The System Si3N4-SiO2-Y2O3

Subsolidus phase relations were established in the system Si₃N₄-SiO₂-Y₂O₃. Four ternary compounds were confirmed, with compositions of Y₄Si₂O₇N₂, Y₂Si₃O₃N₄, YSiO₂N, and Y₁₀(SiO₄)₆N₂. The eutectic in the triangle Si₃N₄-Y₂Si₂O₇-Y₁₀(SiO₄)₆N₂ melts at 1500°C and that in the triangle Si₂N₂O-SiO₂-Y₂Si₂O₇ at 1550°C. The eutectic temperature of the Si₃N₄-Y₂Si₂O₇ join was ∼ 1520°C.     

Formation of α-Si3N4 Solid Solutions in the System Si3N4-A1N-Y2O3

The subsolidus phase diagram of the quasiternary system Si₃N₄-AlN-Y₂O₃ was established. In this system α-Si₃N₄ forms a solid solution with 0.1Y₂O₃: 0.9 AIN. The solubility limits are represented by Y_0.33Si_10.5Al_1.5O_0.5N_15.5 and Y_0.67Si₉A1₃ON₁₅. At 1700°C an equilibrium exists between β-Si₃N₄ and this solid solution.     

Subsolidus Phase Relationships in Part of the System Si,Al,Y/N,O: The System Si3N4─AIN─YN─Al2O3─Y2O3

The subsolidus phase relationships in the system Si,Al,Y/N,O were determined. Thirty-nine compatibility tetrahedra were established in the region Si₃N₄─AIN─Al₂O₃─Y₂O₃. The subsolidus phase relationships in the region Si₃N₄─AIN─YN─Y₂O₃ have also been studied. Only one compound, 2YN:Si₃N₄, was confirmed in the binary system Si₃N₄─YN. The solubility limits of the α'─SiAION on the Si₃N₄─YN:3AIN join were determined to range from m = 1.3 to m = 2.4 in the formula Y _{m /3}Si_{12- m} Al _m N₁₆. No quinary compound was found. Seven compatibility tetrahedra were established in the region Si₃N₄─AIN─YN─Y₂O₃.     

Compressive Creep and Oxidation Resistance of an Si3N4 Material Fabricated in the System Si3N4-Si2N2O-Y2Si2O7

The compressive creep behavior and oxidation resistance of an Si₃N₄/Y₂Si₂O₇ material (0.85Si₃N₄+0.10SiO₂+0.05Y₂O₃) were determined at 1400°C. Creep re sistance was superior to that of other Si₃N₄ materials and was significantly in creased by a preoxidation treatment (1600°C /120 h). An apparent parabolic rate constant of 4.2 × 10⁻¹¹ kg²·m-⁴·s⁻¹ indicates excellent oxidation resistance.     

Densification Behavior and Properties of Y2O3-Containing α-SiAlON-Based Composites

Different SiAION composites based on α'-SiAION are investigated, with respect to the phase relationships, densification behavior, and mechanical properties. The compositions are located on a phase-diagram line parallel to the Si₃N₄-Y₂O₃ 9AIN compound in the Si₃N₄-SiO₂-AlN-Al₂O₃-Y₂O₃-YN system. Analysis of the reaction sequences shows that the formation of the composites is associated with the transient appearance of Y₄A1₂O₉ (YAM), yttrium-aluminum-garnet (YAG), melilite, and a nitrogen-rich liquid phase. The small shift of compositions on the Si₃N₄-Y₂O₃-9AIN compound phase-diagram line toward the Al₂O₃-rich side offers the advantage of a higher sinterability and the removal of the melilite phase from a wide range of compositions containing α'-SiAlON and polytypes. The α'/β'-SiAlON composites show better mechanical properties in comparison to pure α'-SiAlON and composites of α'-SiAION and polytypes. A post-heat-treatment causes the crystallization of YAG as a grain-boundary phase and leads to excellent strength retention up to temperatures of 1350°C.     

Sintering of Si3N4-Y2O3-Al2O3

Sintering kinetics of the system Si₃N4-Y2O₃-Al₂O3 were determined from measurements of the linear shrinkage of pressed disks sintered isothermally at 1500° to 1700°C. Amorphous and crystalline Si₃N₄ were studied with additions of 4 to 17 wt% Y₂O₃ and 4 wt% A1₂O₃. Sintering occurs by a liquid-phase mechanism in which the kinetics exhibit the three stages predicted by Kingery's model. However, the rates during the second stage of the process are higher for all compositions than predicted by the model. X-ray data show the presence of several transient phases which, with sufficient heating, disappear leaving mixtures of β ' -Si₃N₄ and glass or β '-Si₃N₄, α '-Si₃N₄, and glass. The compositions and amounts of the residual glassy phases are estimated.     

Hydrothermal Treatment of Si3N4 for the Improvement of Oxidation Resistance at 1400°C

The surface of Si₃N₄ ceramics was hydrothermally treated with HCl or H₂SO₄ using an autoclave. The thickness of the oxide layers formed on the Si₃N₄ samples decreased to one-fourth after oxidation at 1400°C by the treatment. The oxide layer of the treated samples was dense, and flaw formation in and beneath the layer did not occur at 1400°C. The avoidance of low melting Y-silicates by leaching Y₂O₃ is the reason for the improved oxidation resistance of the hydrothermally treated Si₃N₄, despite an increase in surface porosity through a 70 μm layer.     

Hot Isostatic Processing of Shocked Si3N4 Powder

To enhance the sinter ability of Si₃N₄, powders mixed with 0, 2, and 5 wt% Y₂O₃ were explosively shock-treated. Compacts of these powders were encapsulated in 96% silica glass containers and isostatically hot-pressed. The shocked Si₃N₄ with 5 wt% Y₂O₃ was pressed to a density of 3.09 g/cm³ (95.4% of theoretical) at 1400°C under 430 MPa for 3 h, whereas the unshocked material attained only 82.4% of theoretical density under the same hot isostatic pressing conditions.     

Synthesis of Porous Si3N4 Ceramics with Rod-Shaped Pore Structure

Porous Si₃N₄ ceramics were synthesized by pressureless sintering of green compacts prepared using slip casting of slurries containing Si₃N₄, 5 wt% Y₂O₃+2 wt% Al₂O₃, and 0–60% organic whiskers composed of phenol–formaldehyde resin with solids loading up to 60 wt%. Rheological properties of slurries were optimized to achieve a high degree of dispersion with a high solid-volume fraction. Samples were heated at 800°C in air and sintered at 1850°C in a N₂ atmosphere. Porosities ranging from 0% to 45% were obtained by the whisker contents (corresponding to 0–60 vol% whisker). Samples exhibited a uniform pore distribution. Their rod-shaped pore morphology originated from burnout of whiskers, and an extremely dense Si₃N₄ matrix.     

Characteristics of ZrO2-Dispersed Si3N4 without Additives Fabricated by Hot Isostatic Pressing

Dense, ZrO₂-dispersed Si₃N₄ composites without additives were fabricated at 180 MPa and ∼1850° to 1900°C for l h by hot isostatic pressing using a glass-encapsulation method; the densities reached >96% of theoretical. The dispersion of 20 wt% of 2.5YZrO₂ (2.5 mol% Y₂O₃) in Si₃N₄ was advantageous to increase the room-temperature fracture toughness (∼7.5 MPa˙m^1/2) without degradation of hardness (∼15 GPa) because of the high retention of tetragonal ZrO₂. The dependence of fracture toughness of Si₃N₄–2.5YZrO₂ on ZrO₂ content can be related to the formation of zirconium oxynitride because of the reaction between ZrO₂ and Si₃N₄ matrix in hot isostatic pressing.     

Controlled Crystallization in Self-Reinforced Silicon Nitride with Y2O3, SrO, and CaO: Crystallization Behavior

The controlled crystallization of the amorphous grain boundary phase has been examined in a series of self-reinforced Si₃N₄ materials with added Y₂O₃, SrO, and CaO. The effects of time, temperature, atmosphere, glass content, glass chemistry, and matrix Si₃N₄ on the crystallization have been investigated. The stability of the crystallized product, the crystallization kinetics ( T-T-T curve), and crystallization mechanisms have also been examined. Crystallization produced an oxynitroapatite containing Y, Sr, and Ca over a broad range of heat-treatment conditions and glass compositions. The oxynitroapatite was compatible with Si₃N₄ and remained stable up to 1600°C. At low temperatures (<1350°C), the rate-limiting crystallization mechanism was oxygen diffuson in the glass, and at higher temperatures (>1350°C) the rate-limiting crystallization step changed to either the formation of new Si₃N₄ grains or solute diffusion in the glass.     

Microstructure and Short-Term Oxidation of Hot-Pressed Si3N4/ZrO2(+Y2O3) Ceramics

Composite ceramic materials based on Si₃N₄ and ZrO₂ stabilized by 3 mol% Y₂O₃ have been formed using aluminum isopropoxide as a precursor for the Al₂O₃ sintering aid. Densification was carred out by hot-pressing at temperatures in the range 1650° to 1800°C, and the resulting micro-structures were related to mechanical properties as well as to oxidation behavior at 1200°C. Densification at the higher temperatures resulted in a fibrous morphology of the Si₃N₄ matrix with consequent high room-temperature toughness and strength. Decomposition of the ZrO₂ grains below the oxidized surface during oxidation introduced radial stresses in the subscalar region, and from the oxidation experiments it is suggested that the ZrO₂ incorporated some N during densification.     

Characteristics of Si3N4-SiO2-Ce2O3 Compositions Sintered in High-pressure Nitrogen

Full-density Si₃N₄-SiO₂-Ce₂O₃ compositions were prepared by sintering with 2.5 MPa nitrogen pressure at temperatures of 1900° and 2090°C. Room-temperature flexural strengths near 700 MPa for sintered material compared favorably with the strength of hot-pressed material. At 1370°C, where flexural strengths as high as 363 MPa were obtained, it was observed that the coarsest structure was the strongest and the finest structure was the weakest. One of the compositions tested, Si₃N₄-8.7 wt% SiO₂-8.3 wt%-Ce₂O₃, was found to have excellent 200-h oxidation resistance at 700°, 1000°, and 1370°C, without incidence of 700° to 1000°C phase instability and cracking.     

Phase Relations and Stability Studies in the Si3N4-SiO2-Y2O3 Pseudoternary System

Composite powders were hot-pressed to determine the phase relations in the Si₃N₄-SiO₂-Y₂O₃ pseudoternary system. Four quaternary compounds, Si₃Y₂O₃N₄, YSiO₂N, Y₁₀Si₇O₂₃N₄, and Y₄Si₂O₇N₂, were identified. Studies of polyphase and single-phase materials in this system showed that these 4 compounds are unstable under oxidizing conditions. Materials within the Si₃N₄-Si₂N₂O-Y₂Si₂O₇ compatibility triangle precluded the unstable compounds, and are extremely resistant to oxidation.     

Effect of Oxidation on Mechanical Properties of Fibrous Monolith Si3N4/BN at Elevated Temperatures in Air

The oxidation behavior and its effect on the mechanical properties of fibrous monolith Si₃N₄/BN after exposure to air at temperatures ranging from 1000° to 1400°C for up to 20 h were investigated. After exposure at 1000°C, only the BN cell boundary was oxidized, forming a B₂O₃ liquid phase. With increasing exposure temperature, the Si₃N₄ cells began to oxidize, forming crystalline Y₂Si₂O₇, SiO₂, and silicate glass. However, in this case, a weight loss was observed due to extensive vaporization of the B₂O₃ liquid. After exposure at 1400°C, large Y₂Si₂O₇ crystals with a glassy phase formed near the BN cell boundaries. The oxidation behavior significantly affected the mechanical properties of the fibrous monolith. The flexural strength and work-of-fracture decreased with increasing exposure temperature, while the noncatastrophic failure was maintained.     

Phase Equilibria and Ionic Conductivity in the System ZrO2−Yb2O3−Y2O3

The phase equilibria in the zirconia-rich part of the system ZrO₂−Yb₂O₃−Y₂O₃ were determined at 1200°, 1400°, and 1650°C. The stabilizing effects of Yb₂O₃ and Y₂O₃ were found to be quite similar with <10 mol% of either being necessary to fully stabilize the cubic fluorite-structure phase at 1200°C. The two binary ordered phases, Zr₃Yb₄O₁₂ and Zr₃Y₄O₁₂, are completely miscible at 1200°C. These were the only binary or ternary phases detected. The ionic conductivities of ternary specimens in this system were measured using the complex impedance analysis technique. For a given level of total dopant, the substitution of Yb₂O₃ for Y₂O₃ gives only minor increases in specimen conductivity.     

Ionic Conductivity of Cubic Solid Solutions in the System CaO—Y2O3—ZrO2

The ionic conductivity of cubic solid solutions in the system CaO -Y₂O₃-ZrO₂ was examined. Particular Y₂O₃-ZrO₂ binary compositions were more conductive at elevated temperatures (>600°C) than either CaO-ZrO₂ binary or CaO-Y₂O₃-ZrO₂ ternary compositions. The higher ionic conductivity appears to be related to a lower activation energy rather than to the number of oxygen vacancies dictated by composition. Those compositions of highest conductivity lie close to the cubic-monoclinic solid-solution phase boundary. Conductivity-temperature data are presented that indicate a reversible order-disorder transition for Y₂O₃-ZrO₂ cubic solid solutions containing 20 and 25 mole % Y₂O₃. The transference number for the oxygen ion at 1000°C for Y₂O₂-ZrO₂ cubic solid solutions is greater than 0.99.     

Microstructure of Y2O3 Fluxed Hot-Pressed Silicon Nitride

Detailed microstructural analysis of a 10 mol% Y₂O₃ fluxed hot-pressed silicon nitride reveals that, in addition to the yttrium-silicon oxynitride phase located at the multiple Si₃N₄ grain junctions, there is a thin boundary phase 10 to 80 Å wide separating the silicon nitride and the oxynitride grains. Also, X-ray microanalysis from regions as small as 200 Å across demonstrates that the yttrium-silicon oxynitride, Y₂Si(Si₂O₃N₄), phase can accommodate appreciable quantities of Ti, W, Fe, Ni, Co, Ca, Mg, Al, and Zn in solid solution. This finding, together with observations of highly prismatic Si₃N₄ grains enveloped by Y₂Si(Si₂O₃N₄), suggests that densification occurred by a liquid-phase "solution-reprecipitation" process.     

Sintering of Si3N4-Y2O3 Under Nitrogen Pressure

This study shows that the amount ofAl₂O₃ needed to form high density Si₃N₄-15Y₂-O₃ samples can be reduced by using high surface area Si₃N₄ powder and high N₂ overpressure (high sintering temperatures) during the sintering process. The reduction in AI₂O₃ content results in improved oxidation resistance of the sintered samples.     

Change in Oxygen Content of Y2O3-Nd2O3-Doped Silicon Nitride During Firing

The oxygen content of silicon nitride with 1 mol% Y₂O₃—Nd₂O₃ additive was measured after firing to determine the compositional change during gas-pressure sintering. Oxygen content decreases from 2.5 to 0.94 wt% during firing for 4 h at 1900°C and 10-MPa pressure in N₂. This decrease in oxygen results from the release of SiO gas generated by a thermaldecomposition reaction between Si₃N₄ and SiO₂. The resultant sintered silicon nitride material contains less than 1 wt% oxygen.