Structures and properties of [CoPt/Ag]<Subscript><Emphasis Type="Italic">n</Emphasis></Subscript> multilayer fims

The magnetic properties and structures of [CoPt/Ag] _n , multilayer films deposited by DC magnetron sputtering have been studied. During the deposited process, two kinds of deposited sequences, that is Ag layer (FDAG) first deposited or CoPt layer (FDCP) first deposited, have been chosen. The results show that the microstructures and coercivities were strongly influenced by the deposited sequence and the thickness of films. The coercivities of [Ag/CoPt] _n with FDAG are obviously higher than those of [CoPt/Ag] _n with FDCP. Especially, when the thickness of films is 8 nm, the difference of coercivities between the FDAG film and the FDCP film is the largest. It is possibly because Ag plays a role of underlayer in FDAG multilayers, which can induce both the transformation from fcc to fct and the oriented growth along c-axis. In addition, δM curves reveal that the [CoPt/Ag]₈ multilayer, film has a lower intergrain interaction than the CoPt/Ag bilayer film.     

Effect of Ag addition on the microstructure and magnetic properties of FePt thin films

FePt thin films and [FePt/Ag]n multilayer thin films were prepared by magnetron sputtering technique and subsequent annealing process. By comparing the microstructure and magnetic properties of these two kinds of thin films, effects of Ag addition on the structure and properties of FePt thin films were investigated. Proper Ag addition was found helpful for FePt phase transition at lower annealing temperature. With Ag addition, the magnetic domain pattern of FePt thin film changed from maze-like pattern to more discrete island-like domain pattern in [FePt/Ag]n multilayer thin films. In addition, introducing nonmagnetic Ag hindered FePt grains from growing larger. The in-depth defects in FePt films and [FePt/Ag]n multilayer films verify that Ag addition is attributed to a large number of pinning site defects in [FePt/Ag]n film and therefore has effects on its magnetic properties and microstructure.     

Microstructures and magnetic properties of [SiO2/FePt]5/Ag thin films

[SiO2/FePt]5/Ag thin films were deposited by RF magnetron sputtering on the glass substrates and post annealing at 550 ℃ for 30 min in vacuum. Vibrating sample magnetometer and X-ray diffraction analyser were applied to study the magnetic properties and microstructures of the films. The results show that without Ag underlayer [SiO2/FePt]5 films deposited onto the glass are FCC disordered; with the addition of Ag underlayer [SiO]FePt]5/Ag films are changed into L10 and （111） mixed texture. The variation of the SiO2 nonmagnetic layer thickness in [SiO2/FePt]5/Ag films indicates that SiO2-doping plays an important role in improving the order parameter and the perpendicular magnetic anisotropy, and reducing the grain size and intergrain interactions. By controlling SiO2 thickness the highly perpendicular magnetic anisotropy can be obtained in the [SiO2 （0.6 nm）/FePt （3 nm）]5/Ag （50 nm） films and highly （001）-oriented films can be obtained in the [SiO2 （2 nm）/FePt （3 nm）]5/Ag （50 nm） films.     

快速热处理的[Fe/Pt]n薄膜的结构和磁性

采用直流磁控溅射方法在Si基片上制备[Fe/Pt]_n薄膜,利用X射线荧光光谱仪(XRF)、X射线衍射仪(XRD)和振动样品磁强计(VSM)分析薄膜的组分、结构和磁性。研究结果表明：[Fe/Pt]_n薄膜经过600 ℃快速热处理,得到了L1₀-FePt薄膜。对于[Fe (x nm)/Pt (0.5 nm)]_n薄膜,当Fe层厚度为0.7 nm时,薄膜的有序度最大,平行膜面和垂直膜面的矫顽力均最高;对于不同调制周期的[Fe/Pt]_n薄膜,有序度随调制周期先增大后减小,平行膜面的矫顽力均高于垂直膜面的矫顽力,当调制周期为2.4 nm时,薄膜平行膜面的矫顽力最大。     

脉冲激光沉积TiN/AlN多层膜的微结构与力学性能

采用脉冲激光沉积(LPA)法,在单晶Si表面制备了调制周期为50nm的不同调制比的TiN/AlN多层膜,并研究了调制比对多层膜微结构和力学性能的影响。扫描电镜(SEM)和原子力显微镜(AFM)显示,薄膜的调制比在1～4之间。并且小调制比下薄膜表面的岛密度小,岛面积过大,分布不均匀,相邻岛之间的起伏较大。X射线衍射(XRD)结果表明,小调制比下,AlN相为明显的(002)择优取向,TiN相主要以(200)、(220)形式存在;调制比增大后,AlN相的择优取向减弱,同时伴随着薄膜晶粒的细化及硬度增强,这一研究结果说明,调制比对多层膜的性质有一定的影响,大调制比会导致Al元素在界面处聚集,并与TiN进行合金化后的形成TiAlN结构,进而对薄膜的硬度产生影响。     

结构调制高硬度TiCu/TiN-Cu纳米多层复合膜制备及其机械性能

为改善TiN硬质薄膜的硬度和耐摩擦磨损性能,采用多弧离子镀技术,在硬质合金基底上制备了单层TiN-Cu薄膜和调制周期Λ=5.9～62.1 nm的5组TiCu/TiN-Cu纳米多层复合膜.使用扫描电子显微镜(SEM)、X射线能谱仪(EDS)、X射线衍射仪(XRD)、纳米压痕仪、划痕仪和摩擦磨损试验机等测试仪器,表征了薄膜...     

Microstructure and optical absorption properties of Au/NiO thin films

Au nanoparticles dispersed NiO composite films were prepared by a chemical solution method.The phase structure,microstructure,surface chemical state,and optical absorption properties of the films were characterized by X-ray diffraction,transmission electron microscopy,X-ray photoelectron spectroscopy,and Uv-vis spectrometer.The results indicate that Au particles with the average diameters of 35-42 nm are approximately spherical and disperse in the NiO matrix.The optical absorption peaks due to the surface p...     

Property improvement of multilayer TiN/Ti films with C~+ implantation

Using the MEVVA ion source, carbon ions have been implanted in TiN coatings deposited by multi-arc ion plating The Vickers microhardness of the C+ -implanted TiN films increased with the increase in the ion flux and dose. X-ray diffraction (XRD) analysis showed that the TiC phases had been formed in the films. In addition, the films had the preferred growth orientations of TiN and TiC, both of which were (111) orientation after annealing at 500℃ for 30 min. Auger electron spectra analysis indicated that C+ -implanted profile was in typical Gaussian-like distribution in single films. The distribution with multipeaks of C atoms was obtained in multi-layer TiN/Ti. The possibility of the multilayer films (Ti (C, N)/TiN/Ti(C, N)/TiN and Ti(C, N)/TiC/Ti(C, N)/TiC) forming using the C-implanted TiN/Ti films is presented for the first time.     

Preparation and magnetic properties of Co-P thin films

Magnetic Co-P thin films were prepared by electroless deposition. The experiment results show that the film thickness has a significant influence on the coercivity. While the film thickness varied from 300 nm to 5 μm,the coercivity dropped sharply from 45.36 to 22.28 kA/m. As the film thickness increased further,the coercivity varied slowly. When the thickness of the film was 300 nm,the deposited film could realize the coercivity as high as 45.36 kA/m,and the remanent magnetization as high as 800 kA/m .The ...     

电弧离子镀TiN/TiAlN复合涂层摩擦磨损性能研究

利用阴极电弧离子镀技术,在硬质合金基体上制得5层和20层TiN/TiAlN复合涂层.研究表明,这两种涂层均为典型的B1-NaCl面心立方结构,且均呈(200)择优取向.两种涂层表面光滑平整,粗糙度分别为0.32和0.11,硬度为1 470HV和2 000HV .20层复合涂层的摩擦系数和比磨损率低于5层,表明增加复合层数有利于提高涂层的耐磨损性能,涂层的磨损机理为磨粒磨损.     

Epitaxial growth of Fe/Ag single crystal superlattices and their magnetic properties

Single crystal Fe/Ag(001) superlattices with various periodicities were fabricated using ultrahigh vacuum evaporation de-position.It was found that single crystal bcc Fe layers and single crystal fcc Ag layers can epitaxially grow on a single crystal Ag buffer layer alternately,which was deposited on NaCl single crystal chips by ion beam assisted deposition.The magnetic measure-ments of the superlattices reveal an oscillation coupling between ferromagnetism and antiferromagnetism as a function of the Ag layer thickness.The oscillation period,which is 1 nm (5 Ag layers),is in good agreement with the calculated values when the Ag thickness is greater than 1.5 nm.While the thickness of the Ag spacer layer decreases to 1 nm,the oscillation coupling varies from calculations,which can be attributed to the intermixing of the interlayers according to the annealing results.     

Effects of Nd substitution on magnetic and magneto-optical properties of TbCo/Cr films

NdTbCo/Cr amorphous films with high perpendicular magnetic anisotropy were prepared onto glass substrates by rf magnetron sputtering. The effects of Nd substitution on the magnetic and magneto-optical properties of TbCo/Cr films were investigated. It was found that partial Tb substitution by Nd would increase the saturation magnetization and the Kerr rotation angle, change the temperature dependence of magneto-optical characteristics. These results can be explained by the ferrimagnetic structure of the rare earth-transition metal alloy. When the magnetic layer composition was （Nd0.265Tb0.735）31Co69, a saturation magnetization of 247 emu/cm^3 and a coercivity of 3.8 kOe at room temperature could be obtained.     

Effect of Sm-doping on the morphology and magnetic properties of radio frequency magnetron sputtered Ni-Mn-Ga films

Ni55.5Mn21Ga23.5 and Ni54Mn22Ga23Sm1 films were prepared by radio frequency (RF) magnetron sputtering. The effect of Sm do-pant on the morphologic and magnetic properties of Ni55.5Mn21Ga23.5 films was investigated. Sm doping can refine the particle size of the films from 100 to 60 nm, and further grain growth is not occurs even after annealing at 1073 K for 3.6 ks. Compared to Ni55.5Mn21Ga23.5 films, Sm-doped Ni54Mn22Ga23Sm1 films are easier to be magnetized and have a lower martensitic transformation temperature. In addition, the Curie temperature can also be adjusted, decreasing from 350 to 325 K after Sm doping. Martensitic transformation is not observed in the Sm-free films, which is close to the Curie temperature in the Sm-doped films, giving rise to the overlap of the structural and magnetic transi-tion temperatures.     

Charge and discharge curves： a unique reliable evidence for the electrochemical properties of LiCoO2

X-ray diffraction (XRD), the traditional characterization method to detect the electrochemical properties of LiCoO2, was doubted. The XRD patterns of three types of LiCoO2, with similar electrochemical properties, present differences. For the same type of LiCoO2, different XRD patterns were obtained when the sample preparing methods were different, because of preferred orienta- tion. The nonstandard method to prepare XRD powder samples can eliminate preferred orientation. The reliable evidence to detect electrochemical properties is still charge and discharge curves.     

硬软磁纳米复合薄膜的制备及其磁性能

为制备电磁性能优异的薄膜,运用溶胶-凝胶浸渍提拉法制备出BaFe12O19/Ni0.8Zn0.2Fe2O4复合膜,借助X射线衍射仪(XRD)、扫描电子显微镜(SEM)、振动样品磁强计(VSM)和矢量网络分析仪等分析手段表征了复合膜的结构、形貌、并对样品的磁性能和吸波性能进行了研究。结果表明,制得的复合膜在950℃下磁滞曲线呈单一相,磁性能最好,其剩磁高于硬软单膜,饱和磁化强度(Ms)、剩余磁化强度(Mr)和矫顽力(Hc)分别达到32.45emu/g、11.22emu/g和1203.24G。复合薄膜与硬软单膜相比,也有利于拓宽吸收频带,改善其吸波性能。     

Interface chemical states of NiO/NiFe films and their effects on magnetic properties

Ta/NiOx/Ni81Fe19/Ta multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field ( Hex) and the coercivity ( Hc) of NiOx/Ni81Fe19 as a function of the ratio of Ar to O2 during the deposition process were studied. The composition and chemical states at the interface region of NiOx/NiFe were also investigated using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that the ratio of Ar to O2 has great effect on the nickel chemical states in NiOx film. When the ratio of Ar to O2 is equal to 7 and the argon sputtering pressure is 0.57 Pa, the x value is approximately 1 and the valence of nickel is + 2. At this point, NiOx is antiferromagnetic NiO and the corresponding Hex is the largest. As the ratio of Ar/O2 deviates from 7, the exchange coupling field ( Hex) will decrease due to the presence of magnetic impurities such as Ni +3 or metallic Ni at the interface region of NiOx/NiFe, while the coercivity ( Hc) will increase due to     

Microstructures of NiFe/nonmagnetic metal spacer/FeMn films and their influences on exchange coupling

The discovery of the oscillatory exchange coupling between ferromagnetic (FM) layers separated by a nonmagnetic spacer layer in 1986[1] aroused peoples interest in the magnetic prop-erties of metallic multilayered films. FM/ nonmagnetic metal spacer /FM systems with any of the 3d transition metals Fe, Co and Ni or their alloys as FM material have been systematically stud-ied[24]. Oscillatory exchange coupling via spacers has been known as a general phenomenon relevant to many spacer materi…     

Influence of negative bias voltage on the mechanical and tribological properties of MoS<Subscript>2</Subscript>/Zr composite films

MoS2/Zr composite films were deposited on the cemented carbide YT14 (WC+14%TiC+6%Co) by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage on the composite film properties,including adhesion strength,micro-hardness,thickness and tribological properties were investigated.The results showed that proper negative bias voltage could significantly improve the mechanical and tribological properties of composite films.The effects of negative ...     

Fabrication of GaN epitaxial films on Al_2O_3/Si (001) substrates

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日盲型紫外探测系滤光膜的研制

针对紫外探测系统利用紫外日盲区的特殊要求,选取HfO2和Mgf2、JGS1三种高低折射率材料组合形式。在石英基底上,采用电子束和离子辅助沉积技术及石英晶体振荡监控厚度方法。对HfO2和JGS1膜电子束沉积工艺进行了研究,对HfO2与不同材料组合的沉积工艺进行了优化,解决了膜层与基底之间附着力的问题,同时改善了Mgf2膜随厚度变化易的龟裂现象。研究了0.24~0.28μm紫外日盲波段薄膜的沉积工艺和光谱特性问题。