Spray pyrolysis deposition of indium sulphide thin films

In₂S₃ thin films were grown by the chemical spray pyrolysis (CSP) method using the pneumatic spray set-up and compressed air as a carrier gas. Aqueous solutions containing InCl₃ and SC(NH₂)₂ at a molar ratio of In/S = 1/3 and 1/6 were deposited onto preheated glass sheets at substrate temperatures T_s = 205-410 °C. The obtained films were characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM,) optical transmission spectra, X-ray photoelectron spectroscopy (XPS) and energy dispersive spectroscopy (EDS). According to XRD, thin films deposited at T_s = 205-365 °C were composed of the (0 0 12) orientated tetragonal β-In₂S₃ phase independent of the In/S ratio in the spray solution. Depositions performed at T_s = 410 °C led to the formation of the In₂O₃ phase, preferably when the 1/3 solution was sprayed. Post-deposition annealing in air indicated that oxidation of the sulphide phase has a minor role in the formation of In₂O₃ at temperatures up to 450 °C. In₂S₃ films grown at T_s below 365 °C exhibited transparency over 70% in the visible spectral region and E_g of 2.90-2.96 eV for direct and 2.15-2.30 eV for indirect transitions, respectively. Film thickness and chlorine content decreased with increasing deposition temperatures. The XPS study revealed that the In/S ratio in the spray solution had a significant influence on the content of oxygen (Me-O, BE = 530.0 eV) in the In₂S₃ films deposited in the temperature range of 205-365 °C. Both XPS and EDS studies confirmed that oxygen content in the films deposited using the solution with the In/S ratio of 1/6 was substantially lower than in the films deposited with the In/S ratio of 1/3.     

Industrially-styled room-temperature pulsed laser deposition of titanium-based coatings

Titanium-based compounds are widely used as coating materials for mechanical, tribological, electrical, optical, catalytic, sensoric, micro-electronical applications due to their exceptionally physical and chemical properties. Recently, the trend of using temperature-sensitive materials like polymers and tool steels with the highest hardness demands new low-temperature coating techniques for protective surface finishing as well as for surface functionalization, but up to now there is lack of industrially scaled vacuum coating techniques at temperatures below 50 °C. An alternative for overcoming this problem is the pulsed laser deposition (PLD) technique, which was up-scaled for industrial demands at Laser Center Leoben of JOANNEUM RESEARCH Forschungsgesellschaft mbH.The current paper summarizes the application of the industrially-scaled PLD technique on the deposition of the presently most important Ti-based coatings: metallic titanium, titanium nitride (TiN), titanium oxide (TiO₂) and titanium carbonitride (TiCN). PLD coating allows, even at room temperature, the formation of film structures of Zone-T type of Thornton's structure zone model, both on substrates aligned normal and parallel to the incident vapor flux. The high-energetic deposition conditions are revealed by the occurrence of (2 2 0) textures for the fcc TiN-based films. The dense grown structure affects advantageously the tribological behavior—generally, low wear rates and (for TiCN) very low friction coefficients were found. For TiO₂ coatings, growing as a mixture of β-TiO₂ and amorphous phases, the easily reproducible change of deposition parameters in the room-temperature PLD allows large differences in the optical transmission and electrical resistance.     

Impurity dependent semiconductor type of epitaxial CuFeO2 (111) thin films deposited by using a pulsed laser deposition

We have prepared CuFeO₂ thin films successfully oriented to the (111) direction on amorphous glass substrates by PLD. The average grain size analyzed by SEM images is about 80-90 nm, and CuFeO₂ grains are formed to the hexagonal flat shape which means CuFeO₂ with the rhombohedral structure was hexagonally grown on the amorphous glass substrate. P-type conductivities are commonly governed by impurities of the amount of metallic Cu phase. However, it was found that the highly (111) oriented CuFeO₂ film shows insulation properties and CuFe₂O₄ phase affects the change of the type of semiconductor from p-type to n-type.     

Effects of TiO2 doping on microstructure and properties of directed laser deposition alumina/aluminum titanate composites

ABSTRACT

Al₂O₃-based composite ceramics have excellent high temperature performance and are ideal materials for preparing hot end components. However, poor fracture toughness and thermal shock resistance limit its applications. Based on the excellent low thermal expansion characteristics and thermal shock resistance of Al₂TiO₅ ceramic, different composition ratios of Al₂O₃/Al₂TiO₅ composite ceramics were prepared by directed laser deposition (DLD) technology. Effects of TiO₂ doping amount on microstructure and properties of the composite ceramics were investigated. Results show that α-Al₂O₃ phase is discretely distributed in the continuous aluminum titanate matrix when TiO₂ doping amount between 2 and 30?mol%. With the increase of TiO₂ doping amount, content of Al₂O₃ gradually decreases and its morphology changes from cellular to dendritic. When TiO₂ doping amount reaches 43.9?mol%, the microstructure transforms into fine Al₂TiO₅/Al₆Ti₂O₁₃ eutectic structure. Property test results show that Al₂O₃/Al₂TiO₅ composite ceramics have good comprehensive mechanical properties when TiO₂ doping amount between 2 and 6?mol%.     

Ultrasonically sprayed indium sulfide buffer layers for Cu(In,Ga)(S,Se)2 thin-film solar cells

Indium sulfide layers were grown by an ultrasonic spray pyrolysis method for application in Cu(In,Ga)(S,Se)₂ solar cells. X-ray diffraction measurements of layers on soda lime glass showed polycrystalline In₂S₃ with preferential orientation along the [103] direction and X-ray photoelectron spectroscopy revealed presence or absence of oxygen and chlorine impurities depending on the composition of the spray solution. For more quantitative chemical composition measurements In₂S₃ layers were sprayed on silicon substrates and analyzed with Rutherford backscattering spectrometry. The structural and chemical information on the In₂S₃ layer sprayed with different sulfur concentrations in the chemical precursor solution are correlated to the photovoltaic performance of solar cells. Best cell efficiency of 12.4% was achieved with an ultrasonically sprayed In₂S₃ buffer layer on a Cu(In,Ga)(S,Se)₂ absorber.     

Structural,optical and electrical properties of In4Sn3O12 films prepared by pulsed laser deposition

Highly conducting (σ ∼ 2.6 × 10³ Ω⁻¹ cm⁻¹) In₄Sn₃O₁₂ films have been deposited using pulsed laser deposition (PLD) on glass and quartz substrates held at temperatures between 350 and 550 °C under chamber pressures of between 2.5 and 15 mTorr O₂. The crystallinity and the surface roughness of the films were found to increase with increasing substrate temperature. Electron concentrations of the order of 5 × 10²⁰ cm⁻³ and mobilities as high as 30 cm² V⁻¹ s⁻¹ were determined from Hall effect measurements performed on the films. Fitting of the transmission spectral profiles in the ultra-violet–visible spectrum has allowed the determination of the refractive index and extinction coefficient for the films. A red-shift in the frequency of plasmon resonance is observed with both increasing substrate temperature and oxygen pressure. Effective masses have been derived from the plasma frequencies and have been found to increase with carrier concentration indicating a non-parabolic conduction band in the material In₄Sn₃O₁₂. The optical band-gap has been determined as 3.8 eV from the analysis of the absorption edge in the UV. These results highlight the potential of these films as lower In-content functional transparent conducting materials.     

Pulsed laser deposition of conductive indium tin oxide thin films

Thin indium tin oxide (ITO) films have been grown on quartz glass substrates by pulsed laser deposition. The influence of ablation target composition and deposition conditions on the growth rate, optical transmission spectra, and carrier mobility and concentration of the films has been examined. The average surface roughness of the ITO films grown at substrate temperatures above 300°C is 2 nm. The films grown at an oxygen partial pressure of 5 mTorr using ablation targets with Sn/(In + Sn) = 5% possess high transmission (85-95%) in the visible range and low resistivity (1.8 × 10⁻⁴ Ω cm).     

The role of hydrogen in hot wire chemical vapor deposition of Ge-Sb-Te thin films

Ge-Sb-Te (GST) thin films were deposited by hot wire chemical vapor deposition using metalorganic Ge, Sb, and Te precursors. The hydrogen flow was varied in order to investigate the hydrogen influence on the deposition of GST films. A decrease of the temperature (from 450 to 350 °C) and an increase of the hydrogen concentration (from 0 to 50%) of the total gas flow result in a lowering of the deposition rate. Additionally, a higher hydrogen flow can be used to obtain smooth GST films (mean roughness—5 nm). The chemical composition of the films significantly depends on the hydrogen content. The tellurium content decreases and the antimony content increases with increasing hydrogen flow.     

Electron beam evaporation deposition and properties of Abrupt GST/Si heterojunction structure

The ternary alloy, Ge₂Te₂Sb₅ is one of the most important compounds of the GeTe-Sb₂Te₃ pseudobinary systems. Ge₂Te₂Sb₅ thin films of thickness of 100 nm-300 nm were deposited by electron beam evaporation. After annealing at different temperatures, we did X-ray diffraction measurement to characterize the structure transformation of the material. In-situ resistance measurement depending on the temperature shows that there is about three orders of magnitude change between the high resistance state (amorphous state) and the low resistance state (face-centered cubic state). To construct a heterojunction diode, we deposited Ge₂Te₂Sb₅ thin films on n-type silicon wafers. Rectification effects were observed in voltage-current measurements of the abrupt heterojunctions. Traditional voltage-current relationship of p-n junctions and metal-semiconductor junctions are used to explain the characteristics of Ge₂Te₂Sb₅/n-Si heterojunctions.     

High-rate deposition of high-quality Sn-doped In2O3 films by reactive magnetron sputtering using alloy targets

Sn-doped In₂O₃ (ITO) films were deposited on heated (200 °C) fused silica glass substrates by reactive DC sputtering with mid-frequency pulsing (50 kHz) and a plasma control unit combined with a feedback system of the optical emission intensity for the atomic O* line at 777 nm. A planar In-Sn alloy target was connected to the switching unit, which was operated in the unipolar pulse mode. The power density on the target was maintained at 4.4 W cm^− 2 during deposition. The feedback system precisely controlled the oxidation of the target surface in “the transition region.” The ITO film with lowest resistivity (3.1 × 10^− 4 Ω cm) was obtained with a deposition rate of 310 nm min^− 1 and transmittance in the visible region of approximately 80%. The deposition rate was about 6 times higher than that of ITO films deposited by conventional sputtering using an oxide target.     

XPS and AFM studies of surface chemistry and morphology of In2O3 ultrathin films deposited by rheotaxial growth and vacuum oxidation

In this paper, the results of XPS and AFM studies of the surface chemistry and morphology of In₂O₃ nanolayers obtained by rheotaxial growth and vacuum oxidation (RGVO) technology are presented. The ultrathin In films were deposited under UHV by thermal evaporation of indium pellets on the well defined Si substrate maintained at different temperatures. Optimal conditions to obtain the smallest grains and highest surface coverage have been determined, which was controlled by AFM, whereas the cleanness of deposited In nanolayers was controlled by XPS method. The ultrathin films of In₂O₃ (nm scale) were obtained in two ways, i.e. by oxidation of ultrathin films of In after their deposition, as well as by oxidation of In ultrathin films already during the deposition process. The XPS experiments showed that in both cases the obtained ultrathin films of In₂O₃ were almost stoichiometric. In turn, the AFM studies confirmed that only ultrathin films obtained during the simultaneous In deposition and oxidation exhibit almost flat surface morphology with average roughness at the level of about 0.85 nm.     

Material properties and growth control of undoped and Sn-doped In2O3 thin films prepared by using ion beam technologies

Undoped (IO) and Sn-doped In₂O₃ (ITO) films have been deposited on glass and polymer substrates by an advanced ion beam technologies including ion-assisted deposition (IAD), hybrid ion beam, ion beam sputter deposition (IBSD), and ion-assisted reaction (IAR). Physical and chemical properties of the oxide films and adhesion between films and substrates were improved significantly by these technologies. By using the IAD method, non-stoichiometry and microstructure of the films were controlled by changing assisted oxygen ion energy and arrival ratio of assisted oxygen ion to evaporated atoms. Relationships between structural and electrical properties in ITO films on glass substrates were intensively investigated by using the IBSD method with changing ion energy, reactive gas environment, and substrate temperature. Smooth-surface ITO films (R_rms ≤ 1 nm and R_p-v ≤ 10 nm) for organic light-emitting diodes were developed with a combination of deposition conditions with controlling microstructure of a seed layer on glass. IAR surface treatment enormously enhanced the adhesion of oxide films to polymer substrate. The different dependence of IO and ITO films' properties on the experimental parameters, such as ion energy and oxygen gas environment, will be intensively discussed.     

Synthesis of single crystal Bi2Te3 nanoplates via an inorganic-surfactant-assisted solvothermal route

Single crystal Bi₂Te₃ nanoplates have been successfully obtained by a solvothermal method adopting a lamellar structure as the precursor. Various techniques such as X-ray diffraction (XRD), field-emission scanning electron microscope (FESEM), high-resolution transmission electron microscope (HRTEM), and selected area electron diffraction (SAED) have been used to characterize the obtained products. The results show that the as-synthesized samples are rhombohedral-structured Bi₂Te₃ single-crystal nanoplates, whose growth direction is perpendicular to c-axis. In addition, some important experiment parameters such as the water/ethanol volume ratio and pH value have been discussed.     

Investigation of Cu(In,Ga)Se2/In2S3 diffuse interface by Raman scattering

The CIGSe/In₂S₃ interface is known to be highly diffuse because of the migration of Cu from the CIGSe into the In₂S₃. Most of the analytical techniques allowing the determination of composition profiles throughout this interface involve ion etching either during the samples preparation or during data acquisitions. In the present work, we have explored the potential of the Raman scattering for the characterization of such interfaces. This technique is non destructive and provides information on both the composition and the structure of the materials that are probed. Three CIGSe/In₂S₃ structures have been investigated; the parameter varying being the substrate temperature during the In₂S₃ deposition. For the first time we could demonstrate that at high temperature, the CuInS₂ Cu-Au phase is formed at the CIGSe/In₂S₃ interface. Furthermore, the thickness of the ordered defect compound at the CIGSe surface increases with the deposition temperature. All of the new knowledge collected during this work shows the relevance of using the Raman scattering technique for the characterization of the CIGSe/In₂S₃ interface.     

Hydrothermal synthesis of single-crystalline Bi2Te3 nanoplates

Novel Bi₂Te₃ nanoplates with about 0.2-1 μm in diagonal and 100 nm in thickness have been facilely synthesized via hydrothermal routes in the presence of polyvinylpyrrolidone (PVP). Various techniques such as X-ray diffraction (XRD), scanning electron microscope (SEM), transmission electron microscope (TEM), and Fourier transform infrared spectrometry (FT-IR) have been used to characterize the obtained products. The results show that the existence of PVP is vital to the formation of the plate-like morphology. Other factors, such as the reaction temperature and the different surfactants also have influence on the morphology of the final products to some extent.     

The effect of In ion on the optical characteristics of Er in Er/Yb:LiNbO3 crystal

The effect of In³⁺ ion on the optical characteristics of Er³⁺ ion in Er/Yb:LiNbO₃ crystal under 980 nm excitation has been investigated. The Er and Yb contents in the crystals were measured by an inductively coupled plasma atomic emission spectrometer (ICP-AES). A significant enhancement of 1.54 μm emission was observed for Er/Yb:LiNbO₃ crystal doped with 1 mol% In₂O₃. The studies on the UV-vis absorption and the OH⁻ absorption spectra indicate that the threshold concentration of In³⁺ ion decreases with the Er/Yb doping in Er/Yb/In:LiNbO₃ crystal. The 1 mol% In₂O₃ doping results in the reduction of absorption cross section in the UV-vis region, meaning the formation of Er³⁺ cluster sites. The enhancement of 1.54 μm emission is attributed to the larger probabilities of the cross relaxation processes ⁴S_3/2 + ⁴I_15/2 → ⁴I_9/2 + ⁴I_13/2 (Er), ⁴S_3/2 + ⁴I_15/2 → ⁴I_13/2 + ⁴I_9/2 (Er) and ⁴I_9/2 + ⁴I_15/2 → ⁴I_13/2 + ⁴I_13/2 (Er) induced by Er³⁺ cluster sites.     

Pulsed laser deposition of indium tin oxide nanowires in argon and helium

Nanowires of indium tin oxide (ITO) were grown on catalyst-free amorphous glass substrates at relatively low temperature of 250 °C in argon and helium ambient by the Nd:YAG pulsed laser deposition technique. All the ITO samples showed crystalline structure due to substrate heating and the (400) X-ray diffraction peak became relatively stronger as the pressure was increased. The surface morphology was also changed from compact, polycrystalline thin-film layers to a dendritic layer consisting of nanowires for some limited pressure ranges. The transition from the normal thin-film structure to nanowires was likely due to the vapor-liquid-solid mechanism but under catalyst-free condition. These nanowires tended to grow perpendicularly on the glass substrate, as observed with the transmission electron microscopy (TEM), which also confirmed that these nanowires were crystalline.     

Solvothermal synthesis of In(OH)3 nanorods and their conversion to In2O3

In this work, we demonstrate that monodisperse indium hydroxide (In(OH)₃) nanorods constructed with parallel wire-like subunits have been fabricated via a acrylamide-assisted synthesis route without any template. NH₃ from the hydrolysis of acrylamide acts as the OH⁻ provider. The structure and morphology of as-prepared products have been characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM) and thermogravimetric analysis (TG). A detailed mechanism has been proposed on the basis of time-dependent experimental results. Furthermore, by annealing In(OH)₃ precursors at 500 °C for 3 h in air, In₂O₃ samples were obtained with the designed morphology.     

First-principles study on electronic structure, phase stability, and optical properties of In2X2O7 (X═C, Si, Ge or Sn)

In₂Ge₂O₇ and In₂Si₂O₇ are commonly used as scintillation materials. More studies on In₂X₂O₇ (X═C, Si, Ge, or Sn) are important to explore the possibility of using these materials for optoelectronic devices. This work presents results dealing with structural properties, electronic structure, chemical bonding, carrier effective masses, and optical spectra of polymorphs of In₂X₂O₇ obtained from first-principles calculations. The monoclinic phase of In₂Ge₂O₇, cubic and monoclinic phases of In₂Si₂O₇, as well as cubic phase of In₂Sn₂O₇ are known in scientific literature. From the total energy calculations at high pressure/strain we have found that the monoclinic phase of In₂Si₂O₇, In₂Ge₂O₇, and In₂Sn₂O₇ can be transformed into the cubic phase. The cubic phase of In₂Ge₂O₇ and In₂Sn₂O₇ is found to be more stable than the monoclinic phase. However, the monoclinic phase of In₂C₂O₇ and In₂Si₂O₇ is more stable than the cubic phase. The phase stability study suggests that In₂C₂O₇ is not stable, and that it might dissociate into corresponding binary oxides. Effective masses of electrons and holes have been estimated. Analysis of optical properties shows that in Si solar cells In₂Si₂O₇ and In₂Sn₂O₇ can be used as antireflection coating layer.     

Structural instability of Sn-doped In2O3 thin films during thermal annealing at low temperature

We report on observations of structural stability of Sn-doped In₂O₃ (ITO) thin films during thermal annealing at low temperature. The ITO thin films were deposited by radio-frequency magnetron sputtering at room temperature. Transmission electron microscopy analysis revealed that the as-deposited ITO thin films are nanocrystalline. After thermal annealing in a He atmosphere at 250 °C for 30 min, recrystallization, coalescence, and agglomeration of grains were observed. We further found that nanovoids formed in the annealed ITO thin films. The majority of the nanovoids are distributed along the locations of the original grain boundaries. These nanovoids divide the agglomerated larger grains into small coherent domains.