Room-temperature self-organised In/sub 0.5/Ga/sub 0.5/As quantum dot laser on silicon

The first room-temperature operation of In/sub 0.5/Ga/sub 0.5/As quantum dot lasers grown directly on Si substrates with a thin (/spl les/2 /spl mu/m) GaAs buffer layer is reported. The devices are characterised by J/sub th//spl sim/1500 A/cm/sup 2/, output power >50 mW, and large T/sub 0/ (244 K) and constant output slope efficiency (/spl ges/0.3 W/A) in the temperature range 5-95/spl deg/C.     

InAs/GaAs quantum dot infrared photodetector (QDIP) with double Al/sub 0.3/Ga/sub 0.7/As blocking barriers

The ten stacked self-assembled InAs/GaAs quantum dot infrared photodetectors (QDIP) with different Al/sub 0.3/Ga/sub 0.7/As barrier widths and growth temperatures were prepared. Asymmetric current-voltage (I-V) characteristics and 2/spl sim/7.5 /spl mu/m detection window were observed. Peak responsivity of 84 mA/W at -0.4 V and peak specific detectivity of 2.5/spl times/10/sup 9/ cm-Hz/sup 1/2//W at zero bias were observed at 50 K. The characteristics of polarization insensitivity over the incident light and the high background photocurrent suggest that the self-assembled QDIP can be operated at higher temperature (/spl sim/250 K) under normal incidence condition in contrast to quantum well infrared photodetector (QWIP).     

Lasing at three-dimensionally quantum-confined sublevel of self-organized In/sub 0.5/Ga/sub 0.5/As quantum dots by current injection

A laser oscillation from self-organized In/sub 0.5/Ga/sub 0.5/As quantum dots is achieved at 80 K by current injection. Lasing at a three-dimensionally quantum confined sublevel of the In/sub 0.5/Ga/sub 0.5/As quantum dots is clearly demonstrated for the first time by electroluminescence and diamagnetic energy shift measurement. The results predict the possibility of ultra-low threshold current operation of quantum dot lasers.     

In/sub 0.5/Ga/sub 0.5/As/GaAs quantum dot infrared photodetectors grown by metal-organic chemical vapor deposition

We report the growth by low-pressure metal-organic chemical vapor deposition, fabrication, and characterization of ten-layer In/sub 0.5/Ga/sub 0.5/As/GaAs quantum dot infrared photodetectors. Normal incidence photoresponse of the detector was obtained at 5.9 /spl mu/m. The 77-K peak responsivity was 5.6 mA/W with the detectivity D/sup */ of 1.2/spl times/10/sup 9/ cm/spl middot/Hz/sup 1/2//W at the bias of 0.4 V.     

Characteristics of MOSFET Prepared on Si/MgO /spl dot/ Al/sub 2/O/sub 3//SiO/sub 2//Si Structure

A new silicon on insulator (SOI) wafer with epitaxial-Si/ epitaxial-MgO/spl dot/Al/sub 2/O/sub 3/ (0.1 /spl mu/m)/SiO/sub 2/(0.5 /spl mu/m)/     

High-T/sub 0/ strain-compensated InGaAsSb-AlGaAsSb quantum-well lasers emitting at 2.43 /spl mu/m

Strain-compensated InGaAsSb-AlGaAsSb quantum-well (QW) lasers emitting near 2.5 /spl mu/m have been grown by solid-source molecular beam epitaxy. The relatively high arsenic composition causing a tensile strain in the Al/sub 0.25/GaAs/sub 0.08/Sb barriers lowers the valence band edge and the hole energy level, leading to an increased hole confinement and improved laser performance. A 60% external differential efficiency in pulsed mode was achieved for 1000-/spl mu/m-long lasers emitting at 2.43 /spl mu/m. A characteristic temperature T/sub 0/ as high as 163 K and a lasing-wavelength temperature dependence of 1.02 nm//spl deg/C were obtained at room temperature. For 2000 /spl times/ 200 /spl mu/m/sup 2/ broad-area three-QW lasers without lateral current confinement, a low pulsed threshold of 275 A/cm/sup 2/ was measured.     

BV/sub CEO/--BV/sub CBO/ separation and sharpness of breakdown in high-speed bipolar transistors

The effect of secondary impact ionization by the noninitiating carrier on the near avalanche behavior of high-speed n-p-n bipolar transistors is studied. We show that secondary collector ionization by generated holes traveling back toward the base layer significantly reduces BV/sub CBO/ if the hole ionization coefficient is higher than that of electrons [/spl beta//sub p/(E)>/spl alpha//sub n/(E)]: positive feedback associated with a strong secondary ionization sharpens the breakdown characteristic by speeding up carrier multiplication and decreases separation between the open-base collector-emitter (BV/sub CEO/) and the open-emitter base-collector (BV/sub CBO/) breakdown voltages. The effect of secondary ionization on the BV/sub CEO/-BV/sub CBO/ separation has not previously been described. Multiplication coefficient comparisons for representative InP, GaAs, and Si collectors indicate all structures can sustain low-current above BV/sub CEO/ operation from a transport (nonthermal) point of view, although the different degrees of secondary ionization in various semiconductors lead to fundamental differences when InP is compared to GaAs and Si since for the latter materials /spl beta//sub p/(E)相似文献   

A 12 /spl times/ 12 In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiode array

We report a 12 /spl times/ 12 In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiode (APD) array. The mean breakdown voltage of the APD was 57.9 V and the standard deviation was less than 0.1 V. The mean dark current was /spl sim/2 and /spl sim/300 nA, and the standard deviation was /spl sim/0.19 and /spl sim/60 nA at unity gain (V/sub bias/ = 13.5 V) and at 90% of the breakdown voltage, respectively. External quantum efficiency was above 40% in the wavelength range from 1.0 to 1.6 /spl mu/m. It was /spl sim/57% and /spl sim/45% at 1.3 and 1.55 /spl mu/m, respectively. A bandwidth of 13 GHz was achieved at low gain.     

Electrically-pumped vertical-cavity lasers with Al/sub x/O/sub y/-GaAs reflectors

We have fabricated the first electrically-pumped vertical-cavity surface-emitting lasers (VCSELs) which use oxide-based distributed Bragg reflectors (DBRs) on both sides of the gain region. They require a third the epitaxial growth time of VCSELs with semiconductor DBRs. We obtain threshold currents as low as 160 /spl mu/A in VCSELs with an active area of 8 /spl mu/m/spl times/8 /spl mu/m using a two quantum well InGaAs-GaAs active region. By etching away mirror pairs from the top reflector, quantum efficiencies as high as 61% are attained, while still maintaining a low threshold current of 290 /spl mu/A.     

High-frequency modulation characteristics of 1.3-/spl mu/m InGaAs quantum dot lasers

In this letter, we report results of small-signal modulation characteristics of self-assembled 1.3-/spl mu/m InGaAs-GaAs quantum dot (QD) lasers at room temperature. The narrow ridge-waveguide lasers were fabricated with multistack InGaAs self-assembled QDs in active region. A high characteristic temperature of T/sub o/=210 K with threshold current density of 200A/cm/sup 2/ was obtained. Small-signal modulation bandwidth of f/sub -3 dB/=12 GHz was measured at 300 K with differential gain of dg/dn/spl cong/2.4/spl times/10/sup -14/ cm/sup 2/ from detailed characteristics. We observed that a limitation of modulation bandwidth in high current injection appeared with gain saturation. This property can direct future high-speed QD laser design.     

Damping-limited modulation bandwidths up to 40 GHz in undoped short-cavity In/sub 0.35/Ga/sub 0.65/As-GaAs multiple-quantum-well lasers

We demonstrate record direct modulation bandwidths from MBE-grown In/sub 0.35/Ga/sub 0.65/As-GaAs multiple-quantum-well lasers with undoped active regions and with the upper and lower cladding layers grown at different growth temperatures. Short-cavity ridge waveguide lasers achieve CW direct modulation bandwidths up to 40 GHz for 6/spl times/130 /spl mu/m/sup 2/ devices at a bias current of 155 mA, which is the damping limit for this structure. We further demonstrate large-signal digital modulation up to 20 Gb/s (limited by the measurement setup) and linewidth enhancement factors of 1.4 at the lasing wavelength at threshold of /spl sim/1.1 /spl mu/m for these devices.     

Cyclic codes over GR(4/sup m/) which are also cyclic over /spl Zopf//sub 4/

Let GR(4/sup m/) be the Galois ring of characteristic 4 and cardinality 4/sup m/, and /spl alpha/_={/spl alpha//sub 0/,/spl alpha//sub 1/,...,/spl alpha//sub m-1/} be a basis of GR(4/sup m/) over /spl Zopf//sub 4/ when we regard GR(4/sup m/) as a free /spl Zopf//sub 4/-module of rank m. Define the map d/sub /spl alpha/_/ from GR(4/sup m/)[z]/(z/sup n/-1) into /spl Zopf//sub 4/[z]/(z/sup mn/-1) by d/spl alpha/_(a(z))=/spl Sigma//sub i=0//sup m-1//spl Sigma//sub j=0//sup n-1/a/sub ij/z/sup mj+i/ where a(z)=/spl Sigma//sub j=0//sup n-1/a/sub j/z/sup j/ and a/sub j/=/spl Sigma//sub i=0//sup m-1/a/sub ij//spl alpha//sub i/, a/sub ij//spl isin//spl Zopf//sub 4/. Then, for any linear code C of length n over GR(4/sup m/), its image d/sub /spl alpha/_/(C) is a /spl Zopf//sub 4/-linear code of length mn. In this article, for n and m being odd integers, it is determined all pairs (/spl alpha/_,C) such that d/sub /spl alpha/_/(C) is /spl Zopf//sub 4/-cyclic, where /spl alpha/_ is a basis of GR(4/sup m/) over /spl Zopf//sub 4/, and C is a cyclic code of length n over GR(4/sup m/).     

Low threshold current density 1.3 /spl mu/m InAs/InGaAs quantum dot lasers with InGaP cladding layers grown by gas-source molecular-beam epitaxy

InAs/InGaAs quantum dot lasers with InGaP cladding layers grown by gas-source molecular-beam epitaxy (MBE) are reported. The laser emits 1.296 /spl mu/m light output and demonstrates a very low threshold current density of 111 A/cm/sup 2/. This is the lowest reported value of GaAs-based 1.3 /spl mu/m quantum dot lasers with InGaP cladding layers.     

On /spl Zopf//sub 4/-linear Preparata-like and Kerdock-like codes

We say that a binary code of length n is additive if it is isomorphic to a subgroup of /spl Zopf//sub 2//sup /spl alpha// /spl times/ /spl Zopf//sub 4//sup /spl beta//, where the quaternary coordinates are transformed to binary by means of the usual Gray map and hence /spl alpha/ + 2/spl beta/ = n. In this paper, we prove that any additive extended Preparata (1968) -like code always verifies /spl alpha/ = 0, i.e., it is always a /spl Zopf//sub 4/-linear code. Moreover, we compute the rank and the dimension of the kernel of such Preparata-like codes and also the rank and the kernel of the /spl Zopf//sub 4/-dual of these codes, i.e., the /spl Zopf//sub 4/-linear Kerdock-like codes.     

Long-wavelength In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As large-area avalanche photodiodes and arrays

Large-area (500-/spl mu/m diameter) mesa-structure In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiodes (APDs) are reported. The dark current density was /spl sim/2.5/spl times/10/sup -2/ nA//spl mu/m/sup 2/ at 90% of breakdown; low surface leakage current density (/spl sim/4.2 pA//spl mu/m) was achieved with wet chemical etching and SiO/sub 2/ passivation. An 18 /spl times/ 18 APD array with uniform distributions of breakdown voltage, dark current, and multiplication gain has also been demonstrated. The APDs in the array achieved 3-dB bandwidth of /spl sim/8 GHz at low gain and a gain-bandwidth product of /spl sim/120 GHz.     

The rank and kernel of extended 1-perfect /spl Zopf//sub 4/-linear and additive non-/spl Zopf//sub 4/-linear codes

A binary extended 1-perfect code of length n + 1 = 2/sup t/ is additive if it is a subgroup of /spl Zopf//sub 2//sup /spl alpha// /spl times/ /spl Zopf//sub 4//sup /spl beta//. The punctured code by deleting a /spl Zopf//sub 2/ coordinate (if there is one) gives a perfect additive code. 1-perfect additive codes were completely characterized and by using that characterization we compute the possible parameters /spl alpha/, /spl beta/, rank, and dimension of the kernel for extended 1-perfect additive codes. A very special case is that of extended 1-perfect /spl Zopf//sub 4/-linear codes.     

High performance quantum dot lasers on GaAs substrates operating in 1.5 /spl mu/m range

Stacked InAs/InGaAs quantum dots are used as an active media of metamorphic InGaAs-InGaAlAs lasers grown on GaAs substrates by molecular beam epitaxy. High quantum efficiency (/spl eta//sub i/>60%) and low internal losses (/spl alpha/<3-4 cm/sup -1/) are realised. The transparency current density per single QD layer is estimated as /spl sim/70 A/cm/sup 2/ and the characteristic temperature is 60 K (20-85/spl deg/C). The emission wavelength exceeds 1.51 /spl mu/m at temperatures above 60/spl deg/C.     

alpha factor improvements in high-speed p doped In/sub 0.35/Ga /sub 0.65/As/GaAs MQW lasers

The authors investigate experimentally for the first time the improvements in the linewidth enhancement factor, alpha , resulting from simultaneous addition of strain and p-doping in high-speed GaAs-based multiquantum well lasers. The alpha factor is determined from measured changes in both gain and refractive index as a function of CW bias current, yielding alpha 3.1 and 1.4 at the threshold lasing wavelength for unstrained GaAs/Al/sub 0.25/Ga/sub 0.75/As and p-doped strained In/sub 0.35/Ga/sub 0.65/As/GaAs devices, respectively.<>     

Metal-oxide-SiO/sub 2/ composite ZnO lasers

The use of metal-oxide-SiO/sub 2/ composite to sustain random lasing in ZnO thin films is proposed. It is shown that the presence of stripe pattern in the metal-oxide-SiO/sub 2/ composite is necessary to minimize lasing threshold and achieve directional emission. By controlling the concentration of the metal-oxide and stripe spacing, coherent lasing threshold and linewidth of /spl sim/85 kW/cm/sup 2/ and /spl sim/0.4 nm, respectively, can be obtained from mirrorless ZnO thin-film waveguide lasers.     

Evidence and understanding of ALD HfO/sub 2/-Al/sub 2/O/sub 3/ laminate MIM capacitors outperforming sandwich counterparts

Metal-insulator-metal capacitors with atomic-layer-deposited HfO/sub 2/-Al/sub 2/O/sub 3/ laminated and sandwiched dielectrics have been compared, for the first time, for analog circuit applications. The experimental results indicate that significant improvements can be obtained using the laminated dielectrics, including an extremely low leakage current of 1/spl times/10/sup -9/ A/cm/sup 2/ at 3.3V and 125/spl deg/C, a high breakdown electric field of /spl sim/3.3MV/cm at 125/spl deg/C, good polarity-independent electrical characteristics, while retaining relatively high capacitance density of 3.13 fF//spl mu/m/sup 2/ as well as voltage coefficients of capacitance as low as -80 ppm/V and 100 ppm/V/sup 2/ at 100 kHz. The underlying mechanism is likely due to alternate insertions of Al/sub 2/O/sub 3/ layers that reduce the thickness of each HfO/sub 2/ layer, hereby efficiently inhibiting HfO/sub 2/ crystallization, and blocking extensions of grain boundary channels from top to bottom as well as to achieve good interfacial quality.