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外高桥电厂1、2号机组湿式烟气脱硫装置,是目前上海火力发电厂中的第一台大型脱硫装置。介绍了该脱硫装置的主要设备和运行系统构成,特别是详细介绍了该装置采用的新型螺旋式喷嘴、石灰石干式磨机和石灰石粉的气力输送、石膏浆液的长距离输送等技术。 相似文献
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1概述 YQSH系列潜海水电动机是在海洋石油平台油田上用来提取海水的主要动力,它是湿式充水密封型新系列潜海水电动机。该系列电动机是我国在引进德国里茨公司先进技术的基础上研制和生产的机组。机组为上泵下机,机泵内通过套筒式联轴器、外用公共双法兰及螺栓紧固为一体的潜水电机电泵机组。它除用在海洋油田外,还可用在其他含氯离子较多的水质中作提水动力工具。根据在海洋平台油田安装调试、故障处理的经验,介绍YQSH系列潜海水电动机安装调试及故障处理要领。2 YQSH系列潜海水电机结构特点及参数 我国目前生产的YQS… 相似文献
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本绝缘结构的研究宗旨在于:用廉价而稳定性又较高的材料作为主绝缘结构,以适应量大面广和生产成本经济的要求。 物美和价廉的辩证统一,是反映绝缘结构成功的标志。 尽管充油型潜海水电机具有完善的密封装置,然而,并不可能绝对密封。当使用环境恶劣,特别是砂粒多时,密封件会严重磨损,势必产生泄漏。在这种情况下,电机的绝缘结构应具有一定的耐海水能力,这乃是决定潜海水电机寿命的关键。 相似文献
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按被生产交联电缆的耐电压等级,生产线的冷却系统分有全干式氮气冷却和湿式水冷却两种。分别介绍了这两种冷却系统的装置组成和循环管路。 相似文献
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针对大庆油田某试验井潜油电机使用情况,给出了在工频和变频条件下应用多层反馈神经网络RMNN(recurrent multilayer neural network)实现电机转速辨识的方案,以便对潜油电机动态运行进行实时监测.鉴于潜油电机独特的高温工作环境,给出了无速度传感器条件下辨识潜油电机动态转速的RMNN模型.通过在井上对潜油电机定子电流、电压等参数的采集,着重研究潜油电机启动、稳定运行以及电源频率变化、负载变化对辨识效果的影响.研究结果表明,基于RMNN模型的潜油电机动态运行的速度辨识误差精度为0.4%,可满足试验井潜油电机转速辨识的需要. 相似文献
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<正> 首先分析了300兆焦/秒热功率范围内的热电厂和供热厂炉膛运行的边界条件,详细介绍了热电厂烟气净化技术的现状,如:脱氮、除硫及除尘(包括:湿式清洗和干添加剂除硫法,干式吸附法,沸腾燃烧技术等)。另外,还介绍了供热厂烟气净化的四种湿式 相似文献
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根据不同电站汽轮机设备的特点,提出了干法和湿法保护相结合的设备封存保养方法,并阐述了保养步骤和定期监督维护工作要点. 相似文献
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在对大型变压器、电抗器等设备检修时,使用干燥空气来对绝缘材料进行隔湿防潮具有安全、可靠、科学和经济的优点。章介绍了干燥空气的工作原理,给出了制取干燥空气的方法,指出了其应用优点、应用领域及应用效果。 相似文献
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In this work, fabrication and properties of 3-dimensional structures coated with piezoelectric Pb(Zr,Ti)O3 (PZT) thin films have been studied in order to improve the piezoelectric coupling into the third dimension. Calotte layers
have been chosen as demonstration devices. The base diameters range from 40 to 120 μm, the height varies between 10 to 40 μm.
A dynamic, in-situ co-sputtering process allowing for in-situ growth was applied. Micromoulds were formed by wet etching in
silicon. The etchant was a HNA solution (HF, HNO3, CH3COOH) on a silicon dioxide mask. Calottes were obtained with the desired geometry and smooth surface state after few minutes
etching time, and the use of chemical mechanical polishing (CMP). After deposition of the PZT membrane, deep silicon dry etching
was then used to liberate the calotte layer. The dielectric constant and loss tangent of the calotte capacitors amounted to
830 and 5%, respectively (10 kHz). The fundamental resonance frequencies varied between 2.5 and 16.5 MHz, and were found to
be inversely proportional to the base area of the calotte, the proportionality factor being 0.08 Hz m2. 相似文献
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本文研究了干法与湿法混合锰粉的工艺及混合锰粉的电性能。试验结果表明:湿法较干法在锰粉混合的均质化、电性能等方面都有明显改善。 相似文献
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Kreisberg Alan J. Schonbach Bernard H. 《Industry Applications, IEEE Transactions on》1984,(3):549-561
Although many papers have dealt with the topic of comparing the economic, thermal, and power efficiencies of wet process versus dry process, few have addressed the overall financial impact to the cement plant owner, namely, the acceptance of an investment decision based on project cost and return on investment. A computer model was developed to evaluate the capital budgeting decision taking into account the investment cost, fuel and power consumption, labor costs, inflation, depreciation, replacement parts, and economies of scale. Six cases of conversion from wet process to completely dry process were investigated for economic feasibility. These cases were selected to cover a range of considerations applicable to wet process plants currently operating in North America. The results show that the increased operating costs for wet process plants will now adequately justify the decision to convert to a completely dry process. 相似文献
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火电厂烟气脱硫技术的探讨 总被引:6,自引:0,他引:6
重点介绍了烟气脱硫技术中的一些主要工艺,包括湿法、半干法、干法以及它们的优缺点,并对火电厂烟气脱硫装置的选择提出了建议,对需要装设脱硫装置的燃煤火力发电厂可以起到一定的参考作用。 相似文献
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Parvais B. Pallandre A. Jonas A.M. Raskin J.-P. 《Device and Materials Reliability, IEEE Transactions on》2005,5(2):250-254
Stiction remains one of the biggest reliability problems in the fabrication of microelectromechanical systems (MEMS). This work investigates the techniques adapted to release thin-film devices (100 nm thick) and submicron gaps MEMS. First, a CMOS compatible wet release process was developed, using nonchlorinated silanes coating providing a high hydrophobicity (contact angle in the range of 110/spl deg/). Second, a vapor phase release process based on the same chemistry is shown to be adequate to release thin-film beams from a silicon-on-insulator wafer, where the wet process failed. This is to the authors' knowledge the first time that an in-use stiction-free release process has been demonstrated for such thin structures. The layers resist up to 300/spl deg/C without damage and X-ray reflectivity confirmed that homogeneous monolayers were obtained. 相似文献