Structures and properties of [CoPt/Ag]<Subscript><Emphasis Type="Italic">n</Emphasis></Subscript> multilayer fims

The magnetic properties and structures of [CoPt/Ag] _n , multilayer films deposited by DC magnetron sputtering have been studied. During the deposited process, two kinds of deposited sequences, that is Ag layer (FDAG) first deposited or CoPt layer (FDCP) first deposited, have been chosen. The results show that the microstructures and coercivities were strongly influenced by the deposited sequence and the thickness of films. The coercivities of [Ag/CoPt] _n with FDAG are obviously higher than those of [CoPt/Ag] _n with FDCP. Especially, when the thickness of films is 8 nm, the difference of coercivities between the FDAG film and the FDCP film is the largest. It is possibly because Ag plays a role of underlayer in FDAG multilayers, which can induce both the transformation from fcc to fct and the oriented growth along c-axis. In addition, δM curves reveal that the [CoPt/Ag]₈ multilayer, film has a lower intergrain interaction than the CoPt/Ag bilayer film.     

快速热处理的[Fe/Pt]n薄膜的结构和磁性

采用直流磁控溅射方法在Si基片上制备[Fe/Pt]_n薄膜,利用X射线荧光光谱仪(XRF)、X射线衍射仪(XRD)和振动样品磁强计(VSM)分析薄膜的组分、结构和磁性。研究结果表明：[Fe/Pt]_n薄膜经过600 ℃快速热处理,得到了L1₀-FePt薄膜。对于[Fe (x nm)/Pt (0.5 nm)]_n薄膜,当Fe层厚度为0.7 nm时,薄膜的有序度最大,平行膜面和垂直膜面的矫顽力均最高;对于不同调制周期的[Fe/Pt]_n薄膜,有序度随调制周期先增大后减小,平行膜面的矫顽力均高于垂直膜面的矫顽力,当调制周期为2.4 nm时,薄膜平行膜面的矫顽力最大。     

Effect of Ag addition on the microstructure and magnetic properties of FePt thin films

FePt thin films and [FePt/Ag]n multilayer thin films were prepared by magnetron sputtering technique and subsequent annealing process. By comparing the microstructure and magnetic properties of these two kinds of thin films, effects of Ag addition on the structure and properties of FePt thin films were investigated. Proper Ag addition was found helpful for FePt phase transition at lower annealing temperature. With Ag addition, the magnetic domain pattern of FePt thin film changed from maze-like pattern to more discrete island-like domain pattern in [FePt/Ag]n multilayer thin films. In addition, introducing nonmagnetic Ag hindered FePt grains from growing larger. The in-depth defects in FePt films and [FePt/Ag]n multilayer films verify that Ag addition is attributed to a large number of pinning site defects in [FePt/Ag]n film and therefore has effects on its magnetic properties and microstructure.     

Microstructures and magnetic properties of [SiO2/FePt]5/Ag thin films

[SiO2/FePt]5/Ag thin films were deposited by RF magnetron sputtering on the glass substrates and post annealing at 550 ℃ for 30 min in vacuum. Vibrating sample magnetometer and X-ray diffraction analyser were applied to study the magnetic properties and microstructures of the films. The results show that without Ag underlayer [SiO2/FePt]5 films deposited onto the glass are FCC disordered; with the addition of Ag underlayer [SiO]FePt]5/Ag films are changed into L10 and （111） mixed texture. The variation of the SiO2 nonmagnetic layer thickness in [SiO2/FePt]5/Ag films indicates that SiO2-doping plays an important role in improving the order parameter and the perpendicular magnetic anisotropy, and reducing the grain size and intergrain interactions. By controlling SiO2 thickness the highly perpendicular magnetic anisotropy can be obtained in the [SiO2 （0.6 nm）/FePt （3 nm）]5/Ag （50 nm） films and highly （001）-oriented films can be obtained in the [SiO2 （2 nm）/FePt （3 nm）]5/Ag （50 nm） films.     

Effect of substrate temperature on the structure and magnetic properties of CoPt/AlN multilayer films

The effect of substrate temperature on the structure and magnetic properties of CoPt/AlN multilayer films has been investigated.The crystallinity of CoPt has been improved with increasing substrate temperature from room temperature to 400 ℃.After post-annealing process,L1_0 CoPt structure transformation has also been promoted.However,since the easy magnetic axis of L1_0 CoPt is in[001]orientation,the promotion of L1_0 CoPt transformation causes the change of easy magnetic axis in(111) textured CoPt layers,which impairs the perpendicular magnetic anisotropy.The optimum substrate temperature should be room temperature to obtain the strongest perpendicular magnetic anisotropy according to the results of the present work.     

直流磁过滤电弧源制备银膜的工艺参数研究

为了探索电弧离子镀技术制备银薄膜中相关的工艺参数,利用直流磁过滤电弧源在K9玻璃和硅片上制备了银膜,通过白光干涉仪和剥离实验对所制备银膜的厚度、表面粗糙度和附着力进行检测,分析靶电流、基片偏压和过渡层对银薄膜沉积速率、粗糙度及附着力等特性的影响．实验结果表明：当靶电流为90．0A时,沉积速率为1．84nm／s,在偏压为＋10V时,得到膜层粗糙度为0．5355nm;利用过渡层的辅助,通过电弧离子镀有效地提高了银膜的附着力．     

PVDF/PDDA静电自组装超薄膜的制备与表征

提出了一种制备纳米量级铁电聚合物PVDF/PDDA超薄膜的新方法。聚二烯丙基二甲基氯化铵(PDDA)和极化处理后的聚偏氟乙烯(PVDF)复合超薄膜是通过层与层的静电自组装(LbL-SA)方法制备的,厚度约30~150 nm,每层膜厚度约为9 nm。PVDF/PDDA多层膜通过石英晶振微天平(QCM)、红外频谱仪、原子力显微镜(AFM)进行了测试与表征。QCM表征结果表明,PVDF与PDDA超薄膜能较好地交替组装;AFM表明PVDF/PDDA聚合物超薄膜的表面均匀、薄膜致密。与PVDF厚膜的电阻性能相比,PVDF/PDDA复合超薄膜的电阻性能有了很大提高。     

Microstructure and magnetic properties of FePt/MgO multilayers deposited by RF magnetron sputtering

FePt (50 nm) and [FePt(a nm)/MgO(b nm)]5/glass (a=1, 2, 3; b=1, 2, 3) films were prepared by radio frequency (RF) magnetron sputtering technique, and then were annealed at 600°C for 30 min. The effect of MgO layer thickness on the structures and magnetic properties of the FePt/MgO multilayers was investigated. The coercivities and inter-grain interactions of the FePt/MgO films were decreased, yet the degree of (001) texturing drastically increased with the increase in MgO layer thickness when the FePt layer thickness was fixed. Thus, the FePt/MgO films with appropriate coercivities, high perpendicular anisotropy, and weak in-ter-grain interactions were obtained by controlling the MgO layer thickness. Overall, these results indicate that the FePt/MgO nanos-tructured films are promising candidates for future high-density perpendicular recording media.     

化学沉积AgOx薄膜的透光性能

采用化学沉积法在银一三乙醇胺(TEA)溶液中制备了AgOx薄膜并研究了薄膜的紫外可见光透过性能.实验结果表明,沉积温度越低、沉积时间越短薄膜的厚度越小.AgOx薄膜成份是由Ag、Ag2O和AgO组成的混合相,且薄膜中AgO含量随着第二次TEA与第一次TEA添加量的比值变化而变化.AgO含量越高、薄膜厚度越小,薄膜在紫外、可见光波段的透过率越大.薄膜在300 nm左右出现紫外透过峰,且随着AgO含量增加,峰强度增加,峰位置发生红移;在980 nm附近出现明显的透过峰,峰强随AsO含量增加而增大,最大透过率达到70%.     

铜合金表面Ti/TiN多层膜的制备、结构及其性能

为了研究多层膜的腐蚀性能,促进多层膜在生产中的应用,采用电弧离子镀技术,通过调整环境N₂和Ar气的时间比例在铜衬底上成功制备了不同调制周期的Ti/TiN多层膜.利用x 射线衍射谱和交流阻抗谱研究了该多层膜的结构和腐蚀性能.表面形貌显示,沉积的Ti/TiN多层膜具有明显的周期性,环境中N2和Ar气的时间比例决定了多层膜的调制周期,N₂气时间越长,多层膜中TiN相层越厚.腐蚀性能测定表明,多层膜的调制周期影响其耐蚀性,当调制周期为550nm时,沉积膜的耐腐蚀性最好.     

Effect of Change in Thickness of Ag Toplayer on the Structure and Magnetic Properties of FePd Films Grown on Glass Substrate

A series of FePd based alloy films were deposited on glass substrates by DC magnetron sputtering. The Ag toplayer effect was studied using FePd(67.5 nm)/Ag(3.875, 7.75, 15.50, 31 and 38.75 nm) films annealed at 600 ℃ for different time in order to find the role of the Ag toplayer in disorder-order of FePd film. The results show that the Ag toplayer can accelerate the phase transition from FCC to FCT in films. The magnetic easy axis of the crystallites in this film is in-plane of substrate. The Ag toplayer can greatly enhance the coercive of FePd films. When the thickness of Ag is equal to 31 nm, the film has a very large in-plane coercivity of 2.8 kOe and a very low out-of-plane coercivity of 1.04 kOe.     

直流PCVD TiN膜针孔率的研究

用铁氰化钾贴纸法研究了PCVD(Plasma CVD)TiN膜中针孔率与沉积温度、样品表面粗糙度和膜厚度的关系。发现TiN膜薄时,针孔率高,针孔直径多数在1～3μm;TiN膜厚时,针孔急剧减少,针孔直径均在3.5～6μm,表明小直径的针孔在TiN生长中逐渐消失。TiN膜厚达到8～10μm时,仍有针孔存在。扫描电镜观察表明:形成针孔的主要原因是表面存在杂质(或污物)和孔洞缺陷。     

高级次反射膜空间解复用器件的设计

为了降低多周期高反射膜空间解复用器的制备工艺难度，根据 “超棱镜” 效应的多层薄膜空间解复用器的设计方法，提出了一种制备工艺简单的多层薄膜结构.通过增加周期中单层膜的级次来减少整个高反射膜系的周期数.所设计的高级次反射膜结构为10(9H9L)9H，对设计的膜系进行了数值模拟计算，并和相同总物理厚度的一级次高反射膜系进行了比较.计算结果表明，该设计方法明显降低了对制备工艺的要求，并具有大的空间色散和实际制备意义.     

脉冲激光沉积制备TiN/AlN多层薄膜的研究

采用脉冲激光沉积(PLA)法,在单晶Si试样表面沉积制备了一系列TiN/AlN硬质多层膜,并采用基于免疫算法的免疫径向基函数(IRBF)神经网络对AlN厚度建立预测模型,设计出具有可控调制周期和调制比的TiN/AlN多层膜。X射线衍射(XRD)结果表明,小调制层周期下,过高或过低的工艺条件下薄膜通常为非晶态,适当的工艺条件下TiN、AlN形成具有强烈织构的超晶格柱状晶多层膜;与此相应,纳米多层膜产生了硬度和弹性模量异常增高;随着调制比增加,使纳米多层膜形成非晶AlN层和纳米晶TiN层的多层结构,多层膜的硬度和弹性模量逐渐下降。XPS结果表明,薄膜界面由Ti+4、Ti+3离子组成,N的负二价、三价亚谱结构预示着非当量TiN、AlN的形成。AFM研究显示,薄膜的调制周期均在10~200 nm范围内,且薄膜表面较均匀;当多层薄膜调制周期在50 nm以下时,薄膜的纳米硬度值明显高于TiN和AlN的混合硬度值,达30 Gpa。     

CdS/Cu2O太阳能电池的制备及膜厚对光电性能的影响

采用水浴法和电沉积法制备CdS/Cu2O复合膜,组装成异质结薄膜太阳能电池。通过改变薄膜的厚度,测试了不同厚度的窗口层和吸收层对太阳能电池性能的影响。实验表明,在400 nm厚的CdS薄膜上沉积30次Cu2O薄膜,所获得的复合膜具有最大的填充因子FF(为0.42)和光电转换效率η(0.05%)。并通过实验发现,适当减少CdS窗口层的厚度,可以提高光的透射率,产生更多的光生载流子,提高了光电转换效率。适当增加Cu2O吸收层的厚度,可以提高光的吸收率,产生更多的光生载流子,提高了光电转换效率。     

脉冲激光沉积TiN/AlN多层膜的微结构与力学性能

采用脉冲激光沉积(LPA)法,在单晶Si表面制备了调制周期为50nm的不同调制比的TiN/AlN多层膜,并研究了调制比对多层膜微结构和力学性能的影响。扫描电镜(SEM)和原子力显微镜(AFM)显示,薄膜的调制比在1～4之间。并且小调制比下薄膜表面的岛密度小,岛面积过大,分布不均匀,相邻岛之间的起伏较大。X射线衍射(XRD)结果表明,小调制比下,AlN相为明显的(002)择优取向,TiN相主要以(200)、(220)形式存在;调制比增大后,AlN相的择优取向减弱,同时伴随着薄膜晶粒的细化及硬度增强,这一研究结果说明,调制比对多层膜的性质有一定的影响,大调制比会导致Al元素在界面处聚集,并与TiN进行合金化后的形成TiAlN结构,进而对薄膜的硬度产生影响。     

双轴织构金属基带上沉积YBCO高温超导膜的研究

制备了立方织构和｛１１０｝双轴织构的银基带,通过准分子激光方法在所制备的双轴织构的银基带上直接沉积了ＹＢＣＯ超导薄膜,其中在｛１１０｝双轴织构的银基带上沉积的超导满膜的临界电流密度Ｊｃ值达到２×１０５～５×１０５Ａ／ ｃｍ２（７７Ｋ, ０Ｔ）．     

Structure and internal stress of Au films deposited on Si02/Si(100) and mica by dc sputtering

Au films with a thickness of about 300 nm were deposited on SiO2/Si(100) and mica substrates by dc sputtering. X-ray diffraction spectroscopy and field emission scanning electron microscopy were used to analyze the structure and internal stress of the Au films. The films grown on SiO2/Si(100) show a preferential orientation of [111] in the growth direction. However the films grown on mica have mixture crystalline orientations of [111], [200], [220] and [311] in the growth direction and the orientations of [200]and [311] are slightly more than those of [111] and [2201. An intemal stress in the films grown on SiO2/Si(100) is tensile. For Au films grown on mica the internal stresses in the [111]- and [311]-orientation grains are compressive while those in the [200]- and [220]-orientation grains are tensile. Au films grown SiO2/Si(100) have some very large grains with a size of about 400 nm and have a wider grain size distribution compared with those grown on mica.     

Epitaxial growth of Fe/Ag single crystal superlattices and their magnetic properties

Single crystal Fe/Ag(001) superlattices with various periodicities were fabricated using ultrahigh vacuum evaporation de-position.It was found that single crystal bcc Fe layers and single crystal fcc Ag layers can epitaxially grow on a single crystal Ag buffer layer alternately,which was deposited on NaCl single crystal chips by ion beam assisted deposition.The magnetic measure-ments of the superlattices reveal an oscillation coupling between ferromagnetism and antiferromagnetism as a function of the Ag layer thickness.The oscillation period,which is 1 nm (5 Ag layers),is in good agreement with the calculated values when the Ag thickness is greater than 1.5 nm.While the thickness of the Ag spacer layer decreases to 1 nm,the oscillation coupling varies from calculations,which can be attributed to the intermixing of the interlayers according to the annealing results.     

Microstructures of NiFe/nonmagnetic metal spacer/FeMn films and their influences on exchange coupling

The discovery of the oscillatory exchange coupling between ferromagnetic (FM) layers separated by a nonmagnetic spacer layer in 1986[1] aroused peoples interest in the magnetic prop-erties of metallic multilayered films. FM/ nonmagnetic metal spacer /FM systems with any of the 3d transition metals Fe, Co and Ni or their alloys as FM material have been systematically stud-ied[24]. Oscillatory exchange coupling via spacers has been known as a general phenomenon relevant to many spacer materi…