Experimental study of gain and output coupling characteristics of aCW chemical oxygen-iodine laser

Gain and output coupling characteristics of the CW chemical oxygen-iodine laser (COIL) are determined experimentally by means of varying the output coupling method. Under the conditions that the Cl₂ flow rate is 11.8 mmol/s, the I₂ molar flow rate is from 20 to 50 μmol/s, and the duct pressure is 200 Pa, the following were obtained from the experimental data: maximum values of output power of 58 W, and optimal output coupling factor of 1.50%, a resonator efficiency of 4.8%, an unsaturated small-signal gain of 1.55×10^-3 cm^-1, a threshold small-signal gain of 1.31×10^-3 cm^-1, a saturation intensity of 1150 W/cm², intraresonator losses of 9%, and an atomic iodine concentration of 2.85×10¹⁴ cm^-3. A comparison of these results to the published data of other COIL systems is presented     

Experimental studies of proton-implanted GaAs-AlGaAsmultiple-quantum-well modulators for low-photocurrent applications

We describe the first attempts to control photocurrent, and thus power dissipation, in surface-normal multiple-quantum-well (MQW) modulators. We have made detailed experimental studies of proton-implanted p-i-n GaAs-Al_xGa_1-xAs MQW modulators having barrier layers of x=0.3, 0.45, and 1.0. Structures were implanted to levels of 1×10¹² cm^-2, 1×10¹³ cm^-2, and 1×10¹⁴ cm ^-2. Photocurrent progressively decreased with increasing implant-dose and barrier mole fraction (x). Exciton linewidths showed a strong voltage and implant dose dependence, demonstrating a tradeoff between photocurrent and modulation performance. We obtained our best results with x=1.0 barriers. For example, 1×10¹³ cm^-2-implanted asymmetric Fabry-Perot modulators were realized in which the optical performance was similar to that of unimplanted devices. The photocurrent responsivity was, however, only 0.007 A/W at 12.5 V bias. We report measurements of carrier lifetime in these materials that show the reduction in photocurrent arises from a reduction in lifetime due to implant-induced damage. In addition, the reduced lifetime decreases the optically-excited quantum-well carrier population, leading to an increase in cw saturation intensity. Specifically, 1×10¹³ cm^-2-implanted devices with x=1.0 have a saturation intensity of roughly 45 kW/cm², while unimplanted devices have 3.5 kW/cm². Asymmetric self electro-optic effect devices (A-SEED's) are demonstrated, and power dissipation issues associated with the use of low-photocurrent modulators in integrated systems are discussed     

Formation of cobalt silicided shallow junction using implantinto/through silicide technology and low temperature furnace annealing

This work investigates the shallow CoSi₂ contacted junctions formed by BF₂⁺ and As⁺ implantation, respectively, into/through cobalt silicide followed by low temperature furnace annealing. For p⁺n junctions fabricated by 20 keV BF₂⁺ implantation to a dose of 5×10¹⁵ cm^-2, diodes with a leakage current density less than 2 nA/cm² at 5 V reverse bias can be achieved by a 700°C/60 min annealing. This diode has a junction depth less than 0.08 μm measured from the original silicon surface. For n⁺p junctions fabricated by 40 keV As⁺ implantation to a dose of 5×10¹⁵ cm^-2, diodes with a leakage current density less than 5 nA/cm² at 5 V reverse bias can be achieved by a 700°C/90 min annealing; the junction depth is about 0.1 μm measured from the original silicon surface. Since the As⁺ implanted silicide film exhibited degraded characteristics, an additional fluorine implantation was conducted to improve the stability of the thin silicide film. The fluorine implantation can improve the silicide/silicon interface morphology, but it also introduces extra defects. Thus, one should determine a tradeoff between junction characteristics, silicide film resistivity, and annealing temperature     

High-Performance Bound-to-Continuum Quantum-Cascade Lasers for Broad-Gain Applications

Based on the bound-to-continuum active region design, we shall present a high performance continuous-wave (CW) quantum-cascade laser. In contrast to high performance lasers based on a two-phonon resonance transition and a narrow linewidth (< 165 cm^-1), the device presented here exhibits a spontaneous emission full-width at half-maximum as large as 295 cm^-1. Thus, such devices are very suitable for broadband tuning. At 30degC, it shows a maximum output power and slope efficiency of 188 mW and 500 mW/A, as well as a threshold current density of only 1.79 kA/cm². Furthermore, at this temperature, the device demonstrates an internal differential quantum efficiency of 71% and a wall plug efficiency of 2.0%. The maximum CW operation temperature reached is 110degC. A thermal resistance of 4.3 K/W was attained by epi-down mounting on diamond submounts. The waveguide losses of 14 cm^-1 are explained by intersubband absorption in addition to free-carrier absorption.     

1/f noise and specific detectivity of HgCdTe photodiodes passivatedwith ZnS-CdS films

1/f noise in HgCdTe photodiodes has been measured as a function of temperature, diode bias, and dark current. The dependence of 1/f noise on dark current was measured over a wide temperature range. At low temperatures, where surface generation and leakage current were predominant, a linear relationship between 1/f noise and dark current was observed. At higher temperatures, where diffusion current is predominant, the correlation no longer holds. The temperature dependence of 1/f noise was also determined. The temperature dependence of the 1/f noise was found to be the same as that for the surface generation and leakage currents. All the data obtained in these experiments could be fit with theoretical predictions by a simple relationship between 1/f noise and dark current. The 1/f noise in the HgCdTe photodiode varies with diode bias, temperature, and dark current only through the dependence of the surface current on these devices. The maximum specific detectivity (D*) value and the maximum signal-to noise ratio are approximately 3.51×10¹⁰ cm·Hz^1/2/W and 5096 at 50 mV reverse bias, respectively     

酒精蒸汽近红外高分辨光谱获取方法研究

酒精是相对复杂的分子,在常压下为宽带吸收,其OH基团的泛频吸收区位于近红外7000～7300cm-1处.利用可调谐二极管激光光谱学(TDLAS)方法测量了含有少量水汽的酒精蒸汽在7180 cm-1附近的吸收谱线,通过多项式拟合消除水汽吸收谱线干扰,获得了酒精蒸汽的特征吸收光谱,其半高半宽为1.3cm-1;并对不同浓度酒精蒸汽吸收谱线线型做了研究,证明其线型与酒精分压不相关,为发展基于TDLAS酒驾遥测技术奠定了基础.     

Uncooled InAs-GaSb type-II infrared detectors grown on GaAssubstrates for the 8-12-μm atmospheric window

We report on the growth and characterization of type-II infrared detectors with an InAs-GaSb superlattice active layer for the 8-12-μm atmospheric window at 300 K. The material was grown by molecular beam epitaxy on semi-insulating GaAs substrates. Photoconductive detectors fabricated from the superlattices showed 80% cutoff at about 12 μm at room temperature. The responsivity of the device is about 2 mA/W with a 1-V bias (E=5 V/cm) and the maximum measured detectivity of the device is 1.3×10⁸ cm.Hz^1/2/W at 11 μm at room temperature. The detector shows very weak temperature sensitivity. Also, the extracted effective carrier lifetime, τ=26 ns, is an order of magnitude longer than the carrier lifetime in HgCdTe with similar bandgap and carrier concentration     

Atmospheric corrections in the thermal infrared: global and watervapor dependent split-window algorithms-applications to ATSR and AVHRRdata

The split-window method is an appropriate way to perform atmospheric corrections of satellite brightness temperatures in order to retrieve the surface temperature. A climatological data set of 1761 different radio soundings, the TIGR database, has been used to develop two different split-window methods. A global quadratic (QUAD) method, with global coefficients to be applied on a worldwide scale, and a water vapor dependent (WVD) algorithm. The first method includes a quadratic term in the split-window equation that roughly accounts for the water vapor amount. The other method explicitly includes the water vapor amount in each split-window coefficient. When applied to the 1761 radio soundings, the latter method gives better results than the global one, especially when the surface emissivity is far from unity (0.95 or less) and when the water vapor reaches great values. Both algorithms have been tested on ATSR/ERSI and AVHRR/NOAA data over sea pixels. The QUAD algorithm gives correct results for simulations (the standard error is 0.2 K) and experimental data (the bias ranges from -0.1 to 0.4 K). The WVD algorithm appears to be more accurate for both simulations (the standard error is less than 0.1 K) and AVHRR experimental data when climatological water vapor contents are used (the bias ranges from -0.2 to 0.1 K)     

The planar 6H-SiC ACCUFET: a new high-voltage power MOSFETstructure

A novel planar accumulation channel SiC MOSFET structure is reported in this paper. The problems of gate oxide rupture and poor channel conductance previously reported in SiC UMOSFETs are solved by using a buried P⁺ layer to shield the channel region. The fabricated 6H-SiC unterminated devices had a blocking voltage of 350 V with a specific on-resistance of 18 mΩ.cm² at room temperature for a gate bias of only 5 V. This measured specific on-resistance is within 2.5× of the value calculated for the epitaxial drift region (10¹⁶ cm^-3, 10 μm), which is capable of supporting 1500 V     

Identification of a corner tunneling current component in advancedCMOS-compatible bipolar transistors

A corner tunneling current component in the reverse-biased emitter-base junction of advanced CMOS compatible polysilicon self-aligned bipolar transistors has been identified by measuring base current as a function of temperature, bias voltage, and emitter shape. This current is found to be an excess tunneling current caused by an increase in defect density in the corners of the emitter and gives rise to three-dimensional effects in small-geometry devices. The devices used for this study were selected from batches aimed at optimizing the emitter-base system. For this reason, the starting material was n-type (~10¹⁶ cm^-3) and provided the collector regions of the transistors. The intrinsic base and lightly doped extrinsic base regions were both implanted at 30 keV to a dose of 1×10¹³ cm^-2. The activation anneal was performed at 1060°C for 20 s in a rapid thermal annealer. Under such conditions, the emitter-base junction is located about 600 Å below the polysilicon-substrate interface     

Constant Bias Stress Effects on Threshold Voltage of Pentacene Thin-Film Transistors Employing Polyvinylphenol Gate Dielectric

We investigate the stability of pentacene thin-film transistors using a poly(4-vinylphenol) (PVP) gate dielectric under constant bias stress. The threshold voltage is shifted to the positive gate voltage when stressed in air, as caused by water vapors in the PVP gate dielectric. Meanwhile, we observe a negative shift under stress in vacuum. This shift is attributed to charges trapped in deep electronic states in pentacene near the gate interface. We propose a model for the negative shift of the threshold voltage and extract the hole concentration 4.5 x 10¹¹ cm^-2 that is needed to avoid the critical degradation, resulting in a W/L larger than 40.     

Gate oxide integrity of thermal oxide grown on high temperatureformed Si0.3Ge0.7

We have investigated the gate oxide integrity of thermal oxides direct grown on high temperature formed Si_0.3Ge_0.7. Good oxide integrity is evidenced by the low interface-trap density of 5.9×10¹⁰ eV^-1 cm^-2, low oxide charge density of -5.6×10¹⁰ cm^-2, and the small stress-induced leakage current after -3.3 V stress for 10 000 s. The good gate oxide integrity is due to the high temperature formed and strain-relaxed Si_0.3Ge_0.7 that has a original smooth surface and stable after subsequent high temperature process     

Continuously tunable high-pressure CO2 laser forspectroscopic studies on trace gases

A high-pressure CO₂ laser with unique characteristics in terms of continuous tunability and emission bandwidth is presented. It is operated at a pressure of 11.5 bar and transversely excited by short, high-voltage pulses generated by a double LC inversion circuit. Auxiliary discharges parallel to the electrodes provide a sufficient free-electron density through UV ionization of the laser gas mixture. The laser resonator consists of a near-grazing-incidence grating setup in which the grating is positioned at a large incidence angle of 77°. A theoretical model for the calculation of the emission bandwidth is presented and its predictions are compared to direct measurements and show excellent agreement. The achieved very narrow bandwidth of 0.018 cm^-1 constitutes the ultimate wavelength resolution of any detection system using this laser as radiation source. It allows the resolution of any fine structure in the spectra of absorbing gases at atmospheric pressure. Continuous tunability has been achieved over 76 cm^-1 between 932 cm^-1 and 1088 cm ^-1 with minimum pulse energies in excess of 10 mJ. The narrow bandwidth precludes the occurrence of mode-pulling effects so that the laser exhibits a linear wavelength tuning behavior throughout the entire emission range. The calibration of the laser wavelength is performed by photoacoustic measurements on low pressure CO₂ gas. An absolute accuracy of ±10^-2 cm^-1 is achieved. A great potential improvement in detection selectivity can thus be expected from a scheme with the high-pressure CO₂ laser as radiation source     

Erase/write cycle tests of n-MOSFETs with Si-implantedgate-SiO2

To discuss the applicability of a MOSFET with Si-implanted gate-SiO₂ of 50 nm thickness to a non volatile random access memory (NVRAM) operating more than 3.3×10¹⁵ erase/write (E/W) cycles, E/W-cycle tests were performed up to 10¹¹ cycles by measuring the hysteresis curve observed in a source follower MOSFET in which a sine-wave voltage of 100 kHz was supplied to the gate. Degradations in the threshold-voltage window of 15 V and gain factor were scarcely observed in a MOSFET with Si-implantation at 50 keV/1×10¹⁶ cm^-2 at a gate voltage of ±40 V. Those degradations observed in a MOSFET with 25 keV/3×10¹⁶ cm^-2 were improved by lowering the gate voltage from ±40 V to ±30 V in sacrificing the smaller threshold-voltage window from 20 to 8.5 V     

A semi-empirical model for the field-effect mobility ofhydrogenated polycrystalline-silicon MOSFETs

The quantitative relationship between field-effect mobility (μ _FE) and grain-boundary trap-state density (N_t ) in hydrogenated polycrystalline-silicon (poly-Si) MOSFETs is investigated. The focus is on the field-effect mobility in MOSFETs with N_t 1×10² cm^-2. It is found that reducing N_t to as low as 5×10¹¹ cm^-2 has a great impact on μ_FE. MOSFETs with the N_t of 4.2×10¹¹ cm^-2 show an electron mobility of 185 cm²/V-s, despite a mean grain size of 0.5 μm. The three principal factors that determine μ_FE, namely, the low-field mobility, the mobility degradation factor, and the trap-state density N_t are clarified     

Quantum-well Hall devices in Si-delta-dopedAl0.25Ga0.75As/GaAs and pseudomorphic Al0.25Ga0.75As/In0.25Ga0.75As/GaAsheterostructures grown by LP-MOCVD: performance comparisons

Characterized herein are quantum-well Hall devices in Si-delta-doped Al_0.25Ga_0.75As/GaAs and pseudomorphic Al_0.25Ga_0.75As/In_0.25Ga _0.75As/GaAs heterostructures, grown by low-pressure metal organic chemical vapor deposition method. The Si-delta-doping technique has been applied to quantum-well Hall devices for the first time. As a result high electron mobilities of 8100 cm^-2/V·s with a sheet electron density of 1.5×10¹² cm^-2 in Al_0.25Ga_0.75As/In_0.25Ga_0.75 As/GaAs structure and of 6000 cm^-2/V·s with the sheet electron density of 1.2×10¹² cm^-2 in Al_0.25Ga_0.75As/GaAs structure have been achieved at room temperature, respectively. From Hall devices in Al_0.25Ga_0.75As/In_0.25Ga_0.75 As structure, the product sensitivity of 420 V/AT with temperature coefficient of -0.015 %/K has been obtained. This temperature characteristic is one of the best result reported. Additionally, a high signal-to-noise ratio corresponding to the minimum detectable magnetic field of 45 nT at 1 kHz and 75 nT at 100 Hz has been attained. These resolutions are among the best reported results     

A physically-based model of the effective mobility in heavily-dopedn-MOSFETs

We present a new analytical mobility model for channel electrons in heavily-doped MOSFETs biased from weak to strong inversion suitable for implementation in device simulation codes. The model accounts for the two-dimensionality of the electron gas and for the effect of charge trapping on the measurements and has been validated by comparing the theoretical curves with an extensive set of mobility measurements performed on devices with channel doping ranging from 3.8×10¹⁷ to 1.25×10¹⁸ cm^-3 over a wide bias and temperature range (141-400 K)     

Transconductance enhancement due to back bias for submicron NMOSFET

For the first time, a new phenomenon of transconductance enhancement due to back bias found in submicron MOSFET's is reported. A two-dimensional numerical simulation has been performed to investigate the origin of this observation. The enhancement of the channel potential gradient is verified to be the main reason responsible for this anomalous transconductance enhancement effect. Moderate channel doping concentrations (5×10¹⁶~5×10¹⁷ cm^-3), short channel lengths (submicron regime), and operation under small drain bias are three key conditions for the maximum transconductance enhancement due to the back bias to occur. A conventional linear I-V model, which employs an effective channel length defined by the source/drain metallurgical junctions and bias-independent source/drain extrinsic resistance is not able to predict such characteristics     

AlGaN/GaN Metal–Oxide–Semiconductor High-Electron Mobility Transistors Using Oxide Insulator Grown by Photoelectrochemical Oxidation Method

A photoelectrochemical oxidation method was used to directly grow oxide layer on AlGaN surface. The annealed oxide layer exhibited beta-Ga₂O₃ and alpha-Al₂O₃ crystalline phases. Using a photoassisted capacitance-voltage method, a low average interface-state density of 5.1 times 10¹¹ cm^-2. eV^-1 was estimated. The directly grown oxide layer was used as gate insulator for AlGaN/GaN MOS high-electron mobility transistors (MOS-HEMTs). The threshold voltage of MOS-HEMT devices is -5 V. The gate leakage currents are 50 and 2 pA at forward gate bias of VGS = 10 V and reverse gate bias of V_GS = -10 V, respectively. The maximum value of g_m is 50 mS/mm of VGs biased at -2.09 V.     

Ultrashallow junctions for ULSI using As2+implantation and rapid thermal anneal

Using As₂⁺ ion implantation and rapid thermal anneal, 40-nm n⁺-p junctions are realized. The junction formed with p^- substrate shows very low leakage current (<0.5 nA/cm²) up to 2-V reverse bias. The introduction of a heavily doped (10¹⁸ cm^-3 level) p region generates a significantly higher leakage current due to the onset of band-to-band tunneling. Using varied geometry devices with a given area, the major tunneling current is shown to be confined in the perimeter of the device, and a method to suppress this leakage is suggested