Evolution of the deformation state and composition as a result of changes in the number of quantum wells in multilayered InGaN/GaN structures

The methods of high-resolution X-ray diffraction have been used to study the multilayered structures in an In _x Ga_{1 − x} N/GaN system grown by the method of metal-organic chemical-vapor deposition. A correlation between the strain state (relaxation) of the system, the indium content within quantum wells, the ratio of the barrier/well thicknesses, and the number of quantum wells in the active superlattice is established. It is shown that partial relaxation is observed even in a structure with one quantum well. The results we obtained indicate that the relaxation processes are bound to appreciably affect the optical characteristics of devices.     

Structural and optical investigation of InGaN/GaN multiple quantum well structures with various indium compositions

We have studied the influence of indium (In) composition on the structural and optical properties of In_x Ga_1−xN/GaN multiple quantum wells (MQWs) with In compositions of more than 25% by means of high-resolution x-ray diffraction (HRXRD), photoluminescence (PL), and transmission electron microscopy (TEM). With increasing the In composition, structural quality deterioration is observed from the broadening of the full width athalf maximum of the HRXRD superlattice peak, the broad multiple emission peaks oflow temperature PL, and the increase of defect density in GaN capping layers and InGaN/GaN MQWs. V-defects, dislocations, and two types of tetragonal shape defects are observed within the MQW with 33% In composition by high resolution TEM. In addition, we found that V-defects result in different growth rates of the GaN barriers according to the degree of the bending of InGaN well layers, which changes the period thickness of the superlattice and might be the source of the multiple emission peaks observed in the In_xGa_1−xN/GaN MQWs with high in compositions.     

Studies on nucleation kinetics of InxGa1−xN/GaN heterostructures

Nucleation kinetics during the growth of In_xGa_1−xN on a GaN substrate have been studied. The behavior of nonequilibrium between the In_xGa_1−xN and the GaN substrate has been analyzed, and hence, the expression derived for the stress-induced supercooling/superheating has been numerically evaluated. The maximum amount of stress-induced supercooling is found to be 1.017 K at x=0.12. These values are incorporated in the classical heterogeneous nucleation theory. Using the regular solution model, the interfacial tension between the nucleus and substrate and, hence, the interfacial tension between nucleus and mother phase and thermodynamical potential of the compounds have been calculated. The amount of driving force available for the nucleation has been determined for different compositions and degrees of supercooling. It has been shown that the value of the interaction parameter of InN-GaN plays a dominant role in nucleation and growth kinetics of In_xGa_1−xN on a GaN substrate. These values have been used to evaluate the nucleation parameters. It is shown that the nucleation barrier for the formation of a In_xGa_1−xN nucleus on a GaN substrate is minimum in the range of x=0.12 to x=0.17, and it has been qualitatively proved that good quality In_xGa_1−xN on GaN can be grown only in the range 0<x≤0.2.     

Evolution of Threading Dislocation Density and Stress in GaN Films Grown on (111) Si Substrates by Metalorganic Chemical Vapor Deposition

We have studied the evolution of threading dislocations (TDs), stress, and cracking of GaN films grown on (111) Si substrates using a variety of buffer layers including thin AlN, compositionally graded Al _x Ga_1-x N (0 ≤ x ≤ 1), and AlN/Al _y Ga_1-y N/Al _x Ga_1-x N (0 ≤ x ≤ 1, y = 0 and 0.25) multilayer buffers. We find a reduction in TD density in GaN films grown on graded Al _x Ga_1-x N buffer layers, in comparison with those grown directly on a thin AlN buffer layer. Threading dislocation bending and annihilation occurs in the region in the graded Al _x Ga_1-x N grown under a compressive stress, which leads to a decrease of TD density in the overgrown GaN films. In addition, growing a thin AlN/Al _y Ga_1-y N bilayer prior to growing the compositionally graded Al _x Ga_1-x N buffer layer significantly reduces the initial TD density in the Al _x Ga_1-x N buffer layer, which subsequently further reduces the TD density in the overgrown GaN film. In-situ stress measurements reveal a delayed compressive-to-tensile stress transition for GaN films grown on graded Al _x Ga_1-x N buffer layers or multilayer buffers, in comparison to the film grown on a thin AlN buffer layer, which subsequently reduces the crack densities in the films.     

Strain relaxation in InGaAs lattice engineered substrates

Strain relaxation of hypercritical thickness In_xGa_1−xAs layers has been observed during lateral oxidation of underlying AlAs layers. Strain relaxation of In_xGa_1−xAs layers was studied as a function of indium composition and the AlAs oxidation temperature. It is proposed that the enhanced strain relaxation is due to two factors. The first is enhanced motion of threading dislocations due to stresses generated during the lateral oxidation process. The second is the porous nature of the In_xGa_1−xAs/Al₂O₃ interface that minimizes the interaction of threading dislocations with existing misfit dislocation segments. The extent of strain relaxation increases with increasing oxidation temperature, whereas the efficiency of strain relaxation was found to decrease with increasing indium composition. The efficiency of strain relaxation upon oxidation can be improved by reducing the misfit dislocation density at the In_xGa_1−xAs/AlAs interface prior to oxidation and by changing the nature of the In_xGa_1−xAs/Al₂O₃ interface.     

Electric and photoelectric properties of n-GaxIn1−x N/p-Si anisotypic heterojunctions

We have developed a technology for producing n-type Ga_xIn_1−x N/p-Si heterostructures by combined pyrolysis of indium and gallium monoammoniate chlorides, making it possible to obtain heterolayers with composition varying over wide limits (from GaN up to InN). The composition and basic electric and optical characteristics of nitride films were determined. The electric and photoelectric properties of the heterostructures with Ga_xIn_1−x N films of different composition were investigated. It was shown that the anisotypic heterojunction n-Ga_xIn_1−x N/p-Si is a promising photosensitive element for detecting visible-range radiation. The maximum values of the specific detectivity were D*=1.2×10¹¹ Hz^1/2·W⁻¹ at 290 K. A band diagram of the heterojunction was constructed. Fiz. Tekh. Poluprovodn. 32, 461–465 (April 1998)     

Materials characteristics of pseudomorphic high electron mobility transistor structures with InxGa1−xas single quantum well and GaAs-InxGa1−xas (0.25 < x < 0.4) thin strained superlattice active layers

Growth and characterization results are presented for pseudomorphic high electron mobility transistor structures with In_xGa_1-xAs single quantum well and GaAs(h ₁)In _x Ga_1−x As(h ₂) thin strained superlattice active layers where 0.25≤x ≤ 0.4. All of the samples were grown by molecular beam epitaxy. Hall effect at 77 K, photoluminescence at 2 K, in-situ reflection high energy electron diffraction, and transmission electron microscopy measurements are discussed. Critical layer thickness measurements are compared with the Matthews-Blakeslee theory. Photoluminescence transition energies are compared with a self-consistent solution to Schrodinger’s and Poisson’s equations.     

Efficient 2.0–2.6 μm wavelength photoluminescence from narrow bandgap InAsP/InGaAs double heterostructures grown on InP substrates

Photoluminescence spectra and efficiency have been measured for several strained InAs_yP_1−yIn_xGa_1−xAs (0.28 < y ≤ 0.62; 0.66 ≤ x ≤ 0.83) double heterostructures grown by vapor phase epitaxy on InP substrates with graded InAsP buffer layers. Luminescence peak positions between the wavelengths of 1.99 and 2.57 (μm at a temperature of 295K are consistent with bandgap luminescence from the In_xGa_1−xAs active regions. Despite a high density of dislocations in the buffer layers, internal radiative recombination efficiencies of from 25 to 50% for the structures are found at 295K.     

MOVPE grown Ga1−xInxAs solar cells for GaInP/GaInAs tandem applications

Lattice-mismatched Ga_1−xIn_xAs solar cells with an absorption edge between 900 and 1150 nm have been grown on GaAs substrates. Different graded Ga_1−xIn_xAs buffer layers and solar cell structures were evaluated to achieve a good electrical performance of the device. External quantum efficiencies comparable to our best GaAs solar cells were measured. The best 1 cm² cell with a bandgap energy of 1.18 eV has an efficiency of 22.6% at AM1.5g and a short circuit current density of 36.4 mA/cm². To our knowledge, this is the highest reported efficiency for a Ga_0.83In_0.17As solar cell.     

MBE growth and properties of GaN and AlxGa1−xN on GaN/SiC substrates

The growth of GaN and AlGaN by molecular beam epitaxy (MBE) has been studied using GaN/SiC substrates. The GaN/SiC substrates consisted of ∼3 μm thick GaN buffer layers grown on 6H-SiC wafers by metalorganic vapor phase epitaxy (MOVPE) at Crée Research, Inc. The MBE-grown GaN films exhibit excellent structural and optical properties—comparable to the best GaN grown by MOVPE. Al_xGa_1−xN films (x ∼ 0.06-0.08) and Al_xGa_1−xN/GaN multi-quantum-well structures which display good optical properties were also grown by MBE on GaN/SiC substrates.     

Drift velocity of electrons in quantum wells of selectively doped In0.5Ga0.5As/AlxIn1 ? xAs and In0.2Ga0.8As/AlxGa1 ? xAs heterostructures in high electric fields

The field dependence of drift velocity of electrons in quantum wells of selectively doped In_0.5Ga_0.5As/Al _x In_{1 − x} As and In_0.2Ga_0.8As/Al _x Ga_{1 − x} As heterostructures is calculated by the Monte Carlo method. The influence of varying the molar fraction of Al in the composition of the Al _x Ga_{1 − x} As and Al _x In_{1 − x} As barriers of the quantum well on the mobility and drift velocity of electrons in high electric fields is studied. It is shown that the electron mobility rises as the fraction x of Al in the barrier composition is decreased. The maximum mobility in the In_0.5Ga_0.5As/In_0.8Al_0.2As quantum wells exceeds the mobility in a bulk material by a factor of 3. An increase in fraction x of Al in the barrier leads to an increase in the threshold field E _th of intervalley transfer (the Gunn effect). The threshold field is E _th = 16 kV/cm in the In_0.5Ga_0.5As/Al_0.5In_0.5As heterostructures and E _th = 10 kV/cm in the In_0.2Ga_0.8As/Al_0.3Ga_0.7As heterostructures. In the heterostructures with the lowest electron mobility, E _th = 2–3 kV/cm, which is lower than E _th = 4 kV/cm in bulk InGaAs.     

Conditions for the formation of defectless quantum dots in the theoretical estimation of In<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Ga<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>As/GaAs heterostructures

Critical thiknesses of formation mismatch dislocations and transition from two dimensional to three dimensional (2D–3D) mode during growth of In _x Ga_{1 − x} As/GaAs heterostructures by the Stranski-Krastanow mechanism were estimated using the energy balance model. The maximal magnitudes of those values and the intervals of the composition of solid solutions allowing the growth of defectless quantum dots were obtained.     

Quantitative and Depth-Resolved Investigation of Deep-Level Defects in InGaN/GaN Heterostructures

Deep-level defects in In_0.17Ga_0.83N/In_0.02Ga_0.98N/p-GaN:Mg heterostructures were studied using deep-level optical spectroscopy (DLOS). Depth-resolved DLOS was achieved by exploiting the polarization-induced electric fields to discriminate among defects located in the In_0.17Ga_0.83N and the In_0.02Ga_0.98N regions. Growth conditions for the In _x Ga_1−x N layers were nominally the same as those in InGaN/GaN multi-quantum-well (MQW) structures, so the defect states reported here are expected to be active in MQW regions. Thus, this work provides important insight into defects that are likely to influence MQW radiative efficiency. In_0.17Ga_0.83N-related bandgap states were observed at E _v + 1.60 eV and E _v + 2.59 eV, where E _v is the valence-band maximum, compared with levels at E _v + 1.85 eV, E _v + 2.51 eV, and E _v + 3.30 eV in the In_0.02Ga_0.98N region. A lighted capacitance–voltage technique was used to determine the areal density of deep states. The possible origins of the associated defects are considered along with their potential roles in light-emitting diodes.     

Very Low Pressure Magnetron Reactive Ion Etching of GaN and Al<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Ga<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>N Using Dichlorofluoromethane (Halocarbon 12)

In this work we report on the magnetron reactive ion etch (MRIE) technology for gallium nitride (GaN) and aluminum gallium nitride (Al _x Ga_1−x N) using dichlorodifluoromethane (CCl₂F₂), commonly known as halocarbon 12, with etch rates greater than 1,000 and 840 ?/min, respectively. Magnetic confinement of a very low pressure (10⁻⁴ Torr range) radio frequency (RF) discharge generates high-density plasmas, with low sheath voltages at the bounding surfaces, and very high dissociation of the source gas. Furthermore, the very low pressure of the etch process is characterized by long mean free paths so that sputtering contamination is reduced. MRIE chemistry has been monitored in situ by means of mass spectroscopy. Finally, we report on the successful fabrication of an indium gallium nitride (In _x Ga_1−x N) blue light emitting diode (LED), whose fabrication sequence included the MRIE etching of GaN in CCl₂F₂.     

Characterization of GaAs/ InxGa1−x As quantum-dot heterostructures by electrical and optical methods

Results of electrical and optical studies of GaAs/In_xGa_1−x As heterostructures are reported. The aim of these studies was to identify the quantum dots and develop a technology of their growth by spontaneous transformation of an In_xGa_1−x As layer. The surface charge at the depth of the quantum dots and their surface density as a function of the deposition time of this narrow-band material are estimated by C-V profiling. A photoluminescence study of the quantum dots revealed peculiarities of the filling of their electron states at various excitation levels. The influence of Coulomb interactions on the optical properties of the quantum dots is discussed. Fiz. Tekh. Poluprovodn. 32, 111–116 (January 1998)     

Luminescence spectra of blue and green light-emitting diodes based on multilayer InGaN/AlGaN/GaN heterostructures with quantum wells

The luminescence spectra of blue and green light-emitting diodes based on In_xGa_1−x N/Al_yGa_1−y N/GaN heterostructures with a thin (2–3 nm) In_xGa_1−x N active layer have been investigated in the temperature and current intervals 100–300 K and J=0.01–20 mA, respectively. The spectra of the blue and green light-emitting diodes have maxima in the interavals ℏω_max=2.55–2.75 eV and ℏω_max=2.38–2.50 eV, respectively, depending on the In content in the active layer. The spectral intensity of the principal band decreases exponentially in the long-wavelength region with energy constant E ₀=45–70 meV; this is described by a model that takes into account the tails of the density of states in the two-dimensional active region and the degree of filling of the tails near the band edges. At low currents radiative tunneling recombination with a voltage-dependent maximum in the spectrum is observed in the spectra of the blue diodes. A model of the energy diagram of the heterostructures is discussed. Fiz. Tekh. Poluprovodn. 31, 1055–1061 (September 1997)     

Epitaxial Growth and Device Design Optimization of Full-Vertical GaN <Emphasis Type="Italic">p</Emphasis>-<Emphasis Type="Italic">i</Emphasis>-<Emphasis Type="Italic">n</Emphasis> Rectifiers

The optimization of growth parameters, epitaxial structure, and device design for full-vertical gallium nitride (GaN) p-i-n rectifiers grown on n-type 6H-SiC substrates employing AlGaN:Si conducting buffer layers have been studied. The Al _x Ga_1−x N:Si (x = ~0.1) nucleation layer is calibrated to be capable of acting as a good buffer layer for subsequent GaN growth as well as to provide excellent electrical properties. Two types of full-vertical devices were fabricated and compared: one without any current guiding and the other with the current guiding in the p-layer. The reverse breakdown voltage for rectifiers with a relatively thin 2.5-μm-thick i-region without p-current guiding was found to be over −330 V, while one with p-current guiding was measured to be over −400 V. Devices with p-current guiding structures exhibit reduced reverse leakage current by an order of magnitude >4 at −100 V.     

Metallurgical amd electroluminescence characteristics of vapor-phase and liquid-phase epitaxial junction structures of InxGa1−xAs

In_xGa_1−xAs (x = 0.05 to 0.32) p-n junction structures have been grown on GaAs substrates by vapor-phase epitaxy (VPE) and liquid-phase epitaxy (LPE). It is shown that by step-grading the VPE material, lattice-mismatch strain can be absorbed by dislocations at the grading interfaces, leaving the final constant-composition device layers relatively dislocation free. In contrast, the dislocation density for LPE In_xGa_1−xAs increases with increasing InAs concentration. For both materials, diffusion lengths, electroluminescence efficiencies, and 77°K laser-diode parameters (threshold and efficiency) can be correlated with their dislocation densities. The VPE materials have electrical and luminescence properties that are independent of InAs concentration, and match those of their GaAs counterparts. The LPE materials exhibit properties that degrade with increasing InAs concentration. This research was supported in part by the Air Force Avionics Laboratory, WPAFB, Ohio, under Contract No. F33615-73-C-1177     

Diode lasers emitting at 1220 nm with a highly strained GaInAs quantum well and GaAsP compensating layers MOCVD-grown on a GaAs substrate

Heterostructures with an active region containing a Ga_0.59In_0.41As quantum well located between GaAs_{1 − y} P _y compensating layers were studied using photoluminescence spectroscopy. It was shown that an increase in the phosphorus content in compensating layers makes it possible to obtain unrelaxed heterostructures with wider Ga_0.59In_0.41As quantum wells. On the basis of photoluminescence studies, the parameters of such a composite active region were chosen with a view to attaining the longest lasing wavelength possible. Laser heterostructures with a composite active region consisting of a highly strained Ga_0.59In_0.41As quantum well located between GaAs_0.85P_0.15 compensating layers were grown on GaAs substrates by metalloorganic chemical vapor deposition. Stripe mesa-structure laser diodes of 100-μm aperture emitting at 1220 nm were fabricated. The highest emission power of these laser diodes in the continuous-wave regime amounted to 2 W per output mirror.     

GaInAsSb/GaSb heterostructures grown in the spinodal decay region by liquid-phase epitaxy from Sb-enriched solution-melts

Nearly isoperiodic solitary Ga_1−x In_xAs_ySb_1−y /GaSb heterostructures, in which the composition of the solid solution should be found inside the region of spinodal decay (x⩽0.4), were grown by liquid-phase epitaxy from solution-melts enriched with antimony. On the basis of the results of a study of structural and luminescence properties of Ga_1−x In_xAs_ySb_1−y /GaSb heterostructures we have determined the main conditions ensuring reproducible growth of epitaxial layers, homogeneous in the composition of their solid solutions in the region where the existence of processes of spinodal and binodal decay have been theoretically predicted. It is shown that the magnitude and sign of the deformation which the layer undergoes during growth and also the thickness of the layer are the main factors influencing the properties of the growing GaInAsSb solid solutions in the spinodal-decay zone. Fiz. Tekh. Poluprovodn. 33, 1134–1136 (September 1999)