6H-SiC单晶表面ZnO薄膜的制备及其结构表征

利用脉冲激光淀积(PLD)技术在6H-SiC单晶衬底上制备了ZnO薄膜. 利用X射线衍射(XRD), 反射式高能电子衍射(RHEED)和同步辐射掠入射X射线衍射(SRGID)φ扫描等实验技术研究了ZnO薄膜的结构. 结果表明:在单晶6H-SiC衬底上制备的ZnO薄膜已经达到单晶水平, 不同入射角的SRGID结果, 显示了ZnO薄膜内部不同深度处a方向的晶格弛豫是不一致的, 从接近衬底界面处到薄膜的中间部分再到薄膜的表面处, a方向的晶格常数分别为0.3264、0.3272和0.3223nm. 通过计算得到ZnO薄膜的泊松比为0.504, ZnO薄膜与单晶6H-SiC衬底在平行于衬底表面a轴方向的实际晶格失配度为5.84%.     

Surface bidirectional reflection distribution function and the texture of bricks and tiles

We study and analyze properties underlying the visual appearance of materials such as the surface bidirectional reflection distribution function and texture. The spatial distribution of scattered light in relation to the incident light determines the surface appearance and can be partly specified by the bidirectional reflection distribution function, which is defined as the directionally dependent ratio of radiance to irradiance. We perform gonioradiometric measurements on samples of bricks and tiles. To describe the reflection mechanisms in the surfaces under study, we combine models of specular and diffuse reflectance from rough surfaces and fit them to the experimental data. We also collect images and determine the textural differences in the surface appearance, resulting from the variation in the illumination direction and the viewing directions.     

Étude spectroscopique des films minces deposés à l'interface par excitation optique des plasmons de surface

Surface plasmons (SPs) are collective charge density waves which are confined to the interfacial region between an active medium (e.g. silver) and a dielectric (electrolyte). They can be excited by light under the attenuated total reflection condition. We used the focused attenuated total reflection method in which SP excitation is recognized as a dark line in the p-polarized reflected light cone. The presence of an adsorbent or a film leads to modifications in the dispersion curve from which the optical properties of the film can be derived.In this paper we present both theoretical and experimental investigations of thin dielectric films with an optical absorption band. The results show clearly the correlation between the structures which appear in the dispersion curve and the optical properties of the film.In a previous investigation we have studied the pyridine-Ag system and we found that the activation cycle for silver (usually used in surface-enhanced Raman spectroscopy) in a chloride-containing electrolyte and in the presence of pyridine leads to the formation of a surface complex which exhibits an absorption band in the near-IR, a region in which pyridine itself does not absorb. We present here some preliminary results for rhodamine B adsoption on silver in order to correlate quantitatively the optical properties of this well-known dye and the anomalous structures which induces on the SP dispersion curve for silver.     

X-ray section topographs of a vapour-grown diamond film on a diamond substrate

X-ray section topographs of a diamond thin film deposited onto a diamond substrate were taken by using a four-circle diffractometer constructed for synchrotron radiation use. The topographs of the 111 reflection revealed a flattened hexagon and parallel spikes at the edges of the hexagon. The former corresponds to the section of the diamond substrate and the latter to the deposited thin film. In the image of the diamond substrate, many triangular contrasts were observed. These contrasts were attributed not to any inner texture of the substrate but to narrow cracks running in the deposited thin film, because of the identity of the patterns in the topograph with that observed on the surface of the substrate by optical microscopy and scanning electron microscopy. The parallel arrangement of the spikes, i.e. the image of the deposited thin film, may indicate the presence of residual strain in the thin film owing to the coherent contact between the thin film and the substrate.     

ZnO transparent thin films for gas sensor applications

Zinc oxide (ZnO) transparent thin films were deposited onto silicon and Corning glass substrates by dc magnetron sputtering using metallic and ceramic targets. Surface investigations carried out by Atomic Force Microscopy (AFM) and X-ray Diffraction (XRD) have shown a strong influence of deposition technique parameters on film surface topography. Film roughness (RMS), grain shape and dimensions are correlated with the deposition technique parameters as well as with the target material. XRD measurements have proven that the dc sputtered films are polycrystalline with the (002) as preferential crystallographic orientation. AFM analysis of thin films sputtered from a ceramic target has shown a completely different surface behavior compared with that of the films grown from a metallic target. This work demonstrates that the target material and the growth conditions determine the film surface characteristics. The gas sensing characteristics of these films are strongly influenced by surface morphology. Thus correlating the optical and electrical film properties with surface parameters (i.e. RMS and Grain Radius) can lead to an enhancement of the material's potential for gas sensing applications.     

Al2O3基陶瓷及玻璃基底制备Ta-N薄膜微结构与电学特性的比较研究

在N2、Ar气氛中,采用反应直流磁控溅射法在Al2O3基陶瓷及玻璃基底上制备了Ta-N薄膜,并对各样品的形貌结构、化学组分及电学特性进行了比较分析研究。结果表明,沉积于Al2O3陶瓷及玻璃基底的Ta-N薄膜分别呈团簇状生长与层状紧密堆积生长;Al2O3陶瓷基底沉积的Ta-N为单相薄膜,而玻璃基底上的Ta-N薄膜,随N2、Ar流量比增加,呈单相向多相共存转变;薄膜表面形貌和微结构与基底材料的原始形貌和微结构紧密相关,这说明基底材料对薄膜的形成有重要的影响;N2、Ar流量比相同时,玻璃基底上沉积的Ta-N薄膜电性能优于Al2O3基陶瓷基底上沉积的Ta-N薄膜。     

Hemispherical and diffuse reflectance and transmittance of a slightly inhomogeneous film bounded by rough, unparallel interfaces

The optical reflectance and transmittance of an ideal thin film are calculated in a well-known way. As far as a non-ideal thin film is concerned - i.e., a slightly inhomogeneous thin film bounded by rough, unparallel interfaces - three categories of spectral coefficients can be defined, i.e.: specular reflectance and direct transmittance (light intensity flux along the optical axis), hemispherical reflectance and transmittance (light intensity flux integrated over the solid half angle π), and diffuse reflectance and transmittance (light intensity flux scattered around the optical axis) coefficients. In this paper a model recently introduced for the specular and direct coefficients is generalized to calculate also the hemispherical and diffuse coefficients of a non-ideal film.     

Defect formation in hafnium dioxide thin films

Hafnium dioxide thin films were deposited by reactive electron-beam evaporation at six different substrate temperatures on fused-silica substrates. During the depositions, the scattering of light caused by the growth of defects in the films was recorded with in situ total internal reflection microscopy. After deposition the films were analyzed by angle-resolved scatterometery, spectrophotometric measurement of film reflectance and transmittance, atomic force microscopy, and x-ray diffraction. We explore the effects of film defect formation on film optical properties and film surface topography using these data.     

YSZ thin films deposited by e-beam technique

YSZ thin films were grown evaporating cubic and tetragonal phase ZrO₂ stabilized by 8 wt.% of Y₂O₃ (8% of YSZ) ceramic powders by using e-beam deposition technique. Operating technical parameters that influence thin film properties were studied. The influence of substrate crystalline structure on growth of deposited YSZ thin film was analyzed there. The YSZ thin films (1.5-2 μm of thickness) were deposited on three different types of substrates: Al₂O₃, optical quartz (SiO₂), and Alloy 600 (Fe-Ni-Cr). The dependence of substrate temperature, electron gun power, and phase of ceramic powder on thin film structure and surface morphology was investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The substrate temperature was changed in the range of 20-600° C (during the YSZ thin film deposition) and its influence on the crystallinity of deposited YSZ thin films was analyzed. It was found that electron gun power and substrate temperature has the influence on the crystallite size, and texture of YSZ thin films. Also, the substrate has no influence on the crystal orientation. The crystallite size varied between 20 and 40 nm and increased linearly changing the substrate temperature. The crystal phase of evaporated YSZ powder has the influence on the structure of the deposited YSZ thin films.     

陷光结构在GaAs薄膜太阳电池中的应用

陷光结构由于其独特的光学特性,在光伏器件中发挥的作用越来越重要。目前硅基太阳电池中陷光结构的应用很常见,然而在GaAs薄膜太阳电池中陷光结构的报道并不多。详细介绍了陷光结构的原理及其在GaAs薄膜电池中的研究现状和应用情况。综述了GaAs薄膜太阳能电池中常用的三类陷光结构:正面陷光结构(包括纳米颗粒、纳米线、纳米锥等)、背面陷光结构(如镜面背反射层)以及混合陷光结构。大量研究表明,陷光结构的使用可以进一步提高GaAs薄膜电池的光电转换效率,一定程度上达到降低电池生产成本的目的。     

Optical properties of pulse laser deposited AlN thin films on silicon

Aluminium-nitride thin films were deposited on silicon Si(111) substrate with pulsed laser deposition in a Riber LDM-32 system. The optical properties of the films were studied by means of optical spectroscopy with an incoherent light source mainly covering the visible range. It is demonstrated that, in comparison with an aluminium mirror, under certain deposition conditions, the film may behave as a metallic thin film as far as the optical reflection is concerned. In this case, there is an enhanced plasmonic reflection peak in the optical spectrum and the peak may be modified according to the degree of the phase transition. The microscopic structures as well as the surface topographies of the films were also studied with X-ray photoelectron spectroscopy and scanning electron microscopy. It turns out that the density and the size of the microscopic domains in the film determine whether the film remains dielectric or becomes metallic. The diamagnetic effect in the enhanced plasma increases in the process when the sample is smoothed out with the optimized nitrogen gas pressure. The nitrogen pressure is thus identified as the most influential deposition condition to the phase transition.     

Sc2W3O12薄膜制备及其负热膨胀性能

采用脉冲激光沉积法制备了斜方相Sc₂W₃O₁₂薄膜。利用X射线衍射仪(XRD)和场发射扫描电镜(FESEM)对Sc₂W₃O₁₂靶材和Sc₂W₃O₁₂薄膜组分、表面形貌和靶材断面形貌进行表征, 研究衬底温度与氧分压对薄膜制备的影响。采用变温XRD和热机械分析仪(TMA)分析了Sc₂W₃O₁₂陶瓷靶材和薄膜的负热膨胀特性。实验结果表明: 经1000℃烧结6 h得到结构致密的斜方相Sc₂W₃O₁₂陶瓷靶材, 其在室温到600℃的温度范围内平均热膨胀系数为-5.28×10^-6 K^-1。在室温到500℃衬底温度范围内脉冲激光沉积制备的Sc₂W₃O₁₂薄膜均为非晶态, 随着衬底温度的升高, 薄膜表面光滑程度提高; 随着沉积氧压强增大, 表面平整性变差。非晶膜经1000℃退火处理7 min后得到斜方相Sc₂W₃O₁₂多晶薄膜, 在室温到600℃温度区间内, Sc₂W₃O₁₂薄膜的平均热膨胀系数为-7.17×10^-6 K^-1。     

CVD金刚石薄膜的介电性能研究

对直流电弧等离子体ＣＶＤ制备的金刚石薄膜的介电性能进行了研究，结果表明，金刚石薄膜的介电性能主要取决于样品的多昌性质以及表面和晶界处的非金刚石相和杂质成分。     

Dynamic scaling in sputter grown tungsten thin films

The evolution of a tungsten thin film grown by magnetron sputtering was studied using a dynamic scaling approach. Film growth was followed in-situ and in real-time by monitoring both the specular and the diffuse X-ray scattered intensities as a function of the time of deposition. The analysis of the scattering data allowed us to determine the two Power Spectral Density (PSD) functions, which describe the thin film topography. The time-dependent PSD-function, which describes the dynamic of the external film surface, is found to obey a universal scaling form, which characterizes the thin film growth. The data collapse of these PSDs into a single master curve was achieved using scaling exponents α = 0.18 ± 0.02 and β = 0.06 ± 0.01. In addition, by analyzing the temporal variation of the roughness conformity, it has been demonstrated that the replication factor decreases exponentially with increasing film thickness and spatial frequency. Hence, for a 25 nm thick film the vertical correlation disappears for spatial frequencies p greater than 3.6 μm^− 1.     

溶胶凝胶合成PbTiO3／NiTi工艺研究

研究了溶胶凝胶工艺在NiTi基体表面复合PbTiO     

The determination of the elastic modulus of microcantilever beams using atomic force microscopy

An investigation into the determination of the micromechanical properties of thin film materials has been performed. Thin metal and ceramic films are used extensively in the computer microprocessor industry and in the field of micro-electromechanical systems (MEMS). The demand for miniaturization and increased performance has resulted in the use of materials without a clear understanding of their mechanical properties on this scale. Micromechanical properties are difficult to obtain due to the lack of adequate testing equipment. The atomic force microscope (AFM), most commonly used as an imaging tool, lends itself to mechanical interaction with the sample surface utilizing a cantilever probe. An array of aluminum microcantilever beams were fabricated using standard IC processing techniques. The microbeams were deflected by the AFM cantilever probe and from this, the micromechanical properties of stiffness and elastic modulus were determined. Initial results indicate that this technique reliably determines the micromechanical properties of thin films.     

Layer by layer composite film of dimyristoyl-phosphatidylcoline and bacteriorhodopsin fabricated by multilayer molecular thin film method using fatty acid and lipid

A composite film of dimyristoyl-phosphatidylcoline (DMPC) and bacteriorhodopsin (BR) was fabricated by multilayer molecular thin film method using fatty acid and lipid on a quartz substrate or a hydrogenated amorphous silicon thin film. FTIR reflection absorption spectrums and UV absorption spectrums of the films were characterized on the detail of surface structure of the films. The spectroscopic data exhibited a specific layer by layer interaction of BR and environmental molecule DMPC above fatty acid. Especially, 4 layer composite LB films DMPC and BR exhibited an entirely different feature of IR reflection absorption spectrum depend on fatty acid species.     

Transmitted scattered light from a thin film with shallow random rough interfaces

The transmitted scattered energy of plane electromagnetic waves from a thin metallic film with shallow rough interfaces bounded by two semi-infinite media is calculated. Both interfaces are modeled as independent stationary random processes with a Gaussian roughness spectrum. Scattering of light is calculated for both TM (p) or TE (s) polarizations for normal and oblique angles of incidence. An integral equation is obtained for the transmitted field based on the Rayleigh method and their solution involves Fourier coefficients, depending on the roughness profiles. We present some results for the case of a single thin metallic film in the attenuated total reflection configuration for s and p polarization around the angle of the excitation of surface-plasma waves θ(sp). The transmitted scattered intensity shows a maximum at the resonant angle θ(sp) in the case of p polarization.     

ZnS:Mn沉积温度对薄膜电致发光器件亮度的影响

采用丝网印刷技术,在Al2O3陶瓷基板上印刷、高温烧结内电极及绝缘层,制备出陶瓷厚膜基板,进而制备了新型厚膜电致发光显示器(TDEL).整个器件结构为陶瓷基板/内电极/厚膜绝缘层/发光层/薄膜绝缘层/ITO透明电极.研究不同基板沉积温度对发光层性能的影响,并对器件的亮度-电压、亮度-频率进行测量.结果显示较高的ZnS:Mn沉积温度明显提高了无机发光器件的发光亮度.其原因主要是由于高的沉积温度提高了ZnS:Mn的成膜质量,提高膜层微晶尺寸大小,从而发光亮度提高.但是我们发现温度继续提高的同时,器件发光亮度趋于饱和,分析原因是由于掺杂Mn浓度过高,影响了发光效果.     

Impedance spectroscopic investigation of the effect of thin azo-calix[4]arene film type on the cation sensitivity of the gold electrodes

In this work, we report the impedance spectroscopic investigation of the effect of the thin film type on the selectivity of gold/azo-calix[4]arene electrodes. For this purpose, two C1 and C3 azo-calix[4]arene derivative molecules, used as thin films, are deposited by spin-coating process on the gold surface. These thin films were first studied using contact angle measurements. This revealed a less hydrophobic character for C3 thin film, which has been attributed to the presence of hydroxyl groups at the lower rim.The sensitivity study, by Electrochemical Impedance Spectroscopy (EIS), towards Cu²⁺ and Eu³⁺ cations, has showed that the C3 thin film is more sensitive and selective towards Eu³⁺ than C1. This best performance is due to the presence of two ester groups acting as clips and leading to more complexation stability.The EIS results were modeled by an appropriate equivalent circuit for the aim of elucidating electrical properties of thin films. This modeling has exposed that C3 thin film presents lower ionic conductivity and limited diffusion phenomenon at the interface.