deposited on porous Si(PS) substrates with different porosities by pulsed laser deposition. The photolumi-nescence spectra of the samples were measured to study the effect of substrate porosity on luminescence properties of ZnS/porous Si composites. After deposition of ZnS films,the red photoluminescence peak of porous Si shows a slight blueshift compared with as-prepared porous Si samples. With an increase of the porosity,a green emission at about 550 nm was observed which may be ascribed to the defect-center luminescence of ZnS films,and the photoluminescence of ZnS/porous Si composites is very close to white light. Good crystal structures of the samples were observed by x-ray diffraction,showing that ZnS films were grown in preferred orientation. Due to the roughness of porous Si surface,some cracks appear in ZnS films,which could be seen from scanning electron microscope images.     

Effect of substrate bias on the properties of plasma deposited organosilicone (pp-HMDSN) thin films

Organosilicone thin films have been deposited by plasma polymerization (pp) in a plasma enhanced chemical vapor deposition (PECVD) system using hexamethyldisilazane (HMDSN:C6H19Si2N) as a monomer precursor, at different biases of the stainless-steel substrate holder. The substrate bias affected film thickness, surface morphology, chemical composition and photoluminescence (PL) emission. For a negatively biased substrate, it is found that the film thickness is the minimum, while the porosity and PL emission are the maximum. For a positively biased substrate, the thickness and the ratio of Si/N are the maximum which correspond to a blue shift of the PL emission in comparison with the case of non-biased grounded substrate. In addition, the characterization of the plasma using a single cylindrical Langmuir probe has been performed to obtain information about both the electron density and the positive ion energy, where it can be concluded that the ion energy plays a major role in determining film thickness.     

Structure and properties of porous silicon obtained by photoanodization

The results of an investigation of layers of porous silicon (PS), which was obtained by electrochemical etching of p-Si under different illumination conditions — natural light, incandescent light, and light from a mercury lamp with and without a filter — are reported. The structure of the layers was studied by double-crystal x-ray diffractometry, the composition was monitored by means of the IR absorption spectra, and the radiative properties were monitored according to the photoluminescence (PL) spectra. It was established that electrochemical etching under illumination produces PS with a higher porosity and more intense PL whose maximum is shifted into the short-wavelength region. These changes are accompanied by a large disordering of the structure and an increase in the oxygen content in the layer. It is concluded that illumination accelerates the chemical interaction of PS with the electrolyte due to oxidation. High-porosity porous silicon stored in air exhibits quenching of PL. Conversely, PL is excited in layers with a lower porosity. Aging of PS is characterized by an increase in the microdeformation of the layers, a decrease in the crystallite sizes with a partial loss of coherence between the crystallites and the substrate, and an increase in the fraction of the amorphous phase. Fiz. Tekh. Poluprovodn. 31, 1261–1268 (October 1997)     

Structure and photoluminescence properties of InN films grown on porous silicon by MOCVD

In this work, indium nitride (InN) films were successfully grown on porous silicon (PS) using metal oxide chemical vapor deposition (MOCVD) method. Room temperature photoluminescence (PL) and field emission scanning electron microscopy (FESEM) analyses are performed to investigate the optical, structural and morphological properties of the InN/PS nanocomposites. FESEM images show that the pore size of InN/PS nanocomposites is usually less than 4 μm in diameter, and the overall thickness is approximately 40 μm. The InN nanoparticles penetrate uniformly into PS layer and adhere to them very well. Nitrogen (N) and indium (In) can be detected by energy dispersive spectrometer (EDS). An important gradual decrease of the PL intensity for PS occurs with the increase of oxidation time, and the PL intensity of PS is quenched after 24 h oxidization. However, there is a strong PL intensity of InN/PS nanocomposites at 430 nm (2.88 eV), which means that PS substrate can influence the structural and optical properties of the InN, and the grown InN on PS substrate has good optical quality.     

Si衬底上MgxZn1-xO薄膜发光特性研究

采用射频磁控溅射（RFMS）法，在Si衬底上生长出具有（002）择优取向的MgxZn1-xO薄膜。透射光谱结果表明，与ZnO相比，MgxZn1-xO薄膜的吸收带边从378nm蓝移至308nm，这说明MgxZn1-xO薄膜的带隙随着Mg组分的增加而加宽。扫描电镜（SEM）能谱分析表明，薄膜中的Mg含量比靶源中的高。用不同波长的光激发得到的光致发光（PL）潜显示，在不同波长的光激励下，只出现单色蓝或绿发光峰，其它的发光峰消失，而且随着激发光波长从260nm、280nm到300nm的增加，发光峰位置分别从431nm、459nm红移至489nm，发光强度也显著增强。分析表明，这些发光峰与O空位有关。