A sub-130-nm conditional keeper technique

Increasing leakage currents combined with reduced noise margins significantly degrade the robustness of wide dynamic circuits. In this paper, we describe two conditional keeper topologies for improving the robustness of sub-130-nm wide dynamic circuits. They are applicable in normal mode of operation as well as during burn-in test. A large fraction of the keepers is activated conditionally, allowing the use of strong keepers with leaky precharged circuits without significant impact on performance of the circuits. Compared to conventional techniques, up to 28% higher performance has been observed for wide dynamic gates in a 130-nm technology. In addition, the proposed burn-in keeper results in 64% active area reduction     

A 64-bit microprocessor in 130-nm and 90-nm technologies with power management features

The first two members in a family of 64-bit superscalar microprocessors are presented. The 130-nm processor, which was introduced first, offers 5-way instruction dispatch, support for 4-way integer and floating-point single-instruction multiple-data (SIMD) operations, a 512-kB second level (L2) cache, and a high-speed external bus. The 90-nm processor is a technology remap of the 130-nm design. It retains the features of the 130-nm processor and adds others, including a new power management facility. The architecture, device characteristics, power management, and thermal details of these two processors are described. In addition, the dataflow layout, aspects of the circuit design, clocking, and timing are discussed.     

Designing leakage tolerant, low power wide-OR dominos for sub-130 nm CMOS technologies

In this paper, we discuss the design of leakage tolerant wide-OR domino gates for deep submicron (DSM), bulk CMOS technologies. Technology scaling is resulting in a 3×-5× increase in transistor I_OFF/μm per generation causing 15-30% degradation in the noise margin of high performance domino gates. We investigate several techniques that can improve the noise margin of domino logic gates and thereby ensure their reliable operation for sub-130 nm technologies. Our results indicate that, selective usage of dual V_TH transistors shows acceptable energy-delay tradeoffs for the 90 nm technology. However, techniques like supply voltage (V_cc) reduction or using non-minimum L_e transistors are required in order to ensure robust and low power operation of wide-OR domino designs for the 70 nm generation.     

Elimination of poly-Si gate depletion for sub-65-nm CMOS technologies by excimer laser annealing

Pulsed excimer laser annealing (ELA) is used to reduce the poly-Si gate depletion effect (to <0.1 nm). Low resistivity (0.58 m/spl Omega//spl middot/cm) and high active boron concentration (4/spl times/10/sup 20/ cm/sup -3/) at the gate-oxide interface are achieved while preserving the gate oxide quality and avoiding boron penetration, to meet International Technology Roadmap for Semiconductors requirements for sub-65-nm CMOS technology nodes. ELA is compatible with high-/spl kappa/ dielectric (HfO/sub 2/) and results in significantly lower gate leakage current density as compared with rapid thermal annealing (RTA).     

Fluorine-assisted super-halo for sub-50-nm transistors

The potential of using a fluorine-assisted super-halo for sub-50-nm transistors is analyzed for the first time. The capability of producing a super-sharp halo using fluorine is demonstrated by one-dimensional (1-D) SIMS profiles. The added ability to tailor the halo profile using fluorine for different transistor criteria on junction capacitance, tunneling current, V/sub t/ roll-off, and mobility is demonstrated. The impact of the resulting fluorine-assisted halo dopant profile on the transistor characteristics is evaluated using TCAD simulations. Experimental data show that the fluorine-assisted halo process results in lowered junction capacitance and improved I/sub on/-I/sub off/ characteristics for both nMOS and pMOS.     

Interconnect accelerating techniques for sub-100-nm gigascale systems

This work describes new circuits called capacitor coupling trigger and capacitor coupling accelerator (CCA) circuits used to reduce the long interconnect RC delay in sub-100-nm processes. The proposed circuits use capacitors to split the output driving paths to eliminate the short-circuit current and thus improve the signal transition time. Besides, the capacitor coupling technique is applied to adjust the gate threshold voltage of the proposed circuits and isolate the input signal from the output driving transistors. The proposed circuits are faster than the prior circuits. Furthermore, the CCA can be applied to bi-directional interface, multiports bus, field-programmable gate array interconnections, and complex dynamic logic circuits.     

An ultrathin vertical channel MOSFET for sub-100-nm applications

An ultrathin vertical channel (UTVC) MOSFET with an asymmetric gate-overlapped low-doped drain (LDD) is experimentally demonstrated. In the structure, the UTVC (15 nm) was obtained using the cost-effective solid phase epitaxy, and the boron-doped poly-Si/sub 0.5/Ge/sub 0.5/ gate was adopted to adjust the threshold voltage. The fabricated NMOSFET offers high-current drive due to the lightly doped (<1/spl times/10/sup 15/ cm/sup -3/) channel, which suppresses the electron mobility degradation. Moreover, an asymmetric gate-overlapped LDD was used to suppress the offstate leakage current and reduce the source/drain series resistance significantly as compared to the conventional symmetrical LDD. The on-current drive, offstate leakage current, subthreshold slope, and DIBL for the fabricated 50-nm devices are 325 /spl mu/A//spl mu/m, 8/spl times/10/sup -9/ /spl mu/A//spl mu/m, 87 mV/V, and 95 mV/dec, respectively.     

Shallow junctions on pillar sidewalls for sub-100-nm vertical MOSFETs

A simple process for the fabrication of shallow drain junctions on pillar sidewalls in sub-100-nm vertical MOSFETs is described. The key feature of this process is the creation of a polysilicon spacer around the perimeter of the pillar to connect the channel to a polysilicon drain contact. The depth of the junction on the pillar sidewall is primarily determined by the thickness of the polysilicon spacer. This process is CMOS compatible and, hence, facilitates the integration of a sub-100-nm vertical MOSFET in a planar CMOS technology using mature lithography. The fabricated transistors have a subthreshold slope of 95 mV/dec (at V/sub DS/=1 V) and a drain-induced barrier lowering of 0.12 V.     

Engineering S/D diffusion for sub-100-nm channel SOI MOSFETs

This paper discusses the importance of controlling the lateral diffusion of impurities around the source and drain (S/D) junctions in sub-100-nm channel single-gate silicon-on-insulator (SOI) MOSFETs. Since any reduction in lateral diffusion length must consider the tradeoff between drivability and short-channel effect with regard to the threshold voltage, optimization of lateral diffusion length is essential in the device design stage. We note that the net performance improvement offered by device-scaling is quite limited, even if lateral diffusion length is optimized in some way. It seems obvious that high-/spl kappa/ materials are needed in order to improve net device performance in the sub-100-nm technology regime. In addition, with regard to the impact of the thermal budget on lateral diffusion control, new doping materials such as Sb and In, will be required in the near future. In the case of nMOSFET, however, advanced structures, such as an elevated layer, and advanced annealing process are needed to provide enhanced control of S/D diffusion regions.     

Optimization of embedded compact nonvolatile memories for sub-100-nm CMOS generations

The performance of compact nonvolatile memory cells, meant for embedded applications in advanced CMOS processes, is studied and analyzed in detail by means of technology computer-aided design (TCAD), and new experimental results are presented. Improvement of the memory performance is achieved. The key element of this improvement is access gate oxide thickness reduction combined with suitable design of the channel/source/drain doping profiles. An increase of the memory readout current by a factor of two was achieved with an excellent low-leakage current level of the access gate transistor. The increase of the read current allows faster read access, while the excellent subthreshold behavior of the access gate transistor allows aggressive scaling of the access gate length down to 160 nm. A gate voltage as low as 1 V can be used for reading the cell, so there is no need for voltage boosting. The source-side injection programming speed is increased by one order of magnitude for devices with thin access gate oxide. The compact cell is suited for embedded applications in sub-100-nm CMOS generations.     

Highly manufacturable advanced gate-stack technology for sub-45-nm self-aligned gate-first CMOSFETs

Issues surrounding the integration of Hf-based high-/spl kappa/ dielectrics with metal gates in a conventional CMOS flow are discussed. The careful choice of a gate-stack process as well as optimization of other CMOS process steps enable robust metal/high-/spl kappa/ CMOSFETs with wide process latitude. HfO/sub 2/ of a 2-nm physical thickness shows a very minimal transient charge trapping resulting from kinetically suppressed crystallization. Thickness of metal electrode is also a critical factor to optimize physical-stress effects and minimize dopant diffusion. A high-temperature anneal after source/drain implantation in a conventional CMOSFET process is found to reduce the interface state density and improve the electron mobility. Even though MOSFET process using single midgap metal gate addresses fundamental issues related to implementing metal/high-/spl kappa/ stack, integrating two different metals on the same wafer (i.e., dual metal gate) poses several additional challenges, such as metal gate separation between n- and pMOS and gate-stack dry etch. We demonstrate that a dual metal gate CMOSFET yields high-performance devices even with a conventional gate-first approach if an appropriate metal separation between band-edge metal for nMOS and pMOS is incorporated. Optimization of dry-etch process enables gentle and complete removal of two different metal gate stacks on ultrathin high-/spl kappa/ layer.     

A power efficient 26-GHz 32:1 static frequency divider in 130-nm bulk CMOS

A 32:1 static frequency divider consisting of five stages of 2:1 dividers using current mode logic (CML) was fabricated in a 130-nm bulk complementary metal-oxide semiconductor (CMOS) logic process. By optimizing transistors size, high operating speed is achieved with limited power consumption. For an input power of 0dBm, the 32:1 divider operates up to 26GHz with a 1.5-V supply voltage. The whole 32:1 chain including buffers consumes 8.97mW and the first stage consumes only 3.88mW at a 26-GHz operation. The power consumption of the first 2:1 stage is less than 15% of other bulk CMOS static frequency dividers operating at the same frequency.     

90-nm CMOS for microwave power applications

We report, for the first time, the experimental evaluation of a very short channel 90-nm CMOS transistor under RF over-voltage conditions. At 9 GHz and 1.5 V supply a 40 /spl mu/m gate width device is able to deliver 370 mW/mm output power with a PAE of 42% and a transducer power gain of 15 dB. Measurement results at 3 and 6 GHz is also presented. The transistor does not show any degradation in either dc or RF performance after prolonged operation at 1 and 6 dB compression. Simulation show, that the peak voltage, V/sub ds/ at this condition is 3.0 V, while the maximum allowed dc supply voltage is limited by the design rules to 1.2 V. We show for the first time that nanometer-scale CMOS can be used for microwave power applications with severe RF over-voltage conditions without any observable degradation.     

A novel approach for the patterning and high-volume production of sub-40-nm gates

A novel approach for the patterning and manufacturing of sub-40-nm gate structures is presented. Rather than using resist or an inorganic hardmask as the patterning layer, this gate patterning scheme uses an amorphous carbon (a:C) and cap hardmask to pattern small gates. Healthy and manufacturable gate lengths have been achieved below 35 nm with this scheme, and the potential exists for further extendibility.     

Low power finite state machine synthesis using power-gating

Power-gating turns off the power supply of a portion of the circuit completely, resulting in total elimination of power consumption for that part. However, it also necessitates that the sub-circuit to be activated should be charged for some time before its activation. This critical issue can influence the decomposition of a finite state machine (FSM) for its power gated implementation. In this paper we have presented a power-gating method that integrates FSM partitioning with state encoding, thus providing a total solution to the problem of power-aware FSM synthesis. It shows better results, in terms of dynamic and leakage power consumption, compared to the existing techniques reported in the literature.     

Advanced gate etching for accurate CD control for 130-nm node ASIC manufacturing

This paper presents a methodology for gate trim etching to obtain accurate critical dimension (CD) control for 130-nm node ASIC manufacturing. In order to reduce mask-to-mask CD variation in gate trim etching, correlation between mask layout and amount of gate trim is investigated. It is found that trim rate strongly depends on gate peripheral length. A novel feed-forward technology to reduce both wafer-to-wafer variation and mask-to-mask variation is developed with the knowledge of peripheral length effect. This technology can also reduce CD variation within die and the CD bias between dense and isolated lines is compensated by optical proximity correction rules. This novel feed-forward technology is one solution for improving every gate CD variation: within die, within wafer, wafer-to-wafer, and mask-to-mask.     

Forward body bias for microprocessors in 130-nm technology generation and beyond

Device and test chip measurements show that forward body bias (FBB) can be used effectively to improve performance and reduce complexity of a 130-nm dual-V/sub T/ technology, reduce leakage power during burn-in and standby, improve circuit delay and robustness, and reduce active power. FBB allows performance advantages of low-temperature operation to be realized fully without requiring transistor redesign, and also improves V/sub T/ variations, mismatch, and saturation transconductance and output resistance product (g/sub m//spl times/r/sub o/).     

A device design methodology for sub-100-nm SOC applications using bulk and SOI MOSFETs

CMOS for the mixed-mode applications has gained much interest recently. While the International Technology Roadmap for Semiconductors provides two different scaling guidelines for the analog and digital circuit operation using the bulk MOSFET, there are no well-defined scaling guidelines for improving the analog performance of silicon-on-insulator (SOI) MOSFETs. This paper presents a systematic and quantitative comparison between the analog characteristics of the bulk and SOI technology. The intrinsic gain, f/sub T/ and g/sub m//I/sub ds/ ratio are considered as a metric for this comparison. It is shown that, even for the operating frequencies in the range of gigahertz (where the ac kink effect is suppressed), analog performance of SOI devices is inferior to that of the bulk devices due to the capacitive drain-to-body coupling. Based on our study, we show that hat the gate-workfunction engineering (close to mid-gap workfunction) is essential in fully depleted SOI (FDSOI) devices for improving analog performance. The analog performance of partially depleted SOI (PDSOI) devices can be improved by using body-tied structures. An increased gate control in double-gate MOSFETs can provide very high output resistance for short-channel devices.