Improved electrical and optical properties of ITO/Ag/ITO films by using electron beam irradiation and their application to ultraviolet light-emitting diode as highly transparent p-type electrodes

We have investigated the effect of insertion of a Ag layer in ITO film as well as electron beam irradiation to the multilayer films on the electrical and optical properties of the ITO-based multilayer deposited by magnetron sputtering method at room temperature. Inserting a very thin Ag layer between ITO layers resulted in a significant decrease in sheet resistance and increased the optical band gap of the ITO/Ag/ITO multilayer to 4.35 eV, followed by a high transparency of approximately 80% at a wavelength of 375 nm. We have also fabricated ultraviolet light-emitting diodes (LED) by using the ITO/Ag/ITO p-type electrode with/without electron beam irradiation. The results show that the UV-LEDs having ITO/Ag/ITO p-electrode with electron beam irradiation produced 19% higher optical output power due to the low absorption of light in the p-type electrode.     

Disentangling the Role of the SnO Layer on the Pyro-Phototronic Effect in ZnO-Based Self-Powered Photodetectors

Self-powered photodetectors (PDs) have been recognized as one of the developing trends of next-generation optoelectronic devices. Herein, it is shown that by introducing a thin layer of SnO film between the Si substrate and the ZnO film, the self-powered photodetector Al/Si/SnO/ZnO/ITO exhibits a stable and uniform violet sensing ability with high photoresponsivity and fast response. The SnO layer introduces a built-in electrostatic field to highly enhance the photocurrent by over 1000%. By analyzing energy diagrams of the p-n junction, the underlying physical mechanism of the self-powered violet PDs is carefully illustrated. A high photo-responsivity (R) of 93 mA W⁻¹ accompanied by a detectivity (D*) of 3.1 × 10¹⁰ Jones are observed under self-driven conditions, when the device is exposed to 405 nm excitation laser wavelength, with a laser power density of 36 mW cm⁻² and at a chopper frequency of 400 Hz. The Si/SnO/ZnO/ITO device shows an enhancement of 3067% in responsivity when compared to the Al/Si/ZnO/ITO. The photodetector holds an ultra-fast response of ≈ 2 µs, which is among the best self-powered photodetectors reported in the literature based on ZnO.     

Effect of electron beam irradiation on the electrical and optical properties of ITO/Ag/ITO and IZO/Ag/IZO films

We have investigated the effect of electron beam irradiation as well as insertion of a Ag layer on the electrical and optical properties of the ITO or IZO films. The results show that electron beam irradiation as well as inserting a very thin Ag layer can significantly reduce sheet resistance of the ITO/Ag/ITO and IZO/Ag/IZO films. The electron beam irradiation also increases light transmittance and optical band gap of the ITO/Ag/ITO multilayer films; meanwhile, it has not influence on the transmittance of the IZO/Ag/IZO films. These results can be explained by that In and Zn cation in IZO film have strong tendency to preserve their coordination with oxygen.     

Transparent conductive film having sandwich structure of gallium-indium-oxide/silver/gallium-indium-oxide

New transparent conductive films having the sandwich structure of gallium-indium-oxide/silver/gallium-indium-oxide (GIO/Ag/GIO) were prepared by conventional magnetron sputtering method at ambient substrate temperature. The electrical and optical properties of the films were compared with those of conventional indium-tin-oxide (ITO) films and ITO/Ag/ITO sandwich films. The GIO/Ag/GIO (40 nm/8 nm/40 nm) sandwich films, in which the GIO film was deposited using a GIO ceramic target with In content [In/(Ga + In)] of 10 at.%, exhibited a low sheet resistance of 11.3 Ω/sq and a large average transmittance of over 92.9% in the visible region (400-800 nm). This GIO/Ag/GIO films also exhibited a novel characteristic of transparency in the ultraviolet region; they showed high transmittance of 82.2% at the wavelength of 330 nm and 40.8% at the wavelength of 280 nm, which was not shown in the ITO films and the ITO/Ag/ITO sandwich films. The GIO/Ag/GIO sandwich films are useful as transparent electrode for emitting devices of ultraviolet radiation because of both their high conductivity and high transparency in the ultraviolet region.     

Surface plasmonic effect of nanoparticle-like silver nanostructure on the high responsivity of visible/infrared silver-based heterojunction photodetector

The fabrication of a silver (Ag) based photodetector on a silicon dioxide/p-silicon (SiO₂/p-Si) substrate using direct current (DC) magnetron sputtering is demonstrated. The proposed method deposits a nanoparticle-like Ag thin film that favours the photoconduction mechanism under light illumination at 468?nm and laser illumination at 660 and 980?nm. The thin film is characterized using scanning electron microscope (SEM), energy dispersive x-ray (EDX), x-ray diffraction (XRD), Raman scattering, photoluminescence (PL) and ultraviolet–visible (UV–VIS) analysis. Current–voltage (I–V) analysis and the calculated rectifying ratio (RR) suggests the establishment of good Schottky contacts for incident light/laser at 468, 660 and 980?nm, with good responsivity towards light and laser illumination in the forward and reverse DC bias regions. The responsivity increases as the wavelength decreases from 980?nm → 660?nm → 468?nm, with the highest responsivity of 213.7?mAW^?1 at 468?nm indicating better photoconduction at low light powers.     

CsPbI3 nanorods as the interfacial layer for high-performance,all-solution-processed self-powered photodetectors

Heterojunction is regarded as a crucial step toward realizing high-performance devices,particularly,forming gradient energy band between heterojunctions benefits self-powered photodetectors.There-fore,in this paper,the synthesis of CsPbI3 nanorods(NRs)and its application as the interfacial layer in high-performance,all-solution-processed self-powered photodetectors are presented.For the bilayer photodetector ITO/ZnO(100 nm)/PbS-TBAI(150 nm)/Au,a responsivity of 3.6 A/W with a specific detec-tivity of 9.8×1012 Jones was obtained under 0.1 mW/cm2 white light illumination at zero bias(i.e.in self-powered mode).Meanwhile,the photocurrent was enhanced to an On/Off current ratio of 10s at zero bias with an open circuit voltage of 0.53 V for trilayer photodetector ITO/ZnO(100 nm)/PbS-TBAI(150 nm)/CsPbI3(250 nm)/Au,in which the CsPbI3 NRs layer works as the interfacial layer.As a result,a specific detectivity of 4.5×1013 Jones with a responsivity of 11.12 A/W was obtained under 0.1 mW/cm2 white light illumination,as well as the rising/decaying time of 0.57 s/0.41 s with excellent stability and reproducibility upto four weeks in air.The enhanced-performance is ascribed to the mis-match bandgap between PbS-TBAI/CsPbI3 interface,which can suppress the carrier recombination and provide efficient transport passages for charge carriers.Thus,it provides a feasible and efficient method for high-performance photodetectors.     

GaN-UV photodetector integrated with asymmetric metal semiconductor metal structure for enhanced responsivity

Fabrication of very thin GaN ultraviolet photodetectors on Si (111) substrate integrated with asymmetric (Pt–Ag, Pt–Cr) metal–semiconductor–metal (MSM) structure have been illustrated. Designed GaN photodetection device displays significant enhancement in responsivity for asymmetric (Pt–Ag) MSM structure (280 mA/W) in comparison to symmetric (Pt–Pt) MSM structure (126 mA/W) at 10 V bias. The fabricated asymmetric and symmetric devices also exhibit fast response time in the range of 30–59 ms. The enhancement in responsivity using asymmetric MSM structure ascribed to large difference in work function which lead to change in Schottky barrier height of the metal semiconductor junction. Additionally, power dependent photoresponse analysis of GaN asymmetric (Pt–Ag) ultraviolet photodetector was showing a responsivity of 116 mA/W at low optical power of 1 mW. Such GaN asymmetric MSM ultraviolet photodetectors having high responsivity can extensively be used for low power, high speed ultraviolet photo detection applications.     

Substantially Improving Device Performance of All‐Inorganic Perovskite‐Based Phototransistors via Indium Tin Oxide Nanowire Incorporation

All‐inorganic halide perovskites (IHPs) have attracted enormous attention due to their intrinsically high optical absorption coefficient and superior ambient stabilities. However, the photosensitivity of IHP‐based photodetectors is still restricted by their poor conductivities. Here, a facile design of hybrid phototransistors based on the CsPbBr₃ thin film and indium tin oxide (ITO) nanowires (NWs) integrated into a InGaZnO channel in order to achieve both high photoresponsivity and fast response is reported. The metallic ITO NWs are employed as electron pumps and expressways to efficiently extract photocarriers from CsPbBr₃ and inject electrons into InGaZnO. The obtained device exhibits the outstanding responsivity of 4.9 × 10⁶ A W^?1, which is about 100‐fold better than the previous best results of CsPbBr₃‐based photodetectors, together with the fast response (0.45/0.55 s), long‐term stability (200 h in ambient), and excellent mechanical flexibility. By operating the phototransistor in the depletion regime, an ultrahigh specific detectivity up to 7.6 × 10¹³ Jones is achieved. More importantly, the optimized spin‐coating manufacturing process is highly beneficial for achieving uniform InGaZnO‐ITO/perovskite hybrid films for high‐performance flexible detector arrays. All these results can not only indicate the potential of these hybrid phototransistors but also provide a valuable insight into the design of hybrid material systems for high‐performance photodetection.     

Optical properties of ZnO thin film on γ-LiAlO2 substrate grown by pulsed laser deposition

Optical properties were investigated of ZnO thin films grown on (100) γ-LiAlO₂ (LAO) substrates by pulsed laser deposition method. C-axis oriented ZnO film was grown on (100) LAO substrate at the substrate temperature of 550 °C. The transmittances of the films were over 85%. Peaks attributed to excitons were seen in the absorption spectra, indicating that the thin films have high crystallinity. Photoluminescence spectra were observed at room temperature; the peak at 550 nm is ascribed to oxygen vacancies in the ZnO films caused by the diffusion of Li from the substrate into the film during deposition.     

Improvements of transparent electrode materials for GaN metal–semiconductor–metal photodetectors

Metal–semiconductor–metal (MSM) photodetectors based on GaN grown on (0 0 0 1) sapphire were fabricated and characterized. The responsivity of the Pt/GaN MSM device is low due to the blocking of incoming light by Pt electrodes. Although this problem can be partly solved by the transparent indium–tin oxide (ITO) contact, the range of operation voltage for ITO/GaN MSM devices is limited by the internal gain. Transparent multilayered electrode is proposed in this work by incorporating various intermediate layers (Ti, TiO₂, and Ti/TiO₂). The dark current of the ITO/TiO₂/GaN contact is two orders of magnitude lower than that of the ITO/Ti/GaN contact. The thin TiO₂ barrier also contributes the lower responsivity of the ITO/TiO₂/GaN structure. By introducing a thin Ti/TiO₂ interlayer at the ITO–GaN interface, a significant decrease in the dark current and an increase in responsivity can be achieved simultaneously. The photo-to-dark current contrast can reach 6×l0⁵, and the responsivity shows no discernible internal gain under a bias between 2.5 and 7.5 V.     

Patterned growth of β-Ga2O3 thin films for solar-blind deep-ultraviolet photodetectors array and optical imaging application

Solar-blind deep-ultraviolet (DUV) photodetectors based on Ga2O3 have attracted great attention due to their potential applications for many military and civil purposes.However,the development of device integration for optoelectronic system applications remains a huge challenge.Herein,we report a facile method for patterned-growth of high-quality β-Ga2O3 thin films,which are assembled into a photodetectors array comprising 8 × 8 device units.A representative detector exhibits outstanding photoresponse performance,in terms of an ultra-low dark current of～0.62 pA,a large Ilight/Idark ratio exceeding 104,a high responsivity of ～0.72 A W-1 and a decent specific detectivity of ～4.18 × 1011 Jones,upon 265 nm DUV illumination.What is more,the DUV/visible (250/400 nm) rejection ratio is as high as 103 with a sharp response cut-offwavelength at ～280 nm.Further optoelectronic analysis reveals that the photodetectors array has good uniformity and repeatability,endowing it the capability to serve as a reliable DUV light image sensor with a decent spatial resolution.These results suggest that the proposed technique offers an effective avenue for patterned growth of β-Ga2O3 thin films for multifunctional DUV optoelectronic applications.     

Fabrication and Properties of DC Magnetron Sputtered Indium Tin Oxide on Flexible Plastic Substrate

Indium tin oxide (ITO) thin films deposited on flexible polyethylene terephthalate (PET) substrates at low temperature by DC magnetron sputtering from an In-Sn (90-10 wt pct) alloy target were studied. The correla-tion between deposition conditions and ITO property was systematically investigated and characterized. These as-deposited ITO films were used as the anode contact for flexible organic light-emitting diodes (FOLEDs). The fabricated FOLEDs with a structure of PET/ITO/NPB (50 nm)/Alq (20 nm)/Mg:Ag (100 nm) showed a maximum luminance of 2125 cd/m2 at 13 V.     

FeS2/TiO2复合薄膜光电性能

采用溶液浸渍法在ITO导电玻璃表面的多孔TiO2薄膜上沉积了FeS2薄膜.使用Fe2O3粉末保护裸露在外的ITO导电膜在硫气氛中热处理后,制得了FeS2/TiO2复合薄膜.应用B531/H数显测厚指示表、数字式四探针测试仪、XJCM-8太阳电池测试仪等研究了FeS2/TiO2复合薄膜的厚度、ITO导电玻璃的电阻率以及FeS2/TiO2复合薄膜的光电性能.结果表明：此方法制得的FeS2/TiO2复合薄膜具有良好的光电性能;且ITO导电膜的电阻率变化较小.因而适宜制备色素增感太阳能电池（DSSC）.     

Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers

Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.     

Polycrystalline growth and recrystallization processes in sputtered ITO thin films

Indium tin oxide (ITO) thin films with various thicknesses from 170 to 700 nm have been grown onto unheated glass substrates by sputtering from ceramic target, and subsequently annealed in vacuum at temperatures ranging from 250 to 350 °C. The structure, morphology and electro-optical characteristics of the ITO samples have been analyzed by X-ray diffraction, atomic force microscopy, four-point electrical measurements and spectrophotometry. Polycrystalline ITO growth has been found varying with film thickness. The thickness also determined the recrystallization achievable by annealing and the electro-optical thin film properties.     

Investigation of low resistance transparent MoO3/Ag/MoO3 multilayer and application as anode in organic solar cells

Depending on the resistivity and transmittance, transparent conductive oxides (TCO) are widely used in thin film optoelectronic devices. Thus doped In₂O₃ (ITO), ZnO, SnO₂ are commercially developed. However, the deposition process of these films need sputtering and/or heating cycle, which has negative effect on the performances of the organic devices due to the sputtering and heat damages. Therefore a thermally evaporable, low resistance, transparent electrode, deposited onto substrates room temperature, has to be developed to overcome these difficulties. For these reasons combination of dielectric materials and metal multilayer has been proposed to achieve high transparent conductive oxides. In this work the different structures probed were: MoO₃ (45 nm)/Ag (x nm)/MoO₃ (37.5 nm), with x = 5-15 nm. The measure of the electrical conductivity of the structures shows that there is a threshold value of the silver thickness: below 10 nm the films are semiconductor, from 10 nm and above the films are conductor. However, the transmittance of the structures decreases with the silver thickness, therefore the optimum Ag thickness is 10 nm. A structure MoO₃ (45 nm)/Ag (10 nm)/MoO₃ (37.5 nm) resulted with a resistivity of 8 × 10^− 5 Ω cm and a transmittance, at around 600 nm, of 80%. Such multilayer structure can be used as anode in organic solar cells according to the device anode/CuPc/C₆₀/Alq₃/Al. We have already shown that when the anode of the cells is an ITO film the introduction of a thin (3 nm) MoO₃ layer at the interface anode (ITO)/organic electron donor (CuPc) allows reducing the energy barrier due to the difference between the work function of ITO and the highest occupied molecular orbital of CuPc [1]. This property has been used in the present work to achieve a high hole transfer efficiency between the CuPc and the anode. For comparison MoO₃/Ag/MoO₃/CuPc/C₆₀/Alq₃/Al and ITO/MoO₃/CuPc/C₆₀/Alq3/Al solar cells have been deposited in the same run. These devices exhibit efficiency of the same order of magnitude.     

Characterization of hexagonal ɛ-Ga1.8Sn0.2O3 thin films for solar-blind ultraviolet applications

Ga_1.8Sn_0.2O₃ thin films were deposited on c-plane Al₂O₃ (0001) substrates by laser molecular beam epitaxy technology. Well crystallized (002) oriented ɛ-phase Ga_1.8Sn_0.2O₃ thin films were obtained at the substrate temperature above 750 °C and the oxygen partial pressure more than 5 × 10⁻³ Pa. The band-gap slightly shrinks with Sn⁴⁺ ions incorporated into Ga³⁺ sites, showing an excellent solar-blind ultraviolet (UV) characteristic. The conductivity of hexagonal ɛ-Ga_1.8Sn_0.2O₃ films is very low in the dark, and permitting the design and fabrication of solar-blind photodetector. The photodetector exhibits obvious photo-response under 254 nm UV light irradiation, and it increases in photocurrent with both the rise of applied bias and optical input power. The results suggest that ɛ-Ga_1.8Sn_0.2O₃ thin film is a promising candidate for using in solar-blind photodetectors.     

Preparation and optimization of epitaxial growth of transparent ZnO nanotip thin films by hydrothermal method

Zinc oxide (ZnO) nanotip thin films were prepared on ZnO coated nanocrystalline ITO/glass substrates by hydrothermal method. In order to obtain the ZnO nanotip arrays with high aspect ratio, the experimental conditions were optimized. The scanning electron microscope images showed that the surface morphology of ZnO thin films could be easily manipulated by changing the seed layer thickness and growth time. The ZnO nanotip thin films were grown epitaxially on ZnO seed layer coated ITO/glass substrates. The surface morphology of ZnO thin films on ITO/glass substrate changed from nanorods with a flat-top end to nanotips as the growth time was increased from 3 to 15 h. The ZnO thin films prepared under these deposition conditions were highly oriented along (002) direction. The as-prepared sample (15 h) was annealed at different temperatures (30, 100, 150, and 270 degrees C). The surface morphologies of annealed ZnO thin films did not show any remarkable change and the best crystallinity was observed at 100 degrees C. The photoluminescence spectra showed that the near band edge emission shifted to shorter wavelength as the annealing temperature was increased from 30 to 270 degrees C, it was due to the intrinsic stress in the films. This was confirmed by X-ray diffraction analyses. NPB thin films were prepared on ITO/clay and ITO/glass substrates by thermal evaporation method. The electrical properties of Ag/NPB/ITO/Clay showed the Ohmic characteristics (J proportional V(1.0)). The J-V characteristic of Ag/NPB/PMMA/ZnO/ITO/Glass showed good rectification behaviour with a diode-ideality factor of 1.36.     

Investigation of the effect of different oxygen partial pressure to LaAlO3 thin film properties and resistive switching characteristics

The pulsed laser deposition and growth of a high-k dielectric lanthanum aluminate LaAlO₃ (LAO) thin film on indium tin oxide/glass substrate at different oxygen partial pressure was studied. Based on the pulsed laser deposition growth mechanism, we explain how a difference in the oxygen partial pressure influences the surface roughness, formation of an interfacial layer, and the transparent resistive switching characteristics of LAO thin films. The micro-structure and oxygen concentration difference inside LAO thin films may be the main reason for the difference in electrical and resistive switching properties. Films grown at higher oxygen partial pressure displayed more reliable resistive switching performance, due to the formation of the interfacial layer and a lower concentration of oxygen vacancies. The interfacial layer serves as a good oxygen reservoir and the involvement of more oxygen ions ensures the switching reliability. The migration of oxygen ions between the interfacial layer and the LAO film under applied bias may be the switching mechanism.     

A High-Performance Solution-Processed Organic Photodetector for Near-Infrared Sensing

Sensitive detection of near-infrared (NIR) light enables many important applications in both research and industry. Current organic photodetectors suffer from low NIR sensitivity typically due to early absorption cutoff, low responsivity, and/or large dark/noise current under bias. Herein, organic photodetectors based on a novel ultranarrow-bandgap nonfullerene acceptor, CO1-4Cl, are presented, showcasing a remarkable responsivity over 0.5 A W⁻¹ in the NIR spectral region (920–960 nm), which is the highest among organic photodiodes. By effectively delaying the onset of the space charge limited current and suppressing the shunt leakage current, the optimized devices show a large specific detectivity around 10¹² Jones for NIR spectral region up to 1010 nm, close to that of a commercial Si photodiode. The presented photodetectors can also be integrated in photoplethysmography for real-time heart-rate monitoring, suggesting its potential for practical applications.