A study of wet oxidized AlxGa1-xAs forintegrated optics

An investigation of wet oxidized Al_xGa_1-xAs layers in integrated optical applications is reported. Refractive index and thickness shrinkage of wet oxidized Al_xGa_1-xAs layers are measured using spectroscopic ellipsometry. A Cauchy fit to the refractive index is found in the wavelength range between 0.3 and 1.6 μm. The refractive index at 1.55 μm is found to be 1.66±0.01 with little dispersion around 1.55 μm. Very low loss single-mode waveguides with metal electrodes showing very low polarization dependence of loss coefficient are fabricated using wet oxidized Al_xGa_1-xAs layers as upper cladding. Optical polarization splitters are also designed and fabricated from the same type of waveguides taking advantage of increased birefringence. Designs utilizing wet oxidized Al_xGa_1-xAs are compared with conventional designs using only compound semiconductor heterostructures     

Monte Carlo study of GaAs/Alx Ga1-xAsMODFETs: effects of AlxGa1-xAs composition

Monte Carlo methods are used to compare electronic transport and device behavior in n⁺-Al_xGa_1-xAs/GaAs modulation-doped field-effect transistors (MODFETs) at 300 K for x =0.10, 0.15, 0.22, 0.30, 0.35, and 0.40. The differences between the x=0.22 and x=0.30 MODFETs with respect to parasitic conduction in Al_xGa_1-xAs, gate currents, and switching times, are of particular interest. The donor-related deep levels in Al_xGa_1-xAs, are disregarded by assuming all donors to be fully ionized, and the focus is only on the confinement and transport of the carriers. The following quantities are studied in detail: transfer characteristics (I_D versus V _G), transconductance (g_m), switching speeds (τ_ON), parasitic conduction in Al_xGa _1-xAs, gate current (I_G), average electron velocities and energies in GaAs and Al_xGa_1-x As, electron concentration in the device domain, k-space transfer (to low mobility L and X valleys), and details of the real-space transfer process     

In0.5(AlxGa1-x)0.5HEMTs for high-efficiency low-voltage power amplifiers: design,fabrication, and device results

In_0.5(Al_xGa_1-x)_0.5 high electron-mobility transistors (HEMTs) are expected to have higher two-dimensional electron gas density and larger current drive capability than both Al_0.23Ga_0.77As and In_0.5Ga _0.5P HEMTs due to the improved conduction-band offsets. In this paper, we performed a systematic investigation of the electrical properties of In_0.5(Al_xGa_1-x)_0.5 P (0⩽x⩽1) material system lattice matched to GaAs. By considering the conduction-band offset, direct-to-indirect-band electron transfer, donor-related deep levels, and Schottky barrier height, a relatively narrow range of the Al content 0.2⩽x⩽0.3 was found to be the optimum for the design of In_0.5(Al_xGa_1-x)_0.5 HEMTs. Under 1.2-V operation, power transistors with the optimum aluminum composition show high drain current density, high transconductance, and excellent power-added efficiency (65.2% at 850 MHz). These results demonstrate that InAlGaP HEMTs are promising candidates for high-efficiency low-voltage power applications     

Characteristics of a In0.52(AlxGa1-x)0.48As/In0.53Ga0.47As(0⩽x⩽1) heterojunction and its application onHEMT's

The quaternary In_0.52(Al_xGa_1-x) _0.48As compound on InP substrates is an important material for use in optoelectronic and microwave devices. We systematically investigated the electrical properties of quaternary In_0.52(Al_xGa_1-x)_0.48As layers, and found a 10% addition of Ga atoms into the InAlAs layer improves the Schottky diode performance. The energy bandgap (E_g ) for the In_0.52(Al_xGa_1-x)_0.48As layer was (0.806+0.711x) eV, and the associated conduction-band discontinuity (ΔE_c), in the InAlGaAs/In_0.53Ga_0.47 As heterojunction, was around (0.68±0.01)ΔE_g . Using this high quality In_0.52(Al_0.9Ga_0.1)_0.48As layer in the Schottky and buffer layers, we obtained quaternary In_0.52(Al_0.9Ga_0.1)_0.48As/In _0.53Ga_0.47As HEMTs. This quaternary HEMT revealed excellent dc and microwave characteristics. In comparison with the conventional InAlAs/InGaAs HEMT's, quaternary HEMT's demonstrated improved sidegating and device reliability     

Low-threshold current low-voltage vertical-cavity surface-emittinglasers with low-Al-content p-type mirrors grown by MOCVD

InGaAs quantum-well vertical-cavity surface-emitting lasers with low-Al-content p-type mirrors grown by metalorganic chemical vapor deposition (MOCVD) have have been characterized. Series resistance in p-type Al_xGa_1-xAs/GaAs mirrors decreases drastically as the Al content in Al_xGa_1-xAs decreases from AlAs. Air-post devices with a p-type Al_0.06Ga _0.4As/GaAs top mirror exhibit a room temperature CW threshold current of 1.8 mA at an operating voltage of 2.0 V (with a threshold power consumption at 3.6 mW)     

Modeling of short-pulse threshold voltage shifts due to DX centersin AlxGa1-xAs/GaAs and AlxGa1-xAs/InyGa1-yAs MODFET's

The DX-center-related short-pulse threshold voltage shifts (SPTVS) in Al_xGa_1-xAs-based MODFETs is modeled using CBAND, a simulator that solves Poisson equations self-consistently with Schrodinger equations and donor statistics. Using values given in the literature for the DX energy level in Al_xGa_1-xAs this technique gives good agreement between measured and simulated SPTVS for Al_0.3Ga_0.7As/GaAs and Al_0.3Ga_0.7As/In_0.2Ga_0.8As MODFETs. Both simulation and experiment show that the use of Al_0.2 Ga_0.8As in the donor layer reduces the SPTVS relative to the structures using Al_0.3Ga_0.7As. However, the measured shifts at this composition are considerably lower than the simulated values, indicating a DX energy level that may be higher than the value extrapolated from the literature, possibly due to the existence of multiple trap levels. Despite this discrepancy, these results support the use of strained-channel layers and lower Al_x Ga_1-xAs compositions in MODFETs for digital and other large-signal applications requiring good threshold stability     

Strained InGaAs/GaAs quantum well constricted-mesa lasers andapplication in a vertical-twin-guide tunable laser

Constricted-mesa semiconductor lasers containing a strained-layer InGaAs single-quantum-well-separate-confinement-heterostructure have been demonstrated. Very high etching selectivity between Al_xGa_1-xAs (x=0.9) and Al_xGa _1-xAs (x=<0.6) was achieved using diluted hydrofluoric acid to create a deeply undercut current confinement region, which enables a side contact for current injection. A process combining a self-aligned reactive ion etch and the undercut wet chemical etch has been developed for implementing a vertical twin-guide three-electrode tunable laser structure. Low-threshold currents for both single-guide devices with centered top contacts (5.2 mA) and twin-guide ones with side contacts (6.5 mA) were obtained     

AlxGa1−xN Ultraviolet Avalanche Photodiodes Grown on GaN Substrates

Al_xGa_1-xN (x=0.05) ultraviolet (UV) avalanche photodiodes grown on a GaN substrate are reported. The epitaxial structure was grown by metal-organic chemical vapor deposition on a free-standing bulk GaN substrate having low dislocation density. The growth conditions for Al_xGa_1-xN epitaxial layers on GaN substrates were optimized to achieve improved crystalline and structural quality. With UV illumination at lambda~250 nm, devices with mesa diameters of ~30 mum achieve stable maximum optical gains of ~50 at a reverse bias voltage of ~87 V.     

Characteristics of native-oxide-confined InGaP-(AlxGa1-x)0.5In0.5P quantum-well ridgewaveguide lasers

We report 670-nm native-oxide confined GaInP-(Al_xGa_1-x)_0.5In_0.5P quantum-well ridge waveguide laser diodes. The devices are fabricated from a compressively strained GaInP-(Al_xGa_1-x)_0.5In_0.5P quantum-well separate confinement heterostructure laser structure. Wet chemical etching and wet oxidation process are used to form native oxide confined ridge waveguides. The oxidation process converts the p-Al_0.5In_0.5P cladding layer into AlO_x after ridge etch. Laser diodes of 3.5-μm-wide ridge waveguide operate with threshold currents below 13.5 mA and differential quantum efficiencies over 35%/facet     

Temperature dependence of the ionization coefficients of AlxGa1-xAs

As Al_xGa_1-xAs alloys are increasingly used for microwave and millimeter wave power devices and circuits that work under high electric field intensities and junction temperatures; understanding the temperature dependence of impact ionization and related properties in this material system becomes more and more important. Measurements of the multiplication gain and noise of avalanche photodiodes (APDs) provide insight to the avalanche characteristics of semiconductors. Previously, we have reported the characteristics of GaAs and Al_0.2Ga_0.8As APD's at room temperature. In this paper, the gain and noise of a series of homojunction Al_xGa_1-xAs APD's were investigated over a wide temperature range from 29°C to 125°C, and the temperature dependence of their ionization coefficients was extracted     

High-quality two-dimensional electron gas inAlxGa1-xAs/GaAs heterostructures by LP-OMVPE

A combination of high mobility and high sheet carrier density in Al_xGa_1-xAs/GaAs two-dimensional electron gas (2DEG) elements was obtained by low-pressure organometallic vapor phase epitaxy (OMVPE). The sheet charge densities (n_s) and mobilities (μ) at 77 K are 1.2×10¹²/cm² and 90000 cm²/V-s for single-channel, and 2.0× 10¹²/cm² and 64500 cm²/V-s for double-channel elements, respectively. Strong correlations between the photoluminescence spectrum of the Al_xGa_1-xAs layers and the 2DEG mobility were found. The 2DEG elements were used as mixers and detectors at millimeter wavelengths. Mixing at 94 GHz with a 1.7-GHz IF bandwidth and detection of signals as high as 238 GHz under a magnetic field were achieved with these devices     

15-μm 128×128 GaAs/AlxGa1-xAsquantum well infrared photodetector focal plane array camera

In this paper, we discuss the development of very sensitive, very long wavelength infrared GaAs/Al_xGa_1-xAs quantum well infrared photodetectors (QWIPs) based on bound-to-quasi-bound intersubband transition, fabrication of random reflectors for efficient light coupling, and the demonstration of a 15-μm cutoff 128×128 focal plane array imaging camera. Excellent imagery, with a noise equivalent differential temperature (NEΔT) of 30 mK has been achieved     

Demonstration of Hybrid Alx Ga1−xAs–Polysilicon Microelectromechanical Tunable Filter

We report the experimental demonstration of a hybrid Al_xGa_1-xAs-polysilicon electrostatically actuated microelectromechanical systems (MEMS) tunable filter. An Al_0.4Ga_0.6As-GaAs distributed Bragg reflector was successfully flip-bonded to a polysilicon MEMS platform using SU-8 photoresist as bonding adhesive. The device demonstrated 53 nm (936.5-989.5 nm) of resonant wavelength tuning over the electrostatic actuation voltage range of 0-10 V     

Fabrication of high-performance AlxGa1-xAs/InyGa1-yAs/GaAs resonant tunneling diodes using amicrowave-compatible technology

A microwave-compatible process for fabricating planar integrated resonant tunneling diodes (RTDs) is described. High-performance RTDs have been fabricated using Al_xGa_1-xAs/In_y Ga_1-yAs/GaAs strained layers. Peak-to-valley current ratios (PVRs) of 4.8:1 with simultaneous peak current densities of 4×10⁴ A/cm² have been achieved at room temperature for diodes of area 9 μm². Accurate measurements of reflection gain versus frequency between 1.5 and 26.5 GHz in the negative differential region indicate that the present technology is promising for millimeter-wave integrated circuits including self-oscillating mixers, frequency multipliers, and detectors     

Influence of Al content x on hot electron noise in AlxGa1-xAs n+nn+ devices: comparison withGaAs

Hot electron noise measurements are performed in Si doped Al_x Ga_1-xAs n⁺nn⁺ devices, for three different Al concentrations: x=0.15, 0.2, 0.25. Noise temperatures are obtained using a pulsed measurement technique as functions of electric field and frequency. Longitudinal diffusion coefficients D(E) are deduced at 4 GHz. Results are analyzed through the scattering mechanisms which greatly affect the electron velocity properties of Al_xGa_1-xAs materials. Comparisons with n⁺ nn⁺ GaAs devices are made     

Dependently addressable dual-spot native-oxide-confined GaInP-(AlxGa1-x)0.5In0.5Pquantum-well lasers

We describe the fabrication and characteristics of 15-μm spaced dual-spot, 670-nm native-oxide confined GaInP-(Al_xGa_1-x )_0.5In_0.5P quantum-well ridge waveguide laser diodes. The devices are fabricated from a compressively strained GaInP-(Al_xGa_1-x)_0.5In_0.5P quantum-well separate confinement heterostructure laser structure. Wet oxidation of Al_0.5In_0.5P is used to form native-oxide-confined dual-ridge waveguides. The oxidation process converts part of the p-Al_0.5In_0.5P cladding layer into AlO_x after ridge etching. These diodes show excellent performance: uniform low threshold currents of 15 mA and differential quantum efficiencies over 35%/facet. The diodes show crosstalk less than 2%     

Optimization of resonant second- and third-order nonlinearities instep and continuously graded semiconductor quantum wells

Methods for systematic optimization of step-graded and continuously graded ternary alloy based quantum wells (QW's), in respect to second- or third-order intersubband nonlinear susceptibilities at resonance, are discussed. The use of these methods is examplified on the design of Al_xGa_1-xN and Al_xGa_1-x As-based QW's intended for resonant second harmonic or third harmonic generation with hω=116 meV or hω=240 meV pump photon energies, the objective being the largest susceptibility achievable with the chosen material. The obtained results exceed those previously reported in the literature     

Hot electron and DX center insensitivity ofAl0.25Ga0.75As/GaAs HFET's designed for microwavepower applications

We show in this work that, although designing Al_xGa_1-xAs/GaAs HFET's for microwave power applications requires a large barrier layer bandgap (hence x>0.2), the presence of a large concentration of electrically active DX centers in the barrier layer does not hinder the device reliability. The existence of a remarkable quantity of DX centers in the Al_0.25Ga_0.75As barrier layer is for the first time revealed by means of room temperature electroluminescence, and their concentration is evaluated by measuring the threshold voltage shift induced by hot electron stress at cryogenic temperatures     

Continuous operation of high-power (200 mW) strained-layerGa1-xInxAs/GaAs quantum-well lasers with emissionwavelengths 0.87⩽λ⩽0.95 μm

Separate confinement single-quantum-well lasers with 100-120 Å-thick strained Ga_1-xIn_xAs/GaAs active layers have been grown on (100) GaAs substrates by metalorganic chemical vapour deposition. Ten-stripe proton-implanted arrays with 90 μm-wide aperture and 250 μm cavity length emit 200 mW CW optical power at wavelengths 0.87⩽λ⩽0.95 μm. Lifetest data on an uncoated device emitting 90 mW/facet at 50°C and λ=0.95 μm suggest a mean-time-to-failure in excess of 2500 h at room temperature. The performance of lasers with strained Ga_1-xIn_xAs quantum wells is comparable to that of unstrained Al_xGa_1-xAs/GaAs quantum-well lasers without facet coating     

GaAs/AlGaAs multiple quantum well GRIN-SCH vertical cavity surfaceemitting laser diodes

Vertical cavity surface emitting lasers (VCSELs) with GaAs/AlGaAs multiple quantum well (20 wells) graded-index separate-confinement-heterostructure (GRIN-SCH) active regions are discussed. The VCSEL structures, which also contained two Al_xGa_1-xAs/Al_yGa_1-yAs distributed Bragg reflectors, were grown by molecular beam epitaxy and had a threshold current and current density at room temperature pulsed excitation of 16 mA and 14 kA/cm², respectively, near 0.85-μm wavelength. Both single-longitudinal and fundamental transverse mode emission characteristics were observed with a light output greater than 3 mW and a slope efficiency of 0.12 mW/mA