Anodization of Al–Nd alloy films in nonaqueous electrolyte solutions for TFT-LCD application

The anodization behavior of Al–Nd alloys in nonaqueous electrolyte solutions and the electronic properties of the resultant anodic oxide films were studied for TFT-LCD application. Sputtered Al–Nd alloy films on glass substrates were anodized at 25 °C and 1 mA cm⁻² up to 100 V in ethylene glycol–water solutions containing 10 wt.% ammonium tartrate or salicylate to give uniform and flat oxide films. The incorporation of organic components into the anodic oxide films from the electrolyte solutions has lowered the relative permittivity and increased the breakdown electric field of the oxide films. This was performed by decreasing the water content in the electrolyte solutions. The tartrate solution caused higher carbon incorporation than the salicylate counterpart at the same water concentrations, giving lower relative permittivity, and higher forward breakdown electric field. The AlO stretching frequency of the oxide films decreased slightly as the amount of incorporated organic moieties increased. Nd was uniformly distributed in the oxide films and an increase in the Nd content was likely to increase both the relative permittivity and the forward breakdown electric field without any apparent change in the anodization behavior.     

Oxide film growth on Al-In alloys in a borate buffer solution in conditions of galvanostatic anodising

Anodic oxide films have been formed galvanostatically on Al-In alloys (containing up to 0.074% In) in a borate buffer solution (pH 7.8) at different current densities (20-100 μA cm⁻²). The mechanism, kinetics of growth and properties of formed oxide films have been investigated. The study of charge curves suggests that the growth of oxide films on Al-In alloys occurs by an activation-controlled ionic conduction under the influence of the high electric field through the oxide film according to an exponential law, like on valve metals. The following parameters have been calculated: the constants of the exponential law, ionic conductivity through the film, the effective activation distance for ion movement and the corresponding field strength. The values for the field strength, of the order of magnitude of 10⁶ V cm⁻¹, justify the application of the high field migration mechanism. Properties of anodic oxide films have been determined by means of electrochemical impedance spectroscopy; the resistance and thickness of the oxide film have been found to increase with the increase in the indium content in the alloy and with increased anodic current density. It has been established that the current efficiency in oxide films formation on Al-In alloys is lower than 100%: the increase of the indium content in the alloy, as well as the increase in anodic current density, increases the value of current efficiency.     

Luminescence properties of oxide films formed by anodization of aluminum in 12-tungstophosphoric acid

In this paper, we have investigated luminescence properties of oxide films formed by anodization of aluminum in 12-tungstophosphoric acid. For the first time we have measured weak luminescence during anodization of aluminum in this electrolyte (so-called galvanoluminescence GL) and showed that there are wide GL bands in the visible region of the spectrum and observed two dominant spectral peaks. The first one is at about 425 nm, and the second one shifts with anodization voltage. As the anodization voltage approaches the breakdown voltage, a large number of sparks appear superimposed on the anodic GL. Several intensive band peaks were observed under breakdown caused by electron transitions in W, P, Al, O, H atoms. Furthermore, photoluminescence (PL) of anodic oxide films and anodic-spark formed oxide coatings were performed. In both cases wide PL bands in the range from 320 nm to 600 nm were observed.     

Surface characteristics of titanium anodized in the four different types of electrolyte

This study evaluated the surface characteristics of titanium modified by anodic spark oxidation and a subsequent hydrothermal treatment. The electrolytic compositions of the experimental groups are as follows: GA: 0.015 M dl-α-glycerophosphate disodium salt hydrate (dl-α-GP) and 0.2 M calcium acetate (CA), GB: anodized in 0.015 M β-GP (glycerophosphate disodium salt) and 0.2 M CA, GC: anodized in 0.015 M GP (glycerophosphate disodium salt) and 0.2 M CA, and GD: anodized in 0.015 M GP-Ca (glycerophosphate calcium salt) and 0.2 M CA. Anodic spark oxidation was carried out at 30 mA/cm² to 290 V. In addition, the anodized samples were treated hydrothermally at 300 °C for 2 h in an autoclave system. Regardless of the electrolytic composition, the anodic oxide films on the titanium surface contained pores ∼5 μm in size and the diameter was larger at the protrusion parts than that at the lower parts. The phase of the anodic oxide layer consisted mainly of anatase with a small amount of rutile. HA crystals precipitated on the porous titanium oxide layer after a hydrothermal treatment. Moreover, the morphology of the HA crystals was a dense fine needle shape, which changed according to the electrolytic composition. The mean surface roughness (R_a) was highest in group GB at 0.437 μm. The R_a values of the hydrothermally treated group was approximately 0.14-0.2 μm higher than the anodized groups. Anodic spark oxidation and the hydrothermal treatment resulted in increasing corrosion potential and decreasing corrosion current density, which means an improvement in the corrosion resistance. The surface activity of the specimens in Hanks’ solution was GD > GA > GB > GC.     

Enhanced electrochromic performance of macroporous WO3 films formed by anodic oxidation of DC-sputtered tungsten layers

Self-organized macroporous tungsten trioxide (WO₃) films are obtained by anodic oxidation of DC-sputtered tungsten (W) layers on 10 mm × 25 mm indium tin oxide (ITO)-coated glass. Under optimized experimental conditions, uniformly macroporous WO₃ films with a thickness of ca. 350 nm are formed. The film shows a connected network with average pore size of 100 nm and a pore wall thickness of approximately 30 nm. The anodized film becomes transparent after annealing without significant change in macroporous structure. In 0.1 M H₂SO₄, the macroporous WO₃ films show enhanced electrochromic properties with a coloration efficiency of 58 cm² C⁻¹. Large modulation of transmittance (∼50% at 632.8 nm) and a switching speed of about 8 s are also achieved with this macroporous film.     

Designing micro-nano structure of anodized iron oxide films by metallographic adjustment on T8 steel

In this study, the anodized iron oxide films with micro-nano structure were prepared by a combination of heat treatment and anodization. The adjustment of these oxide films at the micron-scale was achieved by heat treatment on substrate to modify the position of the cementite and ferrite. The distribution and existing forms of carbon on cementite and ferrite determine the morphology of their respective anodization. It was found annealing at 300 °C can improve the crystallinity of iron oxide and maintain the original micro-nano structure. Although the crystal quality of iron oxide can be further improved with higher annealing temperature, it would result in the collapse of nanoporous structures and the reconstruction of the surface morphology. Furthermore, anodized samples made from those with lamellar ferrite and cementite show better specific capacitance. The iron oxide film on the annealed substrate obtained the highest specific capacitance of 35.3 mF/cm² at a scan rate of 20 mV/s in our samples.     

Microstructure and electrical conductivity of Mo/TiN composite powder for alkali metal thermal to electric converter electrodes

A Mo/TiN composite powder has been synthesized by a sol–gel method to improve the electrical performance and microstructural stability of the alkali metal thermal to electric converter electrode. The core (TiN)–shell (Mo) structure of the composite powder is confirmed by energy-dispersive X-ray spectroscopy and scanning electron microscopy. The composite powder is primarily composed of submicron (400–800 nm) particles that are coated on a core (>3–5 μm) particle. The Mo/TiN composite electrode exhibits high electrical conductivities of 1000 Scm⁻¹ at 300 °C and 260 Scm⁻¹ at 700  °C in an Ar atmosphere. The electrode exhibits excellent tolerance against grain growth during thermal cycling tests (R.T.↔800 °C), where the average growth rate of Mo grains in the Mo/TiN composite electrodes is controlled less than 0.5%/time (0.62→0.65 μm), while the growth rate in Mo electrodes is 306.7%/time (0.24→3.92 μm). It can be concluded that the Mo/TiN composite powder will suppress the degradation of the electrode and enhance the performance and durability of the unit cell at elevated temperatures.     

Scanned Probe Oxidation on p-GaAs(100) Surface with an Atomic Force Microscopy

Locally anodic oxidation has been performed to fabricate the nanoscale oxide structures on p-GaAs(100) surface, by using an atomic force microscopy (AFM) with the conventional and carbon nanotube (CNT)-attached probes. The results can be utilized to fabricate the oxide nanodots under ambient conditions in noncontact mode. To investigate the conversion of GaAs to oxides, micro-Auger analysis was employed to analyze the chemical compositions. The growth kinetics and the associated mechanism of the oxide nanodots were studied under DC voltages. With the CNT-attached probe the initial growth rate of oxide nanodots is in the order of ~300 nm/s, which is ~15 times larger than that obtained by using the conventional one. The oxide nanodots cease to grow practically as the electric field strength is reduced to the threshold value of ~2 × 10⁷ V cm⁻¹. In addition, results indicate that the height of oxide nanodots is significantly enhanced with an AC voltage for both types of probes. The influence of the AC voltages on controlling the dynamics of the AFM-induced nanooxidation is discussed.     

Importance of water content in formation of porous anodic niobium oxide films in hot phosphate-glycerol electrolyte

Niobium has been anodized at a constant current density to 10 V with a current decay in 0.8 mol dm⁻³ K₂HPO₄-glycerol electrolyte containing 0.08-0.65 mass% water at 433 K to develop porous anodic oxide films. The film growth rate is markedly increased when the water content is reduced to 0.08 mass%; a 28 μm-thick porous film is developed in this electrolyte by anodizing for 3.6 ks, while the thickness is 4.6 and 2.6 μm in the electrolytes containing 0.16 and 0.65 mass% water respectively. For all the electrolytes, the film thickness changes approximately linearly with the charge passed during anodizing, indicating that chemical dissolution of the developing oxide is negligible. SIMS depth profiling analysis was carried for anodic films formed in electrolyte containing ∼0.4 mass% water with and without enrichment of H₂¹⁸O. Findings disclose that water in the electrolyte is a predominant source of oxygen in the anodic oxide films. The anodic films formed in the electrolyte containing 0.65 mass% water are practically free from phosphorus species. Reduction in water content increased the incorporation of phosphorus species.     

Evidence and analysis of parallel growth mechanisms in Cu2O films prepared by Cu anodization

We have studied the preparation of Cu₂O films by copper anodization in a 0.1 M NaOH electrolyte. We identified the potential range at which Cu⁺ dissolution takes place then we prepared films with different times of exposure to this potential. The morphology, crystalline structure, band gap, Urbach energy and thickness of the films were studied. Films prepared with the electrode unexposed to the dissolution potential have a pyramidal growth typical of potential driven processes, while samples prepared at increasing exposure times to dissolution potential present continuous nucleation, growth and grain coalescence. We observed a discrepancy in the respective film thicknesses calculated by coulometry, atomic force microscopy and optical reflectance. We propose that anodic Cu₂O film formation involves three parallel mechanisms (i) Cu₂O nucleation at the surface, (ii) Cu⁺ dissolution followed by heterogeneous nucleation and (iii) Cu⁺ and OH⁻ diffusion through the forming oxide and subsequent reaction in the solid state.     

Li-intercalation behaviour of vanadium oxide thin film prepared by thermal oxidation of vanadium metal

In order to produce thin films of crystalline V₂O₅, vanadium metal was thermally oxidised at 500 °C under oxygen pressures between 250 and 1000 mbar for 1-5 min. The oxide films were characterised by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), X-ray diffraction (XRD) and Rutherford backscattering spectrometry (RBS). The lithium intercalation performance of the oxide films was investigated by cyclic voltammetry (CV), chronopotentiometry and electrochemical impedance spectroscopy (EIS). It was shown that the composition, the crystallinity and the related lithium intercalation properties of the thin oxide films were critically dependent on the oxidation conditions. The formation of crystalline V₂O₅ films was stimulated by higher oxygen pressure and longer oxidation time. Exposure for 5 min at 750 mbar O₂ at 500 °C resulted in a surface oxide film composed of V₂O_5, and consisting of crystallites up to 200 nm in lateral size. The thickness of the layer was about 100 nm. This V₂O₅ oxide film was found to have good cycling performance in a potential window between 3.8 and 2.8 V, with a stable capacity of 117 ± 10 mAh/g at an applied current density of 3.4 μA/cm². The diffusion coefficients corresponding to the two plateaus at 3.4 and 3.2 V were determined from the impedance measurements to (5.2 and 3.0) × 10⁻¹³ cm² s⁻¹, respectively. Beneath the V₂O₅ layer, lower oxides (mainly VO₂) were found close to the metal. At lower oxygen pressure and shorter exposure times, the oxide films were less crystalline and the amount of V⁴⁺ increased in the surface oxide film, as revealed by XPS. At intermediate oxygen pressures and exposure times a mixture of crystalline V₂O₅ and V₆O₁₃ was found in the oxide film.     

Anodic oxidation of Mg-Cu and Mg-Zn alloys

Metastable, solid-solution Mg-0.8 at.% Cu and Mg-1.4 at.% Zn alloys have been anodized up to 250 V at 10 mA cm⁻² in an alkaline phosphate electrolyte at 293 K in order to investigate the enriching of alloying elements beneath the anodic films. Rutherford backscattering spectroscopy (RBS) revealed enrichments to about 4.1×10¹⁵ Cu atoms cm⁻² and 5.2×10¹⁵ Zn atoms cm⁻², which correlate with the higher standard Gibbs free energies per equivalent for formation of copper and zinc oxides relative to that for formation of MgO. The enriched layers were of thickness about 1.5-4.0 nm by medium energy ion scattering (MEIS). The anodic films, composed mainly of magnesium hydroxide, contained copper and zinc species throughout their thicknesses; the Cu:Mg and Zn:Mg atomic ratios were about 18 and 25% of those of the alloys, respectively. Phosphorus species were present in most of the film regions, with a P:Mg atomic ratio of about 0.16. The magnesium ions in the film account for about 30% of the charge passed during anodizing.     

Corrosion resistance of plasma-anodized AZ91D magnesium alloy by electrochemical methods

Anodic coatings formed on magnesium alloys by plasma anodization process are mainly used as protective coatings against corrosion. The effects of KOH concentration, anodization time and current density on properties of anodic layers formed on AZ91D magnesium alloy were investigated to obtain coatings with improved corrosion behaviour. The coatings were characterized by scanning electron microscopy (SEM), electron dispersion X-ray spectroscopy (EDX), X-ray diffraction (XRD) and micro-Raman spectroscopy. The film is porous and cracked, mainly composed of magnesium oxide (MgO), but contains all the elements present in the electrolyte and alloy. The corrosion behaviour of anodized Mg alloy was examined by using stationary and dynamic electrochemical techniques in corrosive water. The best corrosion resistance measured by electrochemical methods is obtained in the more concentrated electrolyte 3 M KOH + 0.5 M KF + 0.25 M Na₃PO₄·12 H₂O, with a long anodization time and a low current density. A double electrochemical effects of the anodized layer on the magnesium corrosion is observed: a large inhibition of the cathodic process and a stabilization of a large passivation plateau.     

Effect of pre-nitridation treatment on the formation of anatase TiO2 films by anodization

High performance-anatase TiO₂ films were successfully formed on metallic titanium by anodization in an acidic electrolyte composed of H₂SO₄, H₃PO₄ and H₂O₂ subsequent to pre-nitridation treatment. The pre-nitridation treatment was carried out by pre-annealing metallic titanium under a nitrogen atmosphere of 0.1 MPa. The anodized films showed photocatalytic activity in photooxidization of the iodide anion into the tri-iodide anion. The nitridation treatment had a significant effect not only on the formation of anatase TiO₂ films but also on the photocatalytic activity of the anodized films.     

Ultrafast oxide nanotube formation on TiNb, TiZr and TiTa alloys by rapid breakdown anodization

The present work demonstrates ultrafast formation of nanotube bundles on titanium-based alloys, namely TiNb, TiZr and TiTa, by so-called rapid breakdown anodization (RBA). In this process anodization is carried out in chloride-perchlorate based solution for a short period of time. Within seconds, initiation of tube growth appears randomly over the anodized surface, and within a few minutes the entire sample surface can be covered with bundles of nanotubes of several 10 μm in length and some 10 nm in diameter. For all three alloys, the tubes consist of mixtures of oxides of the alloying elements. In every case, the “as formed” oxide tubes are amorphous. By annealing, the oxide nanotube powders can be converted to crystalline mixed oxide in the case of TiNb and TiZr, and a mixture of the individual oxides in the case of TiTa.     

Cathodoluminescence and electron field emission of boron-doped a-C:N films

The optical and electrical properties of so-called carbon nitride films (a-C:N) and boron doped so-called carbon nitride films (a-C:N:B) are studied with cathodoluminescence (CL) spectroscopy and electron field emission measurement. The a-C:N films were first deposited on Si by a filtered cathodic arc plasma system, and then boron ions (∼1 × 10¹⁶ cm⁻²) were implanted into the a-C:N films to form a-C:N:B films by a medium current implanter. The structural and morphological properties of a-C:N and a-C:N:B films were then analyzed using secondary ion mass spectrometer, X-ray photoelectron spectroscopy, FT-IR spectra, Raman spectroscopy and atomic force microscopy. The a-C:N film exhibits luminescence of blue light (∼2.67 eV) and red light (∼1.91 eV), and the a-C:N:B film displays luminescence of blue light (∼2.67 eV) in CL spectra measured at 300 K. Furthermore, the incorporated boron atoms change the electron field emission property, which shows a higher turn on field for the a-C:N:B film (3.6 V/μm) than that for the a-C:N film (2.8 V/μm).     

Structural features of self-organized nanopore arrays formed by anodization of aluminum in oxalic acid at relatively high temperatures

Anodic aluminum oxide (AAO) membranes with a highly ordered nanopore arrangement typically serve as ideal templates for the formation of various nanostructured materials. A typical procedure of the template preparation is based on a two-step self-organized anodization of aluminum carried out at the temperature of about 1-3 °C. In the current study, AAO templates were fabricated in 0.3 M oxalic acid under the anodizing potential range of 30-65 V at a relatively high electrolyte temperature ranging from 20 to 30 °C. Due to a high rate of porous oxide growth, about 5-10-fold higher than in low-temperature anodizing, the process of the template fabrication can be shorten significantly. Similarly to the low-temperature anodization, the best hexagonal pore arrangement is observed for samples anodized at 40 V. With a prolonged duration of the first anodizing step the order degree of triangular nanoporous lattice, observed after the second anodization, improves considerably. The effects of the anodizing potential and the process duration on the structural features of porous anodic alumina such as: pore diameter (D_p), interpore distance (D_c), porosity (P), pore density (n) and anodizing ratio (B_U) were investigated in details at various temperatures. The obtained results were compared with theoretical predictions and data reported in the literature.     

Mechanically stable flat anodic titania membranes for gas transport applications

Anodic titanium oxide (ATO) membranes were produced by two-step anodic oxidation of titanium foil in ethylene glycol electrolyte containing NH₄F at the anodization voltage of 60?V. To provide the mechanical strength necessary for applying tubular anodic films as gas membranes, we utilized the formation of protective continuous TiO₂ layer at the top film surface prior to second anodization. As compared to conventional two-step anodic oxidation this technique decreases dissolution rates of titanium oxide phases with oxidation states lower than +4 (Ti₂O₃, Ti₃O₅), which are forming between titania nanotubes during anodization. The structural parameters of anodic titania films were determined by small-angle X-ray scattering and scanning electron microscopy techniques. According to SEM the proposed method resulted in growth of ATO films with a flat surface without nanotube endings, which enabled to use the films as gas separation membranes. The permeance of individual gases through ATO membranes were found to depend on gas molecular weight (M^?0.5), with absolute values twice exceeding theoretical permeabilities as it was predicted by Knudsen diffusion (up to 63?m³/(m²?×?bar?×?h) for nitrogen at 298?K). Here we ascribe this phenomenon to diffusion according to Knudsen-Smoluchoski mechanism (diffusion with slip, involving specular reflections of molecules), which is appropriate for membranes with straight pores and smooth internal pore surfaces.     

Self-ordering of anodic porous alumina formed in organic acid electrolytes

New self-ordering porous alumina films were fabricated in organic acid electrolytes. Highly ordered cell arrangements of porous alumina films were realized in malonic acid at 120 V and tartaric acid at 195 V having 300 nm and 500 nm pore intervals, respectively. Self-organization was achieved at the maximum voltage required to induce high-current-density anodization while preventing burning, i.e., an extremely high-current flow concentrated at local points. The cells of the film grown at a high field must be pressed against each other, so that the self-ordering proceeds with the porous layer growth. When the self-ordering of cell arrangement proceeds, the cells became smaller. To improve the regularity of the cell configuration, a low electrolyte temperature and a relatively high electrolyte concentration were effective for maintaining a high-current-density to prevent burning. Surface flatness was an essential factor for self-ordering, however, the surface oxide film produced by electropolishing an aluminum substrate prevented quick pore growth in the organic acids having a low dissociation constant. It is confirmed that electropolishing followed by alkaline treatment was most appropriate as the pre-treatment in preparing flat surfaces.     

The anodic dissolution of zinc and zinc alloys in alkaline solution. I. Oxide formation on electrogalvanized steel

The polarization behaviour of zinc in alkaline solution has been investigated using atomic emission spectroelectrochemistry. By independently measuring the oxidation rate of zinc (electrical current) and the rate of Zn²⁺ dissolution (partial elemental current) it is possible to calculate the amount of insoluble zinc cations produced at any instant. Assuming the insoluble cations are present as a zinc oxide film, the growth of this film as a function of potential and time was determined. On the basis of kinetic evidence, it was found that at least three forms of zinc based oxide/hydroxide films form during polarization experiments. Type I oxide formation occurs when the metal/electrolyte interface becomes locally saturated with Zn²⁺ ions. Type II oxide forms on the metal surface underneath the film of Type I oxide but has little inhibiting effect on zinc dissolution. Type III oxide is produced in much smaller quantity and results in a transition to the passive state. This may be due to a potential induced transition of Type II → Type III oxide.